後藤 康仁

最終更新日時: 2021/06/25 14:15:20

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氏名(漢字/フリガナ/アルファベット表記)
後藤 康仁/ゴトウ ヤスヒト/Gotoh, Yasuhito
所属部署・職名(部局/所属/講座等/職名)
工学研究科/電子工学専攻集積機能工学講座/准教授
学部兼担
部局 所属 講座等 職名
工学部
連絡先住所
種別 住所(日本語) 住所(英語)
職場 〒615-8510 京都市西京区京都大学桂1番地 Kyotodaigaku-Katsura, Nishikyo-ku, Kyoto 615-8510 Japan
所属学会(国内)
学会名(日本語) 学会名(英語)
応用物理学会 Japan Society of Applied Physics
電子情報通信学会 Institute of Electronics, Information and Communication Engineers
日本表面真空学会 The Japan Society of Vacuum and Surface Science
原子衝突学会 The Atomic Collision Society of Japan
取得学位
学位名(日本語) 学位名(英語) 大学(日本語) 大学(英語) 取得区分
工学修士 京都大学
博士(工学) 京都大学
出身大学院・研究科等
大学名(日本語) 大学名(英語) 研究科名(日本語) 研究科名(英語) 専攻名(日本語) 専攻名(英語) 修了区分
京都大学 大学院工学研究科修士課程電子工学専攻 修了
出身学校・専攻等
大学名(日本語) 大学名(英語) 学部名(日本語) 学部名(英語) 学科名(日本語) 学科名(英語) 卒業区分
京都大学 工学部電子工学科 卒業
職歴
期間 組織名(日本語) 組織名(英語) 職名(日本語) 職名(英語)
1987/04/〜1990/05/ 株式会社豊田中央研究所 Toyota Central Research and Development Laborabories, Inc. 技師補 Assistant Engineer
1990/06/〜1995/03/ 京都大学工学部 Kyoto University, Faculty of Engineering 助手 Instructor
1995/04/〜2003/02/ 京都大学大学院工学研究科 Kyoto University, Graduate School of Engineering 助手 Instructor
2003/03/〜 京都大学大学院工学研究科 Kyoto University, Graduate School of Engineering 准教授(助教授) Associate Professor
プロフィール
(日本語)
真空中における荷電粒子の発生・輸送とその応用に関する研究に従事している。大学院生と共同で実験を主体に理論も交えて研究を進め、院生には総合的な研究推進能力を身につけさせるようにしている。研究テーマは基礎中心であるが、関連分野の企業との共同研究により新製品の実用化に向けた研究にも取り組んでいる。学会等主催の国際会議への協力、学会の行う講習会等の企画運営等の社会活動にも携わり、真空関連技術の普及に努めている。
(英語)
I am engaged in generation, transport, and application of charged particle beams in vacuum. In promoting researches, I always think of balance between experimatal and theoretical works so that the graduate students who take part in the research gain versatile research abilities. The research topics include fundamental studies, together with development of new commercial products in cooperation with some private companies. I also cooperate with academic societies to organize international conferences and tutorial lectures, in order to distibute the knowledge of vacuum engineering.
使用言語
言語名(japanese) 言語名(english) コード
英語 English eng
researchmap URL
https://researchmap.jp/read0012724
研究テーマ
(日本語)
電界放出による電子・イオン生成、高速粒子を伴う薄膜形成・微細加工技術、原子尺度の分解能を持つ顕微質量分析
(英語)
Electron and ion formation by field emission, Thin film formation and microfabrication with energetic particles, Microscopic mass spectroscopy with atomic spatial resolution
研究概要
(日本語)
強電界や高速のイオン衝撃などが存在するような材料にとっての極限状態ともいえる条件下における物理と、それらを応用した荷電粒子生成・輸送技術、薄膜・微細加工技術、微細領域の分析技術の開発を研究のテーマとしている。これまで培った電界放射顕微鏡の技術の展開として、ナノ構造における個々の原子・分子の構造分析・質量分析を同時に行う顕微質量分析技術の開発に着手している。
(英語)
My major interest is the physics under high electric field and/or bombardment of energetic particles. The research topics also include the application of the physics to such technologies that generation and transportation of charged particles, thin-film and micro-fabrication, and micro-analysis. Recently, studies on microscopic mass spectroscopy with atomic spatial resolution, of which basis is the principle of field emission microscope, have been started.
研究分野(キーワード)
キーワード(日本語) キーワード(英語)
電界放出 Field emission
高速粒子プロセス Processes with energetic particles
顕微質量分析 Microscopic mass spectroscopy with atomic spatial resolution
論文
著者 著者(日本語) 著者(英語) タイトル タイトル(日本語) タイトル(英語) 書誌情報等 書誌情報等(日本語) 書誌情報等(英語) 出版年月 査読の有無 記述言語 掲載種別 公開
Tamotsu Okamoto, Tomoya Igari, Takahiro Fukui, Ryuto Tozawa, Yasuhito Gotoh, Nobuhiro Sato, Yasuki Okuno, Tomohiro Kobayashi, Mitsuru Imaizumi, Masafumi Akiyoshi Tamotsu Okamoto, Tomoya Igari, Takahiro Fukui, Ryuto Tozawa, Yasuhito Gotoh, Nobuhiro Sato, Yasuki Okuno, Tomohiro Kobayashi, Mitsuru Imaizumi, Masafumi Akiyoshi Tamotsu Okamoto, Tomoya Igari, Takahiro Fukui, Ryuto Tozawa, Yasuhito Gotoh, Nobuhiro Sato, Yasuki Okuno, Tomohiro Kobayashi, Mitsuru Imaizumi, Masafumi Akiyoshi Gamma-ray irradiation effects on CdTe solar cell dosimeter Gamma-ray irradiation effects on CdTe solar cell dosimeter Gamma-ray irradiation effects on CdTe solar cell dosimeter Japanese Journal of Applied Physics, 60, SB, SBBF02-SBBF02 Japanese Journal of Applied Physics, 60, SB, SBBF02-SBBF02 Japanese Journal of Applied Physics, 60, SB, SBBF02-SBBF02 2021/05/01 英語 研究論文(学術雑誌) 公開
Yasuhito Gotoh, Hiroshi Tsuji, Masayoshi Nagao, Tomoaki Masuzawa, Yoichiro Neo, Hidenori Mimura, Tamotsu Okamoto, Tomoya Igari, Masafumi Akiyoshi, Nobuhiro Sato, Ikuji Takagi Yasuhito Gotoh, Hiroshi Tsuji, Masayoshi Nagao, Tomoaki Masuzawa, Yoichiro Neo, Hidenori Mimura, Tamotsu Okamoto, Tomoya Igari, Masafumi Akiyoshi, Nobuhiro Sato, Ikuji Takagi Yasuhito Gotoh, Hiroshi Tsuji, Masayoshi Nagao, Tomoaki Masuzawa, Yoichiro Neo, Hidenori Mimura, Tamotsu Okamoto, Tomoya Igari, Masafumi Akiyoshi, Nobuhiro Sato, Ikuji Takagi Development of a Field Emission Image Sensor Tolerant to Gamma-Ray Irradiation Development of a Field Emission Image Sensor Tolerant to Gamma-Ray Irradiation Development of a Field Emission Image Sensor Tolerant to Gamma-Ray Irradiation IEEE Transactions on Electron Devices, 67, 4, 1660-1665 IEEE Transactions on Electron Devices, 67, 4, 1660-1665 IEEE Transactions on Electron Devices, 67, 4, 1660-1665 2020/04 英語 研究論文(学術雑誌) 公開
Anatoly G. Kolosko, Eugeni O. Popov, Sergey V. Filippov, Yasuhito Gotoh Anatoly G. Kolosko, Eugeni O. Popov, Sergey V. Filippov, Yasuhito Gotoh Anatoly G. Kolosko, Eugeni O. Popov, Sergey V. Filippov, Yasuhito Gotoh Fluctuations of the emission characteristics of multi-tip field cathodes Fluctuations of the emission characteristics of multi-tip field cathodes Fluctuations of the emission characteristics of multi-tip field cathodes Journal of Vacuum Science & Technology B, 37, 3, 031803-031803 Journal of Vacuum Science & Technology B, 37, 3, 031803-031803 Journal of Vacuum Science & Technology B, 37, 3, 031803-031803 2019/05 英語 研究論文(学術雑誌) 公開
Chikasa Nishimura, Yuki Haneji, Hiroshi Tsuji, Yasuhito Gotoh Chikasa Nishimura, Yuki Haneji, Hiroshi Tsuji, Yasuhito Gotoh Chikasa Nishimura, Yuki Haneji, Hiroshi Tsuji, Yasuhito Gotoh Observation of DC field-evaporated ion species extracted from transition metal nitride thin film deposited on tungsten-tip Observation of DC field-evaporated ion species extracted from transition metal nitride thin film deposited on tungsten-tip Observation of DC field-evaporated ion species extracted from transition metal nitride thin film deposited on tungsten-tip Surface and Interface Analysis, 51, 1, 61-64 Surface and Interface Analysis, 51, 1, 61-64 Surface and Interface Analysis, 51, 1, 61-64 2019/01 英語 研究論文(学術雑誌) 公開
後藤康仁, 辻 博司, 長尾昌善, 秋吉優史, 高木郁二 後藤康仁, 辻 博司, 長尾昌善, 秋吉優史, 高木郁二 Yasuhito Gotoh, Hiroshi Tsuji, Masayoshi Nagao, Masafumi Akiyoshi, Ikuji Takagi エックス線照射下におけるフィールドエミッタアレイの動作特性評価装置 エックス線照射下におけるフィールドエミッタアレイの動作特性評価装置 System for evaluation of electron emission properties of field emitter arrays under x-ray irradiation Journal of The Vacuum Society of Japan, 60, 8, 328-333 Journal of The Vacuum Society of Japan, 60, 8, 328-333 Journal of the Vacuum Society of Japan, 60, 8, 328-333 2017/08 日本語 研究論文(学術雑誌) 公開
Yasuhito Gotoh, Wataru Ohue, Hiroshi Tsuji Yasuhito Gotoh, Wataru Ohue, Hiroshi Tsuji Yasuhito Gotoh, Wataru Ohue, Hiroshi Tsuji Characterization of the electron emission properties of hafnium nitride field emitter arrays at elevated temperatures Characterization of the electron emission properties of hafnium nitride field emitter arrays at elevated temperatures Characterization of the electron emission properties of hafnium nitride field emitter arrays at elevated temperatures JOURNAL OF APPLIED PHYSICS, 121, 23, 234503-234503 JOURNAL OF APPLIED PHYSICS, 121, 23, 234503-234503 JOURNAL OF APPLIED PHYSICS, 121, 23, 234503-234503 2017/06 英語 研究論文(学術雑誌) 公開
Yasuhito Gotoh, Sho Fujiwara, Hiroshi Tsuji Yasuhito Gotoh, Sho Fujiwara, Hiroshi Tsuji Yasuhito Gotoh, Sho Fujiwara, Hiroshi Tsuji Work functions of hafnium nitride thin films as emitter material for field emitter arrays Work functions of hafnium nitride thin films as emitter material for field emitter arrays Work functions of hafnium nitride thin films as emitter material for field emitter arrays JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 34, 3, 031401-031401 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 34, 3, 031401-031401 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 34, 3, 031401-031401 2016/05 英語 研究論文(学術雑誌) 公開
Tamotsu Okamoto, Tomoya Igari, Yasuhito Gotoh, Nobuhiro Sato, Masafumi Akiyoshi, Ikuji Takagi Tamotsu Okamoto, Tomoya Igari, Yasuhito Gotoh, Nobuhiro Sato, Masafumi Akiyoshi, Ikuji Takagi Tamotsu Okamoto, Tomoya Igari, Yasuhito Gotoh, Nobuhiro Sato, Masafumi Akiyoshi, Ikuji Takagi Gamma-ray tolerance of CdS/CdTe photodiodes for radiation tolerant compact image sensor with field emitter array Gamma-ray tolerance of CdS/CdTe photodiodes for radiation tolerant compact image sensor with field emitter array Gamma-ray tolerance of CdS/CdTe photodiodes for radiation tolerant compact image sensor with field emitter array PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 13 NO 7-9, 13, 7-9, 635-638 PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 13 NO 7-9, 13, 7-9, 635-638 PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 13 NO 7-9, 13, 7-9, 635-638 2016 英語 研究論文(学術雑誌) 公開
Nagao Masayoshi, Gotoh Yasuhito, Neo Yoichiro, Mimura Hidenori Nagao Masayoshi, Gotoh Yasuhito, Neo Yoichiro, Mimura Hidenori Nagao Masayoshi, Gotoh Yasuhito, Neo Yoichiro, Mimura Hidenori Beam profile measurement of volcano-structured double-gate Spindt-type field emitter Beam profile measurement of volcano-structured double-gate Spindt-type field emitter Beam profile measurement of volcano-structured double-gate Spindt-type field emitter Journal of Vacuum Science & Technology B, 34, 2, 02G108-02G108 Journal of Vacuum Science & Technology B, 34, 2, 02G108-02G108 Journal of Vacuum Science & Technology B, 34, 2, 02G108-02G108 2016 英語 研究論文(学術雑誌) 公開
Susumu Hogyoku, Sho Fujiwara, Hiroshi Tsuji, Yasuhito Gotoh Susumu Hogyoku, Sho Fujiwara, Hiroshi Tsuji, Yasuhito Gotoh Susumu Hogyoku, Sho Fujiwara, Hiroshi Tsuji, Yasuhito Gotoh Field ion microscope observation of tungsten surface processed in ethanol Field ion microscope observation of tungsten surface processed in ethanol Field ion microscope observation of tungsten surface processed in ethanol NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 332, 168-171 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 332, 168-171 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 332, 168-171 2014/08 英語 研究論文(学術雑誌) 公開
後藤康仁, 安友佳樹, 辻 博司 後藤康仁, 安友佳樹, 辻 博司 Yasuhito Gotoh, Yoshiki Yasutomo, Hiroshi Tsuji 窒化ハフニウムフィールドエミッタアレイの低温における動作特性 窒化ハフニウムフィールドエミッタアレイの低温における動作特性 Characteristics of hafnium nitride field emitter array at low temperatures Journal of The Vacuum Society of Japan, 57, 4, 128-130 Journal of The Vacuum Society of Japan, 57, 4, 128-130 Journal of the Vacuum Society of Japan, 57, 4, 128-130 2014/04 日本語 研究論文(学術雑誌) 公開
Yoshihiko Ueda, Junichi Abe, Hideyuki Murata, Yasuhito Gotoh, Osamu Sakai Yoshihiko Ueda, Junichi Abe, Hideyuki Murata, Yasuhito Gotoh, Osamu Sakai Yoshihiko Ueda, Junichi Abe, Hideyuki Murata, Yasuhito Gotoh, Osamu Sakai Control of work function of indium tin oxide: A surface treatment by atmospheric-pressure plasma layer on fabric-type electrodes Control of work function of indium tin oxide: A surface treatment by atmospheric-pressure plasma layer on fabric-type electrodes Control of work function of indium tin oxide: A surface treatment by atmospheric-pressure plasma layer on fabric-type electrodes JAPANESE JOURNAL OF APPLIED PHYSICS, 53, 3 JAPANESE JOURNAL OF APPLIED PHYSICS, 53, 3 JAPANESE JOURNAL OF APPLIED PHYSICS, 53, 3 2014/03 英語 研究論文(学術雑誌) 公開
Yasuhito Gotoh, Shuhei Taguchi, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Yasuhito Gotoh, Shuhei Taguchi, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Yasuhito Gotoh, Shuhei Taguchi, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Emittance of compact microwave ion source for low energy application Emittance of compact microwave ion source for low energy application Emittance of compact microwave ion source for low energy application REVIEW OF SCIENTIFIC INSTRUMENTS, 85, 2 REVIEW OF SCIENTIFIC INSTRUMENTS, 85, 2 REVIEW OF SCIENTIFIC INSTRUMENTS, 85, 2 2014/02 英語 研究論文(学術雑誌) 公開
Yasuhito Gotoh, Wataru Ohue, Hiroshi Tsuji Yasuhito Gotoh, Wataru Ohue, Hiroshi Tsuji Yasuhito Gotoh, Wataru Ohue, Hiroshi Tsuji Energy dependence of non-Rutherford proton elastic scattering spectrum for hafnium nitride thin film Energy dependence of non-Rutherford proton elastic scattering spectrum for hafnium nitride thin film Energy dependence of non-Rutherford proton elastic scattering spectrum for hafnium nitride thin film NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 315, 68-71 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 315, 68-71 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 315, 68-71 2013/11 英語 研究論文(学術雑誌) 公開
Yasuhito Gotoh, Yoshiki Yasutomo, Hiroshi Tsuji Yasuhito Gotoh, Yoshiki Yasutomo, Hiroshi Tsuji Yasuhito Gotoh, Yoshiki Yasutomo, Hiroshi Tsuji Vacuum frequency mixer with a field emitter array Vacuum frequency mixer with a field emitter array Vacuum frequency mixer with a field emitter array Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 31, 5, 050601-050601 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 31, 5, 050601-050601 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 31, 5, 050601-050601 2013/09 英語 研究論文(学術雑誌) 公開
Yasuhito Gotoh, Hiroshi Tsuji, Shuhei Taguchi, Keita Ikeda, Takayuki Kitagawa, Junzo Ishikawa, Shigeki Sakai Yasuhito Gotoh, Hiroshi Tsuji, Shuhei Taguchi, Keita Ikeda, Takayuki Kitagawa, Junzo Ishikawa, Shigeki Sakai Yasuhito Gotoh, Hiroshi Tsuji, Shuhei Taguchi, Keita Ikeda, Takayuki Kitagawa, Junzo Ishikawa, Shigeki Sakai Neutralization of Space Charge on High-Current Low-Energy Ion Beam by Low-Energy Electrons Supplied from Silicon Based Field Emitter Arrays Neutralization of Space Charge on High-Current Low-Energy Ion Beam by Low-Energy Electrons Supplied from Silicon Based Field Emitter Arrays Neutralization of Space Charge on High-Current Low-Energy Ion Beam by Low-Energy Electrons Supplied from Silicon Based Field Emitter Arrays ION IMPLANTATION TECHNOLOGY 2012, 1496, 368-371 ION IMPLANTATION TECHNOLOGY 2012, 1496, 368-371 ION IMPLANTATION TECHNOLOGY 2012, 1496, 368-371 2012 英語 研究論文(国際会議プロシーディングス) 公開
Tomohiro Daimaru, Shigeki Sakai, Yasuhito Gotoh Tomohiro Daimaru, Shigeki Sakai, Yasuhito Gotoh Tomohiro Daimaru, Shigeki Sakai, Yasuhito Gotoh Neutralization of space charge in magnetic field by electrons supplied from silicon based field emitter arrays Neutralization of space charge in magnetic field by electrons supplied from silicon based field emitter arrays Neutralization of space charge in magnetic field by electrons supplied from silicon based field emitter arrays ION IMPLANTATION TECHNOLOGY 2012, 1496, 422-425 ION IMPLANTATION TECHNOLOGY 2012, 1496, 422-425 ION IMPLANTATION TECHNOLOGY 2012, 1496, 422-425 2012 英語 研究論文(国際会議プロシーディングス) 公開
Hiroshi Tsuji, Piyanuch Sommani, Yuichiro Hayashi, Hiroyuki Kojima, Hiroko Sato, Yasuhito Gotoh, Gikan Takaoka, Junzo Ishikawa Hiroshi Tsuji, Piyanuch Sommani, Yuichiro Hayashi, Hiroyuki Kojima, Hiroko Sato, Yasuhito Gotoh, Gikan Takaoka, Junzo Ishikawa Hiroshi Tsuji, Piyanuch Sommani, Yuichiro Hayashi, Hiroyuki Kojima, Hiroko Sato, Yasuhito Gotoh, Gikan Takaoka, Junzo Ishikawa Surface modification of silica glass by CHF<sub>3</sub> plasma treatment and carbon negative-ion implantation for cell pattern adhesion Surface modification of silica glass by CHF<sub>3</sub> plasma treatment and carbon negative-ion implantation for cell pattern adhesion Surface modification of silica glass by CHF<sub>3</sub> plasma treatment and carbon negative-ion implantation for cell pattern adhesion SURFACE & COATINGS TECHNOLOGY, 206, 5, 900-904 SURFACE & COATINGS TECHNOLOGY, 206, 5, 900-904 SURFACE & COATINGS TECHNOLOGY, 206, 5, 900-904 2011/11 英語 研究論文(学術雑誌) 公開
Piyanuch Sommani, Hiroshi Tsuji, Hiroyuki Kojima, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa, Gikan Takaoka Piyanuch Sommani, Hiroshi Tsuji, Hiroyuki Kojima, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa, Gikan Takaoka Piyanuch Sommani, Hiroshi Tsuji, Hiroyuki Kojima, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa, Gikan Takaoka Line-width of ion beam-modified polystyrene by negative carbon ions for fine adhesion pattern of mesenchymal stem cells Line-width of ion beam-modified polystyrene by negative carbon ions for fine adhesion pattern of mesenchymal stem cells Line-width of ion beam-modified polystyrene by negative carbon ions for fine adhesion pattern of mesenchymal stem cells SURFACE & COATINGS TECHNOLOGY, 206, 5, 897-899 SURFACE & COATINGS TECHNOLOGY, 206, 5, 897-899 SURFACE & COATINGS TECHNOLOGY, 206, 5, 897-899 2011/11 英語 研究論文(学術雑誌) 公開
Hiroshi Tsuji, Nobutoshi Arai, Masashi Hattori, Masayuki Ohsaki, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Nobutoshi Arai, Masashi Hattori, Masayuki Ohsaki, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Nobutoshi Arai, Masashi Hattori, Masayuki Ohsaki, Yasuhito Gotoh, Junzo Ishikawa Germanium negative-ion implantation into SiO<sub>2</sub> layer on Si Photoluminescence properties and oxidation state of Ge atoms in subsequent heat treatment Germanium negative-ion implantation into SiO<sub>2</sub> layer on Si Photoluminescence properties and oxidation state of Ge atoms in subsequent heat treatment Germanium negative-ion implantation into SiO<sub>2</sub> layer on Si Photoluminescence properties and oxidation state of Ge atoms in subsequent heat treatment SURFACE & COATINGS TECHNOLOGY, 206, 5, 785-788 SURFACE & COATINGS TECHNOLOGY, 206, 5, 785-788 SURFACE & COATINGS TECHNOLOGY, 206, 5, 785-788 2011/11 英語 研究論文(学術雑誌) 公開
Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Ion beam neutralization using three-dimensional electron confinement by surface modification of magnetic poles Ion beam neutralization using three-dimensional electron confinement by surface modification of magnetic poles Ion beam neutralization using three-dimensional electron confinement by surface modification of magnetic poles NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 645, 1, 153-158 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 645, 1, 153-158 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 645, 1, 153-158 2011/07 英語 研究論文(学術雑誌) 公開
Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Compensation of space charge for positive ion beams using electron injection and confinement in nonuniform magnetic fields Compensation of space charge for positive ion beams using electron injection and confinement in nonuniform magnetic fields Compensation of space charge for positive ion beams using electron injection and confinement in nonuniform magnetic fields JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 29, 2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 29, 2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 29, 2 2011/03 英語 研究論文(学術雑誌) 公開
Keita Ikeda, Wataru Ohue, Keisuke Endo, Yasuhito Gotoh, Hiroshi Tsuji Keita Ikeda, Wataru Ohue, Keisuke Endo, Yasuhito Gotoh, Hiroshi Tsuji Keita Ikeda, Wataru Ohue, Keisuke Endo, Yasuhito Gotoh, Hiroshi Tsuji Development of a vacuum transistor using hafnium nitride field emitter arrays Development of a vacuum transistor using hafnium nitride field emitter arrays Development of a vacuum transistor using hafnium nitride field emitter arrays JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 29, 2, 207-208 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 29, 2, 207-208 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 29, 2, 207-208 2011/03 英語 研究論文(国際会議プロシーディングス) 公開
Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Compensation of space charge for positive ion beams using electron injection and confinement in nonuniform magnetic fields Compensation of space charge for positive ion beams using electron injection and confinement in nonuniform magnetic fields Compensation of space charge for positive ion beams using electron injection and confinement in nonuniform magnetic fields Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 29, 2 Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 29, 2 Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 29, 2 2011 英語 研究論文(学術雑誌) 公開
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Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa, Gikan H. Takaoka Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa, Gikan H. Takaoka Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa, Gikan H. Takaoka Fine adhesion patterning and aligned nuclei orientation of mesenchymal stem cell on narrow line-width of silicone rubber implanted by carbon negative ions Fine adhesion patterning and aligned nuclei orientation of mesenchymal stem cell on narrow line-width of silicone rubber implanted by carbon negative ions Fine adhesion patterning and aligned nuclei orientation of mesenchymal stem cell on narrow line-width of silicone rubber implanted by carbon negative ions Journal of the Vacuum Society of Japan, 53, 3, 191-193 Journal of the Vacuum Society of Japan, 53, 3, 191-193 Journal of the Vacuum Society of Japan, 53, 3, 191-193 2010 英語 研究論文(学術雑誌) 公開
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Nobutoshi Arai, Hiroshi Tsuji, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Silver negative-ion implantation into thermally grown thin SiO2 film on Si substrate and heat treatment for formation of silver nanoparticles Silver negative-ion implantation into thermally grown thin SiO2 film on Si substrate and heat treatment for formation of silver nanoparticles Silver negative-ion implantation into thermally grown thin SiO2 film on Si substrate and heat treatment for formation of silver nanoparticles JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 46, 9B, 6260-6266 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 46, 9B, 6260-6266 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 46, 9B, 6260-6266 2007/09 英語 研究論文(学術雑誌) 公開
Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Toyotsugu Ishibashi, Tetsuya Okumine, Kouichiro Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Toyotsugu Ishibashi, Tetsuya Okumine, Kouichiro Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Toyotsugu Ishibashi, Tetsuya Okumine, Kouichiro Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Germanium nanoparticle formation in thin oxide films on Si by negative-ion implantation Germanium nanoparticle formation in thin oxide films on Si by negative-ion implantation Germanium nanoparticle formation in thin oxide films on Si by negative-ion implantation SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8516-8520 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8516-8520 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8516-8520 2007/08 英語 研究論文(学術雑誌) 公開
Nobutoshi Arai, Hiroshi Tsuji, Naoyuki Gotoh, Takashi Minotani, Toyotsugu Ishibashi, Tetsuya Okumine, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Naoyuki Gotoh, Takashi Minotani, Toyotsugu Ishibashi, Tetsuya Okumine, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Naoyuki Gotoh, Takashi Minotani, Toyotsugu Ishibashi, Tetsuya Okumine, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Thermal diffusion behavior of implanted germanium atoms in silicon dioxide film measured by high-resolution RBS Thermal diffusion behavior of implanted germanium atoms in silicon dioxide film measured by high-resolution RBS Thermal diffusion behavior of implanted germanium atoms in silicon dioxide film measured by high-resolution RBS SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8312-8316 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8312-8316 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8312-8316 2007/08 英語 研究論文(学術雑誌) 公開
H. Tsuji, P. Sommani, T. Kitamura, M. Hattori, H. Sato, Y. Gotoh, J. Ishikawa H. Tsuji, P. Sommani, T. Kitamura, M. Hattori, H. Sato, Y. Gotoh, J. Ishikawa H. Tsuji, P. Sommani, T. Kitamura, M. Hattori, H. Sato, Y. Gotoh, J. Ishikawa Nerve-cell attachment properties of polystyrene and silicone rubber modified by carbon negative-ion implantation Nerve-cell attachment properties of polystyrene and silicone rubber modified by carbon negative-ion implantation Nerve-cell attachment properties of polystyrene and silicone rubber modified by carbon negative-ion implantation SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8123-8126 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8123-8126 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8123-8126 2007/08 英語 研究論文(学術雑誌) 公開
Junzo Ishikawa, Hiroshi Tsuji, Hiroko Sato, Yasuhito Gotoh Junzo Ishikawa, Hiroshi Tsuji, Hiroko Sato, Yasuhito Gotoh Junzo Ishikawa, Hiroshi Tsuji, Hiroko Sato, Yasuhito Gotoh Ion implantation of negative ions for cell growth manipulation and nervous system repair Ion implantation of negative ions for cell growth manipulation and nervous system repair Ion implantation of negative ions for cell growth manipulation and nervous system repair SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8083-8090 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8083-8090 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8083-8090 2007/08 英語 研究論文(学術雑誌) 公開
Y. Gotoh, Y. Kawamura, T. Niiya, T. Ishibashi, D. Nicolaescu, H. Tsuji, J. Ishikawa, A. Hosono, S. Nakata, S. Okuda Y. Gotoh, Y. Kawamura, T. Niiya, T. Ishibashi, D. Nicolaescu, H. Tsuji, J. Ishikawa, A. Hosono, S. Nakata, S. Okuda Y. Gotoh, Y. Kawamura, T. Niiya, T. Ishibashi, D. Nicolaescu, H. Tsuji, J. Ishikawa, A. Hosono, S. Nakata, S. Okuda Derivation of length of carbon nanotube responsible for electron emission from field emission characteristics Derivation of length of carbon nanotube responsible for electron emission from field emission characteristics Derivation of length of carbon nanotube responsible for electron emission from field emission characteristics APPLIED PHYSICS LETTERS, 90, 20, 203107-1-203107-3 APPLIED PHYSICS LETTERS, 90, 20, 203107-1-203107-3 APPLIED PHYSICS LETTERS, 90, 20, 203107-1-203107-3 2007/05 英語 研究論文(学術雑誌) 公開
P. Sommani, H. Tsuji, H. Sato, T. Kitamura, M. Hattori, Y. Gotoh, J. Ishikawa P. Sommani, H. Tsuji, H. Sato, T. Kitamura, M. Hattori, Y. Gotoh, J. Ishikawa P. Sommani, H. Tsuji, H. Sato, T. Kitamura, M. Hattori, Y. Gotoh, J. Ishikawa Minimum line width of ion beam-modified polystyrene by negative carbon ions for nerve-cell attachment and neurite extension Minimum line width of ion beam-modified polystyrene by negative carbon ions for nerve-cell attachment and neurite extension Minimum line width of ion beam-modified polystyrene by negative carbon ions for nerve-cell attachment and neurite extension NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 118-121 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 118-121 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 118-121 2007/04 英語 研究論文(学術雑誌) 公開
Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Kenji Kojima, Kouichiro Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Kenji Kojima, Kouichiro Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Kenji Kojima, Kouichiro Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Nanoparticle formation in 25-nm-SiO<sub>2</sub> thin layer by germanium negative-ion implantation and its capacitance-voltage characteristics Nanoparticle formation in 25-nm-SiO<sub>2</sub> thin layer by germanium negative-ion implantation and its capacitance-voltage characteristics Nanoparticle formation in 25-nm-SiO<sub>2</sub> thin layer by germanium negative-ion implantation and its capacitance-voltage characteristics NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 94-98 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 94-98 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 94-98 2007/04 英語 研究論文(学術雑誌) 公開
Y. Gotoh, K. Mukai, Y. Kawamura, H. Tsuji, J. Ishikawa Y. Gotoh, K. Mukai, Y. Kawamura, H. Tsuji, J. Ishikawa Y. Gotoh, K. Mukai, Y. Kawamura, H. Tsuji, J. Ishikawa Work function of low index crystal facet of tungsten evaluated by the Seppen-Katamuki analysis Work function of low index crystal facet of tungsten evaluated by the Seppen-Katamuki analysis Work function of low index crystal facet of tungsten evaluated by the Seppen-Katamuki analysis JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 25, 2, 508-512 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 25, 2, 508-512 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 25, 2, 508-512 2007/03 英語 研究論文(学術雑誌) 公開
D. Nicolaescu, V. Filip, G. H. Takaoka, Y. Gotoh, J. Ishikawa D. Nicolaescu, V. Filip, G. H. Takaoka, Y. Gotoh, J. Ishikawa D. Nicolaescu, V. Filip, G. H. Takaoka, Y. Gotoh, J. Ishikawa Analytical modeling for the electron emission properties of carbon nanotube arrays Analytical modeling for the electron emission properties of carbon nanotube arrays Analytical modeling for the electron emission properties of carbon nanotube arrays JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 25, 2, 472-477 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 25, 2, 472-477 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 25, 2, 472-477 2007/03 英語 研究論文(学術雑誌) 公開
Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Kenji Kojima, Kouichiro Adachi, Hiroshi Kotaki, Katsumi Takahiro, Toyogi Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Kenji Kojima, Kouichiro Adachi, Hiroshi Kotaki, Katsumi Takahiro, Toyogi Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Kenji Kojima, Kouichiro Adachi, Hiroshi Kotaki, Katsumi Takahiro, Toyogi Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Cathode luminescence from SiO<sub>2</sub> layer including Ge nanoparticles formed by negative-ion implantation Cathode luminescence from SiO<sub>2</sub> layer including Ge nanoparticles formed by negative-ion implantation Cathode luminescence from SiO<sub>2</sub> layer including Ge nanoparticles formed by negative-ion implantation TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 903-906 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 903-906 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 903-906 2007 英語 研究論文(国際会議プロシーディングス) 公開
Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Mitsutaka Hattori, Tetsuya Yamada, Yasuhito Gotoh, Junzo Ishikawa Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Mitsutaka Hattori, Tetsuya Yamada, Yasuhito Gotoh, Junzo Ishikawa Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Mitsutaka Hattori, Tetsuya Yamada, Yasuhito Gotoh, Junzo Ishikawa Mesenchymal stem cell attachment properties on silicone rubber modified by carbon negative-ion implantation Mesenchymal stem cell attachment properties on silicone rubber modified by carbon negative-ion implantation Mesenchymal stem cell attachment properties on silicone rubber modified by carbon negative-ion implantation TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 921-924 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 921-924 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 921-924 2007 英語 研究論文(国際会議プロシーディングス) 公開
Nobutoshi Arai, Hiroshi Tsuji, Takashi Minotani, Hiroyuki Nakatsuka, Kenji Kojima, Kouichirou Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Takashi Minotani, Hiroyuki Nakatsuka, Kenji Kojima, Kouichirou Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Takashi Minotani, Hiroyuki Nakatsuka, Kenji Kojima, Kouichirou Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Raman spectroscopy of ge nanoparticles formed in thin SiO<sub>2</sub> films by negative ion implantation Raman spectroscopy of ge nanoparticles formed in thin SiO<sub>2</sub> films by negative ion implantation Raman spectroscopy of ge nanoparticles formed in thin SiO<sub>2</sub> films by negative ion implantation TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 907-910 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 907-910 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 907-910 2007 英語 研究論文(国際会議プロシーディングス) 公開
Hiroshi Tsuji, Piyanuch Sommani, Mitsutaka Hattori, Tetsuya Yamada, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Piyanuch Sommani, Mitsutaka Hattori, Tetsuya Yamada, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Piyanuch Sommani, Mitsutaka Hattori, Tetsuya Yamada, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa Modification limit in line width of carbon negative-ion implantation to polystyrene surface for nerve-cell adhesion and neurite outgrowth Modification limit in line width of carbon negative-ion implantation to polystyrene surface for nerve-cell adhesion and neurite outgrowth Modification limit in line width of carbon negative-ion implantation to polystyrene surface for nerve-cell adhesion and neurite outgrowth TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 917-920 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 917-920 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 917-920 2007 英語 研究論文(国際会議プロシーディングス) 公開
Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Mitsutaka Hattori, Tetsuya Yamada, Yasuhito Gotoh, Junzo Ishikawa Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Mitsutaka Hattori, Tetsuya Yamada, Yasuhito Gotoh, Junzo Ishikawa Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Mitsutaka Hattori, Tetsuya Yamada, Yasuhito Gotoh, Junzo Ishikawa Protein adsorption properties on silicone rubber modified by carbon negative-ion implantation Protein adsorption properties on silicone rubber modified by carbon negative-ion implantation Protein adsorption properties on silicone rubber modified by carbon negative-ion implantation TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 925-928 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 925-928 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 925-928 2007 英語 研究論文(国際会議プロシーディングス) 公開
Piyanuch Sommani, Hiroshi Tsuji, Tsuyoshi Kitamura, Mitsutaka Hattori, Tetsuya Yamada, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa Piyanuch Sommani, Hiroshi Tsuji, Tsuyoshi Kitamura, Mitsutaka Hattori, Tetsuya Yamada, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa Piyanuch Sommani, Hiroshi Tsuji, Tsuyoshi Kitamura, Mitsutaka Hattori, Tetsuya Yamada, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa Effect of C-implantation on nerve-cell attachment to polystyrene films Effect of C-implantation on nerve-cell attachment to polystyrene films Effect of C-implantation on nerve-cell attachment to polystyrene films Shinku/Journal of the Vacuum Society of Japan, 50, 12, 755-758 Shinku/Journal of the Vacuum Society of Japan, 50, 12, 755-758 Shinku/Journal of the Vacuum Society of Japan, 50, 12, 755-758 2007 英語 研究論文(学術雑誌) 公開
山田哲也, 辻 博司, 服部光高, ソムマニ ピヤヌット, 佐藤弘子, 後藤康仁, 石川順三 山田哲也, 辻 博司, 服部光高, ソムマニ ピヤヌット, 佐藤弘子, 後藤康仁, 石川順三 Tetsuya Yamada, Hiroshi Tsuji, Mitsutaka Hattori, Piyanuch Sommani, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa 炭素負イオン注入処理を施した高分子材料上におけるタンパク質吸着性の評価 炭素負イオン注入処理を施した高分子材料上におけるタンパク質吸着性の評価 Estimation of protein absorption on polymer material by carbon-negative ion implantation 真空, 50, 9, 579-582 真空, 50, 9, 579-582 Shinku/Journal of the Vacuum Society of Japan, 50, 9, 579-582 2007 日本語 研究論文(学術雑誌) 公開
大和田淳, 小島俊彦, 竹内光明, 後藤康仁, 長尾昌善, 辻 博司, 石川順三, 酒井茂樹, 木本恒暢 大和田淳, 小島俊彦, 竹内光明, 後藤康仁, 長尾昌善, 辻 博司, 石川順三, 酒井茂樹, 木本恒暢 A. Oowada, T. Kojima, M. Takeuchi, Y. Gotoh, M. Nagao, H. Tsuji, J. Ishikawa, S. Sakai, T. Kimoto 水素ガス導入下におけるSi:C-FEAの経時変化の測定 水素ガス導入下におけるSi:C-FEAの経時変化の測定 Long time operation of Si:C field emitter arrays in H<sub>2</sub> gas atmosphere 真空, 50, 3, 178-180 真空, 50, 3, 178-180 Shinku/Journal of the Vacuum Society of Japan, 50, 3, 178-180 2007 日本語 研究論文(学術雑誌) 公開
R Fujii, Y Gotoh, MY Liao, H Tsuji, J Ishikawa R Fujii, Y Gotoh, MY Liao, H Tsuji, J Ishikawa R Fujii, Y Gotoh, MY Liao, H Tsuji, J Ishikawa Work function measurement of transition metal nitride and carbide thin films Work function measurement of transition metal nitride and carbide thin films Work function measurement of transition metal nitride and carbide thin films VACUUM, 80, 7, 832-835 VACUUM, 80, 7, 832-835 VACUUM, 80, 7, 832-835 2006/05 英語 研究論文(学術雑誌) 公開
S Kawaguchi, M Tanemura, M Kudo, N Handa, N Kinoshita, L Miao, S Tanemura, Y Gotoh, MY Liao, S Shinkai S Kawaguchi, M Tanemura, M Kudo, N Handa, N Kinoshita, L Miao, S Tanemura, Y Gotoh, MY Liao, S Shinkai S Kawaguchi, M Tanemura, M Kudo, N Handa, N Kinoshita, L Miao, S Tanemura, Y Gotoh, MY Liao, S Shinkai Development of a compact angle-resolved secondary ion mass spectrometer for Ar<sup>+</sup> sputtering Development of a compact angle-resolved secondary ion mass spectrometer for Ar<sup>+</sup> sputtering Development of a compact angle-resolved secondary ion mass spectrometer for Ar<sup>+</sup> sputtering VACUUM, 80, 7, 768-770 VACUUM, 80, 7, 768-770 VACUUM, 80, 7, 768-770 2006/05 英語 研究論文(学術雑誌) 公開
H Tsuji, N Arai, N Gotoh, T Minotani, T Ishibashi, T Okumine, K Adachi, H Kotaki, Y Gotoh, J Ishikawa H Tsuji, N Arai, N Gotoh, T Minotani, T Ishibashi, T Okumine, K Adachi, H Kotaki, Y Gotoh, J Ishikawa H Tsuji, N Arai, N Gotoh, T Minotani, T Ishibashi, T Okumine, K Adachi, H Kotaki, Y Gotoh, J Ishikawa Negative-ion implantation into thin SiO<sub>2</sub> layer for defined nanoparticle formation Negative-ion implantation into thin SiO<sub>2</sub> layer for defined nanoparticle formation Negative-ion implantation into thin SiO<sub>2</sub> layer for defined nanoparticle formation REVIEW OF SCIENTIFIC INSTRUMENTS, 77, 3 REVIEW OF SCIENTIFIC INSTRUMENTS, 77, 3 REVIEW OF SCIENTIFIC INSTRUMENTS, 77, 3 2006/03 英語 研究論文(学術雑誌) 公開
Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Tsuyoshi Kitamura, Mitsutaka Hattori, Yasuhito Gotoh, Junzo Ishikawa Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Tsuyoshi Kitamura, Mitsutaka Hattori, Yasuhito Gotoh, Junzo Ishikawa Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Tsuyoshi Kitamura, Mitsutaka Hattori, Yasuhito Gotoh, Junzo Ishikawa Neurite outgrowth properties on spin-coated polystyrene modified by carbon negative-ion implantation through pattern mask Neurite outgrowth properties on spin-coated polystyrene modified by carbon negative-ion implantation through pattern mask Neurite outgrowth properties on spin-coated polystyrene modified by carbon negative-ion implantation through pattern mask Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 669-672 Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 669-672 Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 669-672 2006 英語 研究論文(国際会議プロシーディングス) 公開
Nobutoshi Arai, Hiroshi Tsuji, Toshio Yanagitani, Tetsuya Okumine, Naoyuki Gotoh, Takashi Minotani, Hiroyuki Nakatsuka, Kenji Kojima, Hitoshi Ohnishi, Takeshi Satoh, Masatomi Harada, Kouichirou Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Toshio Yanagitani, Tetsuya Okumine, Naoyuki Gotoh, Takashi Minotani, Hiroyuki Nakatsuka, Kenji Kojima, Hitoshi Ohnishi, Takeshi Satoh, Masatomi Harada, Kouichirou Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Toshio Yanagitani, Tetsuya Okumine, Naoyuki Gotoh, Takashi Minotani, Hiroyuki Nakatsuka, Kenji Kojima, Hitoshi Ohnishi, Takeshi Satoh, Masatomi Harada, Kouichirou Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Electrical characteristics of thin SiO<sub>2</sub> film including Ge nanoparticles formed by negative ion implantation Electrical characteristics of thin SiO<sub>2</sub> film including Ge nanoparticles formed by negative ion implantation Electrical characteristics of thin SiO<sub>2</sub> film including Ge nanoparticles formed by negative ion implantation Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 705-708 Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 705-708 Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 705-708 2006 英語 研究論文(国際会議プロシーディングス) 公開
Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Tsuyoshi Kitamura, Mitsutaka Hattori, Yasuhito Gotoh, Junzo Ishikawa Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Tsuyoshi Kitamura, Mitsutaka Hattori, Yasuhito Gotoh, Junzo Ishikawa Piyanuch Sommani, Hiroshi Tsuji, Hiroko Sato, Tsuyoshi Kitamura, Mitsutaka Hattori, Yasuhito Gotoh, Junzo Ishikawa Nerve cell attachment properties on spin-coated polystyrene modified by carbon negative-ion implantation Nerve cell attachment properties on spin-coated polystyrene modified by carbon negative-ion implantation Nerve cell attachment properties on spin-coated polystyrene modified by carbon negative-ion implantation Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 673-676 Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 673-676 Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 673-676 2006 英語 研究論文(国際会議プロシーディングス) 公開
Nobutoshi Arai, Hiroshi Tsuji, Naoyuki Gotoh, Tetsuya Okumine, Toshio Yanagitani, Masatomi Harada, Takeshi Satoh, Hitoshi Ohnishi, Takashi Minotani, Kouichirou Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Naoyuki Gotoh, Tetsuya Okumine, Toshio Yanagitani, Masatomi Harada, Takeshi Satoh, Hitoshi Ohnishi, Takashi Minotani, Kouichirou Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Naoyuki Gotoh, Tetsuya Okumine, Toshio Yanagitani, Masatomi Harada, Takeshi Satoh, Hitoshi Ohnishi, Takashi Minotani, Kouichirou Adachi, Hiroshi Kotaki, Toyotsugu Ishibashi, Yasuhito Gotoh, Junzo Ishikawa Germanium nanoparticle formation into Thin SiO<sub>2</sub> films by negative ion implantation and their electric characteristics Germanium nanoparticle formation into Thin SiO<sub>2</sub> films by negative ion implantation and their electric characteristics Germanium nanoparticle formation into Thin SiO<sub>2</sub> films by negative ion implantation and their electric characteristics ION IMPLANTATION TECHNOLOGY, 866, 317-+ ION IMPLANTATION TECHNOLOGY, 866, 317-+ ION IMPLANTATION TECHNOLOGY, 866, 317-+ 2006 英語 研究論文(国際会議プロシーディングス) 公開
Tsuji Hiroshi, Arai Nobutoshi, Gotoh Naoyuki, Minotani Takashi, Ishibashi Toyotsugu, Kimura Kenji, Nakajima Kaoru, Okumine Tetsuya, Adachi Koulchlro, Kotaki Hiroshi, Gotoh Yasuhito, Ishikawa Junzo Tsuji Hiroshi, Arai Nobutoshi, Gotoh Naoyuki, Minotani Takashi, Ishibashi Toyotsugu, Kimura Kenji, Nakajima Kaoru, Okumine Tetsuya, Adachi Koulchlro, Kotaki Hiroshi, Gotoh Yasuhito, Ishikawa Junzo Tsuji Hiroshi, Arai Nobutoshi, Gotoh Naoyuki, Minotani Takashi, Ishibashi Toyotsugu, Kimura Kenji, Nakajima Kaoru, Okumine Tetsuya, Adachi Koulchlro, Kotaki Hiroshi, Gotoh Yasuhito, Ishikawa Junzo Diflusion barrier for silver atoms in thermally grown oxide layer on silicon and mono-layered Ag nanocrystals formed by negative-ion implantation and subsequent annealing Diflusion barrier for silver atoms in thermally grown oxide layer on silicon and mono-layered Ag nanocrystals formed by negative-ion implantation and subsequent annealing Diflusion barrier for silver atoms in thermally grown oxide layer on silicon and mono-layered Ag nanocrystals formed by negative-ion implantation and subsequent annealing Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 701-704 Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 701-704 Transactions of the Materials Research Society of Japan, Vol 31, No 3, 31, 3, 701-704 2006 公開
Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Toyotsugu Ishibashi, Tetsuya Okumine, Kouichiro Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Toyotsugu Ishibashi, Tetsuya Okumine, Kouichiro Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Nobutoshi Arai, Naoyuki Gotoh, Takashi Minotani, Toyotsugu Ishibashi, Tetsuya Okumine, Kouichiro Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Thermal diffusion barrier for Ag atoms implanted in silicon dioxide layer on silicon substrate and monolayer formation of nanoparticles Thermal diffusion barrier for Ag atoms implanted in silicon dioxide layer on silicon substrate and monolayer formation of nanoparticles Thermal diffusion barrier for Ag atoms implanted in silicon dioxide layer on silicon substrate and monolayer formation of nanoparticles ION IMPLANTATION TECHNOLOGY, 866, 295-+ ION IMPLANTATION TECHNOLOGY, 866, 295-+ ION IMPLANTATION TECHNOLOGY, 866, 295-+ 2006 英語 研究論文(国際会議プロシーディングス) 公開
N Arai, H Tsuji, K Ueno, T Matsumoto, N Gotoh, K Aadachi, H Kotaki, Y Gotoh, J Ishikawa N Arai, H Tsuji, K Ueno, T Matsumoto, N Gotoh, K Aadachi, H Kotaki, Y Gotoh, J Ishikawa N Arai, H Tsuji, K Ueno, T Matsumoto, N Gotoh, K Aadachi, H Kotaki, Y Gotoh, J Ishikawa Formation of silver nanoparticles aligned near the bottom of SiO<sub>2</sub> film silicon substrate by negative-ion implantation and post-annealing Formation of silver nanoparticles aligned near the bottom of SiO<sub>2</sub> film silicon substrate by negative-ion implantation and post-annealing Formation of silver nanoparticles aligned near the bottom of SiO<sub>2</sub> film silicon substrate by negative-ion implantation and post-annealing NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 217-220 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 217-220 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 217-220 2006/01 英語 研究論文(学術雑誌) 公開
H Tsuji, N Sakai, Y Gotoh, J Ishikawa H Tsuji, N Sakai, Y Gotoh, J Ishikawa H Tsuji, N Sakai, Y Gotoh, J Ishikawa Photocatalytic properties of sol-gel titania film under fluorescent-light irradiation improved by silver negative-ion implantation Photocatalytic properties of sol-gel titania film under fluorescent-light irradiation improved by silver negative-ion implantation Photocatalytic properties of sol-gel titania film under fluorescent-light irradiation improved by silver negative-ion implantation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 129-132 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 129-132 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 129-132 2006/01 英語 研究論文(学術雑誌) 公開
H Tsuji, N Arai, K Ueno, T Matsumoto, N Gotoh, K Adachi, H Kotaki, Y Gotoh, J Ishikawa H Tsuji, N Arai, K Ueno, T Matsumoto, N Gotoh, K Adachi, H Kotaki, Y Gotoh, J Ishikawa H Tsuji, N Arai, K Ueno, T Matsumoto, N Gotoh, K Adachi, H Kotaki, Y Gotoh, J Ishikawa Formation of mono-layered gold nanoparticles in shallow depth of SiO<sub>2</sub> thin film by low-energy negative-ion implantation Formation of mono-layered gold nanoparticles in shallow depth of SiO<sub>2</sub> thin film by low-energy negative-ion implantation Formation of mono-layered gold nanoparticles in shallow depth of SiO<sub>2</sub> thin film by low-energy negative-ion implantation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 125-128 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 125-128 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 125-128 2006/01 英語 研究論文(学術雑誌) 公開
S. Kawaguchi, M. Kudo, M. Tanemura, L. Miao, S. Tanemura, Y. Gotoh, M. Liao, S. Shinkai S. Kawaguchi, M. Kudo, M. Tanemura, L. Miao, S. Tanemura, Y. Gotoh, M. Liao, S. Shinkai S. Kawaguchi, M. Kudo, M. Tanemura, L. Miao, S. Tanemura, Y. Gotoh, M. Liao, S. Shinkai Angle dependent sputtering and dimer formation from vanadium nitride target by Ar<sup>+</sup> ion bombardment Angle dependent sputtering and dimer formation from vanadium nitride target by Ar<sup>+</sup> ion bombardment Angle dependent sputtering and dimer formation from vanadium nitride target by Ar<sup>+</sup> ion bombardment AICAM 2005, 11-12, 607-+ AICAM 2005, 11-12, 607-+ AICAM 2005, 11-12, 607-+ 2006 英語 研究論文(国際会議プロシーディングス) 公開
辻 博司, 洗 暢俊, 中塚博之, 後藤直行, 箕谷崇, 小嶋研史, 木村健二, 中嶋 薫, 奥峰徹也, 足立浩一郎, 小滝 浩, 後藤康仁, 石川順三 辻 博司, 洗 暢俊, 中塚博之, 後藤直行, 箕谷崇, 小嶋研史, 木村健二, 中嶋 薫, 奥峰徹也, 足立浩一郎, 小滝 浩, 後藤康仁, 石川順三 Hiroshi Tsuji, Nobutoshi Arai, Hiroyuki Nakatsuka, Naoyuki Gotoh, Takashi Minotani, Kenji Kojima, Kenji Kimura, Kaoru Nakajima, Tetsuya Okumine, Kouichiro Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa 高分解能ラザフォード後方散乱分析(RBS)による銀負イオン注入熱酸化薄膜における銀の熱拡散分布の測定と拡散障壁による単層銀ナノ粒子の形成 高分解能ラザフォード後方散乱分析(RBS)による銀負イオン注入熱酸化薄膜における銀の熱拡散分布の測定と拡散障壁による単層銀ナノ粒子の形成 Diffusion measurement of silver atoms implanted into thermally grown oxide thin film on silicon substrate by high-resolution RBS and mono-layered silver nanoparticle formation by using diffusion barrier 真空, 49, 6, 386-389 真空, 49, 6, 386-389 Shinku/Journal of the Vacuum Society of Japan, 49, 6, 386-389 2006 日本語 研究論文(学術雑誌) 公開
洗 暢俊, 辻 博司, 後藤直行, 箕谷 崇, 中塚博之, 小嶋研史, 柳谷敏雄, 奥峰徹也, 大西 均, 佐藤 剛, 原田真臣, 足立浩一郎, 小滝 浩, 後藤康仁, 石川順三 洗 暢俊, 辻 博司, 後藤直行, 箕谷 崇, 中塚博之, 小嶋研史, 柳谷敏雄, 奥峰徹也, 大西 均, 佐藤 剛, 原田真臣, 足立浩一郎, 小滝 浩, 後藤康仁, 石川順三 Nobutoshi Arai, Hiroshi Tsuji, Naoyuki Gotoh, Takashi Minotani, Hiroyuki Nakatsuka, Kenji Kojima, Toshio Yanagitani, Tetsuya Okumine, Hitoshi Ohnishi, Takeshi Satoh, Masatomi Harada, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa 負イオン注入形成Geナノ粒子含有SiO<sub>2</sub>薄膜の電気的特性 負イオン注入形成Geナノ粒子含有SiO<sub>2</sub>薄膜の電気的特性 Electric characteristics of thin SiO<sub>2</sub> film embedded with Ge nanoparticles formed by negative ion implantation 真空, 49, 3, 180-182 真空, 49, 3, 180-182 Shinku/Journal of the Vacuum Society of Japan, 49, 3, 180-182 2006 日本語 研究論文(学術雑誌) 公開
MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa Deposition of vanadium carbide thin films using compound target sputtering and their field emission Deposition of vanadium carbide thin films using compound target sputtering and their field emission Deposition of vanadium carbide thin films using compound target sputtering and their field emission JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 23, 5, 1379-1383 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 23, 5, 1379-1383 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 23, 5, 1379-1383 2005/09 英語 研究論文(学術雑誌) 公開
川口慎一, 種村眞幸, 種村 榮, 後藤康仁, 廖 梅勇, 新海聡子 川口慎一, 種村眞幸, 種村 榮, 後藤康仁, 廖 梅勇, 新海聡子 HfN薄膜からのスパッタイオンの放出角度分布測定 HfN薄膜からのスパッタイオンの放出角度分布測定 表面科学, 26, 8, 449-453 表面科学, 26, 8, 449-453 , 26, 8, 449-453 2005/08 日本語 研究論文(学術雑誌) 公開
H Tsuji, P Sommani, T Muto, Y Utagawa, S Sakai, H Sato, Y Gotoh, J Ishikawa H Tsuji, P Sommani, T Muto, Y Utagawa, S Sakai, H Sato, Y Gotoh, J Ishikawa H Tsuji, P Sommani, T Muto, Y Utagawa, S Sakai, H Sato, Y Gotoh, J Ishikawa Immobilization of extracellular matrix on polymeric materials by carbon-negative-ion implantation Immobilization of extracellular matrix on polymeric materials by carbon-negative-ion implantation Immobilization of extracellular matrix on polymeric materials by carbon-negative-ion implantation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 459-464 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 459-464 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 459-464 2005/08 英語 研究論文(学術雑誌) 公開
H Tsuji, N Sakai, H Sugahara, Y Gotoh, J Ishikawa H Tsuji, N Sakai, H Sugahara, Y Gotoh, J Ishikawa H Tsuji, N Sakai, H Sugahara, Y Gotoh, J Ishikawa Silver negative-ion implantation to sol-gel TiO<sub>2</sub> film for improving photocatalytic property under fluorescent light Silver negative-ion implantation to sol-gel TiO<sub>2</sub> film for improving photocatalytic property under fluorescent light Silver negative-ion implantation to sol-gel TiO<sub>2</sub> film for improving photocatalytic property under fluorescent light NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 433-437 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 433-437 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 433-437 2005/08 英語 研究論文(学術雑誌) 公開
J Ishikawa, H Tsuji, N Arai, T Matsumoto, K Ueno, K Adachi, H Kotaki, Y Gotoh J Ishikawa, H Tsuji, N Arai, T Matsumoto, K Ueno, K Adachi, H Kotaki, Y Gotoh J Ishikawa, H Tsuji, N Arai, T Matsumoto, K Ueno, K Adachi, H Kotaki, Y Gotoh Formation of almost delta-layered nanoparticles in SiO2 thin film on Si substrate by metal negative-ion implantation Formation of almost delta-layered nanoparticles in SiO2 thin film on Si substrate by metal negative-ion implantation Formation of almost delta-layered nanoparticles in SiO2 thin film on Si substrate by metal negative-ion implantation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 422-427 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 422-427 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 422-427 2005/08 英語 研究論文(学術雑誌) 公開
J Ishikawa, Y Gotoh, K Nakamura, T Kojima, H Tsuji, T Ikejiri, S Sakai, S Umisedo, N Nagai, M Nagao, S Kanemaru J Ishikawa, Y Gotoh, K Nakamura, T Kojima, H Tsuji, T Ikejiri, S Sakai, S Umisedo, N Nagai, M Nagao, S Kanemaru J Ishikawa, Y Gotoh, K Nakamura, T Kojima, H Tsuji, T Ikejiri, S Sakai, S Umisedo, N Nagai, M Nagao, S Kanemaru Silicon field emission array as novel charge neutralization device for high current ion implanter Silicon field emission array as novel charge neutralization device for high current ion implanter Silicon field emission array as novel charge neutralization device for high current ion implanter NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 390-394 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 390-394 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 390-394 2005/08 英語 研究論文(学術雑誌) 公開
N Arai, H Tsuji, K Ueno, T Matsumoto, Y Gotoh, K Adachi, H Kotaki, J Ishikawa N Arai, H Tsuji, K Ueno, T Matsumoto, Y Gotoh, K Adachi, H Kotaki, J Ishikawa N Arai, H Tsuji, K Ueno, T Matsumoto, Y Gotoh, K Adachi, H Kotaki, J Ishikawa Evaluation of nanoparticles embedded in thin silicon dioxide film by optical reflection property Evaluation of nanoparticles embedded in thin silicon dioxide film by optical reflection property Evaluation of nanoparticles embedded in thin silicon dioxide film by optical reflection property SURFACE & COATINGS TECHNOLOGY, 196, 1-3, 44-49 SURFACE & COATINGS TECHNOLOGY, 196, 1-3, 44-49 SURFACE & COATINGS TECHNOLOGY, 196, 1-3, 44-49 2005/06 英語 研究論文(学術雑誌) 公開
H Tsuji, N Arai, T Matsumoto, K Ueno, K Adachi, H Kotaki, Y Gotoh, J Ishikawa H Tsuji, N Arai, T Matsumoto, K Ueno, K Adachi, H Kotaki, Y Gotoh, J Ishikawa H Tsuji, N Arai, T Matsumoto, K Ueno, K Adachi, H Kotaki, Y Gotoh, J Ishikawa Delta layer formation of silver nanoparticles in thin silicon dioxide film by negative ion implantation Delta layer formation of silver nanoparticles in thin silicon dioxide film by negative ion implantation Delta layer formation of silver nanoparticles in thin silicon dioxide film by negative ion implantation SURFACE & COATINGS TECHNOLOGY, 196, 1-3, 39-43 SURFACE & COATINGS TECHNOLOGY, 196, 1-3, 39-43 SURFACE & COATINGS TECHNOLOGY, 196, 1-3, 39-43 2005/06 英語 研究論文(学術雑誌) 公開
小島俊彦, 中村好志, 後藤康仁, 辻 博司, 石川順三, 池尻忠司, 海勢頭聖, 酒井茂樹, 長井宣夫 小島俊彦, 中村好志, 後藤康仁, 辻 博司, 石川順三, 池尻忠司, 海勢頭聖, 酒井茂樹, 長井宣夫 Toshihiko Kojima, Kouji Nakamura, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa, Tadashi Ikejiri, Sei Umisedo, Shigeki Sakai, Nobuo Nagai シリコン電界放出電子源から放出される電子のエネルギー分析 シリコン電界放出電子源から放出される電子のエネルギー分析 Energy distribution of electrons emitted from silicon field emitter arrays 真空, 48, 5, 329-332 真空, 48, 5, 329-332 Shinku/Journal of the Vacuum Society of Japan, 48, 5, 329-332 2005 日本語 研究論文(学術雑誌) 公開
河村嘉徳, 石津勝之, 後藤康仁, 辻 博司, 石川順三, 中田修平, 奥田荘一郎 河村嘉徳, 石津勝之, 後藤康仁, 辻 博司, 石川順三, 中田修平, 奥田荘一郎 Yoshinori Kawamura, Katsuyuki Ishizu, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa, Shuuhei Nakata, Souichiro Okuda レーザ照射処理を施したカーボンナノチューブの電子放出特性の切片傾きチャートによる解析 レーザ照射処理を施したカーボンナノチューブの電子放出特性の切片傾きチャートによる解析 Seppen-katamuki analysis of field emission from carbon nanotubes after KrF-excimer laser irradiation 真空, 48, 5, 325-328 真空, 48, 5, 325-328 Shinku/Journal of the Vacuum Society of Japan, 48, 5, 325-328 2005 日本語 研究論文(学術雑誌) 公開
H Tsuji, N Arai, T Matsumoto, K Ueno, Y Gotoh, K Adachi, H Kotaki, J Ishikawa H Tsuji, N Arai, T Matsumoto, K Ueno, Y Gotoh, K Adachi, H Kotaki, J Ishikawa H Tsuji, N Arai, T Matsumoto, K Ueno, Y Gotoh, K Adachi, H Kotaki, J Ishikawa Silver nanoparticle formation in thin oxide layer on silicon by silver-negative-ion implantation for Coulomb blockade at room temperature Silver nanoparticle formation in thin oxide layer on silicon by silver-negative-ion implantation for Coulomb blockade at room temperature Silver nanoparticle formation in thin oxide layer on silicon by silver-negative-ion implantation for Coulomb blockade at room temperature APPLIED SURFACE SCIENCE, 238, 1-4, 132-137 APPLIED SURFACE SCIENCE, 238, 1-4, 132-137 APPLIED SURFACE SCIENCE, 238, 1-4, 132-137 2004/11 英語 研究論文(学術雑誌) 公開
MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa Compound-target sputtering for niobium carbide thin-film deposition Compound-target sputtering for niobium carbide thin-film deposition Compound-target sputtering for niobium carbide thin-film deposition JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 22, 5, L24-L27 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 22, 5, L24-L27 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 22, 5, L24-L27 2004/09 英語 公開
H Tsuji, M Izukawa, R Ikeguchi, R Kakinoki, H Sato, Y Gotoh, J Ishikawa H Tsuji, M Izukawa, R Ikeguchi, R Kakinoki, H Sato, Y Gotoh, J Ishikawa H Tsuji, M Izukawa, R Ikeguchi, R Kakinoki, H Sato, Y Gotoh, J Ishikawa Surface treatment of silicone rubber by carbon negative-ion implantation for nerve regeneration Surface treatment of silicone rubber by carbon negative-ion implantation for nerve regeneration Surface treatment of silicone rubber by carbon negative-ion implantation for nerve regeneration APPLIED SURFACE SCIENCE, 235, 1-2, 182-187 APPLIED SURFACE SCIENCE, 235, 1-2, 182-187 APPLIED SURFACE SCIENCE, 235, 1-2, 182-187 2004/07 英語 研究論文(学術雑誌) 公開
K Miya, M Sasaki, S Yamamoto, Y Gotoh, Y Kawamura, J Ishikawa K Miya, M Sasaki, S Yamamoto, Y Gotoh, Y Kawamura, J Ishikawa K Miya, M Sasaki, S Yamamoto, Y Gotoh, Y Kawamura, J Ishikawa A study of TaN film field electron emitter material by a Kelvin probe force microscope A study of TaN film field electron emitter material by a Kelvin probe force microscope A study of TaN film field electron emitter material by a Kelvin probe force microscope MICROELECTRONIC ENGINEERING, 71, 3-4, 343-347 MICROELECTRONIC ENGINEERING, 71, 3-4, 343-347 MICROELECTRONIC ENGINEERING, 71, 3-4, 343-347 2004/05 英語 研究論文(学術雑誌) 公開
Y Gotoh, M Nagao, D Nozaki, K Utsumi, K Inoue, T Nakatani, T Sakashita, K Betsui, H Tsuji, J Ishikawa Y Gotoh, M Nagao, D Nozaki, K Utsumi, K Inoue, T Nakatani, T Sakashita, K Betsui, H Tsuji, J Ishikawa Y Gotoh, M Nagao, D Nozaki, K Utsumi, K Inoue, T Nakatani, T Sakashita, K Betsui, H Tsuji, J Ishikawa Electron emission properties of Spindt-type platinum field emission cathodes Electron emission properties of Spindt-type platinum field emission cathodes Electron emission properties of Spindt-type platinum field emission cathodes JOURNAL OF APPLIED PHYSICS, 95, 3, 1537-1549 JOURNAL OF APPLIED PHYSICS, 95, 3, 1537-1549 JOURNAL OF APPLIED PHYSICS, 95, 3, 1537-1549 2004/02 英語 研究論文(学術雑誌) 公開
MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa Growth and stress evolution of hafnium nitride films sputtered from a compound target Growth and stress evolution of hafnium nitride films sputtered from a compound target Growth and stress evolution of hafnium nitride films sputtered from a compound target JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 22, 1, 214-220 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 22, 1, 214-220 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 22, 1, 214-220 2004/01 英語 研究論文(学術雑誌) 公開
MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa Crystallographic structure and composition of vanadium nitride films deposited by direct sputtering of a compound target Crystallographic structure and composition of vanadium nitride films deposited by direct sputtering of a compound target Crystallographic structure and composition of vanadium nitride films deposited by direct sputtering of a compound target JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 22, 1, 146-150 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 22, 1, 146-150 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 22, 1, 146-150 2004/01 英語 研究論文(学術雑誌) 公開
一原主税, 小林 明, 後藤康仁, 井上憲一, 辻 博司, 石川順三 一原主税, 小林 明, 後藤康仁, 井上憲一, 辻 博司, 石川順三 Chikara Ichihara, Akira Kobayashi, Yasuhito Gotoh, Ken-Ichi Inoue, Hiroshi Tsuji, Junzo Ishikawa マイクロガスジェットイオン源の放電特性把握実験 マイクロガスジェットイオン源の放電特性把握実験 Discharge characteristics of micro gas jet ion source 真空, 47, 3, 285-288 真空, 47, 3, 285-288 Shinku/Journal of the Vacuum Society of Japan, 47, 3, 285-288 2004 日本語 研究論文(学術雑誌) 公開
H Sato, H Tsuji, H Sasaki, S Ikemura, Y Gotoh, J Ishikawa, SI Nishimoto H Sato, H Tsuji, H Sasaki, S Ikemura, Y Gotoh, J Ishikawa, SI Nishimoto H Sato, H Tsuji, H Sasaki, S Ikemura, Y Gotoh, J Ishikawa, SI Nishimoto Selective neurite outgrowth on silver negative ion Ag<sup>-</sup>-implanted polystyrene surfaces Selective neurite outgrowth on silver negative ion Ag<sup>-</sup>-implanted polystyrene surfaces Selective neurite outgrowth on silver negative ion Ag<sup>-</sup>-implanted polystyrene surfaces CHINESE JOURNAL OF POLYMER SCIENCE, 22, 1, 69-75 CHINESE JOURNAL OF POLYMER SCIENCE, 22, 1, 69-75 CHINESE JOURNAL OF POLYMER SCIENCE, 22, 1, 69-75 2003/12 英語 研究論文(学術雑誌) 公開
洗暢俊, 辻博司, 本野正徳, 菅原弘允, 松本卓也, 後藤康仁, 石川順三 洗暢俊, 辻博司, 本野正徳, 菅原弘允, 松本卓也, 後藤康仁, 石川順三 Nobutoshi Arai, Hiroshi Tsuji, Masanori Motono, Hiromitsu Sugawara, Takuya Matsumoto, Yasuhito Gotoh, Junzo Ishikawa シリコン基板上熱酸化膜中への銀負イオン注入で作製した銀ナノ粒子の光反射特性による評価 シリコン基板上熱酸化膜中への銀負イオン注入で作製した銀ナノ粒子の光反射特性による評価 Study on optical reflection property from multilayer on Si substrate including nanoparticles in SiO2 layer 真空, 46, 9, 698-702 真空, 46, 9, 698-702 Shinku/Journal of the Vacuum Society of Japan, 46, 9, 698-702 2003/09 日本語 研究論文(学術雑誌) 公開
MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa Field electron emission from nanostructured heterogeneous HfN<sub>x</sub>O<sub>y</sub> films Field electron emission from nanostructured heterogeneous HfN<sub>x</sub>O<sub>y</sub> films Field electron emission from nanostructured heterogeneous HfN<sub>x</sub>O<sub>y</sub> films APPLIED PHYSICS LETTERS, 83, 8, 1626-1628 APPLIED PHYSICS LETTERS, 83, 8, 1626-1628 APPLIED PHYSICS LETTERS, 83, 8, 1626-1628 2003/08 英語 研究論文(学術雑誌) 公開
Y Gotoh, T Hagiwara, Y Tanaka, H Kubo, H Tsuji, J Ishikawa Y Gotoh, T Hagiwara, Y Tanaka, H Kubo, H Tsuji, J Ishikawa Y Gotoh, T Hagiwara, Y Tanaka, H Kubo, H Tsuji, J Ishikawa On the stability of electronic perturbations on a graphite surface produced by low-energy ion bombardment On the stability of electronic perturbations on a graphite surface produced by low-energy ion bombardment On the stability of electronic perturbations on a graphite surface produced by low-energy ion bombardment MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 353, 1-2, 6-11 MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 353, 1-2, 6-11 MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 353, 1-2, 6-11 2003/07 英語 研究論文(学術雑誌) 公開
Y Gotoh, MY Liao, H Tsuji, J Ishikawa Y Gotoh, MY Liao, H Tsuji, J Ishikawa Y Gotoh, MY Liao, H Tsuji, J Ishikawa Formation and control of stoichiometric hafnium nitride thin films by direct sputtering of hafnium nitride target Formation and control of stoichiometric hafnium nitride thin films by direct sputtering of hafnium nitride target Formation and control of stoichiometric hafnium nitride thin films by direct sputtering of hafnium nitride target JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 42, 7A, L778-L780 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 42, 7A, L778-L780 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 42, 7A, L778-L780 2003/07 英語 研究論文(学術雑誌) 公開
Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Measurement of work function of transition metal nitride and carbide thin films Measurement of work function of transition metal nitride and carbide thin films Measurement of work function of transition metal nitride and carbide thin films JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 21, 4, 1607-1611 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 21, 4, 1607-1611 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 21, 4, 1607-1611 2003/07 英語 研究論文(学術雑誌) 公開
Y Gotoh, K Ishizu, H Tsuji, J Ishikawa Y Gotoh, K Ishizu, H Tsuji, J Ishikawa Y Gotoh, K Ishizu, H Tsuji, J Ishikawa In situ analyzer of electron emission properties: Fowler-Nordheim plotter and Seppen-Katamuki plotter In situ analyzer of electron emission properties: Fowler-Nordheim plotter and Seppen-Katamuki plotter In situ analyzer of electron emission properties: Fowler-Nordheim plotter and Seppen-Katamuki plotter JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 21, 4, 1524-1527 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 21, 4, 1524-1527 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 21, 4, 1524-1527 2003/07 英語 研究論文(学術雑誌) 公開
N Arai, H Tsuji, M Motono, Y Gotoh, K Adachi, H Kotaki, J Ishikawa N Arai, H Tsuji, M Motono, Y Gotoh, K Adachi, H Kotaki, J Ishikawa N Arai, H Tsuji, M Motono, Y Gotoh, K Adachi, H Kotaki, J Ishikawa Formation of silver nanoparticles in thin oxide layer on Si by negative-ion implantation Formation of silver nanoparticles in thin oxide layer on Si by negative-ion implantation Formation of silver nanoparticles in thin oxide layer on Si by negative-ion implantation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 629-633 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 629-633 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 629-633 2003/05 英語 研究論文(学術雑誌) 公開
H Tsuji, N Arai, M Motono, Y Gotoh, K Adachi, H Kotaki, J Ishikawa H Tsuji, N Arai, M Motono, Y Gotoh, K Adachi, H Kotaki, J Ishikawa H Tsuji, N Arai, M Motono, Y Gotoh, K Adachi, H Kotaki, J Ishikawa Study on optical reflection property from multilayer on Si substrate including nanoparticles in SiO<sub>2</sub> layer Study on optical reflection property from multilayer on Si substrate including nanoparticles in SiO<sub>2</sub> layer Study on optical reflection property from multilayer on Si substrate including nanoparticles in SiO<sub>2</sub> layer NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 615-619 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 615-619 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 615-619 2003/05 英語 研究論文(学術雑誌) 公開
H Tsuji, M Izukawa, R Ikeguchi, R Kakinoki, H Sato, Y Gotoh, J Ishikawa H Tsuji, M Izukawa, R Ikeguchi, R Kakinoki, H Sato, Y Gotoh, J Ishikawa H Tsuji, M Izukawa, R Ikeguchi, R Kakinoki, H Sato, Y Gotoh, J Ishikawa Improvement of polydimethylsiloxane guide tube for nerve regeneration treatment by carbon negative-ion implantation Improvement of polydimethylsiloxane guide tube for nerve regeneration treatment by carbon negative-ion implantation Improvement of polydimethylsiloxane guide tube for nerve regeneration treatment by carbon negative-ion implantation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 507-511 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 507-511 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 507-511 2003/05 英語 研究論文(学術雑誌) 公開
H Tsuji, H Sugahara, Y Gotoh, J Ishikawa H Tsuji, H Sugahara, Y Gotoh, J Ishikawa H Tsuji, H Sugahara, Y Gotoh, J Ishikawa Improvement of photocatalytic efficiency of rutile titania by silver negative-ion implantation Improvement of photocatalytic efficiency of rutile titania by silver negative-ion implantation Improvement of photocatalytic efficiency of rutile titania by silver negative-ion implantation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 249-253 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 249-253 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 249-253 2003/05 英語 研究論文(学術雑誌) 公開
K Kobashi, Y Nishibayashi, Y Yokota, Y Ando, T Tachibana, N Kawakami, K Hayashi, K Inoue, K Meguro, H Imai, H Furata, T Hirao, K Oura, Y Gotoh, H Nakahara, H Tsuji, J Ishikawa, FA Koeck, RJ Nernanich, T Sakai, N Sakuma, H Yoshida K Kobashi, Y Nishibayashi, Y Yokota, Y Ando, T Tachibana, N Kawakami, K Hayashi, K Inoue, K Meguro, H Imai, H Furata, T Hirao, K Oura, Y Gotoh, H Nakahara, H Tsuji, J Ishikawa, FA Koeck, RJ Nernanich, T Sakai, N Sakuma, H Yoshida K Kobashi, Y Nishibayashi, Y Yokota, Y Ando, T Tachibana, N Kawakami, K Hayashi, K Inoue, K Meguro, H Imai, H Furata, T Hirao, K Oura, Y Gotoh, H Nakahara, H Tsuji, J Ishikawa, FA Koeck, RJ Nernanich, T Sakai, N Sakuma, H Yoshida R&D of diamond films in the Frontier Carbon Technology Project and related topics R&D of diamond films in the Frontier Carbon Technology Project and related topics R&D of diamond films in the Frontier Carbon Technology Project and related topics DIAMOND AND RELATED MATERIALS, 12, 3-7, 233-240 DIAMOND AND RELATED MATERIALS, 12, 3-7, 233-240 DIAMOND AND RELATED MATERIALS, 12, 3-7, 233-240 2003/03 英語 研究論文(学術雑誌) 公開
K Kobashi, T Tachibana, Y Yokota, N Kawakami, K Hayashi, K Yamamoto, Y Koga, S Fujiwara, Y Gotoh, H Nakahara, H Tsuji, J Ishikawa, FA Kock, RJ Nemanich K Kobashi, T Tachibana, Y Yokota, N Kawakami, K Hayashi, K Yamamoto, Y Koga, S Fujiwara, Y Gotoh, H Nakahara, H Tsuji, J Ishikawa, FA Kock, RJ Nemanich K Kobashi, T Tachibana, Y Yokota, N Kawakami, K Hayashi, K Yamamoto, Y Koga, S Fujiwara, Y Gotoh, H Nakahara, H Tsuji, J Ishikawa, FA Kock, RJ Nemanich Fibrous structures on diamond and carbon surfaces formed by hydrogen plasma under direct current bias and field electron-emission properties Fibrous structures on diamond and carbon surfaces formed by hydrogen plasma under direct current bias and field electron-emission properties Fibrous structures on diamond and carbon surfaces formed by hydrogen plasma under direct current bias and field electron-emission properties JOURNAL OF MATERIALS RESEARCH, 18, 2, 305-326 JOURNAL OF MATERIALS RESEARCH, 18, 2, 305-326 JOURNAL OF MATERIALS RESEARCH, 18, 2, 305-326 2003/02 英語 研究論文(学術雑誌) 公開
石津勝之, 後藤康仁, 辻 博司, 石川順三 石津勝之, 後藤康仁, 辻 博司, 石川順三 Katsuyuki Ishizu, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa 電子放出特性その場解析装置によるF-Nプロット及びS-Kチャートのその場表示 電子放出特性その場解析装置によるF-Nプロット及びS-Kチャートのその場表示 Development of in situ analyzer of electron emission properties: Fowler-Nordheim plotter and Seppen-Katamuki plotter 真空, 46, 7, 550-553 真空, 46, 7, 550-553 Shinku/Journal of the Vacuum Society of Japan, 46, 7, 550-553 2003 日本語 研究論文(学術雑誌) 公開
J Ishikawa, H Tsuji, M Motono, Y Gotoh, N Arai, K Adachi, H Kotaki J Ishikawa, H Tsuji, M Motono, Y Gotoh, N Arai, K Adachi, H Kotaki J Ishikawa, H Tsuji, M Motono, Y Gotoh, N Arai, K Adachi, H Kotaki Negative-ion implantation into thin SiO2 film on Si and formation of silver nanoparticles in the film Negative-ion implantation into thin SiO2 film on Si and formation of silver nanoparticles in the film Negative-ion implantation into thin SiO2 film on Si and formation of silver nanoparticles in the film IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 690-693 IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 690-693 IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 690-693 2003 英語 研究論文(国際会議プロシーディングス) 公開
J Ishikawa, H Tsuji, H Sugahara, Y Gotoh J Ishikawa, H Tsuji, H Sugahara, Y Gotoh J Ishikawa, H Tsuji, H Sugahara, Y Gotoh Nanoparticle formation in surface layer of oxide materials and improvement of photocatalytic properties of rutile titanium dioxide Nanoparticle formation in surface layer of oxide materials and improvement of photocatalytic properties of rutile titanium dioxide Nanoparticle formation in surface layer of oxide materials and improvement of photocatalytic properties of rutile titanium dioxide APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 639-642 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 639-642 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 639-642 2003 英語 研究論文(国際会議プロシーディングス) 公開
H Tsuji, H Sugahara, Y Gotoh, J Ishikawa H Tsuji, H Sugahara, Y Gotoh, J Ishikawa H Tsuji, H Sugahara, Y Gotoh, J Ishikawa Metal negative-ion implantation into rutile TiO<sub>2</sub> and enhancement of photocatalytic property under irradiation of fluorescent light Metal negative-ion implantation into rutile TiO<sub>2</sub> and enhancement of photocatalytic property under irradiation of fluorescent light Metal negative-ion implantation into rutile TiO<sub>2</sub> and enhancement of photocatalytic property under irradiation of fluorescent light IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 705-708 IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 705-708 IIT2002: ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 705-708 2003 英語 研究論文(国際会議プロシーディングス) 公開
芝原 豪, 安孫子正義, 後藤康仁, 辻 博司, 石川順三 芝原 豪, 安孫子正義, 後藤康仁, 辻 博司, 石川順三 Takeshi Shibahara, Masayoshi Abiko, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa 低エネルギー小型マイクロ波イオン源を用いたイオンビームアシスト蒸着装置の開発 低エネルギー小型マイクロ波イオン源を用いたイオンビームアシスト蒸着装置の開発 Development of ion beam assisted deposition system equipped with a low energy compact microwave ion source 真空, 46, 9, 708-711 真空, 46, 9, 708-711 Shinku/Journal of the Vacuum Society of Japan, 46, 9, 708-711 2003 日本語 研究論文(学術雑誌) 公開
H Tsuji, K Kurita, Y Gotoh, N Kishimoto, J Ishikawa H Tsuji, K Kurita, Y Gotoh, N Kishimoto, J Ishikawa H Tsuji, K Kurita, Y Gotoh, N Kishimoto, J Ishikawa Optical absorption properties of Cu and Ag double negative-ion implanted silica glass Optical absorption properties of Cu and Ag double negative-ion implanted silica glass Optical absorption properties of Cu and Ag double negative-ion implanted silica glass NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 195, 3-4, 315-319 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 195, 3-4, 315-319 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 195, 3-4, 315-319 2002/10 英語 研究論文(学術雑誌) 公開
Y Gotoh, K Kagamimori, H Tsuji, J Ishikawa Y Gotoh, K Kagamimori, H Tsuji, J Ishikawa Y Gotoh, K Kagamimori, H Tsuji, J Ishikawa Ion beam assisted deposition of tantalum nitride thin films for vacuum microelectronics devices Ion beam assisted deposition of tantalum nitride thin films for vacuum microelectronics devices Ion beam assisted deposition of tantalum nitride thin films for vacuum microelectronics devices SURFACE & COATINGS TECHNOLOGY, 158, 729-731 SURFACE & COATINGS TECHNOLOGY, 158, 729-731 SURFACE & COATINGS TECHNOLOGY, 158, 729-731 2002/09 英語 研究論文(学術雑誌) 公開
H Tsuji, H Sasaki, Y Utsumi, H Sato, Y Gotoh, J Ishikawa H Tsuji, H Sasaki, Y Utsumi, H Sato, Y Gotoh, J Ishikawa H Tsuji, H Sasaki, Y Utsumi, H Sato, Y Gotoh, J Ishikawa Extracellular matrix absorption properties of negative ion-implanted polystyrene, polydimethylsiloxane and poly-lactic acid Extracellular matrix absorption properties of negative ion-implanted polystyrene, polydimethylsiloxane and poly-lactic acid Extracellular matrix absorption properties of negative ion-implanted polystyrene, polydimethylsiloxane and poly-lactic acid SURFACE & COATINGS TECHNOLOGY, 158, 620-623 SURFACE & COATINGS TECHNOLOGY, 158, 620-623 SURFACE & COATINGS TECHNOLOGY, 158, 620-623 2002/09 英語 研究論文(学術雑誌) 公開
H Tsuji, T Sagimori, K Kurita, Y Gotoh, J Ishikawa H Tsuji, T Sagimori, K Kurita, Y Gotoh, J Ishikawa H Tsuji, T Sagimori, K Kurita, Y Gotoh, J Ishikawa Surface modification of TiO<sub>2</sub> (rutile) by metal negative ion implantation for improving catalytic properties Surface modification of TiO<sub>2</sub> (rutile) by metal negative ion implantation for improving catalytic properties Surface modification of TiO<sub>2</sub> (rutile) by metal negative ion implantation for improving catalytic properties SURFACE & COATINGS TECHNOLOGY, 158, 208-213 SURFACE & COATINGS TECHNOLOGY, 158, 208-213 SURFACE & COATINGS TECHNOLOGY, 158, 208-213 2002/09 英語 研究論文(学術雑誌) 公開
N Kiwa, Y Gotoh, H Tsuji, J Ishikawa N Kiwa, Y Gotoh, H Tsuji, J Ishikawa N Kiwa, Y Gotoh, H Tsuji, J Ishikawa Relationship between composition and work function of gold-samarium alloy thin films Relationship between composition and work function of gold-samarium alloy thin films Relationship between composition and work function of gold-samarium alloy thin films VACUUM, 66, 3-4, 517-521 VACUUM, 66, 3-4, 517-521 VACUUM, 66, 3-4, 517-521 2002/08 英語 研究論文(学術雑誌) 公開
H Tsuji, H Sasaki, H Sato, Y Gotoh, J Ishikawa H Tsuji, H Sasaki, H Sato, Y Gotoh, J Ishikawa H Tsuji, H Sasaki, H Sato, Y Gotoh, J Ishikawa Neuron attachment properties of carbon negative-ion implanted bioabsorbable polymer of poly-lactic acid Neuron attachment properties of carbon negative-ion implanted bioabsorbable polymer of poly-lactic acid Neuron attachment properties of carbon negative-ion implanted bioabsorbable polymer of poly-lactic acid NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 191, 815-819 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 191, 815-819 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 191, 815-819 2002/05 英語 研究論文(学術雑誌) 公開
Y Gotoh, K Nakajima, T Hagiwara, H Tsuji, J Ishikawa Y Gotoh, K Nakajima, T Hagiwara, H Tsuji, J Ishikawa Y Gotoh, K Nakajima, T Hagiwara, H Tsuji, J Ishikawa Energy distribution of the compact microwave ion source for extremely low voltage ion extraction Energy distribution of the compact microwave ion source for extremely low voltage ion extraction Energy distribution of the compact microwave ion source for extremely low voltage ion extraction REVIEW OF SCIENTIFIC INSTRUMENTS, 73, 2, 758-760 REVIEW OF SCIENTIFIC INSTRUMENTS, 73, 2, 758-760 REVIEW OF SCIENTIFIC INSTRUMENTS, 73, 2, 758-760 2002/02 英語 研究論文(学術雑誌) 公開
後藤康仁, 北井秀憲, 辻 博司, 石川順三 後藤康仁, 北井秀憲, 辻 博司, 石川順三 Y. Gotoh, H. Kitai, H. Tsuji, J. Ishikawa イオンビームアシスト蒸着による窒化ニオブ薄膜の配向制御 イオンビームアシスト蒸着による窒化ニオブ薄膜の配向制御 Orientation control of niobium nitride thin films by ion beam assisted deposition 真空, 45, 3, 215-218 真空, 45, 3, 215-218 Shinku/Journal of the Vacuum Society of Japan, 45, 3, 215-218 2002 英語 研究論文(学術雑誌) 公開
後藤康仁, 紀和伸政, 辻 博司, 石川順三 後藤康仁, 紀和伸政, 辻 博司, 石川順三 Y. Gotoh, N. Kiwa, H. Tsuji, J. Ishikawa マグネトロンスパッタ法による遷移金属炭化物薄膜の作製と冷陰極材料としての評価 マグネトロンスパッタ法による遷移金属炭化物薄膜の作製と冷陰極材料としての評価 Magnetron sputter deposition of transition metal carbide thin films and their evaluation as a cold cathode 真空, 45, 3, 212-214 真空, 45, 3, 212-214 Shinku/Journal of the Vacuum Society of Japan, 45, 3, 212-214 2002 英語 研究論文(学術雑誌) 公開
泉川雅芳, 辻 博司, 佐藤弘子, 佐々木仁志, 後藤康仁, 石川順三 泉川雅芳, 辻 博司, 佐藤弘子, 佐々木仁志, 後藤康仁, 石川順三 Masayoshi Izukawa, Hiroshi Tsuji, Hiroko Sato, Hitoshi Sasaki, Yasuhito Gotoh, Junzo Ishikawa 炭素負イオン注入により改質した生分解性ポリ乳酸表面の神経細胞接着特性 炭素負イオン注入により改質した生分解性ポリ乳酸表面の神経細胞接着特性 Nerve cell attachment property of absorbable poly-lactic-acid modified by carbon negative-ion implantation 真空, 45, 6, 514-518 真空, 45, 6, 514-518 Shinku/Journal of the Vacuum Society of Japan, 45, 6, 514-518 2002 日本語 研究論文(学術雑誌) 公開
辻 博司, 栗田賢一, 本野正徳, 菅原弘允, 後藤康仁, 岸本直樹, 石川順三 辻 博司, 栗田賢一, 本野正徳, 菅原弘允, 後藤康仁, 岸本直樹, 石川順三 Hiroshi Tsuji, Ken'ichi Kurita, Masanori Motono, Hiromitsu Sugahara, Yasuhito Gotoh, Naoki Kishimoto, Junzo Ishikawa 石英ガラスへの金属負イオン多重注入による表面プラズモン共鳴吸収帯域の制御 石英ガラスへの金属負イオン多重注入による表面プラズモン共鳴吸収帯域の制御 Control of optical absorption band due to Cu/Ag nanoparticles in SiO<sub>2</sub> glass by dual ion implantation of Cu<sup>-</sup> and Ag<sup>-</sup> 真空, 45, 6, 528-532 真空, 45, 6, 528-532 Shinku/Journal of the Vacuum Society of Japan, 45, 6, 528-532 2002 日本語 研究論文(学術雑誌) 公開
辻 博司, 菅原弘允, 鷺森友彦, 本野正徳, 後藤康仁, 石川順三 辻 博司, 菅原弘允, 鷺森友彦, 本野正徳, 後藤康仁, 石川順三 Hiroshi Tsuji, Hiromitsu Sugahara, Tomohiko Sagimori, Masanori Motono, Yasuhito Gotoh, Junzo Ishikawa 金属負イオン注入による二酸化チタンルチルの光触媒効率の改善 金属負イオン注入による二酸化チタンルチルの光触媒効率の改善 Improvement of photocatalytic efficiencies of rutile TiO<sub>2</sub> by metal negative ion implantation 真空, 45, 3, 177-180 真空, 45, 3, 177-180 Shinku/Journal of the Vacuum Society of Japan, 45, 3, 177-180 2002 日本語 研究論文(学術雑誌) 公開
後藤康仁, 紀和伸政, 辻 博司, 石川順三 後藤康仁, 紀和伸政, 辻 博司, 石川順三 Yasuhito Gotoh, Nobumasa Kiwa, Hiroshi Tsuji, Junzo Ishikawa 窒化物ターゲットの高周波スパッタリングによるハフニウムおよびタンタル窒化物薄膜の形成と評価 窒化物ターゲットの高周波スパッタリングによるハフニウムおよびタンタル窒化物薄膜の形成と評価 Evaluation of hafnium and tantalum nitride thin films prepared by magnetron sputter deposition with a nitride target 真空, 45, 3, 309-312 真空, 45, 3, 309-312 Shinku/Journal of the Vacuum Society of Japan, 45, 3, 309-312 2002 日本語 研究論文(学術雑誌) 公開
Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa On the increase of the intensity ratio of doubly charged ions to singly charged ions for liquid gold and copper ion sources On the increase of the intensity ratio of doubly charged ions to singly charged ions for liquid gold and copper ion sources On the increase of the intensity ratio of doubly charged ions to singly charged ions for liquid gold and copper ion sources ULTRAMICROSCOPY, 89, 1-3, 69-74 ULTRAMICROSCOPY, 89, 1-3, 69-74 ULTRAMICROSCOPY, 89, 1-3, 69-74 2001/10 英語 研究論文(学術雑誌) 公開
Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Relationships among the physical parameters required to give a linear relation between slope and intercept of Fowler-Nordheim plots Relationships among the physical parameters required to give a linear relation between slope and intercept of Fowler-Nordheim plots Relationships among the physical parameters required to give a linear relation between slope and intercept of Fowler-Nordheim plots ULTRAMICROSCOPY, 89, 1-3, 63-67 ULTRAMICROSCOPY, 89, 1-3, 63-67 ULTRAMICROSCOPY, 89, 1-3, 63-67 2001/10 英語 研究論文(学術雑誌) 公開
Y Gotoh, Y Kashiwagi, M Nagao, T Kondo, H Tsuji, J Ishikawa Y Gotoh, Y Kashiwagi, M Nagao, T Kondo, H Tsuji, J Ishikawa Y Gotoh, Y Kashiwagi, M Nagao, T Kondo, H Tsuji, J Ishikawa Fabrication of gated niobium nitride field emitter array Fabrication of gated niobium nitride field emitter array Fabrication of gated niobium nitride field emitter array JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19, 4, 1373-1376 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19, 4, 1373-1376 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19, 4, 1373-1376 2001/07 英語 研究論文(学術雑誌) 公開
Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Relationship between work function and current fluctuation of field emitters: Use of SK chart dor evaluation of work function Relationship between work function and current fluctuation of field emitters: Use of SK chart dor evaluation of work function Relationship between work function and current fluctuation of field emitters: Use of SK chart dor evaluation of work function JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19, 3, 992-994 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19, 3, 992-994 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19, 3, 992-994 2001/05 英語 研究論文(学術雑誌) 公開
Y Gotoh, D Nozaki, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui Y Gotoh, D Nozaki, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui Y Gotoh, D Nozaki, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui Emission characteristics of Spindt-type platinum field emitters improved by operation in carbon monoxide ambient Emission characteristics of Spindt-type platinum field emitters improved by operation in carbon monoxide ambient Emission characteristics of Spindt-type platinum field emitters improved by operation in carbon monoxide ambient JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19, 3, 912-915 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19, 3, 912-915 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 19, 3, 912-915 2001/05 英語 研究論文(学術雑誌) 公開
J Ishikawa, H Tsuji, H Sato, H Sasaki, Y Gotoh J Ishikawa, H Tsuji, H Sato, H Sasaki, Y Gotoh J Ishikawa, H Tsuji, H Sato, H Sasaki, Y Gotoh A negative ion beam application for improving biocompatibility of polystyrene surface A negative ion beam application for improving biocompatibility of polystyrene surface A negative ion beam application for improving biocompatibility of polystyrene surface APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 576, 1028-1031 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 576, 1028-1031 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 576, 1028-1031 2001 英語 研究論文(国際会議プロシーディングス) 公開
辻 博司, 佐藤弘子, 佐々木仁志, 後藤康仁, 石川順三 辻 博司, 佐藤弘子, 佐々木仁志, 後藤康仁, 石川順三 H. Tsuji, H. Sato, H. Sasaki, Y. Gotoh, J. Ishikawa 負イオン注入によるポリスチレン表面の神経細胞接着特性の改質とパターン化処理 負イオン注入によるポリスチレン表面の神経細胞接着特性の改質とパターン化処理 Modification of polystyrene surface for neuron cell attachment properties by negative ion implantation and pattern treatment 真空, 44, 2, 87-93 真空, 44, 2, 87-93 Shinku/Journal of the Vacuum Society of Japan, 44, 2, 87-93 2001 日本語 研究論文(学術雑誌) 公開
佐々木仁志, 辻 博司, 佐藤弘子, 後藤康仁, 石川順三 佐々木仁志, 辻 博司, 佐藤弘子, 後藤康仁, 石川順三 H. Sasaki, H. Tsuji, H. Sato, Y. Gotoh, J. Ishikawa 細胞接着特性の向上を目指した負イオン注入ポリスチレンの原子間力顕微鏡による表面観測 細胞接着特性の向上を目指した負イオン注入ポリスチレンの原子間力顕微鏡による表面観測 Observation of negative-ion-implanted polystyrene by atomic force microscope for improvement of neural attachment properties 真空, 44, 3, 217-220 真空, 44, 3, 217-220 Shinku/Journal of the Vacuum Society of Japan, 44, 3, 217-220 2001 日本語 研究論文(学術雑誌) 公開
辻 博司, 鷺森友彦, 栗田賢一, 後藤康仁, 石川順三 辻 博司, 鷺森友彦, 栗田賢一, 後藤康仁, 石川順三 H. Tsuji, T. Sagimori, K. Kurita, Y. Gotoh, J. Ishikawa 銅負イオン注入による二酸化チタンの光吸収特性の変化と銅超微粒子の形成 銅負イオン注入による二酸化チタンの光吸収特性の変化と銅超微粒子の形成 Optical absorption properties of copper-negative-ion implanted titanium dioxide and formation of copper nanoparticles 真空, 44, 3, 225-227 真空, 44, 3, 225-227 Shinku/Journal of the Vacuum Society of Japan, 44, 3, 225-227 2001 日本語 研究論文(学術雑誌) 公開
Y Gotoh, D Nozaki, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui Y Gotoh, D Nozaki, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui Y Gotoh, D Nozaki, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui Significant improvement of the emission property of Spindt-type platinum field emitters by operation in carbon monoxide ambient Significant improvement of the emission property of Spindt-type platinum field emitters by operation in carbon monoxide ambient Significant improvement of the emission property of Spindt-type platinum field emitters by operation in carbon monoxide ambient APPLIED PHYSICS LETTERS, 77, 4, 588-590 APPLIED PHYSICS LETTERS, 77, 4, 588-590 APPLIED PHYSICS LETTERS, 77, 4, 588-590 2000/07 英語 研究論文(学術雑誌) 公開
H Tsuji, H Sato, T Baba, S Ikemura, Y Gotoh, J Ishikawa H Tsuji, H Sato, T Baba, S Ikemura, Y Gotoh, J Ishikawa H Tsuji, H Sato, T Baba, S Ikemura, Y Gotoh, J Ishikawa Neuron cell positioning on polystyrene in culture by silver-negative ion implantation and region control of neural outgrowth Neuron cell positioning on polystyrene in culture by silver-negative ion implantation and region control of neural outgrowth Neuron cell positioning on polystyrene in culture by silver-negative ion implantation and region control of neural outgrowth NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 166, 815-819 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 166, 815-819 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 166, 815-819 2000/05 英語 研究論文(学術雑誌) 公開
Y Gotoh, T Kondo, M Nagao, H Tsuji, J Ishikawa, K Hayashi, K Kobashi Y Gotoh, T Kondo, M Nagao, H Tsuji, J Ishikawa, K Hayashi, K Kobashi Y Gotoh, T Kondo, M Nagao, H Tsuji, J Ishikawa, K Hayashi, K Kobashi Estimation of emission field and emission site of boron-doped diamond thin-film field emitters Estimation of emission field and emission site of boron-doped diamond thin-film field emitters Estimation of emission field and emission site of boron-doped diamond thin-film field emitters JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 18, 2, 1018-1023 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 18, 2, 1018-1023 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 18, 2, 1018-1023 2000/03 英語 研究論文(学術雑誌) 公開
Y Gotoh, H Kubo, H Tsuji, J Ishikawa Y Gotoh, H Kubo, H Tsuji, J Ishikawa Y Gotoh, H Kubo, H Tsuji, J Ishikawa Compact microwave ion source for extremely low energy ion irradiation system Compact microwave ion source for extremely low energy ion irradiation system Compact microwave ion source for extremely low energy ion irradiation system REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 1160-1162 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 1160-1162 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 1160-1162 2000/02 英語 研究論文(学術雑誌) 公開
Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Application of compact microwave ion source to low temperature growth of transition metal nitride thin films for vacuum microelectronics devices Application of compact microwave ion source to low temperature growth of transition metal nitride thin films for vacuum microelectronics devices Application of compact microwave ion source to low temperature growth of transition metal nitride thin films for vacuum microelectronics devices REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 1002-1005 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 1002-1005 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 1002-1005 2000/02 英語 研究論文(学術雑誌) 公開
H Tsuji, S Kido, H Sasaki, Y Gotoh, J Ishikawa H Tsuji, S Kido, H Sasaki, Y Gotoh, J Ishikawa H Tsuji, S Kido, H Sasaki, Y Gotoh, J Ishikawa Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beads Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beads Negative-ion implanter for powders and its application to nanometer-sized metal particle formation in the surface of glass beads REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 804-806 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 804-806 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 804-806 2000/02 英語 研究論文(学術雑誌) 公開
H Tsuji, H Sato, T Baba, Y Gotoh, J Ishikawa H Tsuji, H Sato, T Baba, Y Gotoh, J Ishikawa H Tsuji, H Sato, T Baba, Y Gotoh, J Ishikawa A negative ion beam application to artificial formation of neuron network in culture A negative ion beam application to artificial formation of neuron network in culture A negative ion beam application to artificial formation of neuron network in culture REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 797-799 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 797-799 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 797-799 2000/02 英語 研究論文(学術雑誌) 公開
Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Molecular ion implanter equipped with liquid-metal alloy ion source Molecular ion implanter equipped with liquid-metal alloy ion source Molecular ion implanter equipped with liquid-metal alloy ion source REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 780-782 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 780-782 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 780-782 2000/02 英語 研究論文(学術雑誌) 公開
Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Criterion for decrease of electric field at ionization point of liquid-metal ion sources Criterion for decrease of electric field at ionization point of liquid-metal ion sources Criterion for decrease of electric field at ionization point of liquid-metal ion sources REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 725-727 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 725-727 REVIEW OF SCIENTIFIC INSTRUMENTS, 71, 2, 725-727 2000/02 英語 研究論文(学術雑誌) 公開
後藤康仁, 柏木 祐, 長尾昌善, 辻 博司, 石川順三 後藤康仁, 柏木 祐, 長尾昌善, 辻 博司, 石川順三 Y. Gotoh, Y. Kashiwagi, M. Nagao, H. Tsuji, J. Ishikawa ゲート電極付き窒化ニオブフィールドエミッタアレイの作製 ゲート電極付き窒化ニオブフィールドエミッタアレイの作製 Fabrication of gated niobium nitride field emitter array 真空, 43, 3, 251-254 真空, 43, 3, 251-254 Shinku/Journal of the Vacuum Society of Japan, 43, 3, 251-254 2000 日本語 研究論文(学術雑誌) 公開
萩原哲也, 久保洋士, 後藤康仁, 辻 博司, 石川順三 萩原哲也, 久保洋士, 後藤康仁, 辻 博司, 石川順三 Tetsuya Hagiwara, Hiroshi Kubo, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa イオン照射によって生じるグラファイト表面原子変位の拡張Hueckel法を用いた解析 イオン照射によって生じるグラファイト表面原子変位の拡張Hueckel法を用いた解析 Extended Huckel molecular orbital calculation of electron density of graphite surface with atomic displacement 真空, 43, 5, 607-610 真空, 43, 5, 607-610 Shinku/Journal of the Vacuum Society of Japan, 43, 5, 607-610 2000 日本語 研究論文(学術雑誌) 公開
Y Gotoh, N Fujita, H Tsuji, J Ishikawa, S Nagamachi, M Ueda Y Gotoh, N Fujita, H Tsuji, J Ishikawa, S Nagamachi, M Ueda Y Gotoh, N Fujita, H Tsuji, J Ishikawa, S Nagamachi, M Ueda Self-aligned formation of a vertical-type micro field emitter with a volcano-shaped gate electrode protruding towards the cathode by focused ion-beam sputter etching and deposition Self-aligned formation of a vertical-type micro field emitter with a volcano-shaped gate electrode protruding towards the cathode by focused ion-beam sputter etching and deposition Self-aligned formation of a vertical-type micro field emitter with a volcano-shaped gate electrode protruding towards the cathode by focused ion-beam sputter etching and deposition JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 9, 4, 364-368 JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 9, 4, 364-368 JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 9, 4, 364-368 1999/12 英語 研究論文(学術雑誌) 公開
Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Theoretical approach to liquid-metal field-emission electron sources Theoretical approach to liquid-metal field-emission electron sources Theoretical approach to liquid-metal field-emission electron sources APPLIED SURFACE SCIENCE, 146, 1-4, 377-381 APPLIED SURFACE SCIENCE, 146, 1-4, 377-381 APPLIED SURFACE SCIENCE, 146, 1-4, 377-381 1999/05 英語 研究論文(学術雑誌) 公開
M Nagao, K Utsumi, Y Gotoh, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui M Nagao, K Utsumi, Y Gotoh, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui M Nagao, K Utsumi, Y Gotoh, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui Dependence of emission characteristics of Spindt-type field emitters on cathode material Dependence of emission characteristics of Spindt-type field emitters on cathode material Dependence of emission characteristics of Spindt-type field emitters on cathode material APPLIED SURFACE SCIENCE, 146, 1-4, 182-186 APPLIED SURFACE SCIENCE, 146, 1-4, 182-186 APPLIED SURFACE SCIENCE, 146, 1-4, 182-186 1999/05 英語 研究論文(学術雑誌) 公開
H Tsuji, S Nakamura, Y Gotoh, J Ishikawa H Tsuji, S Nakamura, Y Gotoh, J Ishikawa H Tsuji, S Nakamura, Y Gotoh, J Ishikawa Dependence of carbon interatomic bonds on incident ion energy in carbon negative ion beam deposited films Dependence of carbon interatomic bonds on incident ion energy in carbon negative ion beam deposited films Dependence of carbon interatomic bonds on incident ion energy in carbon negative ion beam deposited films THIN SOLID FILMS, 343, 17-20 THIN SOLID FILMS, 343, 17-20 THIN SOLID FILMS, 343, 17-20 1999/04 英語 研究論文(学術雑誌) 公開
Y Gotoh, K Utsumi, M Nagao, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui Y Gotoh, K Utsumi, M Nagao, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui Y Gotoh, K Utsumi, M Nagao, H Tsuji, J Ishikawa, T Nakatani, T Sakashita, K Betsui Emission characteristics of Spindt-type field emitter arrays in oxygen ambient Emission characteristics of Spindt-type field emitter arrays in oxygen ambient Emission characteristics of Spindt-type field emitter arrays in oxygen ambient JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 17, 2, 604-607 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 17, 2, 604-607 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 17, 2, 604-607 1999/03 英語 研究論文(学術雑誌) 公開
吉原孝明, 辻 博司, 後藤康仁, 石川順三 吉原孝明, 辻 博司, 後藤康仁, 石川順三 T. Yoshihara, H. Tsuji, Y. Gotoh, J. Ishikawa 低エネルギーCN分子負イオンビーム蒸着膜における窒素含有率のエネルギー依存性 低エネルギーCN分子負イオンビーム蒸着膜における窒素含有率のエネルギー依存性 Ion energy dependence of N/C ratio in low energy CN molecular negative-ion beam deposited films 真空, 42, 3, 229-232 真空, 42, 3, 229-232 Shinku/Journal of the Vacuum Society of Japan, 42, 3, 229-232 1999 日本語 研究論文(学術雑誌) 公開
Y. Gotoh, T. Shiigi, M. Nagao, H. Tsuji, J. Ishikawa Y. Gotoh, T. Shiigi, M. Nagao, H. Tsuji, J. Ishikawa Y. Gotoh, T. Shiigi, M. Nagao, H. Tsuji, J. Ishikawa Influence of ambient nitrogen pressure on the property of zirconium nitride thin films in ion beam assisted deposition Influence of ambient nitrogen pressure on the property of zirconium nitride thin films in ion beam assisted deposition Influence of ambient nitrogen pressure on the property of zirconium nitride thin films in ion beam assisted deposition Proceedings of the International Conference on Ion Implantation Technology, 2, 1125-1128 Proceedings of the International Conference on Ion Implantation Technology, 2, 1125-1128 Proceedings of the International Conference on Ion Implantation Technology, 2, 1125-1128 1999 英語 公開
Hiroshi Tsuji, Masakazu Mimura, Shunsuke Kido, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Masakazu Mimura, Shunsuke Kido, Yasuhito Gotoh, Junzo Ishikawa Hiroshi Tsuji, Masakazu Mimura, Shunsuke Kido, Yasuhito Gotoh, Junzo Ishikawa Negative-ion implanter for powders and uniform implantation without particle scattering Negative-ion implanter for powders and uniform implantation without particle scattering Negative-ion implanter for powders and uniform implantation without particle scattering Proceedings of the International Conference on Ion Implantation Technology, 2, 1199-1202 Proceedings of the International Conference on Ion Implantation Technology, 2, 1199-1202 Proceedings of the International Conference on Ion Implantation Technology, 2, 1199-1202 1999 英語 公開
Junzo Ishikawa, Hiroshi Tsuji, Kazuma Shibutani, Hiroshi Ikai, Yasuhito Gotoh Junzo Ishikawa, Hiroshi Tsuji, Kazuma Shibutani, Hiroshi Ikai, Yasuhito Gotoh Junzo Ishikawa, Hiroshi Tsuji, Kazuma Shibutani, Hiroshi Ikai, Yasuhito Gotoh Comparison of silicon etching properties between F<sup>-</sup> negative ion and SF<sub>3</sub><sup>+</sup> positive ion-beam etchings Comparison of silicon etching properties between F<sup>-</sup> negative ion and SF<sub>3</sub><sup>+</sup> positive ion-beam etchings Comparison of silicon etching properties between F<sup>-</sup> negative ion and SF<sub>3</sub><sup>+</sup> positive ion-beam etchings Proceedings of the International Conference on Ion Implantation Technology, 2, 716-719 Proceedings of the International Conference on Ion Implantation Technology, 2, 716-719 Proceedings of the International Conference on Ion Implantation Technology, 2, 716-719 1999 英語 公開
H Tsuji, H Satoh, S Ikeda, S Ikemura, Y Gotoh, J Ishikawa H Tsuji, H Satoh, S Ikeda, S Ikemura, Y Gotoh, J Ishikawa H Tsuji, H Satoh, S Ikeda, S Ikemura, Y Gotoh, J Ishikawa Negative-ion beam surface modification of tissue-culture polystyrene dishes for changing hydrophilic and cell-attachment properties Negative-ion beam surface modification of tissue-culture polystyrene dishes for changing hydrophilic and cell-attachment properties Negative-ion beam surface modification of tissue-culture polystyrene dishes for changing hydrophilic and cell-attachment properties NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 148, 1-4, 1136-1140 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 148, 1-4, 1136-1140 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 148, 1-4, 1136-1140 1999/01 英語 研究論文(学術雑誌) 公開
H Tsuji, T Yoshihara, S Nakamura, Y Gotoh, J Ishikawa H Tsuji, T Yoshihara, S Nakamura, Y Gotoh, J Ishikawa H Tsuji, T Yoshihara, S Nakamura, Y Gotoh, J Ishikawa CN molecular negative-ion beam deposition and ion energy dependence of atomic bonds between carbon and nitrogen in the films CN molecular negative-ion beam deposition and ion energy dependence of atomic bonds between carbon and nitrogen in the films CN molecular negative-ion beam deposition and ion energy dependence of atomic bonds between carbon and nitrogen in the films NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 148, 1-4, 650-654 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 148, 1-4, 650-654 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 148, 1-4, 650-654 1999/01 英語 研究論文(学術雑誌) 公開
辻 博司, 池村慎一, 佐藤弘子, 後藤康仁, 石川順三 辻 博司, 池村慎一, 佐藤弘子, 後藤康仁, 石川順三 Hiroshi Tsuji, Shinichi Ikemura, Hiroko Sato, Yasuhito Gotoh, Junzo Ishikawa 銀負イオン注入による組織培養ポリスチレン表面の細胞接着特性の改質 銀負イオン注入による組織培養ポリスチレン表面の細胞接着特性の改質 Modification of cell attachment properties of tissue-culture polystyrene surface by silver-negative-ion implantation 真空, 42, 3, 237-240 真空, 42, 3, 237-240 Shinku/Journal of the Vacuum Society of Japan, 42, 3, 237-240 1999 日本語 研究論文(学術雑誌) 公開
辻 博司, 中村修一, 吉原孝明, 後藤康仁, 石川順三 辻 博司, 中村修一, 吉原孝明, 後藤康仁, 石川順三 Hiroshi Tsuji, Syuichi Nakamura, Takaaki Yoshihara, Yasuhito Gotoh, Junzo Ishikawa 低エネルギー炭素イオンビーム蒸着膜の原子間結合状態のエネルギー依存性 低エネルギー炭素イオンビーム蒸着膜の原子間結合状態のエネルギー依存性 Ion energy dependence of inter-atomic bonding state of carbon films deposited by low-energy carbon-negative ion beam 真空, 42, 3, 221-224 真空, 42, 3, 221-224 Shinku/Journal of the Vacuum Society of Japan, 42, 3, 221-224 1999 日本語 研究論文(学術雑誌) 公開
木戸俊介, 三村昌和, 辻 博司, 後藤康仁, 石川順三 木戸俊介, 三村昌和, 辻 博司, 後藤康仁, 石川順三 Shunsuke Kido, Masakazu Mimura, Hiroshi Tsuji, Yasuhito Gotoh, Junzo Ishikawa 球状粉体への負イオン注入による均一性評価と注入原子の深さ方向分布 球状粉体への負イオン注入による均一性評価と注入原子の深さ方向分布 Evaluation of uniformity and depth profiles in negative-ion implantation into spherical powders 真空, 42, 3, 345-348 真空, 42, 3, 345-348 Shinku/Journal of the Vacuum Society of Japan, 42, 3, 345-348 1999 日本語 研究論文(学術雑誌) 公開
後藤康仁, 長尾昌善, 浦 利之, 辻 博司, 石川順三 後藤康仁, 長尾昌善, 浦 利之, 辻 博司, 石川順三 Yasuhito Gotoh, Masayoshi Nagao, Toshiyuki Ura, Hiroshi Tsuji, Junzo Ishikawa イオンビームアシスト蒸着法により作製した窒化ニオブフィールドエミッタの電子放出特性 イオンビームアシスト蒸着法により作製した窒化ニオブフィールドエミッタの電子放出特性 Electron emission characteristics of niobium nitride field emitters prepared by ion beam assisted deposition 真空, 42, 3, 309-312 真空, 42, 3, 309-312 Shinku/Journal of the Vacuum Society of Japan, 42, 3, 309-312 1999 日本語 研究論文(学術雑誌) 公開
後藤康仁, 浦 利之, 長尾昌善, 辻 博司, 石川順三 後藤康仁, 浦 利之, 長尾昌善, 辻 博司, 石川順三 Yasuhito Gotoh, Toshiyuki Ura, Masayoshi Nagao, Hiroshi Tsuji, Junzo Ishikawa 真空マイクロエレクトロニクス素子の陰極材料としての窒化ニオブ薄膜の作製と評価 真空マイクロエレクトロニクス素子の陰極材料としての窒化ニオブ薄膜の作製と評価 Properties of niobium nitride thin films as a candidate for cathode material of vacuum microelectronics devices 真空, 42, 3, 305-308 真空, 42, 3, 305-308 Shinku/Journal of the Vacuum Society of Japan, 42, 3, 305-308 1999 日本語 研究論文(学術雑誌) 公開
Y Gotoh, M Nagao, T Ura, H Tsuji, J Ishikawa Y Gotoh, M Nagao, T Ura, H Tsuji, J Ishikawa Y Gotoh, M Nagao, T Ura, H Tsuji, J Ishikawa Ion beam assisted deposition of niobium nitride thin films for vacuum microelectronics devices Ion beam assisted deposition of niobium nitride thin films for vacuum microelectronics devices Ion beam assisted deposition of niobium nitride thin films for vacuum microelectronics devices NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 148, 1-4, 925-929 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 148, 1-4, 925-929 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 148, 1-4, 925-929 1999/01 英語 研究論文(学術雑誌) 公開
K Inoue, Y Gotoh, Y Fujimori, M Nagao, S Sadakane, H Tsuji, J Ishikawa K Inoue, Y Gotoh, Y Fujimori, M Nagao, S Sadakane, H Tsuji, J Ishikawa K Inoue, Y Gotoh, Y Fujimori, M Nagao, S Sadakane, H Tsuji, J Ishikawa Monte Carlo simulation of emission efficiency of cone-shaped metal-insulator-semiconductor cathode Monte Carlo simulation of emission efficiency of cone-shaped metal-insulator-semiconductor cathode Monte Carlo simulation of emission efficiency of cone-shaped metal-insulator-semiconductor cathode JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 37, 10, 5719-5725 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 37, 10, 5719-5725 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 37, 10, 5719-5725 1998/10 英語 研究論文(学術雑誌) 公開
Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Rate of decrease in the intensity ratio of doubly charged ions to singly charged ions in liquid-metal ion source with gold-based alloy Rate of decrease in the intensity ratio of doubly charged ions to singly charged ions in liquid-metal ion source with gold-based alloy Rate of decrease in the intensity ratio of doubly charged ions to singly charged ions in liquid-metal ion source with gold-based alloy ULTRAMICROSCOPY, 73, 1-4, 83-87 ULTRAMICROSCOPY, 73, 1-4, 83-87 ULTRAMICROSCOPY, 73, 1-4, 83-87 1998/06 英語 研究論文(学術雑誌) 公開
H Tsuji, H Satoh, S Ikeda, N Ikemoto, Y Gotoh, J Ishikawa H Tsuji, H Satoh, S Ikeda, N Ikemoto, Y Gotoh, J Ishikawa H Tsuji, H Satoh, S Ikeda, N Ikemoto, Y Gotoh, J Ishikawa Surface modification by silver-negative-ion implantation for controlling cell-adhesion properties of polystyrene Surface modification by silver-negative-ion implantation for controlling cell-adhesion properties of polystyrene Surface modification by silver-negative-ion implantation for controlling cell-adhesion properties of polystyrene SURFACE & COATINGS TECHNOLOGY, 104, 124-128 SURFACE & COATINGS TECHNOLOGY, 104, 124-128 SURFACE & COATINGS TECHNOLOGY, 104, 124-128 1998/05 英語 研究論文(学術雑誌) 公開
H Tsuji, Y Gotoh, J Ishikawa H Tsuji, Y Gotoh, J Ishikawa H Tsuji, Y Gotoh, J Ishikawa Secondary electron emission and surface potential of SiO<sub>2</sub> film surface by negative ion bombardment Secondary electron emission and surface potential of SiO<sub>2</sub> film surface by negative ion bombardment Secondary electron emission and surface potential of SiO<sub>2</sub> film surface by negative ion bombardment NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 141, 1-4, 645-651 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 141, 1-4, 645-651 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 141, 1-4, 645-651 1998/05 英語 研究論文(学術雑誌) 公開
H Tsuji, H Satoh, S Ikeda, Y Gotoh, J Ishikawa H Tsuji, H Satoh, S Ikeda, Y Gotoh, J Ishikawa H Tsuji, H Satoh, S Ikeda, Y Gotoh, J Ishikawa Contact angle lowering of polystyrene surface by silver-negative-ion implantation for improving biocompatibility and introduced atomic bond evaluation by XPS Contact angle lowering of polystyrene surface by silver-negative-ion implantation for improving biocompatibility and introduced atomic bond evaluation by XPS Contact angle lowering of polystyrene surface by silver-negative-ion implantation for improving biocompatibility and introduced atomic bond evaluation by XPS NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 141, 1-4, 197-201 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 141, 1-4, 197-201 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 141, 1-4, 197-201 1998/05 英語 研究論文(学術雑誌) 公開
J Ishikawa, H Tsuji, M Mimura, S Ikemura, Y Gotoh J Ishikawa, H Tsuji, M Mimura, S Ikemura, Y Gotoh J Ishikawa, H Tsuji, M Mimura, S Ikemura, Y Gotoh Non-scattering technique of ion-implantation into vibrated micro-powders by using a negative-ion beam Non-scattering technique of ion-implantation into vibrated micro-powders by using a negative-ion beam Non-scattering technique of ion-implantation into vibrated micro-powders by using a negative-ion beam SURFACE & COATINGS TECHNOLOGY, 104, 173-177 SURFACE & COATINGS TECHNOLOGY, 104, 173-177 SURFACE & COATINGS TECHNOLOGY, 104, 173-177 1998/05 英語 研究論文(学術雑誌) 公開
J Ishikawa, Y Gotoh, S Sadakane, K Inoue, M Nagao, H Tsuji J Ishikawa, Y Gotoh, S Sadakane, K Inoue, M Nagao, H Tsuji J Ishikawa, Y Gotoh, S Sadakane, K Inoue, M Nagao, H Tsuji Emission stability analysis of cone-shaped metal-insulator-semiconductor cathode by Monte Carlo simulation Emission stability analysis of cone-shaped metal-insulator-semiconductor cathode by Monte Carlo simulation Emission stability analysis of cone-shaped metal-insulator-semiconductor cathode by Monte Carlo simulation JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16, 2, 895-899 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16, 2, 895-899 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16, 2, 895-899 1998/03 英語 研究論文(学術雑誌) 公開
T Kozawa, M Suzuki, Y Taga, Y Gotoh, J Ishikawa T Kozawa, M Suzuki, Y Taga, Y Gotoh, J Ishikawa T Kozawa, M Suzuki, Y Taga, Y Gotoh, J Ishikawa Fabrication of GaN field emitter arrays by selective area growth technique Fabrication of GaN field emitter arrays by selective area growth technique Fabrication of GaN field emitter arrays by selective area growth technique JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16, 2, 833-835 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16, 2, 833-835 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16, 2, 833-835 1998/03 英語 研究論文(学術雑誌) 公開
M Nagao, Y Fujimori, Y Gotoh, H Tsuji, J Ishikawa M Nagao, Y Fujimori, Y Gotoh, H Tsuji, J Ishikawa M Nagao, Y Fujimori, Y Gotoh, H Tsuji, J Ishikawa Emission characteristics of ZrN thin film field emitter array fabricated by ion beam assisted deposition technique Emission characteristics of ZrN thin film field emitter array fabricated by ion beam assisted deposition technique Emission characteristics of ZrN thin film field emitter array fabricated by ion beam assisted deposition technique JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16, 2, 829-832 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16, 2, 829-832 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 16, 2, 829-832 1998/03 英語 研究論文(学術雑誌) 公開
Y Gotoh, Y Fujimori, H Kubo, H Tsuji, J Ishikawa Y Gotoh, Y Fujimori, H Kubo, H Tsuji, J Ishikawa Y Gotoh, Y Fujimori, H Kubo, H Tsuji, J Ishikawa Development of compact microwave ion source for low-energy application Development of compact microwave ion source for low-energy application Development of compact microwave ion source for low-energy application REVIEW OF SCIENTIFIC INSTRUMENTS, 69, 2, 887-889 REVIEW OF SCIENTIFIC INSTRUMENTS, 69, 2, 887-889 REVIEW OF SCIENTIFIC INSTRUMENTS, 69, 2, 887-889 1998/02 英語 研究論文(学術雑誌) 公開
Tsuji, H, Ishikawa, J, Tomita, T, Yoshihara, T, Gotoh, Y Tsuji, H, Ishikawa, J, Tomita, T, Yoshihara, T, Gotoh, Y Tsuji, H, Ishikawa, J, Tomita, T, Yoshihara, T, Gotoh, Y Extraction of molecular negative-ion beams of CN from radio frequency plasma-sputter-type heavy negative ion source for negative-ion beam deposition Extraction of molecular negative-ion beams of CN from radio frequency plasma-sputter-type heavy negative ion source for negative-ion beam deposition Extraction of molecular negative-ion beams of CN from radio frequency plasma-sputter-type heavy negative ion source for negative-ion beam deposition REVIEW OF SCIENTIFIC INSTRUMENTS, 69, 2, 884-886 REVIEW OF SCIENTIFIC INSTRUMENTS, 69, 2, 884-886 REVIEW OF SCIENTIFIC INSTRUMENTS, 69, 2, 884-886 1998/02 英語 公開
J Ishikawa, H Tsuji, Y Gotoh J Ishikawa, H Tsuji, Y Gotoh J Ishikawa, H Tsuji, Y Gotoh Surface charging of insulated materials by negative ion beam bombardment Surface charging of insulated materials by negative ion beam bombardment Surface charging of insulated materials by negative ion beam bombardment PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS / PRODUCTION AND APPLICATION OF LIGHT NEGATIVE IONS, 439, 217-220 PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS / PRODUCTION AND APPLICATION OF LIGHT NEGATIVE IONS, 439, 217-220 PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS / PRODUCTION AND APPLICATION OF LIGHT NEGATIVE IONS, 439, 217-220 1998 英語 研究論文(国際会議プロシーディングス) 公開
M Nagao, T Kondo, Y Gotoh, H Tsuji, J Ishikawa, K Miyata, K Kobashi M Nagao, T Kondo, Y Gotoh, H Tsuji, J Ishikawa, K Miyata, K Kobashi M Nagao, T Kondo, Y Gotoh, H Tsuji, J Ishikawa, K Miyata, K Kobashi Influence of surface treatment and dopant concentration on field emission characteristics of boron-doped diamond thin films Influence of surface treatment and dopant concentration on field emission characteristics of boron-doped diamond thin films Influence of surface treatment and dopant concentration on field emission characteristics of boron-doped diamond thin films APPLIED PHYSICS LETTERS, 71, 19, 2806-2808 APPLIED PHYSICS LETTERS, 71, 19, 2806-2808 APPLIED PHYSICS LETTERS, 71, 19, 2806-2808 1997/11 英語 研究論文(学術雑誌) 公開
M Nagao, T Kondo, Y Gotoh, H Tsuji, J Ishikawa, K Miyata, K Kobashi M Nagao, T Kondo, Y Gotoh, H Tsuji, J Ishikawa, K Miyata, K Kobashi M Nagao, T Kondo, Y Gotoh, H Tsuji, J Ishikawa, K Miyata, K Kobashi Stability of field emission current from boron-doped diamond thin films terminated with hydrogen and oxygen Stability of field emission current from boron-doped diamond thin films terminated with hydrogen and oxygen Stability of field emission current from boron-doped diamond thin films terminated with hydrogen and oxygen JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 36, 9AB, L1250-L1253 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 36, 9AB, L1250-L1253 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 36, 9AB, L1250-L1253 1997/09 英語 研究論文(学術雑誌) 公開
Y Gotoh, T Kashiwagi, H Tsuji, J Ishikawa Y Gotoh, T Kashiwagi, H Tsuji, J Ishikawa Y Gotoh, T Kashiwagi, H Tsuji, J Ishikawa Empirical relation between electric field at the ionization point and emission current of liquid copper, gold, germanium, and tin ion sources Empirical relation between electric field at the ionization point and emission current of liquid copper, gold, germanium, and tin ion sources Empirical relation between electric field at the ionization point and emission current of liquid copper, gold, germanium, and tin ion sources APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 64, 5, 527-532 APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 64, 5, 527-532 APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 64, 5, 527-532 1997/05 英語 研究論文(学術雑誌) 公開
J Ishikawa, H Tsuji, S Ikeda, Y Gotoh J Ishikawa, H Tsuji, S Ikeda, Y Gotoh J Ishikawa, H Tsuji, S Ikeda, Y Gotoh Study on emission yields of negative- and positive-ion induced secondary electron from thin SiO<sub>2</sub> film Study on emission yields of negative- and positive-ion induced secondary electron from thin SiO<sub>2</sub> film Study on emission yields of negative- and positive-ion induced secondary electron from thin SiO<sub>2</sub> film NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 127, 282-285 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 127, 282-285 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 127, 282-285 1997/05 英語 研究論文(学術雑誌) 公開
H Tsuji, J Ishikawa, S Ikeda, Y Gotoh H Tsuji, J Ishikawa, S Ikeda, Y Gotoh H Tsuji, J Ishikawa, S Ikeda, Y Gotoh Slightly negative surface potential and charging model of insulator in the negative-ion implantation Slightly negative surface potential and charging model of insulator in the negative-ion implantation Slightly negative surface potential and charging model of insulator in the negative-ion implantation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 127, 278-281 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 127, 278-281 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 127, 278-281 1997/05 英語 研究論文(学術雑誌) 公開
後藤康仁, 藤森敬和, 椎木 崇, 辻 博司, 石川順三 後藤康仁, 藤森敬和, 椎木 崇, 辻 博司, 石川順三 Yasuhito Gotoh, Yoshikazu Fujimori, Takashi Shiigi, Hiroshi Tsuji, Junzo Ishikawa 真空マイクロエレクトロニクス素子のための窒化ジルコニウム薄膜の作製と評価 真空マイクロエレクトロニクス素子のための窒化ジルコニウム薄膜の作製と評価 Evaluation of zirconium nitride thin films prepared by ion beam assisted deposition as a candidate for cathode material of vacuum microelectronics devices 真空, 40, 3, 276-279 真空, 40, 3, 276-279 Shinku/Journal of the Vacuum Society of Japan, 40, 3, 276-279 1997 日本語 研究論文(学術雑誌) 公開
H Tsuji, J Ishikawa, T Tomita, Y Gotoh H Tsuji, J Ishikawa, T Tomita, Y Gotoh H Tsuji, J Ishikawa, T Tomita, Y Gotoh Negative-ion production of reactive elements from compound gases in the RF plasma-sputter-type heavy negative-ion source Negative-ion production of reactive elements from compound gases in the RF plasma-sputter-type heavy negative-ion source Negative-ion production of reactive elements from compound gases in the RF plasma-sputter-type heavy negative-ion source ION IMPLANTATION TECHNOLOGY - 96, 334-337 ION IMPLANTATION TECHNOLOGY - 96, 334-337 ION IMPLANTATION TECHNOLOGY - 96, 334-337 1997 英語 研究論文(国際会議プロシーディングス) 公開
J Ishikawa, H Tsuji, M Mimura, Y Gotoh J Ishikawa, H Tsuji, M Mimura, Y Gotoh J Ishikawa, H Tsuji, M Mimura, Y Gotoh Molecular ion implantation technique for obtaining the same depth profile for the component atoms Molecular ion implantation technique for obtaining the same depth profile for the component atoms Molecular ion implantation technique for obtaining the same depth profile for the component atoms ION IMPLANTATION TECHNOLOGY - 96, 776-779 ION IMPLANTATION TECHNOLOGY - 96, 776-779 ION IMPLANTATION TECHNOLOGY - 96, 776-779 1997 英語 研究論文(国際会議プロシーディングス) 公開
J Ishikawa, H Tsuji, Y Gotoh J Ishikawa, H Tsuji, Y Gotoh J Ishikawa, H Tsuji, Y Gotoh Particle-scattering phenomenon of powders caused by charging voltage of the surface during ion implantation Particle-scattering phenomenon of powders caused by charging voltage of the surface during ion implantation Particle-scattering phenomenon of powders caused by charging voltage of the surface during ion implantation ION IMPLANTATION TECHNOLOGY - 96, 249-252 ION IMPLANTATION TECHNOLOGY - 96, 249-252 ION IMPLANTATION TECHNOLOGY - 96, 249-252 1997 英語 研究論文(国際会議プロシーディングス) 公開
辻 博司, 富田哲生, 後藤康仁, 石川順三 辻 博司, 富田哲生, 後藤康仁, 石川順三 Hiroshi Tsuji, Tetsuo Tomita, Yasuhito Gotoh, Junzo Ishikawa 高周波プラズマスパッタ型負重イオン源からのCN分子負イオン引き出しとCN負イオンビーム蒸着膜の作製 高周波プラズマスパッタ型負重イオン源からのCN分子負イオン引き出しとCN負イオンビーム蒸着膜の作製 CN molecular negative-ion extraction properties from RF plasma-sputter-type heavy negative-ion source and CN negative-ion beam deposition 真空, 40, 3, 284-287 真空, 40, 3, 284-287 Shinku/Journal of the Vacuum Society of Japan, 40, 3, 284-287 1997 日本語 研究論文(学術雑誌) 公開
長尾昌善, 後藤康仁, 辻博司, 石川順三 長尾昌善, 後藤康仁, 辻博司, 石川順三 Masayoshi Nagao, Yasuhito Gotoh, Hiroshi Tuji, Junzo Ishikawa 雑音電力を用いた極微フィールドエミッタの安定性の定量的評価 雑音電力を用いた極微フィールドエミッタの安定性の定量的評価 Noise power analysis of the stability of micro-field emitters 真空, 40, 3, 159-162 真空, 40, 3, 159-162 Shinku/Journal of the Vacuum Society of Japan, 40, 3, 159-162 1997 日本語 研究論文(学術雑誌) 公開
Y Gotoh, H Yoshii, T Amioka, K Kameyama, H Tsuji, J Ishikawa Y Gotoh, H Yoshii, T Amioka, K Kameyama, H Tsuji, J Ishikawa Y Gotoh, H Yoshii, T Amioka, K Kameyama, H Tsuji, J Ishikawa Structures and properties of copper thin films prepared by ion beam assisted deposition Structures and properties of copper thin films prepared by ion beam assisted deposition Structures and properties of copper thin films prepared by ion beam assisted deposition THIN SOLID FILMS, 288, 1-2, 300-308 THIN SOLID FILMS, 288, 1-2, 300-308 THIN SOLID FILMS, 288, 1-2, 300-308 1996/11 英語 研究論文(学術雑誌) 公開
Y Gotoh, M Nagao, M Matsubara, K Inoue, H Tsuji, J Ishikawa Y Gotoh, M Nagao, M Matsubara, K Inoue, H Tsuji, J Ishikawa Y Gotoh, M Nagao, M Matsubara, K Inoue, H Tsuji, J Ishikawa Relationship between effective work functions and noise powers of emission currents in nickel-deposited field emitters Relationship between effective work functions and noise powers of emission currents in nickel-deposited field emitters Relationship between effective work functions and noise powers of emission currents in nickel-deposited field emitters JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 35, 10A, L1297-L1300 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 35, 10A, L1297-L1300 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 35, 10A, L1297-L1300 1996/10 英語 研究論文(学術雑誌) 公開
M Nagao, M Matsubara, K Inoue, Y Gotoh, H Tsuji, J Ishikawa M Nagao, M Matsubara, K Inoue, Y Gotoh, H Tsuji, J Ishikawa M Nagao, M Matsubara, K Inoue, Y Gotoh, H Tsuji, J Ishikawa Influences of ambient gases on the emission characteristics of Nickel-deposited field emitters for vacuum microelectronics Influences of ambient gases on the emission characteristics of Nickel-deposited field emitters for vacuum microelectronics Influences of ambient gases on the emission characteristics of Nickel-deposited field emitters for vacuum microelectronics JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 35, 10, 5479-5484 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 35, 10, 5479-5484 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 35, 10, 5479-5484 1996/10 英語 研究論文(学術雑誌) 公開
Y Toyota, H Tsuji, Y Gotoh, J Ishikawa Y Toyota, H Tsuji, Y Gotoh, J Ishikawa Y Toyota, H Tsuji, Y Gotoh, J Ishikawa Yield measurement of secondary electrons emitted from silicon dioxide film in negative-ion bombardment Yield measurement of secondary electrons emitted from silicon dioxide film in negative-ion bombardment Yield measurement of secondary electrons emitted from silicon dioxide film in negative-ion bombardment JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 35, 9A, 4785-4788 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 35, 9A, 4785-4788 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 35, 9A, 4785-4788 1996/09 英語 研究論文(学術雑誌) 公開
J Ishikawa, H Tsuji, K Kameyama, S Shimada, Y Gotoh J Ishikawa, H Tsuji, K Kameyama, S Shimada, Y Gotoh J Ishikawa, H Tsuji, K Kameyama, S Shimada, Y Gotoh Development of ion irradiation system for in situ observation of ion irradiated semiconductor surfaces by ultra high vacuum scanning tunneling microscope Development of ion irradiation system for in situ observation of ion irradiated semiconductor surfaces by ultra high vacuum scanning tunneling microscope Development of ion irradiation system for in situ observation of ion irradiated semiconductor surfaces by ultra high vacuum scanning tunneling microscope APPLIED SURFACE SCIENCE, 100, 370-373 APPLIED SURFACE SCIENCE, 100, 370-373 APPLIED SURFACE SCIENCE, 100, 370-373 1996/07 英語 研究論文(学術雑誌) 公開
Y Toyota, H Tsuji, S Nagumo, Y Gotoh, J Ishikawa Y Toyota, H Tsuji, S Nagumo, Y Gotoh, J Ishikawa Y Toyota, H Tsuji, S Nagumo, Y Gotoh, J Ishikawa Charging phenomenon of insulators in negative-ion implantation Charging phenomenon of insulators in negative-ion implantation Charging phenomenon of insulators in negative-ion implantation APPLIED SURFACE SCIENCE, 100, 360-364 APPLIED SURFACE SCIENCE, 100, 360-364 APPLIED SURFACE SCIENCE, 100, 360-364 1996/07 英語 研究論文(学術雑誌) 公開
H Tsuji, J Ishikawa, H Itoh, Y Toyota, Y Gotoh H Tsuji, J Ishikawa, H Itoh, Y Toyota, Y Gotoh H Tsuji, J Ishikawa, H Itoh, Y Toyota, Y Gotoh Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials Fundamental study on powder-scattering in positive- and negative-ion implantation into powder materials APPLIED SURFACE SCIENCE, 100, 342-346 APPLIED SURFACE SCIENCE, 100, 342-346 APPLIED SURFACE SCIENCE, 100, 342-346 1996/07 英語 研究論文(学術雑誌) 公開
Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Y Gotoh, H Tsuji, J Ishikawa Liquid gold-antimony ion sources Liquid gold-antimony ion sources Liquid gold-antimony ion sources JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 35, 6A, 3670-3676 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 35, 6A, 3670-3676 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 35, 6A, 3670-3676 1996/06 英語 研究論文(学術雑誌) 公開
Y Gotoh, T Amioka, H Tsuji, J Ishikawa Y Gotoh, T Amioka, H Tsuji, J Ishikawa Y Gotoh, T Amioka, H Tsuji, J Ishikawa Metal ion beam self-sputter deposition system Metal ion beam self-sputter deposition system Metal ion beam self-sputter deposition system REVIEW OF SCIENTIFIC INSTRUMENTS, 67, 5, 1996-1999 REVIEW OF SCIENTIFIC INSTRUMENTS, 67, 5, 1996-1999 REVIEW OF SCIENTIFIC INSTRUMENTS, 67, 5, 1996-1999 1996/05 英語 研究論文(学術雑誌) 公開
J Ishikawa, K Inoue, S Sadakane, Y Gotoh, H Tsuji J Ishikawa, K Inoue, S Sadakane, Y Gotoh, H Tsuji J Ishikawa, K Inoue, S Sadakane, Y Gotoh, H Tsuji Cone-shaped metal-insulator-semiconductor cathode for vacuum microelectronics Cone-shaped metal-insulator-semiconductor cathode for vacuum microelectronics Cone-shaped metal-insulator-semiconductor cathode for vacuum microelectronics JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 14, 3, 1970-1972 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 14, 3, 1970-1972 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 14, 3, 1970-1972 1996/05 英語 研究論文(学術雑誌) 公開
Tsuji, H, Ishikawa, J, Tomita, T, Gotoh, Y Tsuji, H, Ishikawa, J, Tomita, T, Gotoh, Y Tsuji, H, Ishikawa, J, Tomita, T, Gotoh, Y Negative-ion extraction of gaseous materials from a radio frequency plasma-sputter-type heavy negative-ion source Negative-ion extraction of gaseous materials from a radio frequency plasma-sputter-type heavy negative-ion source Negative-ion extraction of gaseous materials from a radio frequency plasma-sputter-type heavy negative-ion source REVIEW OF SCIENTIFIC INSTRUMENTS, 67, 3, 1012-1014 REVIEW OF SCIENTIFIC INSTRUMENTS, 67, 3, 1012-1014 REVIEW OF SCIENTIFIC INSTRUMENTS, 67, 3, 1012-1014 1996/03 英語 公開
J Ishikawa, H Tsuji, T Takatori, Y Gotoh J Ishikawa, H Tsuji, T Takatori, Y Gotoh J Ishikawa, H Tsuji, T Takatori, Y Gotoh Study on the energy distribution of ion beams extracted from the sputter-type negative-ion source Study on the energy distribution of ion beams extracted from the sputter-type negative-ion source Study on the energy distribution of ion beams extracted from the sputter-type negative-ion source PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS / PRODUCTION AND APPLICATION OF LIGHT NEGATIVE IONS, 380, 241-251 PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS / PRODUCTION AND APPLICATION OF LIGHT NEGATIVE IONS, 380, 241-251 PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS / PRODUCTION AND APPLICATION OF LIGHT NEGATIVE IONS, 380, 241-251 1996 英語 研究論文(国際会議プロシーディングス) 公開
K Inoue, S Sadakane, Y Gotoh, H Tsuji, J Ishikawa K Inoue, S Sadakane, Y Gotoh, H Tsuji, J Ishikawa K Inoue, S Sadakane, Y Gotoh, H Tsuji, J Ishikawa Self-aligned fabrication of extractor for cone-shaped metal-insulator-semiconductor electron tunneling cathodes Self-aligned fabrication of extractor for cone-shaped metal-insulator-semiconductor electron tunneling cathodes Self-aligned fabrication of extractor for cone-shaped metal-insulator-semiconductor electron tunneling cathodes JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 34, 12B, 6922-6925 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 34, 12B, 6922-6925 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 34, 12B, 6922-6925 1995/12 英語 研究論文(学術雑誌) 公開
Y Toyota, H Tsuji, Y Gotoh, J Ishikawa Y Toyota, H Tsuji, Y Gotoh, J Ishikawa Y Toyota, H Tsuji, Y Gotoh, J Ishikawa Energy distribution and yield measurement of secondary electrons to evaluate the equilibrium charging voltage of an isolated electrode during negative-ion implantation Energy distribution and yield measurement of secondary electrons to evaluate the equilibrium charging voltage of an isolated electrode during negative-ion implantation Energy distribution and yield measurement of secondary electrons to evaluate the equilibrium charging voltage of an isolated electrode during negative-ion implantation JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 34, 12A, 6487-6491 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 34, 12A, 6487-6491 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 34, 12A, 6487-6491 1995/12 英語 研究論文(学術雑誌) 公開
豊田啓孝, 本田広史, 辻 博司, 後藤康仁, 石川順三 豊田啓孝, 本田広史, 辻 博司, 後藤康仁, 石川順三 豊田啓孝, 本田広史, 辻博司, 後藤康仁, 石川順三 負イオン注入における絶縁物からの放出二次電子の測定 負イオン注入における絶縁物からの放出二次電子の測定 負イオン注入における絶縁物からの放出二次電子の測定 真空, 38, 9, 796 真空, 38, 9, 796 真空, 38, 9, 796 1995/09 英語 公開
辻 博司, 岡山芳央, 豊田啓孝, 後藤康仁, 石川順三 辻 博司, 岡山芳央, 豊田啓孝, 後藤康仁, 石川順三 高周波プラズマスパッタ型負重イオン源における気体材料の負イオン生成 高周波プラズマスパッタ型負重イオン源における気体材料の負イオン生成 真空, 38, 3, 218-220 真空, 38, 3, 218-220 , 38, 3, 218-220 1995/03 英語 研究論文(学術雑誌) 公開
藤森敬和, 後藤康仁, 辻 博司, 石川順三 藤森敬和, 後藤康仁, 辻 博司, 石川順三 Yoshikazu Fujimori, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa 低エネルギー引き出し小型マイクロ波イオン源の開発 低エネルギー引き出し小型マイクロ波イオン源の開発 Development of compact microwave ion source for the purpose of direct extraction of low energy ion beam 真空, 38, 3, 156-159 真空, 38, 3, 156-159 Shinku/Journal of the Vacuum Society of Japan, 38, 3, 156-159 1995/03 日本語 研究論文(学術雑誌) 公開
Y GOTOH, T OHTAKE, N FUJITA, K INOUE, H TSUJI, J ISHIKAWA Y GOTOH, T OHTAKE, N FUJITA, K INOUE, H TSUJI, J ISHIKAWA Y GOTOH, T OHTAKE, N FUJITA, K INOUE, H TSUJI, J ISHIKAWA FABRICATION OF LATERAL-TYPE THIN-FILM EDGE FIELD EMITTERS BY FOCUSED ION-BEAM TECHNIQUE FABRICATION OF LATERAL-TYPE THIN-FILM EDGE FIELD EMITTERS BY FOCUSED ION-BEAM TECHNIQUE FABRICATION OF LATERAL-TYPE THIN-FILM EDGE FIELD EMITTERS BY FOCUSED ION-BEAM TECHNIQUE JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 13, 2, 465-468 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 13, 2, 465-468 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 13, 2, 465-468 1995/03 英語 研究論文(学術雑誌) 公開
J ISHIKAWA, T OHTAKE, Y GOTOH, H TSUJI, N FUKAYAMA, K INOUE, S NAGAMACHI, Y YAMAKAGE, M UEDA, H MARUNO, M ASARI J ISHIKAWA, T OHTAKE, Y GOTOH, H TSUJI, N FUKAYAMA, K INOUE, S NAGAMACHI, Y YAMAKAGE, M UEDA, H MARUNO, M ASARI J ISHIKAWA, T OHTAKE, Y GOTOH, H TSUJI, N FUKAYAMA, K INOUE, S NAGAMACHI, Y YAMAKAGE, M UEDA, H MARUNO, M ASARI APPLICATION OF THE FOCUSED ION-BEAM TECHNIQUE TO THE DIRECT FABRICATION OF VERTICAL-TYPE FIELD EMITTERS APPLICATION OF THE FOCUSED ION-BEAM TECHNIQUE TO THE DIRECT FABRICATION OF VERTICAL-TYPE FIELD EMITTERS APPLICATION OF THE FOCUSED ION-BEAM TECHNIQUE TO THE DIRECT FABRICATION OF VERTICAL-TYPE FIELD EMITTERS JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 13, 2, 452-455 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 13, 2, 452-455 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 13, 2, 452-455 1995/03 英語 研究論文(学術雑誌) 公開
S SAKAI, Y GOTOH, H TSUJI, Y TOYOTA, J ISHIKAWA, M TANJYO, K MATSUDA S SAKAI, Y GOTOH, H TSUJI, Y TOYOTA, J ISHIKAWA, M TANJYO, K MATSUDA S SAKAI, Y GOTOH, H TSUJI, Y TOYOTA, J ISHIKAWA, M TANJYO, K MATSUDA THE CHARGING MECHANISM OF INSULATED ELECTRODE IN NEGATIVE-ION IMPLANTATION THE CHARGING MECHANISM OF INSULATED ELECTRODE IN NEGATIVE-ION IMPLANTATION THE CHARGING MECHANISM OF INSULATED ELECTRODE IN NEGATIVE-ION IMPLANTATION NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 96, 1-2, 43-47 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 96, 1-2, 43-47 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 96, 1-2, 43-47 1995/03 英語 研究論文(学術雑誌) 公開
J ISHIKAWA, H TSUJI, Y TOYOTA, Y GOTOH, K MATSUDA, M TANJYO, S SAKAI J ISHIKAWA, H TSUJI, Y TOYOTA, Y GOTOH, K MATSUDA, M TANJYO, S SAKAI J ISHIKAWA, H TSUJI, Y TOYOTA, Y GOTOH, K MATSUDA, M TANJYO, S SAKAI NEGATIVE-ION IMPLANTATION TECHNIQUE NEGATIVE-ION IMPLANTATION TECHNIQUE NEGATIVE-ION IMPLANTATION TECHNIQUE NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 96, 1-2, 7-12 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 96, 1-2, 7-12 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 96, 1-2, 7-12 1995/03 英語 研究論文(学術雑誌) 公開
豊田啓孝, 辻 博司, 南雲正二, 酒井滋樹, 後藤康仁, 石川順三, 松田耕自 豊田啓孝, 辻 博司, 南雲正二, 酒井滋樹, 後藤康仁, 石川順三, 松田耕自 Yoshitaka Toyota, Hiroshi Tsuji, Shoji Nagumo, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa, Koji Matsuda 負イオン注入における基板帯電モデルとその評価 負イオン注入における基板帯電モデルとその評価 Evaluation of Charging Model in Negative-Ion Implantation 真空, 38, 3, 224-227 真空, 38, 3, 224-227 Shinku/Journal of the Vacuum Society of Japan, 38, 3, 224-227 1995 英語 研究論文(学術雑誌) 公開
酒井滋樹, 辻 博司, 後藤康仁, 豊田啓孝, 石川順三, 丹上正安, 松田耕自 酒井滋樹, 辻 博司, 後藤康仁, 豊田啓孝, 石川順三, 丹上正安, 松田耕自 Shigeki Sakai, Hiroshi Tsuji, Yasuhito Gotoh, Yoshitaka Toyota, Junzo Ishikawa, Masayasu Tanjyo, Koji Matsuda 微細周期構造にイオン注入したときの素子帯電のシミュレーション 微細周期構造にイオン注入したときの素子帯電のシミュレーション Charging Simulation of Micro-structured Pattern in Ion Implantation 真空, 38, 3, 228-230 真空, 38, 3, 228-230 Shinku/Journal of the Vacuum Society of Japan, 38, 3, 228-230 1995 英語 研究論文(学術雑誌) 公開
辻 博司, 南雲正二, 豊田啓孝, 酒井滋樹, 後藤康仁, 石川順三 辻 博司, 南雲正二, 豊田啓孝, 酒井滋樹, 後藤康仁, 石川順三 Hiroshi Tsuji, Shoji Nagumo, Yoshitaka Toyota, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa イオン誘起二次電子分析による負イオン注入時のレジスト膜の帯電測定 イオン誘起二次電子分析による負イオン注入時のレジスト膜の帯電測定 Charging Potential Measurement of Photoresist-Layer Surface during Negative-Ion Implantation from Ion-Induced Secondary Electron Energy Analysis 真空, 38, 3, 221-223 真空, 38, 3, 221-223 Shinku/Journal of the Vacuum Society of Japan, 38, 3, 221-223 1995 英語 研究論文(学術雑誌) 公開
INOUE, K, GOTOH, Y, TSUJI, H, ISHIKAWA, J INOUE, K, GOTOH, Y, TSUJI, H, ISHIKAWA, J INOUE, K, GOTOH, Y, TSUJI, H, ISHIKAWA, J FABRICATION OF CONE-SHAPED METAL-INSULATOR-SEMICONDUCTOR ELECTRON-TUNNELING CATHODE FABRICATION OF CONE-SHAPED METAL-INSULATOR-SEMICONDUCTOR ELECTRON-TUNNELING CATHODE FABRICATION OF CONE-SHAPED METAL-INSULATOR-SEMICONDUCTOR ELECTRON-TUNNELING CATHODE JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 33, 12B, 7176-7179 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 33, 12B, 7176-7179 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 33, 12B, 7176-7179 1994/12 英語 公開
H TSUJI, J ISHIKAWA, Y KAWABATA, Y GOTOH H TSUJI, J ISHIKAWA, Y KAWABATA, Y GOTOH H TSUJI, J ISHIKAWA, Y KAWABATA, Y GOTOH NEGATIVE-ION PRODUCTION PROBABILITY IN RF PLASMA SPUTTER-TYPE HEAVY NEGATIVE-ION SOURCE NEGATIVE-ION PRODUCTION PROBABILITY IN RF PLASMA SPUTTER-TYPE HEAVY NEGATIVE-ION SOURCE NEGATIVE-ION PRODUCTION PROBABILITY IN RF PLASMA SPUTTER-TYPE HEAVY NEGATIVE-ION SOURCE REVIEW OF SCIENTIFIC INSTRUMENTS, 65, 5, 1732-1736 REVIEW OF SCIENTIFIC INSTRUMENTS, 65, 5, 1732-1736 REVIEW OF SCIENTIFIC INSTRUMENTS, 65, 5, 1732-1736 1994/05 英語 研究論文(学術雑誌) 公開
Y GOTOH, K YOSHIDA, T KAWAI, N FUKAYAMA, Y OGATA, H TSUJI, J ISHIKAWA Y GOTOH, K YOSHIDA, T KAWAI, N FUKAYAMA, Y OGATA, H TSUJI, J ISHIKAWA Y GOTOH, K YOSHIDA, T KAWAI, N FUKAYAMA, Y OGATA, H TSUJI, J ISHIKAWA OPERATIONAL CHARACTERISTICS OF THE IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE WITH MULTIPLE TIP AND RESERVOIRS OPERATIONAL CHARACTERISTICS OF THE IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE WITH MULTIPLE TIP AND RESERVOIRS OPERATIONAL CHARACTERISTICS OF THE IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE WITH MULTIPLE TIP AND RESERVOIRS REVIEW OF SCIENTIFIC INSTRUMENTS, 65, 4, 1351-1353 REVIEW OF SCIENTIFIC INSTRUMENTS, 65, 4, 1351-1353 REVIEW OF SCIENTIFIC INSTRUMENTS, 65, 4, 1351-1353 1994/04 英語 研究論文(学術雑誌) 公開
辻 博司, 酒井滋樹, 岡山芳央, 豊田啓孝, 後藤康仁, 松田耕自, 丹上正安, 石川順三 辻 博司, 酒井滋樹, 岡山芳央, 豊田啓孝, 後藤康仁, 松田耕自, 丹上正安, 石川順三 Hiroshi Tsuji, Shigeki Sakai, Yoshio Okayama, Yoshitaka Toyota, Yasuhito Gotoh, Kouji Matsuda, Masayasu Tanjyo, Junzo Ishikawa 負イオン注入における絶縁した電極表面の帯電電位のイオン電流密度依存性 負イオン注入における絶縁した電極表面の帯電電位のイオン電流密度依存性 Negative-Ion Current Density Dependence of the Surface Potential of Insulated Electrode During Negative-Ion Implantation 真空, 37, 3, 135-138 真空, 37, 3, 135-138 Shinku/Journal of the Vacuum Society of Japan, 37, 3, 135-138 1994 英語 研究論文(学術雑誌) 公開
辻 博司, 豊田啓孝, 南雲正二, 後藤康仁, 石川順三, 酒井滋樹, 丹上正安, 松田耕自 辻 博司, 豊田啓孝, 南雲正二, 後藤康仁, 石川順三, 酒井滋樹, 丹上正安, 松田耕自 Hiroshi Tsuji, Yoshitaka Toyota, Syoji Nagumo, Yasuhito Gotoh, Junzo Ishikawa, Shigeki Sakai, Masayasu Taniyo, Kohji Matsuda イオン誘起二次電子による負イオン注入時の絶縁物基板の帯電測定 イオン誘起二次電子による負イオン注入時の絶縁物基板の帯電測定 Surface Potential Measurement of the Insulator with Secondary Electron Caused by Negative Ion Implantation 真空, 37, 3, 139-142 真空, 37, 3, 139-142 Shinku/Journal of the Vacuum Society of Japan, 37, 3, 139-142 1994 英語 研究論文(学術雑誌) 公開
J ISHIKAWA, H TSUJI, Y GOTOH, S AZEGAMI J ISHIKAWA, H TSUJI, Y GOTOH, S AZEGAMI J ISHIKAWA, H TSUJI, Y GOTOH, S AZEGAMI MEASUREMENT OF HEAVY NEGATIVE-ION PRODUCTION PROBABILITIES BY SPUTTERING MEASUREMENT OF HEAVY NEGATIVE-ION PRODUCTION PROBABILITIES BY SPUTTERING MEASUREMENT OF HEAVY NEGATIVE-ION PRODUCTION PROBABILITIES BY SPUTTERING PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS, 287, 66-75 PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS, 287, 66-75 PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS, 287, 66-75 1994 英語 研究論文(国際会議プロシーディングス) 公開
H TSUJI, J ISHIKAWA, Y GOTOH, Y OKADA H TSUJI, J ISHIKAWA, Y GOTOH, Y OKADA H TSUJI, J ISHIKAWA, Y GOTOH, Y OKADA RF PLASMA SPUTTER-TYPE DC-MODE HEAVY NEGATIVE-ION SOURCE RF PLASMA SPUTTER-TYPE DC-MODE HEAVY NEGATIVE-ION SOURCE RF PLASMA SPUTTER-TYPE DC-MODE HEAVY NEGATIVE-ION SOURCE PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS, 287, 530-539 PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS, 287, 530-539 PRODUCTION AND NEUTRALIZATION OF NEGATIVE IONS AND BEAMS, 287, 530-539 1994 英語 研究論文(国際会議プロシーディングス) 公開
Y GOTOH, K INOUE, T OHTAKE, H UEDA, Y HISHIDA, H TSUJI, J ISHIKAWA Y GOTOH, K INOUE, T OHTAKE, H UEDA, Y HISHIDA, H TSUJI, J ISHIKAWA Y GOTOH, K INOUE, T OHTAKE, H UEDA, Y HISHIDA, H TSUJI, J ISHIKAWA APPLICATION OF FOCUSED ION-BEAM TECHNIQUES TO THE FABRICATION OF LATERAL-TYPE THIN-FILM EDGE FIELD EMITTERS APPLICATION OF FOCUSED ION-BEAM TECHNIQUES TO THE FABRICATION OF LATERAL-TYPE THIN-FILM EDGE FIELD EMITTERS APPLICATION OF FOCUSED ION-BEAM TECHNIQUES TO THE FABRICATION OF LATERAL-TYPE THIN-FILM EDGE FIELD EMITTERS JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 33, 1A, L63-L66 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 33, 1A, L63-L66 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 33, 1A, L63-L66 1994/01 英語 研究論文(学術雑誌) 公開
酒井滋樹, 丹上正安, 河合 禎, 松田耕自, 後藤康仁, 大西浩之, 辻 博司, 石川順三 酒井滋樹, 丹上正安, 河合 禎, 松田耕自, 後藤康仁, 大西浩之, 辻 博司, 石川順三 酒井滋樹, 丹上正安, 河合禎, 松田耕自, 後藤康仁, 大西浩之, 辻博司, 石川順三 絶縁性基板への負イオン注入によるチャージアップの軽減 絶縁性基板への負イオン注入によるチャージアップの軽減 絶縁性基板への負イオン注入によるチャージアップの軽減 真空, 36, 11, 889-892 真空, 36, 11, 889-892 真空, 36, 11, 889-892 1993/11 英語 研究論文(学術雑誌) 公開
Y GOTOH, J ISHIKAWA, H TSUJI, N FUKAYAMA, Y OGATA Y GOTOH, J ISHIKAWA, H TSUJI, N FUKAYAMA, Y OGATA Y GOTOH, J ISHIKAWA, H TSUJI, N FUKAYAMA, Y OGATA METAL-SHEET-BEAM FORMATION USING AN IMPREGNATED ELECTRODE-TYPE LIQUID-METAL ION-SOURCE WITH A LINEAR-ARRAY OF EMISSION POINTS METAL-SHEET-BEAM FORMATION USING AN IMPREGNATED ELECTRODE-TYPE LIQUID-METAL ION-SOURCE WITH A LINEAR-ARRAY OF EMISSION POINTS METAL-SHEET-BEAM FORMATION USING AN IMPREGNATED ELECTRODE-TYPE LIQUID-METAL ION-SOURCE WITH A LINEAR-ARRAY OF EMISSION POINTS NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 74, 1-2, 35-38 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 74, 1-2, 35-38 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 74, 1-2, 35-38 1993/04 英語 研究論文(学術雑誌) 公開
J ISHIKAWA, H TSUJI, Y OKADA, M SHINODA, Y GOTOH J ISHIKAWA, H TSUJI, Y OKADA, M SHINODA, Y GOTOH J ISHIKAWA, H TSUJI, Y OKADA, M SHINODA, Y GOTOH RADIO-FREQUENCY PLASMA SPUTTER TYPE HEAVY NEGATIVE-ION SOURCE RADIO-FREQUENCY PLASMA SPUTTER TYPE HEAVY NEGATIVE-ION SOURCE RADIO-FREQUENCY PLASMA SPUTTER TYPE HEAVY NEGATIVE-ION SOURCE VACUUM, 44, 3-4, 203-207 VACUUM, 44, 3-4, 203-207 VACUUM, 44, 3-4, 203-207 1993/03 英語 研究論文(学術雑誌) 公開
J ISHIKAWA, H TSUJI, K INOUE, M NAGAO, T SASAKI, T KANEKO, Y GOTOH J ISHIKAWA, H TSUJI, K INOUE, M NAGAO, T SASAKI, T KANEKO, Y GOTOH J ISHIKAWA, H TSUJI, K INOUE, M NAGAO, T SASAKI, T KANEKO, Y GOTOH ESTIMATION OF METAL-DEPOSITED FIELD EMITTERS FOR THE MICRO-VACUUM TUBE ESTIMATION OF METAL-DEPOSITED FIELD EMITTERS FOR THE MICRO-VACUUM TUBE ESTIMATION OF METAL-DEPOSITED FIELD EMITTERS FOR THE MICRO-VACUUM TUBE JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 32, 3A, L342-L345 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 32, 3A, L342-L345 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 32, 3A, L342-L345 1993/03 英語 研究論文(学術雑誌) 公開
J ISHIKAWA, Y GOTOH, N FUKAYAMA, Y OGATA, K YOSHIDA, H TSUJI J ISHIKAWA, Y GOTOH, N FUKAYAMA, Y OGATA, K YOSHIDA, H TSUJI J ISHIKAWA, Y GOTOH, N FUKAYAMA, Y OGATA, K YOSHIDA, H TSUJI PROFILES OF ION-BEAMS EXTRACTED FROM IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE WITH LINEAR-ARRAY EMISSION POINTS PROFILES OF ION-BEAMS EXTRACTED FROM IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE WITH LINEAR-ARRAY EMISSION POINTS PROFILES OF ION-BEAMS EXTRACTED FROM IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE WITH LINEAR-ARRAY EMISSION POINTS VACUUM, 44, 3-4, 357-360 VACUUM, 44, 3-4, 357-360 VACUUM, 44, 3-4, 357-360 1993/03 英語 研究論文(学術雑誌) 公開
長尾昌善, 井上和則, 笹木高広, 金子 毅, 後藤康仁, 辻 博司, 石川順三 長尾昌善, 井上和則, 笹木高広, 金子 毅, 後藤康仁, 辻 博司, 石川順三 Masayoshi Nagao, Kazunori Inoue, Takahiro Sasaki, Takashi Kaneko, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa 金属蒸着フィールドエミッタの作製と電子放出特性 金属蒸着フィールドエミッタの作製と電子放出特性 Measurement of Emission Characteristics of Metal-Deposited Field Emitter 真空, 36, 3, 328-330 真空, 36, 3, 328-330 Shinku/Journal of the Vacuum Society of Japan, 36, 3, 328-330 1993 英語 研究論文(学術雑誌) 公開
ISHIKAWA J, TSUJI H, GOTOH Y, SASAKI T, KANEKO T, NAGAO M, INOUE K ISHIKAWA J, TSUJI H, GOTOH Y, SASAKI T, KANEKO T, NAGAO M, INOUE K ISHIKAWA J, TSUJI H, GOTOH Y, SASAKI T, KANEKO T, NAGAO M, INOUE K INFLUENCE OF CATHODE MATERIAL ON EMISSION CHARACTERISTICS OF FIELD EMITTERS FOR MICROELECTRONICS DEVICES INFLUENCE OF CATHODE MATERIAL ON EMISSION CHARACTERISTICS OF FIELD EMITTERS FOR MICROELECTRONICS DEVICES INFLUENCE OF CATHODE MATERIAL ON EMISSION CHARACTERISTICS OF FIELD EMITTERS FOR MICROELECTRONICS DEVICES Journal of Vacuum Science & Technology B, 11, 2, 403-406 Journal of Vacuum Science & Technology B, 11, 2, 403-406 Journal of Vacuum Science & Technology B, 11, 2, 403-406 1993 英語 研究論文(学術雑誌) 公開
Y GOTOH, N FUKAYAMA, H TSUJI, J ISHIKAWA Y GOTOH, N FUKAYAMA, H TSUJI, J ISHIKAWA Y GOTOH, N FUKAYAMA, H TSUJI, J ISHIKAWA INTENSIFICATION OF AN IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE BY MULTIPLYING THE NUMBER OF TIP-AND-RESERVOIRS INTENSIFICATION OF AN IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE BY MULTIPLYING THE NUMBER OF TIP-AND-RESERVOIRS INTENSIFICATION OF AN IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE BY MULTIPLYING THE NUMBER OF TIP-AND-RESERVOIRS REVIEW OF SCIENTIFIC INSTRUMENTS, 63, 4, 2438-2440 REVIEW OF SCIENTIFIC INSTRUMENTS, 63, 4, 2438-2440 REVIEW OF SCIENTIFIC INSTRUMENTS, 63, 4, 2438-2440 1992/04 英語 研究論文(学術雑誌) 公開
J ISHIKAWA, H TSUJI, Y GOTOH J ISHIKAWA, H TSUJI, Y GOTOH J ISHIKAWA, H TSUJI, Y GOTOH MILLIAMPERE METAL-ION BEAM FORMATION USING MULTIPOINT EMISSION BY AN IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE MILLIAMPERE METAL-ION BEAM FORMATION USING MULTIPOINT EMISSION BY AN IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE MILLIAMPERE METAL-ION BEAM FORMATION USING MULTIPOINT EMISSION BY AN IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 55, 1-4, 343-347 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 55, 1-4, 343-347 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 55, 1-4, 343-347 1991/04 英語 研究論文(学術雑誌) 公開
Y TAGA, Y GOTOH Y TAGA, Y GOTOH Y TAGA, Y GOTOH ROLE OF KINETIC-ENERGY OF SPUTTERED PARTICLES IN THIN-FILM FORMATION ROLE OF KINETIC-ENERGY OF SPUTTERED PARTICLES IN THIN-FILM FORMATION ROLE OF KINETIC-ENERGY OF SPUTTERED PARTICLES IN THIN-FILM FORMATION THIN SOLID FILMS, 193, 1-2, 164-170 THIN SOLID FILMS, 193, 1-2, 164-170 THIN SOLID FILMS, 193, 1-2, 164-170 1990/12 英語 研究論文(学術雑誌) 公開
Y GOTOH, Y TAGA Y GOTOH, Y TAGA Y GOTOH, Y TAGA STRUCTURES AND PROPERTIES OF CHROMIUM THIN-FILMS PREPARED BY ANISOTROPIC-EMISSION-EFFECT SPUTTER DEPOSITION STRUCTURES AND PROPERTIES OF CHROMIUM THIN-FILMS PREPARED BY ANISOTROPIC-EMISSION-EFFECT SPUTTER DEPOSITION STRUCTURES AND PROPERTIES OF CHROMIUM THIN-FILMS PREPARED BY ANISOTROPIC-EMISSION-EFFECT SPUTTER DEPOSITION JOURNAL OF APPLIED PHYSICS, 67, 2, 1030-1036 JOURNAL OF APPLIED PHYSICS, 67, 2, 1030-1036 JOURNAL OF APPLIED PHYSICS, 67, 2, 1030-1036 1990/01 英語 研究論文(学術雑誌) 公開
J ISHIKAWA, Y GOTOH, H TSUJI, T TAKAGI J ISHIKAWA, Y GOTOH, H TSUJI, T TAKAGI J ISHIKAWA, Y GOTOH, H TSUJI, T TAKAGI IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE IMPREGNATED-ELECTRODE-TYPE LIQUID-METAL ION-SOURCE NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 21, 2-4, 186-189 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 21, 2-4, 186-189 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 21, 2-4, 186-189 1987/03 英語 研究論文(学術雑誌) 公開

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著者 著者(日本語) 著者(英語) タイトル タイトル(日本語) タイトル(英語) 書誌情報等 書誌情報等(日本語) 書誌情報等(英語) 出版年月 査読の有無 記述言語 掲載種別 公開
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後藤康仁, 奥野泰希, 佐藤信浩, 秋吉優史, 今泉 充, 小林知洋, 岡本 保 後藤康仁, 奥野泰希, 佐藤信浩, 秋吉優史, 今泉 充, 小林知洋, 岡本 保 放射線環境下のセンサ出力を伝送する線路において生成するガンマ線励起電流の評価 放射線環境下のセンサ出力を伝送する線路において生成するガンマ線励起電流の評価 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 119, 305 (ED2019 59-75), 39-42 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 119, 305 (ED2019 59-75), 39-42 , 119, 305 (ED2019 59-75), 39-42 2019/11/21 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
後藤康仁 後藤康仁 微小電子源を用いた真空集積回路創成のための技術的課題 微小電子源を用いた真空集積回路創成のための技術的課題 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 119, 305(ED2019 59-75, 29-30 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 119, 305(ED2019 59-75, 29-30 , 119, 305(ED2019 59-75, 29-30 2019/11/21 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Yasuhito Gotoh, Shotaro Yano Yasuhito Gotoh, Shotaro Yano Yasuhito Gotoh, Shotaro Yano Effects of bombardment of argon ions backscattered at target surface in magnetron sputter deposition Effects of bombardment of argon ions backscattered at target surface in magnetron sputter deposition Effects of bombardment of argon ions backscattered at target surface in magnetron sputter deposition Proceedings of the 15th International Symposium on Sputtering and Plasma Processes Proceedings of the 15th International Symposium on Sputtering and Plasma Processes Proceedings of the 15th International Symposium on Sputtering and Plasma Processes 2019/06 英語 研究発表ペーパー・要旨(国際会議) 公開
Yasuhito Gotoh, Teryuki Morito, Masayoshi Nagao, Tamotsu Okamoto, Tomoya Igari, Takahiro Fukui, Tomoaki Masuzawa, Yoichiro Neo, Hidenori Mimura, Nobuhiro Sato, Masafumi Akiyoshi, Ikuji Takagi Yasuhito Gotoh, Teryuki Morito, Masayoshi Nagao, Tamotsu Okamoto, Tomoya Igari, Takahiro Fukui, Tomoaki Masuzawa, Yoichiro Neo, Hidenori Mimura, Nobuhiro Sato, Masafumi Akiyoshi, Ikuji Takagi Yasuhito Gotoh, Teryuki Morito, Masayoshi Nagao, Tamotsu Okamoto, Tomoya Igari, Takahiro Fukui, Tomoaki Masuzawa, Yoichiro Neo, Hidenori Mimura, Nobuhiro Sato, Masafumi Akiyoshi, Ikuji Takagi Radiation tolerant vacuum image sensor for robots working on removal of fuel debris Radiation tolerant vacuum image sensor for robots working on removal of fuel debris Radiation tolerant vacuum image sensor for robots working on removal of fuel debris International Topical Workshop on Fukushima Daiichi Decommissioning Research International Topical Workshop on Fukushima Daiichi Decommissioning Research International Topical Workshop on Fukushima Daiichi Decommissioning Research 2019/05 英語 研究発表ペーパー・要旨(国際会議) 公開
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Teruyuki Morito, Yusuke Handa, Yasuhito Gotoh, Nobuhiro Sato, Masayoshi Nagao, Masafumi Akiyoshi, Ikuji Takagi, Tamotsu Okamoto Teruyuki Morito, Yusuke Handa, Yasuhito Gotoh, Nobuhiro Sato, Masayoshi Nagao, Masafumi Akiyoshi, Ikuji Takagi, Tamotsu Okamoto Teruyuki Morito, Yusuke Handa, Yasuhito Gotoh, Nobuhiro Sato, Masayoshi Nagao, Masafumi Akiyoshi, Ikuji Takagi, Tamotsu Okamoto Operation of field emitter arrays under high dose rate gamma-ray irradiation Operation of field emitter arrays under high dose rate gamma-ray irradiation Operation of field emitter arrays under high dose rate gamma-ray irradiation 2018 31st International Vacuum Nanoelectronics Conference, 96-97 2018 31st International Vacuum Nanoelectronics Conference, 96-97 2018 31st International Vacuum Nanoelectronics Conference, 96-97 2018 英語 研究発表ペーパー・要旨(国際会議) 公開
Masayoshi Nagao, Katsuhisa Murakami, Sommwan Khumpuang, Shiro Hara, Yasuhito Gotoh, Yoichiro Neo, Hidenori Mimura Masayoshi Nagao, Katsuhisa Murakami, Sommwan Khumpuang, Shiro Hara, Yasuhito Gotoh, Yoichiro Neo, Hidenori Mimura Masayoshi Nagao, Katsuhisa Murakami, Sommwan Khumpuang, Shiro Hara, Yasuhito Gotoh, Yoichiro Neo, Hidenori Mimura Fabrication of volcano structured Spindt-type field emitter arrays using Minimal Fab system Fabrication of volcano structured Spindt-type field emitter arrays using Minimal Fab system Fabrication of volcano structured Spindt-type field emitter arrays using Minimal Fab system 2018 31st International Vacuum Nanoelectronics Conference, 206-207 2018 31st International Vacuum Nanoelectronics Conference, 206-207 2018 31st International Vacuum Nanoelectronics Conference, 206-207 2018 英語 研究発表ペーパー・要旨(国際会議) 公開
Tamotsu Okamoto, Tomoya Igari, Takahiro Fukui, Yasuhito Gotoh, Nobuhiro Sato, Masafumi Akiyoshi, Ikuji Takagi Tamotsu Okamoto, Tomoya Igari, Takahiro Fukui, Yasuhito Gotoh, Nobuhiro Sato, Masafumi Akiyoshi, Ikuji Takagi Tamotsu Okamoto, Tomoya Igari, Takahiro Fukui, Yasuhito Gotoh, Nobuhiro Sato, Masafumi Akiyoshi, Ikuji Takagi Gamma-ray irradiation effects of CdS/CdTe photodiode for radiation tolerant FEA image sensor Gamma-ray irradiation effects of CdS/CdTe photodiode for radiation tolerant FEA image sensor Gamma-ray irradiation effects of CdS/CdTe photodiode for radiation tolerant FEA image sensor 2018 31st International Vacuum Nanoelectronics Conference, 214-215 2018 31st International Vacuum Nanoelectronics Conference, 214-215 2018 31st International Vacuum Nanoelectronics Conference, 214-215 2018 英語 研究発表ペーパー・要旨(国際会議) 公開
森藤瑛之, 辻 博司, 長尾昌善, 秋吉優史, 高木郁二, 後藤康仁 森藤瑛之, 辻 博司, 長尾昌善, 秋吉優史, 高木郁二, 後藤康仁 高線量率のX線照射下におけるフィールドエミッタアレイの動作 高線量率のX線照射下におけるフィールドエミッタアレイの動作 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 117, 267 (ED2017 36-48), 43-46 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 117, 267 (ED2017 36-48), 43-46 , 117, 267 (ED2017 36-48), 43-46 2017/10/28 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
後藤康仁 後藤康仁 ファウラーノルドハイムプロットの非直線性が切片傾き解析に与える影響 ファウラーノルドハイムプロットの非直線性が切片傾き解析に与える影響 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 117, 267 (ED2017 36-48), 9-11 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 117, 267 (ED2017 36-48), 9-11 , 117, 267 (ED2017 36-48), 9-11 2017/10/28 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Yasuhito Gotoh, Saba Maeda, Hiroshi Tsuji Yasuhito Gotoh, Saba Maeda, Hiroshi Tsuji Yasuhito Gotoh, Saba Maeda, Hiroshi Tsuji Large magnification of electrostatic divergent lens system with extremely short focal length for ion and electron microscopy Large magnification of electrostatic divergent lens system with extremely short focal length for ion and electron microscopy Large magnification of electrostatic divergent lens system with extremely short focal length for ion and electron microscopy 2017 30th International Vacuum Nanoelectronics Conference, IVNC 2017, 246-247 2017 30th International Vacuum Nanoelectronics Conference, IVNC 2017, 246-247 2017 30th International Vacuum Nanoelectronics Conference, IVNC 2017, 246-247 2017/09/26 英語 研究発表ペーパー・要旨(国際会議) 公開
Yasuhito Gotoh, Hirofumi Fujiwara, Hiroshi Tsuji Yasuhito Gotoh, Hirofumi Fujiwara, Hiroshi Tsuji Yasuhito Gotoh, Hirofumi Fujiwara, Hiroshi Tsuji Effect of oblique incidence of sputtered and fast particles on crystal orientation in tungsten thin film formation Effect of oblique incidence of sputtered and fast particles on crystal orientation in tungsten thin film formation Effect of oblique incidence of sputtered and fast particles on crystal orientation in tungsten thin film formation Proceedings of the 14th International Symposium on Sputtering and Plasma Processes, 153-155 Proceedings of the 14th International Symposium on Sputtering and Plasma Processes, 153-155 Proceedings of the 14th International Symposium on Sputtering and Plasma Processes, 153-155 2017/07 英語 研究発表ペーパー・要旨(国際会議) 公開
Gotoh Yasuhito, Morito Teruyuki, Tsuji Hiroshi, Akiyoshi Masafumi, Nagao Masayoshi, Takagi Ikuji Gotoh Yasuhito, Morito Teruyuki, Tsuji Hiroshi, Akiyoshi Masafumi, Nagao Masayoshi, Takagi Ikuji Gotoh Yasuhito, Morito Teruyuki, Tsuji Hiroshi, Akiyoshi Masafumi, Nagao Masayoshi, Takagi Ikuji Robustness of Field Emitter Arrays against High-Energy X-ray Irradiation at High Dose Rate Robustness of Field Emitter Arrays against High-Energy X-ray Irradiation at High Dose Rate Robustness of Field Emitter Arrays against High-Energy X-ray Irradiation at High Dose Rate 2017 30th International Vacuum Nanoelectronics Conference (Ivnc), 104-105 2017 30th International Vacuum Nanoelectronics Conference (Ivnc), 104-105 2017 30th International Vacuum Nanoelectronics Conference (Ivnc), 104-105 2017 英語 研究発表ペーパー・要旨(国際会議) 公開
Nagao Masayoshi, Murakami Katsuhisa, Gotoh Yasuhito, Neo Yoichiro, Mimura Hidenori Nagao Masayoshi, Murakami Katsuhisa, Gotoh Yasuhito, Neo Yoichiro, Mimura Hidenori Nagao Masayoshi, Murakami Katsuhisa, Gotoh Yasuhito, Neo Yoichiro, Mimura Hidenori Process technology for volcano-structured double-gate Spindt-type field emitter arrays Process technology for volcano-structured double-gate Spindt-type field emitter arrays Process technology for volcano-structured double-gate Spindt-type field emitter arrays 2017 30th International Vacuum Nanoelectronics Conference (Ivnc), 122-123 2017 30th International Vacuum Nanoelectronics Conference (Ivnc), 122-123 2017 30th International Vacuum Nanoelectronics Conference (Ivnc), 122-123 2017 英語 研究発表ペーパー・要旨(国際会議) 公開
後藤康仁, 辻 博司, 長尾昌善, 秋吉優史, 高木郁二 後藤康仁, 辻 博司, 長尾昌善, 秋吉優史, 高木郁二 エックス線照射下におけるフィールドエミッタアレイの動作特性とその解析 エックス線照射下におけるフィールドエミッタアレイの動作特性とその解析 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 116, 268 (ED2016 43-50), 5-8 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 116, 268 (ED2016 43-50), 5-8 , 116, 268 (ED2016 43-50), 5-8 2016/10/27 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
増澤智昭, 根尾陽一郎, 後藤康仁, 岡本 保, 長尾昌善, 佐藤信浩, 秋吉優史, 高木郁二, 三村秀典 増澤智昭, 根尾陽一郎, 後藤康仁, 岡本 保, 長尾昌善, 佐藤信浩, 秋吉優史, 高木郁二, 三村秀典 CdTe/CdS光電変換膜の耐放射線性評価 CdTe/CdS光電変換膜の耐放射線性評価 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 116, 268 (ED2016 43-56), 63-66 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 116, 268 (ED2016 43-56), 63-66 , 116, 268 (ED2016 43-56), 63-66 2016/10/25 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
長尾昌善, 村上勝久, 辰巳憲之, クンプアン ソマワン, 原 史朗, 後藤康仁 長尾昌善, 村上勝久, 辰巳憲之, クンプアン ソマワン, 原 史朗, 後藤康仁 ミニマルファブを活用した微小電子源の作製 ミニマルファブを活用した微小電子源の作製 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 116, 268 (ED2016 43-50), 31-36 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 116, 268 (ED2016 43-50), 31-36 , 116, 268 (ED2016 43-50), 31-36 2016/10/25 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
後藤康仁 後藤康仁 Yasuhito Gotoh 真空技術における潜在的な危険と安全対策 真空技術における潜在的な危険と安全対策 Potential dangers and safety measures of vacuum technologies Journal of the Vacuum Society of Japan, 59, 7, 184-191 Journal of the Vacuum Society of Japan, 59, 7, 184-191 Journal of the Vacuum Society of Japan, 59, 7, 184-191 2016/07 日本語 記事・総説・解説・論説等(学術雑誌) 公開
Y. Gotoh, M. Nagao, T. Masuzawa, Y. Neo, H. Mimura, T. Okamoto, M. Akiyoshi, N. Sato, I. Takagi Y. Gotoh, M. Nagao, T. Masuzawa, Y. Neo, H. Mimura, T. Okamoto, M. Akiyoshi, N. Sato, I. Takagi Y. Gotoh, M. Nagao, T. Masuzawa, Y. Neo, H. Mimura, T. Okamoto, M. Akiyoshi, N. Sato, I. Takagi Field emitter array with electrostatic focusing electrode for radiation tolerant compact image sensor Field emitter array with electrostatic focusing electrode for radiation tolerant compact image sensor Field emitter array with electrostatic focusing electrode for radiation tolerant compact image sensor 11th International Vacuum Electron Sources Conference 11th International Vacuum Electron Sources Conference 11th International Vacuum Electron Sources Conference 2016 英語 研究発表ペーパー・要旨(国際会議) 公開
Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Okamoto Tamotsu, Nagao Masayoshi, Akiyoshi Masafumi, Sato Nobuhiro, Takagi Ikuji, Tsuji Hiroshi, Gotoh Yasuhito Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Okamoto Tamotsu, Nagao Masayoshi, Akiyoshi Masafumi, Sato Nobuhiro, Takagi Ikuji, Tsuji Hiroshi, Gotoh Yasuhito Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Okamoto Tamotsu, Nagao Masayoshi, Akiyoshi Masafumi, Sato Nobuhiro, Takagi Ikuji, Tsuji Hiroshi, Gotoh Yasuhito Radiation tolerant compact image sensor using CdTe photodiode and field emitter array (Conference Presentation) Radiation tolerant compact image sensor using CdTe photodiode and field emitter array (Conference Presentation) Radiation tolerant compact image sensor using CdTe photodiode and field emitter array (Conference Presentation) Radiation Detectors: Systems and Applications XVII, 9969 Radiation Detectors: Systems and Applications XVII, 9969 Radiation Detectors: Systems and Applications XVII, 9969 2016 英語 研究発表ペーパー・要旨(国際会議) 公開
Gotoh Yasuhito, Tsuji Hiroshi, Nagao Masayoshi, Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Okamoto Tamotsu, Akiyoshi Masafumi, Sato Nobuhiro, Takagi Ikuji, IEEE Gotoh Yasuhito, Tsuji Hiroshi, Nagao Masayoshi, Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Okamoto Tamotsu, Akiyoshi Masafumi, Sato Nobuhiro, Takagi Ikuji, IEEE Gotoh Yasuhito, Tsuji Hiroshi, Nagao Masayoshi, Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Okamoto Tamotsu, Akiyoshi Masafumi, Sato Nobuhiro, Takagi Ikuji, IEEE Radiation tolerance of compact image sensor with field emitter array and cadmium telluride-based photoconductor Radiation tolerance of compact image sensor with field emitter array and cadmium telluride-based photoconductor Radiation tolerance of compact image sensor with field emitter array and cadmium telluride-based photoconductor 2016 29th International Vacuum Nanoelectronics Conference (Ivnc) 2016 29th International Vacuum Nanoelectronics Conference (Ivnc) 2016 29th International Vacuum Nanoelectronics Conference (Ivnc) 2016 英語 研究発表ペーパー・要旨(国際会議) 公開
Gotoh Yasuhito, Tsuji Hiroshi, Nagao Masayoshi, IEEE Gotoh Yasuhito, Tsuji Hiroshi, Nagao Masayoshi, IEEE Gotoh Yasuhito, Tsuji Hiroshi, Nagao Masayoshi, IEEE Evaluation of current density distribution of field emitted electrons by numerical simulation in conjunction with analytical approach Evaluation of current density distribution of field emitted electrons by numerical simulation in conjunction with analytical approach Evaluation of current density distribution of field emitted electrons by numerical simulation in conjunction with analytical approach 2016 29th International Vacuum Nanoelectronics Conference (Ivnc) 2016 29th International Vacuum Nanoelectronics Conference (Ivnc) 2016 29th International Vacuum Nanoelectronics Conference (Ivnc) 2016 英語 研究発表ペーパー・要旨(国際会議) 公開
Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Okamoto Tamotsu, Nagao Masayoshi, Gotoh Yasuhito, Akiyoshi Masafumi, Sato Nobuhiro, Takagi Ikuji, IEEE Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Okamoto Tamotsu, Nagao Masayoshi, Gotoh Yasuhito, Akiyoshi Masafumi, Sato Nobuhiro, Takagi Ikuji, IEEE Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Okamoto Tamotsu, Nagao Masayoshi, Gotoh Yasuhito, Akiyoshi Masafumi, Sato Nobuhiro, Takagi Ikuji, IEEE Development of CdTe based photoconductive target for radiation tolerant compact image sensors Development of CdTe based photoconductive target for radiation tolerant compact image sensors Development of CdTe based photoconductive target for radiation tolerant compact image sensors 2016 29th International Vacuum Nanoelectronics Conference (Ivnc) 2016 29th International Vacuum Nanoelectronics Conference (Ivnc) 2016 29th International Vacuum Nanoelectronics Conference (Ivnc) 2016 英語 研究発表ペーパー・要旨(国際会議) 公開
後藤康仁, 辻 博司, 長尾昌善 後藤康仁, 辻 博司, 長尾昌善 ダブルゲートスピント型エミッタの電極構造と電子ビーム軌道 ダブルゲートスピント型エミッタの電極構造と電子ビーム軌道 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 115, 264 (ED2015 54-67), 1-4 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 115, 264 (ED2015 54-67), 1-4 , 115, 264 (ED2015 54-67), 1-4 2015/10/22 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
H. Fujiwara, H. Tsuji, Y. Gotoh H. Fujiwara, H. Tsuji, Y. Gotoh H. Fujiwara, H. Tsuji, Y. Gotoh Effect of substrate position on crystal orientation of tungsten films prepared by rf magnetron sputter deposition Effect of substrate position on crystal orientation of tungsten films prepared by rf magnetron sputter deposition Effect of substrate position on crystal orientation of tungsten films prepared by rf magnetron sputter deposition Proceedings of the 13th International Symposium on Sputtering and Plasma Processes, 387-390 Proceedings of the 13th International Symposium on Sputtering and Plasma Processes, 387-390 Proceedings of the 13th International Symposium on Sputtering and Plasma Processes, 387-390 2015/07 英語 研究発表ペーパー・要旨(国際会議) 公開
Yasuhito Gotoh, Sho Fujiwara, Hiroshi Tsuji Yasuhito Gotoh, Sho Fujiwara, Hiroshi Tsuji Yasuhito Gotoh, Sho Fujiwara, Hiroshi Tsuji Work function of hafnium nitirde thin films prepared by radio frequency magnetron sputtering Work function of hafnium nitirde thin films prepared by radio frequency magnetron sputtering Work function of hafnium nitirde thin films prepared by radio frequency magnetron sputtering Proceedings of the 13th International Symposium on Sputtering and Plasma Processes, 248-251 Proceedings of the 13th International Symposium on Sputtering and Plasma Processes, 248-251 Proceedings of the 13th International Symposium on Sputtering and Plasma Processes, 248-251 2015/07 英語 研究発表ペーパー・要旨(国際会議) 公開
Masayoshi Nagao, Yasuhito Gotoh, Tomoaki Masuzawa, Yoichiro Neo, Hidenori Mimura Masayoshi Nagao, Yasuhito Gotoh, Tomoaki Masuzawa, Yoichiro Neo, Hidenori Mimura Masayoshi Nagao, Yasuhito Gotoh, Tomoaki Masuzawa, Yoichiro Neo, Hidenori Mimura Revised fabrication of volcano-structured double-gate Spindt-type FEA Revised fabrication of volcano-structured double-gate Spindt-type FEA Revised fabrication of volcano-structured double-gate Spindt-type FEA IDW '15: The 22nd International Display Workshops, 593-596 IDW '15: The 22nd International Display Workshops, 593-596 IDW '15: The 22nd International Display Workshops, 593-596 2015 英語 記事・総説・解説・論説等(国際会議プロシーディングス) 公開
Noriaki Nyuba, Makoto Okada, Hiroshi Tsuji, Yasuhito Gotoh Noriaki Nyuba, Makoto Okada, Hiroshi Tsuji, Yasuhito Gotoh Noriaki Nyuba, Makoto Okada, Hiroshi Tsuji, Yasuhito Gotoh Deposition of glycine molecules on tungsten emitter and observation of its surface with field ion microscope Deposition of glycine molecules on tungsten emitter and observation of its surface with field ion microscope Deposition of glycine molecules on tungsten emitter and observation of its surface with field ion microscope IDW '15: The 22nd International Display Workshops, 586-589 IDW '15: The 22nd International Display Workshops, 586-589 IDW '15: The 22nd International Display Workshops, 586-589 2015 英語 記事・総説・解説・論説等(国際会議プロシーディングス) 公開
Gotoh Yasuhito, Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Nagao Masayoshi, Okamoto Tamotsu, Akiyoshi Masafumi, Takagi Ikuji, IEEE Gotoh Yasuhito, Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Nagao Masayoshi, Okamoto Tamotsu, Akiyoshi Masafumi, Takagi Ikuji, IEEE Gotoh Yasuhito, Masuzawa Tomoaki, Neo Yoichiro, Mimura Hidenori, Nagao Masayoshi, Okamoto Tamotsu, Akiyoshi Masafumi, Takagi Ikuji, IEEE Research Project on Development of Radiation Tolerant Compact Image Sensor with a Field Emitter Array Research Project on Development of Radiation Tolerant Compact Image Sensor with a Field Emitter Array Research Project on Development of Radiation Tolerant Compact Image Sensor with a Field Emitter Array 2015 28th International Vacuum Nanoelectronics Conference (Ivnc), 240-241 2015 28th International Vacuum Nanoelectronics Conference (Ivnc), 240-241 2015 28th International Vacuum Nanoelectronics Conference (Ivnc), 240-241 2015 英語 研究発表ペーパー・要旨(国際会議) 公開
Nagao Masayoshi, Gotoh Yasuhito, Neo Yoichiro, Mimura Hidenori, IEEE Nagao Masayoshi, Gotoh Yasuhito, Neo Yoichiro, Mimura Hidenori, IEEE Nagao Masayoshi, Gotoh Yasuhito, Neo Yoichiro, Mimura Hidenori, IEEE Beam profile measurement of volcano-structured double-gated Spindt-type filed emitter arrays Beam profile measurement of volcano-structured double-gated Spindt-type filed emitter arrays Beam profile measurement of volcano-structured double-gated Spindt-type filed emitter arrays 2015 28th International Vacuum Nanoelectronics Conference (Ivnc), 190-191 2015 28th International Vacuum Nanoelectronics Conference (Ivnc), 190-191 2015 28th International Vacuum Nanoelectronics Conference (Ivnc), 190-191 2015 英語 研究発表ペーパー・要旨(国際会議) 公開
後藤康仁, 辻 博司 後藤康仁, 辻 博司 電界放出電子源のエミッタ付近の電界計算手法の検討 電界放出電子源のエミッタ付近の電界計算手法の検討 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 114, 262 (ED2014 62-72), 15-17 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 114, 262 (ED2014 62-72), 15-17 , 114, 262 (ED2014 62-72), 15-17 2014/10/21 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Y. Gotoh, H. Tsuji, M. Nagao Y. Gotoh, H. Tsuji, M. Nagao Y. Gotoh, H. Tsuji, M. Nagao Computer Simulation of Electron Beam Trajectories in Double-Gated Spindt-Type FEAs Computer Simulation of Electron Beam Trajectories in Double-Gated Spindt-Type FEAs Computer Simulation of Electron Beam Trajectories in Double-Gated Spindt-Type FEAs IDW '14: The 21st International Display Workshops, 591-593 IDW '14: The 21st International Display Workshops, 591-593 IDW '14: The 21st International Display Workshops, 591-593 2014 英語 記事・総説・解説・論説等(国際会議プロシーディングス) 公開
Yasuhito Gotoh, Wataru Ohue, Yoshiki Yasutomo, Hiroshi Tsuji Yasuhito Gotoh, Wataru Ohue, Yoshiki Yasutomo, Hiroshi Tsuji Yasuhito Gotoh, Wataru Ohue, Yoshiki Yasutomo, Hiroshi Tsuji Operational Characteristics of Vacuum Triode with Hafnium Nitride Field Emitter Arrays in Harsh Environments Operational Characteristics of Vacuum Triode with Hafnium Nitride Field Emitter Arrays in Harsh Environments Operational Characteristics of Vacuum Triode with Hafnium Nitride Field Emitter Arrays in Harsh Environments 2014 27TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC) 2014 27TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC) 2014 27TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC) 2014 英語 公開
Gotoh Yasuhito, Tsui Hiroshi, Yoshizawa Shunichi, Nagao Masayoshi, Akiyoshi Masafumi, Takgai Ikuji Gotoh Yasuhito, Tsui Hiroshi, Yoshizawa Shunichi, Nagao Masayoshi, Akiyoshi Masafumi, Takgai Ikuji Gotoh Yasuhito, Tsui Hiroshi, Yoshizawa Shunichi, Nagao Masayoshi, Akiyoshi Masafumi, Takgai Ikuji Evaluation of Radiation Tolerance of Silicon Dioxide Layer for Field Emitter Arrays Evaluation of Radiation Tolerance of Silicon Dioxide Layer for Field Emitter Arrays Evaluation of Radiation Tolerance of Silicon Dioxide Layer for Field Emitter Arrays 2014 27th International Vacuum Nanoelectronics Conference (Ivnc) 2014 27th International Vacuum Nanoelectronics Conference (Ivnc) 2014 27th International Vacuum Nanoelectronics Conference (Ivnc) 2014 公開
後藤康仁, 辻 博司 後藤康仁, 辻 博司 低速電子ビーム形成のための電界放出電子源引き出し電極系の設計 低速電子ビーム形成のための電界放出電子源引き出し電極系の設計 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 113, 257 (ED2013 50-63), 17-18 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 113, 257 (ED2013 50-63), 17-18 , 113, 257 (ED2013 50-63), 17-18 2013/10/22 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Y. Gotoh, Y. Yasutomo, H. Tsuji Y. Gotoh, Y. Yasutomo, H. Tsuji Y. Gotoh, Y. Yasutomo, H. Tsuji Evaluation of Radiation Tolerance of Hafnium Nitride Field Emitter Arrays Evaluation of Radiation Tolerance of Hafnium Nitride Field Emitter Arrays Evaluation of Radiation Tolerance of Hafnium Nitride Field Emitter Arrays IDW '13: The 20th International Display Workshops, 850-853 IDW '13: The 20th International Display Workshops, 850-853 IDW '13: The 20th International Display Workshops, 850-853 2013 英語 記事・総説・解説・論説等(国際会議プロシーディングス) 公開
S. Fujiwara, S. Hogyoku, H. Tsuji, Y. Gotoh S. Fujiwara, S. Hogyoku, H. Tsuji, Y. Gotoh S. Fujiwara, S. Hogyoku, H. Tsuji, Y. Gotoh Measurement of Work Function of Hafnium Nitride Films at Elevated Temperatures in Ultra High Vacuum Measurement of Work Function of Hafnium Nitride Films at Elevated Temperatures in Ultra High Vacuum Measurement of Work Function of Hafnium Nitride Films at Elevated Temperatures in Ultra High Vacuum IDW '13: The 20th International Display Workshops, 846-849 IDW '13: The 20th International Display Workshops, 846-849 IDW '13: The 20th International Display Workshops, 846-849 2013 英語 記事・総説・解説・論説等(国際会議プロシーディングス) 公開
後藤康仁, 安友佳樹, 辻 博司 後藤康仁, 安友佳樹, 辻 博司 フィールドエミッタアレイを用いた電子デバイスにおける空間電荷効果 フィールドエミッタアレイを用いた電子デバイスにおける空間電荷効果 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 112, 303(ED2012 54-64), 45-48 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 112, 303(ED2012 54-64), 45-48 , 112, 303(ED2012 54-64), 45-48 2012/11/12 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Hiroshi Tsuji, Akira Sakata, Go Miyagawa, Yoshiki Yasutomo, Yasuhito Gotoh Hiroshi Tsuji, Akira Sakata, Go Miyagawa, Yoshiki Yasutomo, Yasuhito Gotoh Hiroshi Tsuji, Akira Sakata, Go Miyagawa, Yoshiki Yasutomo, Yasuhito Gotoh Observation of Cathodoluminescence of Germanium-Implanted Quartz Glass Excited by Low-Energy Electrons Emitted from Silicon Field Emitter Array Observation of Cathodoluminescence of Germanium-Implanted Quartz Glass Excited by Low-Energy Electrons Emitted from Silicon Field Emitter Array Observation of Cathodoluminescence of Germanium-Implanted Quartz Glass Excited by Low-Energy Electrons Emitted from Silicon Field Emitter Array IDW/AD '12: PROCEEDINGS OF THE INTERNATIONAL DISPLAY WORKSHOPS, PT 3, 19, 1781-1784 IDW/AD '12: PROCEEDINGS OF THE INTERNATIONAL DISPLAY WORKSHOPS, PT 3, 19, 1781-1784 IDW/AD '12: PROCEEDINGS OF THE INTERNATIONAL DISPLAY WORKSHOPS, PT 3, 19, 1781-1784 2012 英語 研究発表ペーパー・要旨(国際会議) 公開
Yasuhito Gotoh, Shuhei Taguchi, Keita Ikeda, Takayuki Kitagawa, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Yasuhito Gotoh, Shuhei Taguchi, Keita Ikeda, Takayuki Kitagawa, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Yasuhito Gotoh, Shuhei Taguchi, Keita Ikeda, Takayuki Kitagawa, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Production of Extremely Low Energy Electron Beam with Silicon-Based Field Emitter Arrays and Its Application to Space Charge Neutralization of Low-Energy and High-Current Ion Beam Production of Extremely Low Energy Electron Beam with Silicon-Based Field Emitter Arrays and Its Application to Space Charge Neutralization of Low-Energy and High-Current Ion Beam Production of Extremely Low Energy Electron Beam with Silicon-Based Field Emitter Arrays and Its Application to Space Charge Neutralization of Low-Energy and High-Current Ion Beam 2012 25TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC), 86-+ 2012 25TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC), 86-+ 2012 25TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC), 86-+ 2012 英語 研究発表ペーパー・要旨(国際会議) 公開
Nobutoshi Arai, Masatomi Harada, Hiroshi Kotaki, Akira Takahashi, Go Miyagawa, Shohei Kinoshita, Hiroshi Tsuji, Yasuhito Gotoh Nobutoshi Arai, Masatomi Harada, Hiroshi Kotaki, Akira Takahashi, Go Miyagawa, Shohei Kinoshita, Hiroshi Tsuji, Yasuhito Gotoh Nobutoshi Arai, Masatomi Harada, Hiroshi Kotaki, Akira Takahashi, Go Miyagawa, Shohei Kinoshita, Hiroshi Tsuji, Yasuhito Gotoh Luminescence properties of Ge-implanted SiO 2 layer on Si substrate for blue-UV light source with low-voltage drive Luminescence properties of Ge-implanted SiO 2 layer on Si substrate for blue-UV light source with low-voltage drive Luminescence properties of Ge-implanted SiO 2 layer on Si substrate for blue-UV light source with low-voltage drive IMFEDK 2012 - 2012 International Meeting for Future of Electron Devices, Kansai, 40-41 IMFEDK 2012 - 2012 International Meeting for Future of Electron Devices, Kansai, 40-41 IMFEDK 2012 - 2012 International Meeting for Future of Electron Devices, Kansai, 40-41 2012 英語 研究発表ペーパー・要旨(国際会議) 公開
Yoshiki Yasutomo, Wataru Ohue, Yasuhito Gotoh, Hiroshi Tsuji Yoshiki Yasutomo, Wataru Ohue, Yasuhito Gotoh, Hiroshi Tsuji Yoshiki Yasutomo, Wataru Ohue, Yasuhito Gotoh, Hiroshi Tsuji Frequency mixing with a tetrode vacuum transistor Frequency mixing with a tetrode vacuum transistor Frequency mixing with a tetrode vacuum transistor IMFEDK 2012 - 2012 International Meeting for Future of Electron Devices, Kansai, 42-43 IMFEDK 2012 - 2012 International Meeting for Future of Electron Devices, Kansai, 42-43 IMFEDK 2012 - 2012 International Meeting for Future of Electron Devices, Kansai, 42-43 2012 英語 研究発表ペーパー・要旨(国際会議) 公開
後藤 康仁, 池田 啓太, 大上 航, 安友 佳樹, 辻 博司 後藤 康仁, 池田 啓太, 大上 航, 安友 佳樹, 辻 博司 真空トランジスタによる振幅変調波の検波 真空トランジスタによる振幅変調波の検波 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 111, 248, 1-4 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 111, 248, 1-4 , 111, 248, 1-4 2011/10/13 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
安友 佳樹, 大上 航, 後藤 康仁, 辻 博司 安友 佳樹, 大上 航, 後藤 康仁, 辻 博司 四極構造の真空トランジスタを用いた周波数混合実験 四極構造の真空トランジスタを用いた周波数混合実験 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 111, 248, 5-8 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 111, 248, 5-8 , 111, 248, 5-8 2011/10/13 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Yasuhito Gotoh, Hiroshi Tsuji Yasuhito Gotoh, Hiroshi Tsuji Yasuhito Gotoh, Hiroshi Tsuji Hafnium nitride thin film cold cathode for field emitter arrays Hafnium nitride thin film cold cathode for field emitter arrays Hafnium nitride thin film cold cathode for field emitter arrays International Meeting for Information Display, 94-95 International Meeting for Information Display, 94-95 International Meeting for Information Display, 94-95 2011 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Yasuhito Gotoh, Keita Ikeda, Hiroshi Tsuji Yasuhito Gotoh, Keita Ikeda, Hiroshi Tsuji Yasuhito Gotoh, Keita Ikeda, Hiroshi Tsuji Comparison of Field Emission Properties between Hafnium Nitride and Niobium Nitride Field Emitter Arrays Comparison of Field Emission Properties between Hafnium Nitride and Niobium Nitride Field Emitter Arrays Comparison of Field Emission Properties between Hafnium Nitride and Niobium Nitride Field Emitter Arrays IDW'11: PROCEEDINGS OF THE 18TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 1791-1794 IDW'11: PROCEEDINGS OF THE 18TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 1791-1794 IDW'11: PROCEEDINGS OF THE 18TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 1791-1794 2011 英語 研究発表ペーパー・要旨(国際会議) 公開
池田啓太, 大上 航, 後藤康仁, 辻 博司 池田啓太, 大上 航, 後藤康仁, 辻 博司 窒化ハフニウムフィールドエミッタアレイを用いた真空トランジスタの周波数特性 窒化ハフニウムフィールドエミッタアレイを用いた真空トランジスタの周波数特性 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 110, 249(ED2010 128-141), 47-50 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 110, 249(ED2010 128-141), 47-50 , 110, 249(ED2010 128-141), 47-50 2010/10/18 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
後藤康仁, 池田啓太, 大上 航, 辻 博司 後藤康仁, 池田啓太, 大上 航, 辻 博司 真空トランジスタのコレクタ形状とコレクタ特性 真空トランジスタのコレクタ形状とコレクタ特性 電子情報通信学会技術研究報告, 110, 249(ED2010 128-141), 51-54 電子情報通信学会技術研究報告, 110, 249(ED2010 128-141), 51-54 , 110, 249(ED2010 128-141), 51-54 2010/10/18 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
後藤康仁, 遠藤恵介, 辻 博司, 石川順三, 酒井滋樹 後藤康仁, 遠藤恵介, 辻 博司, 石川順三, 酒井滋樹 三フッ化メタンプラズマ処理したシリコン電界放出電子源の表面状態と電子放出特性 三フッ化メタンプラズマ処理したシリコン電界放出電子源の表面状態と電子放出特性 電子情報通信学会技術研究報告, 110, 249(ED2010 128-141), 7-10 電子情報通信学会技術研究報告, 110, 249(ED2010 128-141), 7-10 , 110, 249(ED2010 128-141), 7-10 2010/10/18 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Yasuhito Gotoh, Michito Kawasaki, Hiroshi Tsuji Yasuhito Gotoh, Michito Kawasaki, Hiroshi Tsuji Yasuhito Gotoh, Michito Kawasaki, Hiroshi Tsuji Observation of Field Emission Current Fluctuation with In Situ Analyzer of Field Emission Devices Observation of Field Emission Current Fluctuation with In Situ Analyzer of Field Emission Devices Observation of Field Emission Current Fluctuation with In Situ Analyzer of Field Emission Devices IDW'10: PROCEEDINGS OF THE 17TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 2041-2044 IDW'10: PROCEEDINGS OF THE 17TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 2041-2044 IDW'10: PROCEEDINGS OF THE 17TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 2041-2044 2010 英語 公開
Wataru Ohue, Keita Ikeda, Keisuke Endo, Yasuhito Gotoh, Hiroshi Tsuji Wataru Ohue, Keita Ikeda, Keisuke Endo, Yasuhito Gotoh, Hiroshi Tsuji Wataru Ohue, Keita Ikeda, Keisuke Endo, Yasuhito Gotoh, Hiroshi Tsuji Performance of Hafnium Nitride Field Emitter Array in Tough Circumstance Performance of Hafnium Nitride Field Emitter Array in Tough Circumstance Performance of Hafnium Nitride Field Emitter Array in Tough Circumstance IDW'10: PROCEEDINGS OF THE 17TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 2029-2032 IDW'10: PROCEEDINGS OF THE 17TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 2029-2032 IDW'10: PROCEEDINGS OF THE 17TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 2029-2032 2010 英語 公開
Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa Dan Nicolaescu, Shigeki Sakai, Yasuhito Gotoh, Junzo Ishikawa P1-6: Compensation of divergence of space charge dominated ion beams using electron injection and confinement in non-uniform magnetic fields P1-6: Compensation of divergence of space charge dominated ion beams using electron injection and confinement in non-uniform magnetic fields P1-6: Compensation of divergence of space charge dominated ion beams using electron injection and confinement in non-uniform magnetic fields 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, 40-41 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, 40-41 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, 40-41 2010 英語 研究発表ペーパー・要旨(国際会議) 公開
Yasuhito Gotoh, Yoshiki Sakai, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Yasuhito Gotoh, Yoshiki Sakai, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Yasuhito Gotoh, Yoshiki Sakai, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai 10.4: Differences in deceleration performance of electrons emitted from field emitter arrays with different electrode geometries 10.4: Differences in deceleration performance of electrons emitted from field emitter arrays with different electrode geometries 10.4: Differences in deceleration performance of electrons emitted from field emitter arrays with different electrode geometries 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, 203-204 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, 203-204 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, 203-204 2010 英語 研究発表ペーパー・要旨(国際会議) 公開
後藤康仁, 池田啓太, 宮田雄高, 遠藤恵介, 辻 博司 後藤康仁, 池田啓太, 宮田雄高, 遠藤恵介, 辻 博司 窒化ハフニウム電界放出電子源の動作特性 窒化ハフニウム電界放出電子源の動作特性 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 109, 230, 17-20 電子情報通信学会技術研究報告. ED, 電子デバイス (電子管と真空ナノエレクトロニクス及びその評価技術), 109, 230, 17-20 , 109, 230, 17-20 2009/10/08 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
K. Endo, Y. Miyata, K. Ikeda, Y. Gotoh, H. Tsuji, J. Ishikawa K. Endo, Y. Miyata, K. Ikeda, Y. Gotoh, H. Tsuji, J. Ishikawa K. Endo, Y. Miyata, K. Ikeda, Y. Gotoh, H. Tsuji, J. Ishikawa Measurement of work function of hafnium nitride films prepared by RF magnetron sputtering Measurement of work function of hafnium nitride films prepared by RF magnetron sputtering Measurement of work function of hafnium nitride films prepared by RF magnetron sputtering Proceedings of the 10th International Symposium on Sputtering and Plasma Processes, 535-538 Proceedings of the 10th International Symposium on Sputtering and Plasma Processes, 535-538 Proceedings of the 10th International Symposium on Sputtering and Plasma Processes, 535-538 2009/07 英語 研究発表ペーパー・要旨(国際会議) 公開
Y. Gotoh, A. Oowada, Y. Sakai, M. Takeuchi, M. Nagao, S. Sakai, H. Tsuji, T. Kimoto, J. Ishikawa Y. Gotoh, A. Oowada, Y. Sakai, M. Takeuchi, M. Nagao, S. Sakai, H. Tsuji, T. Kimoto, J. Ishikawa Y. Gotoh, A. Oowada, Y. Sakai, M. Takeuchi, M. Nagao, S. Sakai, H. Tsuji, T. Kimoto, J. Ishikawa Fabrication of silicon gate electrode of field emitter arrays by RF magnetron sputtering Fabrication of silicon gate electrode of field emitter arrays by RF magnetron sputtering Fabrication of silicon gate electrode of field emitter arrays by RF magnetron sputtering Proceedings of the 10th International Symposium on Sputtering and Plasma Processes, 219-222 Proceedings of the 10th International Symposium on Sputtering and Plasma Processes, 219-222 Proceedings of the 10th International Symposium on Sputtering and Plasma Processes, 219-222 2009/07 英語 研究発表ペーパー・要旨(国際会議) 公開
Y. Gotoh Y. Gotoh Y. Gotoh Analysis of field emission characteristics of field stabilized liquid cone Analysis of field emission characteristics of field stabilized liquid cone Analysis of field emission characteristics of field stabilized liquid cone IDW '09 - Proceedings of the 16th International Display Workshops, 3, 2015-2018 IDW '09 - Proceedings of the 16th International Display Workshops, 3, 2015-2018 IDW '09 - Proceedings of the 16th International Display Workshops, 3, 2015-2018 2009 英語 研究発表ペーパー・要旨(国際会議) 公開
Keita Ikeda, Yuko Miyata, Keisuke Endo, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa Keita Ikeda, Yuko Miyata, Keisuke Endo, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa Keita Ikeda, Yuko Miyata, Keisuke Endo, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa Hafnium nitride field emitter array for field emission amplifier Hafnium nitride field emitter array for field emission amplifier Hafnium nitride field emitter array for field emission amplifier Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 81-82 Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 81-82 Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 81-82 2009 英語 研究発表ペーパー・要旨(国際会議) 公開
Shuhei Taguchi, Mitsuaki Takeuchi, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Shuhei Taguchi, Mitsuaki Takeuchi, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Shuhei Taguchi, Mitsuaki Takeuchi, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa, Shigeki Sakai Formation of low energy electron beam with silicon field emitter arrays for space charge compensation in low-energy ion-implantation system Formation of low energy electron beam with silicon field emitter arrays for space charge compensation in low-energy ion-implantation system Formation of low energy electron beam with silicon field emitter arrays for space charge compensation in low-energy ion-implantation system Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 201-202 Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 201-202 Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 201-202 2009 英語 公開
M. Takeuchi, S. Taguchi, Y. Gotoh, H. Tsuji, J. Ishikawa, S. Sakai M. Takeuchi, S. Taguchi, Y. Gotoh, H. Tsuji, J. Ishikawa, S. Sakai M. Takeuchi, S. Taguchi, Y. Gotoh, H. Tsuji, J. Ishikawa, S. Sakai Application of silicon field emitter arrays for space-charge compensation of low energy ion beam Application of silicon field emitter arrays for space-charge compensation of low energy ion beam Application of silicon field emitter arrays for space-charge compensation of low energy ion beam Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 93-94 Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 93-94 Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 93-94 2009 英語 公開
Michito Kawasaki, Zhen He, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa Michito Kawasaki, Zhen He, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa Michito Kawasaki, Zhen He, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa Development of in situ analyzer of field emission devices Development of in situ analyzer of field emission devices Development of in situ analyzer of field emission devices Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 123-124 Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 123-124 Technical Digest - 2009 22nd International Vacuum Nanoelectronics Conference, IVNC 2009, 123-124 2009 英語 公開
竹内光明, 後藤康仁, 辻 博司, 酒井滋樹, 木本恒暢, 石川順三 竹内光明, 後藤康仁, 辻 博司, 酒井滋樹, 木本恒暢, 石川順三 シリコン微小電子源のイオンビーム空間電荷中和への応用 シリコン微小電子源のイオンビーム空間電荷中和への応用 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 108, 177 (ED2008 109-123), 49-52 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 108, 177 (ED2008 109-123), 49-52 , 108, 177 (ED2008 109-123), 49-52 2008/08/04 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
後藤康仁, 河崎道人, 辻 博司, 石川順三 後藤康仁, 河崎道人, 辻 博司, 石川順三 電界電子放出特性その場解析アナログ回路の改良 電界電子放出特性その場解析アナログ回路の改良 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 108, 177 (ED2018 109-123), 45-48 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 108, 177 (ED2018 109-123), 45-48 , 108, 177 (ED2018 109-123), 45-48 2008/08/04 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Y. Gotoh, M. Kawasaki, H. Tsuji, J. Ishikawa Y. Gotoh, M. Kawasaki, H. Tsuji, J. Ishikawa Y. Gotoh, M. Kawasaki, H. Tsuji, J. Ishikawa Improvement of in situ analyzer of field emission properties Improvement of in situ analyzer of field emission properties Improvement of in situ analyzer of field emission properties IDW \\'08 - Proceedings of the 15th International Display Workshops, 3, 2073-2076 IDW \\'08 - Proceedings of the 15th International Display Workshops, 3, 2073-2076 IDW \\'08 - Proceedings of the 15th International Display Workshops, 3, 2073-2076 2008 英語 公開
N. Arai, H. Tsuji, K. Kojima, K. Adachi, H. Kotaki, T. Ishibashi, Y. Gotoh, J. Ishikawa N. Arai, H. Tsuji, K. Kojima, K. Adachi, H. Kotaki, T. Ishibashi, Y. Gotoh, J. Ishikawa N. Arai, H. Tsuji, K. Kojima, K. Adachi, H. Kotaki, T. Ishibashi, Y. Gotoh, J. Ishikawa Cathode and Photo Luminescence of Silicon Dioxide Layer Implanted with Ge Negative Ions at Multi-Energy Cathode and Photo Luminescence of Silicon Dioxide Layer Implanted with Ge Negative Ions at Multi-Energy Cathode and Photo Luminescence of Silicon Dioxide Layer Implanted with Ge Negative Ions at Multi-Energy PROCEEDINGS OF THE 17TH INTERNATIONAL VACUUM CONGRESS/13TH INTERNATIONAL CONFERENCE ON SURFACE SCIENCE/INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 100, 1 PROCEEDINGS OF THE 17TH INTERNATIONAL VACUUM CONGRESS/13TH INTERNATIONAL CONFERENCE ON SURFACE SCIENCE/INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 100, 1 PROCEEDINGS OF THE 17TH INTERNATIONAL VACUUM CONGRESS/13TH INTERNATIONAL CONFERENCE ON SURFACE SCIENCE/INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 100, 1 2008 英語 公開
Y. Gotoh, Y. Miyata, N. Setojima, H. Tsuji, J. Ishikawa Y. Gotoh, Y. Miyata, N. Setojima, H. Tsuji, J. Ishikawa Y. Gotoh, Y. Miyata, N. Setojima, H. Tsuji, J. Ishikawa Properties of insulating layer of gated FEAs with transition metal nitride cathode Properties of insulating layer of gated FEAs with transition metal nitride cathode Properties of insulating layer of gated FEAs with transition metal nitride cathode IDW '07: PROCEEDINGS OF THE 14TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 2213-2216 IDW '07: PROCEEDINGS OF THE 14TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 2213-2216 IDW '07: PROCEEDINGS OF THE 14TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 3, 2213-2216 2007 英語 研究発表ペーパー・要旨(国際会議) 公開
A. Oowada, M. Takeuchi, Y. Sakai, Y. Gotoh, M. Nagao, H. Tsuji, J. Ishikawa, S. Sakai, T. Kimoto A. Oowada, M. Takeuchi, Y. Sakai, Y. Gotoh, M. Nagao, H. Tsuji, J. Ishikawa, S. Sakai, T. Kimoto A. Oowada, M. Takeuchi, Y. Sakai, Y. Gotoh, M. Nagao, H. Tsuji, J. Ishikawa, S. Sakai, T. Kimoto Extension of lifetime of silicon field emitter arrays in oxygen ambient by carbon negative ion implantation Extension of lifetime of silicon field emitter arrays in oxygen ambient by carbon negative ion implantation Extension of lifetime of silicon field emitter arrays in oxygen ambient by carbon negative ion implantation 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 200-+ 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 200-+ 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 200-+ 2007 英語 研究発表ペーパー・要旨(国際会議) 公開
M. Takeuchi, T. Kojima, A. Oowada, Y. Gotoh, M. Nagao, H. Tsuji, J. IShikawa, S. Sakai, T. Kimoto M. Takeuchi, T. Kojima, A. Oowada, Y. Gotoh, M. Nagao, H. Tsuji, J. IShikawa, S. Sakai, T. Kimoto M. Takeuchi, T. Kojima, A. Oowada, Y. Gotoh, M. Nagao, H. Tsuji, J. IShikawa, S. Sakai, T. Kimoto Electron emission properties of silicon field emitter arrays in gaseous ambient for charge compensation device Electron emission properties of silicon field emitter arrays in gaseous ambient for charge compensation device Electron emission properties of silicon field emitter arrays in gaseous ambient for charge compensation device 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 131-+ 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 131-+ 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 131-+ 2007 英語 研究発表ペーパー・要旨(国際会議) 公開
Y. Gotoh, N. Setojima, Y. Miyata, T. Kanzawa, H. Tsuji, J. Ishikawa Y. Gotoh, N. Setojima, Y. Miyata, T. Kanzawa, H. Tsuji, J. Ishikawa Y. Gotoh, N. Setojima, Y. Miyata, T. Kanzawa, H. Tsuji, J. Ishikawa Fabrication and field emission properties of gated field emitter arrays with hafnium nitride cathode Fabrication and field emission properties of gated field emitter arrays with hafnium nitride cathode Fabrication and field emission properties of gated field emitter arrays with hafnium nitride cathode 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 127-128 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 127-128 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 127-128 2007 英語 研究発表ペーパー・要旨(国際会議) 公開
D. Nicolaescu, V. Filip, Y. Gotoh, J. Ishikawa D. Nicolaescu, V. Filip, Y. Gotoh, J. Ishikawa D. Nicolaescu, V. Filip, Y. Gotoh, J. Ishikawa Modeling of linear CNT nanotriodes with improved field uniformity Modeling of linear CNT nanotriodes with improved field uniformity Modeling of linear CNT nanotriodes with improved field uniformity 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 137-+ 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 137-+ 2007 IEEE 20TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 137-+ 2007 英語 研究発表ペーパー・要旨(国際会議) 公開
N. Arai, H. Tsuji, N. Gotoh, T. Minotani, T. Ishibashi, K. Adachi, H. Kotaki, Y. Gotoh, J. Ishikawa N. Arai, H. Tsuji, N. Gotoh, T. Minotani, T. Ishibashi, K. Adachi, H. Kotaki, Y. Gotoh, J. Ishikawa N. Arai, H. Tsuji, N. Gotoh, T. Minotani, T. Ishibashi, K. Adachi, H. Kotaki, Y. Gotoh, J. Ishikawa Nanocrystal Formation of Metals in Thermally Grown Thin Silicon Dioxide Layer by Ion Implantation and Thermal Diffusion of Implanted Atoms in Heat Treatment Nanocrystal Formation of Metals in Thermally Grown Thin Silicon Dioxide Layer by Ion Implantation and Thermal Diffusion of Implanted Atoms in Heat Treatment Nanocrystal Formation of Metals in Thermally Grown Thin Silicon Dioxide Layer by Ion Implantation and Thermal Diffusion of Implanted Atoms in Heat Treatment PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 61, 1, 41-45 PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 61, 1, 41-45 PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 61, 1, 41-45 2007 英語 公開
H. Tsuji, N. Arai, N. Gotoh, T. Minotani, K. Kojima, K. Adachi, H. Kotaki, T. Ishibashi, Y. Gotoh, J. Ishikawa H. Tsuji, N. Arai, N. Gotoh, T. Minotani, K. Kojima, K. Adachi, H. Kotaki, T. Ishibashi, Y. Gotoh, J. Ishikawa H. Tsuji, N. Arai, N. Gotoh, T. Minotani, K. Kojima, K. Adachi, H. Kotaki, T. Ishibashi, Y. Gotoh, J. Ishikawa Germanium nanoparticles formed in silicon dioxide layer by multi-energy implantation and oxidation state of Ge atoms Germanium nanoparticles formed in silicon dioxide layer by multi-energy implantation and oxidation state of Ge atoms Germanium nanoparticles formed in silicon dioxide layer by multi-energy implantation and oxidation state of Ge atoms PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 61, 1, 1196-1201 PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 61, 1, 1196-1201 PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON NANOSCIENCE AND TECHNOLOGY, 61, 1, 1196-1201 2007 英語 公開
後藤康仁, 瀬戸島範幸, 神澤太郎, 小島俊彦, 藤井亮一, 辻 博司, 石川順三 後藤康仁, 瀬戸島範幸, 神澤太郎, 小島俊彦, 藤井亮一, 辻 博司, 石川順三 窒化ハフニウムを陰極とした電界放出電子源の作製 窒化ハフニウムを陰極とした電界放出電子源の作製 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 106, 200 (ED2006 117-134), 61-62 電子情報通信学会技術研究報告. ED, 電子デバイス(電子管と真空ナノエレクトロニクス及びその評価技術), 106, 200 (ED2006 117-134), 61-62 , 106, 200 (ED2006 117-134), 61-62 2006/08/04 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Y. Gotoh, N. Setojima, T. Kanzawa, H. Tsuji, J. Ishikawa Y. Gotoh, N. Setojima, T. Kanzawa, H. Tsuji, J. Ishikawa Y. Gotoh, N. Setojima, T. Kanzawa, H. Tsuji, J. Ishikawa Fabrication of field emission arrays with hafnium nitride cathode Fabrication of field emission arrays with hafnium nitride cathode Fabrication of field emission arrays with hafnium nitride cathode IDW '06: PROCEEDINGS OF THE 13TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 2, 1557-1560 IDW '06: PROCEEDINGS OF THE 13TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 2, 1557-1560 IDW '06: PROCEEDINGS OF THE 13TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 2, 1557-1560 2006 英語 研究発表ペーパー・要旨(国際会議) 公開
D. Nicolaescu, V. Filip, G. H. Takaoka, Y. Gotoh, J. Ishikawa D. Nicolaescu, V. Filip, G. H. Takaoka, Y. Gotoh, J. Ishikawa D. Nicolaescu, V. Filip, G. H. Takaoka, Y. Gotoh, J. Ishikawa Analytical modeling for the electron emission properties of carbon nanotube arrays Analytical modeling for the electron emission properties of carbon nanotube arrays Analytical modeling for the electron emission properties of carbon nanotube arrays IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium, 7-8 IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium, 7-8 IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium, 7-8 2006 英語 公開
Y. Gotoh, K. Mukai, Y. Kawamura, H. Tsuji, J. Ishikawa Y. Gotoh, K. Mukai, Y. Kawamura, H. Tsuji, J. Ishikawa Y. Gotoh, K. Mukai, Y. Kawamura, H. Tsuji, J. Ishikawa Work function of low index crystal facet of tungsten evaluated by Seppen-Katamuki analysis Work function of low index crystal facet of tungsten evaluated by Seppen-Katamuki analysis Work function of low index crystal facet of tungsten evaluated by Seppen-Katamuki analysis IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium, 27-28 IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium, 27-28 IVNC and IFES 2006 - Technical Digest - l9th International Vacuum Nanoelectronics Conference and 50th International Field Emission Symposium, 27-28 2006 英語 研究発表ペーパー・要旨(国際会議) 公開
Y. Gotoh, T. Kojima, A. Oowada, M. Nagao, H. Tsuji, J. Ishikawa, S. Sakai Y. Gotoh, T. Kojima, A. Oowada, M. Nagao, H. Tsuji, J. Ishikawa, S. Sakai Y. Gotoh, T. Kojima, A. Oowada, M. Nagao, H. Tsuji, J. Ishikawa, S. Sakai Electron emission properties of plasma treated silicon field emission arrays in gaseous ambient Electron emission properties of plasma treated silicon field emission arrays in gaseous ambient Electron emission properties of plasma treated silicon field emission arrays in gaseous ambient Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, 2, 865-868 Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, 2, 865-868 Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, 2, 865-868 2006 英語 研究発表ペーパー・要旨(国際会議) 公開
Y. Gotoh, C. Ichihara, A. Kobayashi, T. Hirano, H. Tsuji, J. Ishikawa Y. Gotoh, C. Ichihara, A. Kobayashi, T. Hirano, H. Tsuji, J. Ishikawa Y. Gotoh, C. Ichihara, A. Kobayashi, T. Hirano, H. Tsuji, J. Ishikawa Discharge characteristics of helium under inhomogeneous pressure distribution Discharge characteristics of helium under inhomogeneous pressure distribution Discharge characteristics of helium under inhomogeneous pressure distribution Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, 2, 670-673 Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, 2, 670-673 Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, 2, 670-673 2006 英語 研究発表ペーパー・要旨(国際会議) 公開
Y. Kawamura, Y. Gotoh, T. Niiya, H. Tsuji, J. Ishikawa, A. Hosono, S. Okuda Y. Kawamura, Y. Gotoh, T. Niiya, H. Tsuji, J. Ishikawa, A. Hosono, S. Okuda Y. Kawamura, Y. Gotoh, T. Niiya, H. Tsuji, J. Ishikawa, A. Hosono, S. Okuda Estimate of structural modification of laser irradiated carbon nanotubes by Seppen-Katamuki analysis Estimate of structural modification of laser irradiated carbon nanotubes by Seppen-Katamuki analysis Estimate of structural modification of laser irradiated carbon nanotubes by Seppen-Katamuki analysis IDW/AD '05: PROCEEDINGS OF THE 12TH INTERNATIONAL DISPLAY WORKSHOPS IN CONJUNCTION WITH ASIA DISPLAY 2005, VOLS 1 AND 2, 1651-1654 IDW/AD '05: PROCEEDINGS OF THE 12TH INTERNATIONAL DISPLAY WORKSHOPS IN CONJUNCTION WITH ASIA DISPLAY 2005, VOLS 1 AND 2, 1651-1654 IDW/AD '05: PROCEEDINGS OF THE 12TH INTERNATIONAL DISPLAY WORKSHOPS IN CONJUNCTION WITH ASIA DISPLAY 2005, VOLS 1 AND 2, 1651-1654 2005 英語 公開
T. Kojima, K. Nakamura, Y. Gotoh, M. Nagao, H. Tsuji, J. Ishikawa, T. Ikejiri, S. Sakai, S. Umisedo, N. Nagai T. Kojima, K. Nakamura, Y. Gotoh, M. Nagao, H. Tsuji, J. Ishikawa, T. Ikejiri, S. Sakai, S. Umisedo, N. Nagai T. Kojima, K. Nakamura, Y. Gotoh, M. Nagao, H. Tsuji, J. Ishikawa, T. Ikejiri, S. Sakai, S. Umisedo, N. Nagai Emission characteristics of silicon field emitter arrays as space charge and wafer charging neutralizer in ion implanter Emission characteristics of silicon field emitter arrays as space charge and wafer charging neutralizer in ion implanter Emission characteristics of silicon field emitter arrays as space charge and wafer charging neutralizer in ion implanter Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference, 2005, 120-121 Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference, 2005, 120-121 Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference, 2005, 120-121 2005 英語 研究発表ペーパー・要旨(国際会議) 公開
Y. Gotoh, Y. Kawamura, T. Niiya, H. Tsuji, J. Ishikawa, A. Hosono, S. Okuda Y. Gotoh, Y. Kawamura, T. Niiya, H. Tsuji, J. Ishikawa, A. Hosono, S. Okuda Y. Gotoh, Y. Kawamura, T. Niiya, H. Tsuji, J. Ishikawa, A. Hosono, S. Okuda Seppen-Katamuki analysis of field emission properties of carbon nanotubes irradiated by different laser fluences Seppen-Katamuki analysis of field emission properties of carbon nanotubes irradiated by different laser fluences Seppen-Katamuki analysis of field emission properties of carbon nanotubes irradiated by different laser fluences Technical Digest of the 18th International Vacuum Nanoelectronics Conference, IVNC 2005, 2005, 149-150 Technical Digest of the 18th International Vacuum Nanoelectronics Conference, IVNC 2005, 2005, 149-150 Technical Digest of the 18th International Vacuum Nanoelectronics Conference, IVNC 2005, 2005, 149-150 2005 英語 研究発表ペーパー・要旨(国際会議) 公開
Soichiro Okuda, Akihiko Hosono, Tetsuya Shiroishi, Kunihiko Nishimura, Shuhei Nakata, Mikio Takai, Junzo Ishikawa, Yasuhito Gotoh, Sashiro Uemura, Junko Yotani, Hiroyuki Kurachi, Nobuaki Hayashi, Makoto Okai, Tsunehiko Sugawara, Takahiro Murakami, Yuichi Kuroki Soichiro Okuda, Akihiko Hosono, Tetsuya Shiroishi, Kunihiko Nishimura, Shuhei Nakata, Mikio Takai, Junzo Ishikawa, Yasuhito Gotoh, Sashiro Uemura, Junko Yotani, Hiroyuki Kurachi, Nobuaki Hayashi, Makoto Okai, Tsunehiko Sugawara, Takahiro Murakami, Yuichi Kuroki Soichiro Okuda, Akihiko Hosono, Tetsuya Shiroishi, Kunihiko Nishimura, Shuhei Nakata, Mikio Takai, Junzo Ishikawa, Yasuhito Gotoh, Sashiro Uemura, Junko Yotani, Hiroyuki Kurachi, Nobuaki Hayashi, Makoto Okai, Tsunehiko Sugawara, Takahiro Murakami, Yuichi Kuroki Development of key technologies for carbon nanotube FEDs in Japanese national project Development of key technologies for carbon nanotube FEDs in Japanese national project Development of key technologies for carbon nanotube FEDs in Japanese national project Technical Digest of the 18th International Vacuum Nanoelectronics Conference, IVNC 2005, 2005, 58-59 Technical Digest of the 18th International Vacuum Nanoelectronics Conference, IVNC 2005, 2005, 58-59 Technical Digest of the 18th International Vacuum Nanoelectronics Conference, IVNC 2005, 2005, 58-59 2005 英語 研究発表ペーパー・要旨(国際会議) 公開
Nobutoshi Arai, Hiroshi Tsuji, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Nobutoshi Arai, Hiroshi Tsuji, Kouichirou Adachi, Hiroshi Kotaki, Yasuhito Gotoh, Junzo Ishikawa Silver nanoparticles formation in thermal oxide on silicon by negative-ion implantation Silver nanoparticles formation in thermal oxide on silicon by negative-ion implantation Silver nanoparticles formation in thermal oxide on silicon by negative-ion implantation IMFEDK 2004 - International Meeting for Future of Electron Devices, Kansai, 37-38 IMFEDK 2004 - International Meeting for Future of Electron Devices, Kansai, 37-38 IMFEDK 2004 - International Meeting for Future of Electron Devices, Kansai, 37-38 2004 英語 公開
Y Gotoh, Y Kawamura, K Ishizu, H Tsuji, J Ishikawa, S Nakata, S Okuda Y Gotoh, Y Kawamura, K Ishizu, H Tsuji, J Ishikawa, S Nakata, S Okuda Y Gotoh, Y Kawamura, K Ishizu, H Tsuji, J Ishikawa, S Nakata, S Okuda Seppen-Katamuki analysis of electron emission from chemical vapor deposited multiwall carbon nanotubes with and without laser irradiation Seppen-Katamuki analysis of electron emission from chemical vapor deposited multiwall carbon nanotubes with and without laser irradiation Seppen-Katamuki analysis of electron emission from chemical vapor deposited multiwall carbon nanotubes with and without laser irradiation TECHNICAL DIGEST OF THE 17TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 42-43 TECHNICAL DIGEST OF THE 17TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 42-43 TECHNICAL DIGEST OF THE 17TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 42-43 2004 英語 研究発表ペーパー・要旨(国際会議) 公開
Y Gotoh, K Nakamura, T Kojima, H Tsuji, J Ishikawa, T Ikejiri, S Umisedo, S Sakai, N Nagai Y Gotoh, K Nakamura, T Kojima, H Tsuji, J Ishikawa, T Ikejiri, S Umisedo, S Sakai, N Nagai Y Gotoh, K Nakamura, T Kojima, H Tsuji, J Ishikawa, T Ikejiri, S Umisedo, S Sakai, N Nagai Electron emission properties of gated silicon field emitter arrays for charge neutralization device in ion implantation system Electron emission properties of gated silicon field emitter arrays for charge neutralization device in ion implantation system Electron emission properties of gated silicon field emitter arrays for charge neutralization device in ion implantation system TECHNICAL DIGEST OF THE 17TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 116-117 TECHNICAL DIGEST OF THE 17TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 116-117 TECHNICAL DIGEST OF THE 17TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 116-117 2004 英語 研究発表ペーパー・要旨(国際会議) 公開
J. Ishikawa, H. Tsuji, H. Satoh, Y. Gotoh J. Ishikawa, H. Tsuji, H. Satoh, Y. Gotoh J. Ishikawa, H. Tsuji, H. Satoh, Y. Gotoh Negative-ion implantation into polymers and its application to nerve regeneration guide tube Negative-ion implantation into polymers and its application to nerve regeneration guide tube Negative-ion implantation into polymers and its application to nerve regeneration guide tube Transactions - 7th World Biomaterials Congress, 641- Transactions - 7th World Biomaterials Congress, 641- Transactions - 7th World Biomaterials Congress, 641- 2004 英語 公開
H Sato, H Tsuji, M Izukawa, H Sasaki, Y Utsumi, Y Gotoh, J Ishikawa H Sato, H Tsuji, M Izukawa, H Sasaki, Y Utsumi, Y Gotoh, J Ishikawa H Sato, H Tsuji, M Izukawa, H Sasaki, Y Utsumi, Y Gotoh, J Ishikawa Protein adsorption on carbon-negative ion (C-)-implanted polystyrene as neuronal guidance. Protein adsorption on carbon-negative ion (C-)-implanted polystyrene as neuronal guidance. Protein adsorption on carbon-negative ion (C-)-implanted polystyrene as neuronal guidance. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 225, U713-U713 ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 225, U713-U713 ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 225, U713-U713 2003/03 英語 研究発表ペーパー・要旨(国際会議) 公開
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J Ishikawa, Y Gotoh, K Nakamura, H Tsuji, K Matsuda, N Nagai, S Sakai, T Ikejiri, S Umisedo, N Hamamoto J Ishikawa, Y Gotoh, K Nakamura, H Tsuji, K Matsuda, N Nagai, S Sakai, T Ikejiri, S Umisedo, N Hamamoto J Ishikawa, Y Gotoh, K Nakamura, H Tsuji, K Matsuda, N Nagai, S Sakai, T Ikejiri, S Umisedo, N Hamamoto Energy spread measurement of electrons from field emitter array for ion beam neutralization Energy spread measurement of electrons from field emitter array for ion beam neutralization Energy spread measurement of electrons from field emitter array for ion beam neutralization TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 297-298 TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 297-298 TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 297-298 2003 英語 研究発表ペーパー・要旨(国際会議) 公開
Y Gotoh, MY Liao, H Tsuji, J Ishikawa Y Gotoh, MY Liao, H Tsuji, J Ishikawa Y Gotoh, MY Liao, H Tsuji, J Ishikawa Measurement of field emission characteristics from transition metal nitride and carbide thin films Measurement of field emission characteristics from transition metal nitride and carbide thin films Measurement of field emission characteristics from transition metal nitride and carbide thin films TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 35-36 TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 35-36 TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 35-36 2003 英語 研究発表ペーパー・要旨(国際会議) 公開
MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa MY Liao, Y Gotoh, H Tsuji, J Ishikawa Field electron emission from amorphous AlN and Cr doped AlN films Field electron emission from amorphous AlN and Cr doped AlN films Field electron emission from amorphous AlN and Cr doped AlN films TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 251-252 TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 251-252 TECHNICAL DIGEST OF THE 16TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 251-252 2003 英語 研究発表ペーパー・要旨(国際会議) 公開
Ikejiri T, Sakai S, Umisedo S, Naito K, Nagai N, Nagao M, Kanemaru S, Ishikawa J, Gotoh Y, Tsuji H Ikejiri T, Sakai S, Umisedo S, Naito K, Nagai N, Nagao M, Kanemaru S, Ishikawa J, Gotoh Y, Tsuji H Ikejiri T, Sakai S, Umisedo S, Naito K, Nagai N, Nagao M, Kanemaru S, Ishikawa J, Gotoh Y, Tsuji H The Field Emitter Array for neutralization of positive ion charge in ion implantation system The Field Emitter Array for neutralization of positive ion charge in ion implantation system The Field Emitter Array for neutralization of positive ion charge in ion implantation system Technical Digest of the 16th International Vacuum Microelectronics Conference, 85-86 Technical Digest of the 16th International Vacuum Microelectronics Conference, 85-86 Technical Digest of the 16th International Vacuum Microelectronics Conference, 85-86 2003 公開
Nicolaescu D, Sato T, Nagao M, Filip V, Kanemaru S, Itoh J, Takai MM, Gotoh Y, Ishikawa J Nicolaescu D, Sato T, Nagao M, Filip V, Kanemaru S, Itoh J, Takai MM, Gotoh Y, Ishikawa J Nicolaescu D, Sato T, Nagao M, Filip V, Kanemaru S, Itoh J, Takai MM, Gotoh Y, Ishikawa J Characterization of enhanced field emission from HfC-coated Si emitter arrays through parameter extraction Characterization of enhanced field emission from HfC-coated Si emitter arrays through parameter extraction Characterization of enhanced field emission from HfC-coated Si emitter arrays through parameter extraction Technical Digest of the 16th International Vacuum Microelectronics Conference, 93-94 Technical Digest of the 16th International Vacuum Microelectronics Conference, 93-94 Technical Digest of the 16th International Vacuum Microelectronics Conference, 93-94 2003 公開
辻 博司, 栗田賢一, 本野正徳, 菅原弘允, 後藤康仁, 岸本直樹, 石川順三 辻 博司, 栗田賢一, 本野正徳, 菅原弘允, 後藤康仁, 岸本直樹, 石川順三 銅及び銀負イオン二重注入石英ガラスにおける金属超微粒子による表面プラズモン共鳴光吸収特性の熱処理温度依存性 銅及び銀負イオン二重注入石英ガラスにおける金属超微粒子による表面プラズモン共鳴光吸収特性の熱処理温度依存性 粒子線の先端的応用技術に関するシンポジウム, 12th, 101-104 粒子線の先端的応用技術に関するシンポジウム, 12th, 101-104 , 12th, 101-104 2001/11/19 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Y Gotoh, H Nakahara, T Kondo, H Tsuji, J Ishikawa Y Gotoh, H Nakahara, T Kondo, H Tsuji, J Ishikawa Y Gotoh, H Nakahara, T Kondo, H Tsuji, J Ishikawa Negative- and positive-temperature dependences of electron emission properties of hydrogen- and oxygen-terminated diamond field emitters Negative- and positive-temperature dependences of electron emission properties of hydrogen- and oxygen-terminated diamond field emitters Negative- and positive-temperature dependences of electron emission properties of hydrogen- and oxygen-terminated diamond field emitters IVMC 2000: PROCEEDINGS OF THE 14TH INTERNATIONAL VACUUM MICROELECTRONICES CONFERENCE, 297-298 IVMC 2000: PROCEEDINGS OF THE 14TH INTERNATIONAL VACUUM MICROELECTRONICES CONFERENCE, 297-298 IVMC 2000: PROCEEDINGS OF THE 14TH INTERNATIONAL VACUUM MICROELECTRONICES CONFERENCE, 297-298 2001 英語 研究発表ペーパー・要旨(国際会議) 公開
後藤康仁, 石川順三 後藤康仁, 石川順三 ダイヤモンド薄膜からの電子放出特性とその解釈 ダイヤモンド薄膜からの電子放出特性とその解釈 ニューダイヤモンド, 57, 6-10 ニューダイヤモンド, 57, 6-10 , 57, 6-10 2000 日本語 記事・総説・解説・論説等(学術雑誌) 公開
J Ishikawa, H Tsuji, S Kido, K Kurita, N Kishimoto, Y Gotoh J Ishikawa, H Tsuji, S Kido, K Kurita, N Kishimoto, Y Gotoh J Ishikawa, H Tsuji, S Kido, K Kurita, N Kishimoto, Y Gotoh Negative-ion implanter and formation of metal nanoparticles in glass Negative-ion implanter and formation of metal nanoparticles in glass Negative-ion implanter and formation of metal nanoparticles in glass 2000 INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 745-748 2000 INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 745-748 2000 INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 745-748 2000 英語 研究発表ペーパー・要旨(国際会議) 公開
H Tsuji, H Sasaki, H Sato, Y Gotoh, J Ishikawa H Tsuji, H Sasaki, H Sato, Y Gotoh, J Ishikawa H Tsuji, H Sasaki, H Sato, Y Gotoh, J Ishikawa Ion implantation technique using negative ions for artificial neuron network on polystyrene in cell culture Ion implantation technique using negative ions for artificial neuron network on polystyrene in cell culture Ion implantation technique using negative ions for artificial neuron network on polystyrene in cell culture 2000 INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 809-812 2000 INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 809-812 2000 INTERNATIONAL CONFERENCE ON ION IMPLANTATION TECHNOLOGY, PROCEEDINGS, 809-812 2000 英語 研究発表ペーパー・要旨(国際会議) 公開
辻 博司, 佐藤弘子, 池村慎一, 後藤康仁, 石川順三 辻 博司, 佐藤弘子, 池村慎一, 後藤康仁, 石川順三 Improvement of Neuron Attachment Properties of Polystyrene by Negative Ion Implantation and Induction of Neural Protrusion Outgrowth. Improvement of Neuron Attachment Properties of Polystyrene by Negative Ion Implantation and Induction of Neural Protrusion Outgrowth. Improvement of Neuron Attachment Properties of Polystyrene by Negative Ion Implantation and Induction of Neural Protrusion Outgrowth. 粒子線の先端的応用技術に関するシンポジウム, 9th, 87-90 粒子線の先端的応用技術に関するシンポジウム, 9th, 87-90 , 9th, 87-90 1998/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
後藤康仁, 辻 博司, 石川順三 後藤康仁, 辻 博司, 石川順三 後藤康仁, 辻博司, 石川順三 液体金属イオン源における液体コーン先端の電界強度の放出電流依存性 液体金属イオン源における液体コーン先端の電界強度の放出電流依存性 液体金属イオン源における液体コーン先端の電界強度の放出電流依存性 粒子線の先端的応用技術に関するシンポジウム, 9th, 43-48 粒子線の先端的応用技術に関するシンポジウム, 9th, 43-48 粒子線の先端的応用技術に関するシンポジウム, 9th, 43-48 1998/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
木戸俊介, 三村昌和, 辻 博司, 後藤康仁, 石川順三 木戸俊介, 三村昌和, 辻 博司, 後藤康仁, 石川順三 木戸俊介, 三村昌和, 辻 博司, 後藤康仁, 石川順三 振動球形粉体への銅負イオン注入における注入原子の深さ方向分布と粒子間の均一性の評価 振動球形粉体への銅負イオン注入における注入原子の深さ方向分布と粒子間の均一性の評価 振動球形粉体への銅負イオン注入における注入原子の深さ方向分布と粒子間の均一性の評価 粒子線の先端的応用技術に関するシンポジウム, 9th, 175-178 粒子線の先端的応用技術に関するシンポジウム, 9th, 175-178 粒子線の先端的応用技術に関するシンポジウム, 9th, 175-178 1998/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
辻 博司, 佐藤弘子, 池村慎一, 後藤康仁, 石川順三 辻 博司, 佐藤弘子, 池村慎一, 後藤康仁, 石川順三 辻 博司, 佐藤弘子, 池村慎一, 後藤康仁, 石川順三 銀負イオン注入によるポリスチレン上の細胞接着特性のパターニングと細胞配向性 銀負イオン注入によるポリスチレン上の細胞接着特性のパターニングと細胞配向性 銀負イオン注入によるポリスチレン上の細胞接着特性のパターニングと細胞配向性 粒子線の先端的応用技術に関するシンポジウム, 9th, 83-86 粒子線の先端的応用技術に関するシンポジウム, 9th, 83-86 粒子線の先端的応用技術に関するシンポジウム, 9th, 83-86 1998/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Y. Gotoh, K. Utsumi, M. Nagao, H. Tsuji, J. Ishikawa, T. Nakatani, T. Sakashita, K. Betsui Y. Gotoh, K. Utsumi, M. Nagao, H. Tsuji, J. Ishikawa, T. Nakatani, T. Sakashita, K. Betsui Y. Gotoh, K. Utsumi, M. Nagao, H. Tsuji, J. Ishikawa, T. Nakatani, T. Sakashita, K. Betsui Emission characteristics of Spindt-type field emitter arrays in oxygen ambient Emission characteristics of Spindt-type field emitter arrays in oxygen ambient Emission characteristics of Spindt-type field emitter arrays in oxygen ambient Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC, 101-102 Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC, 101-102 Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC, 101-102 1998 英語 研究発表ペーパー・要旨(国際会議) 公開
M. Nagao, T. Ura, Y. Gotoh, H. Tsuji, J. Ishikawa M. Nagao, T. Ura, Y. Gotoh, H. Tsuji, J. Ishikawa M. Nagao, T. Ura, Y. Gotoh, H. Tsuji, J. Ishikawa Influence of the composition of NbN<sub>x</sub> thin film field emitter array on the emission characteristics Influence of the composition of NbN<sub>x</sub> thin film field emitter array on the emission characteristics Influence of the composition of NbN<sub>x</sub> thin film field emitter array on the emission characteristics Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC, 306-307 Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC, 306-307 Proceedings of the IEEE International Vacuum Microelectronics Conference, IVMC, 306-307 1998 英語 研究発表ペーパー・要旨(国際会議) 公開
近藤利行, 長尾昌善, 後藤康仁, 辻 博司, 石川順三, 宮田浩一, 小橋宏司 近藤利行, 長尾昌善, 後藤康仁, 辻 博司, 石川順三, 宮田浩一, 小橋宏司 近藤利行, 長尾昌善, 後藤康仁, 辻博司, 石川順三, 宮田浩一, 小橋宏司 ボロンドープダイヤモンド薄膜からの電界電子放出特性 ボロンドープダイヤモンド薄膜からの電界電子放出特性 ボロンドープダイヤモンド薄膜からの電界電子放出特性 粒子線の先端的応用技術に関するシンポジウム, 8th, 59-62 粒子線の先端的応用技術に関するシンポジウム, 8th, 59-62 粒子線の先端的応用技術に関するシンポジウム, 8th, 59-62 1997/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
渋谷和真, 富田哲生, 辻 博司, 後藤康仁, 石川順三 渋谷和真, 富田哲生, 辻 博司, 後藤康仁, 石川順三 フッ素負イオンビームによるSi及びSiO<sub>2</sub>エッチング フッ素負イオンビームによるSi及びSiO<sub>2</sub>エッチング 粒子線の先端的応用技術に関するシンポジウム, 8th, 123-126 粒子線の先端的応用技術に関するシンポジウム, 8th, 123-126 , 8th, 123-126 1997/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
辻 博司, 三村昌和, 池村慎一, 後藤康仁, 石川順三 辻 博司, 三村昌和, 池村慎一, 後藤康仁, 石川順三 振動状態における粉体の飛散開始帯電電圧と正イオン及び負イオン注入実験 振動状態における粉体の飛散開始帯電電圧と正イオン及び負イオン注入実験 粒子線の先端的応用技術に関するシンポジウム, 8th, 143-146 粒子線の先端的応用技術に関するシンポジウム, 8th, 143-146 , 8th, 143-146 1997/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
池村慎一, 辻 博司, 佐藤弘子, 池田茂雄, 池本伸郎, 後藤康仁, 石川順三 池村慎一, 辻 博司, 佐藤弘子, 池田茂雄, 池本伸郎, 後藤康仁, 石川順三 池村慎一, 辻 博司, 佐藤弘子, 池田茂雄, 池本伸郎, 後藤康仁, 石川順三 銀負イオン注入によるポリスチレン表面の濡れ性と細胞接着特性の制御 銀負イオン注入によるポリスチレン表面の濡れ性と細胞接着特性の制御 銀負イオン注入によるポリスチレン表面の濡れ性と細胞接着特性の制御 粒子線の先端的応用技術に関するシンポジウム, 8th, 109-112 粒子線の先端的応用技術に関するシンポジウム, 8th, 109-112 粒子線の先端的応用技術に関するシンポジウム, 8th, 109-112 1997/11 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
辻 博司, 石川順三, 後藤康仁 辻 博司, 石川順三, 後藤康仁 辻 博司, 石川順三, 後藤康仁 Current Status of Negative Ion Application Techniques-for the 100th anniversary of discovery of negative ions. Negative-Ion Production by Sputtering and RF Plasma-Sputter-Type Heavy Negative-Ion Source. Current Status of Negative Ion Application Techniques-for the 100th anniversary of discovery of negative ions. Negative-Ion Production by Sputtering and RF Plasma-Sputter-Type Heavy Negative-Ion Source. Current Status of Negative Ion Application Techniques-for the 100th anniversary of discovery of negative ions. Negative-Ion Production by Sputtering and RF Plasma-Sputter-Type Heavy Negative-Ion Source. Ionics, 23, 7, 41-53 Ionics, 23, 7, 41-53 Ionics, 23, 7, 41-53 1997/07 英語 記事・総説・解説・論説等(商業誌、新聞、ウェブメディア) 公開
辻 博司, 富田哲生, 吉原孝明, 後藤康仁, 石川順三 辻 博司, 富田哲生, 吉原孝明, 後藤康仁, 石川順三 辻 博司, 富田哲生, 吉原孝明, 後藤康仁, 石川順三 Current Status of Negative Ion Application Techniques-for the 100th anniversary of discovery of negative ions. CN Molecular-Negative-Ion Production and Film Preparation by CN Negative-Ion Beam Deposition. Current Status of Negative Ion Application Techniques-for the 100th anniversary of discovery of negative ions. CN Molecular-Negative-Ion Production and Film Preparation by CN Negative-Ion Beam Deposition. Current Status of Negative Ion Application Techniques-for the 100th anniversary of discovery of negative ions. CN Molecular-Negative-Ion Production and Film Preparation by CN Negative-Ion Beam Deposition. Ionics, 23, 7, 105-111 Ionics, 23, 7, 105-111 Ionics, 23, 7, 105-111 1997/07 英語 記事・総説・解説・論説等(商業誌、新聞、ウェブメディア) 公開
石川順三, 辻 博司, 後藤康仁, 酒井滋樹, 丹上正安, 松田耕自 石川順三, 辻 博司, 後藤康仁, 酒井滋樹, 丹上正安, 松田耕自 石川順三, 辻 博司, 後藤康仁, 酒井滋樹, 丹上正安, 松田耕自 Current Status of Negative Ion Application Techniques-for the 100th anniversary of discovery of negative ions. Charging Free Negative-ion Implantation Technique and Negative-ion Implanter. Current Status of Negative Ion Application Techniques-for the 100th anniversary of discovery of negative ions. Charging Free Negative-ion Implantation Technique and Negative-ion Implanter. Current Status of Negative Ion Application Techniques-for the 100th anniversary of discovery of negative ions. Charging Free Negative-ion Implantation Technique and Negative-ion Implanter. Ionics, 23, 7, 85-94 Ionics, 23, 7, 85-94 Ionics, 23, 7, 85-94 1997/07 英語 記事・総説・解説・論説等(商業誌、新聞、ウェブメディア) 公開
Ishikawa J, Gotoh Y, Sadakane S, Inoue K, Nagao M, Tsuji H Ishikawa J, Gotoh Y, Sadakane S, Inoue K, Nagao M, Tsuji H Ishikawa J, Gotoh Y, Sadakane S, Inoue K, Nagao M, Tsuji H Emission stability analysis of cone-shaped metal-insulator-semiconductor cathode by Monte Carlo simulation Emission stability analysis of cone-shaped metal-insulator-semiconductor cathode by Monte Carlo simulation Emission stability analysis of cone-shaped metal-insulator-semiconductor cathode by Monte Carlo simulation Ivmc'97 - 1997 10th International Vacuum Microelectronics Conference, Technical Digest, 19-23 Ivmc'97 - 1997 10th International Vacuum Microelectronics Conference, Technical Digest, 19-23 Ivmc'97 - 1997 10th International Vacuum Microelectronics Conference, Technical Digest, 19-23 1997 研究発表ペーパー・要旨(国際会議) 公開
Nagao M, Fujimori Y, Gotoh Y, Tsuji H, Ishikawa J, ELECTR DISPLAY, IND RES ASSOC KOREA Nagao M, Fujimori Y, Gotoh Y, Tsuji H, Ishikawa J, ELECTR DISPLAY, IND RES ASSOC KOREA Nagao M, Fujimori Y, Gotoh Y, Tsuji H, Ishikawa J, ELECTR DISPLAY, IND RES ASSOC KOREA Emission characteristics of ZrN thin film field emitter array fabricated with ion beam assisted deposition technique Emission characteristics of ZrN thin film field emitter array fabricated with ion beam assisted deposition technique Emission characteristics of ZrN thin film field emitter array fabricated with ion beam assisted deposition technique Ivmc'97 - 1997 10th International Vacuum Microelectronics Conference, Technical Digest, 608-612 Ivmc'97 - 1997 10th International Vacuum Microelectronics Conference, Technical Digest, 608-612 Ivmc'97 - 1997 10th International Vacuum Microelectronics Conference, Technical Digest, 608-612 1997 研究発表ペーパー・要旨(国際会議) 公開
三村昌和, 辻 博司, 後藤康仁, 石川順三 三村昌和, 辻 博司, 後藤康仁, 石川順三 三村昌和, 辻 博司, 後藤康仁, 石川順三 分子イオン注入における構成原子の注入深さ分布の一致度の評価 分子イオン注入における構成原子の注入深さ分布の一致度の評価 分子イオン注入における構成原子の注入深さ分布の一致度の評価 粒子線の先端的応用技術に関するシンポジウム, 7th, 25-28 粒子線の先端的応用技術に関するシンポジウム, 7th, 25-28 粒子線の先端的応用技術に関するシンポジウム, 7th, 25-28 1996/11 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
中村修一, 辻 博司, 後藤康仁, 石川順三 中村修一, 辻 博司, 後藤康仁, 石川順三 中村修一, 辻 博司, 後藤康仁, 石川順三 スパッタ型負重イオン源における初速エネルギー分布の測定 スパッタ型負重イオン源における初速エネルギー分布の測定 スパッタ型負重イオン源における初速エネルギー分布の測定 粒子線の先端的応用技術に関するシンポジウム, 7th, 91-94 粒子線の先端的応用技術に関するシンポジウム, 7th, 91-94 粒子線の先端的応用技術に関するシンポジウム, 7th, 91-94 1996/11 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
内海一成, 定金伸治, 長尾昌善, 後藤康仁, 辻 博司, 石川順三 内海一成, 定金伸治, 長尾昌善, 後藤康仁, 辻 博司, 石川順三 内海一成, 定金伸治, 長尾昌善, 後藤康仁, 辻 博司, 石川順三 Moゲートを有するSiフィールドエミッタの作製 Moゲートを有するSiフィールドエミッタの作製 Moゲートを有するSiフィールドエミッタの作製 粒子線の先端的応用技術に関するシンポジウム, 7th, 103-106 粒子線の先端的応用技術に関するシンポジウム, 7th, 103-106 粒子線の先端的応用技術に関するシンポジウム, 7th, 103-106 1996/11 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
J Ishikawa, Y Gotoh, N Fujita, S Nishikawa, H Tsuji J Ishikawa, Y Gotoh, N Fujita, S Nishikawa, H Tsuji J Ishikawa, Y Gotoh, N Fujita, S Nishikawa, H Tsuji Miniaturized liquid gallium field emission electron sources for vacuum microelectronics Miniaturized liquid gallium field emission electron sources for vacuum microelectronics Miniaturized liquid gallium field emission electron sources for vacuum microelectronics IVMC '96 - 9TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, TECHNICAL DIGEST, 34-38 IVMC '96 - 9TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, TECHNICAL DIGEST, 34-38 IVMC '96 - 9TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, TECHNICAL DIGEST, 34-38 1996 英語 研究発表ペーパー・要旨(国際会議) 公開
池田茂雄, 豊田啓孝, 辻 博司, 後藤康仁, 石川順三 池田茂雄, 豊田啓孝, 辻 博司, 後藤康仁, 石川順三 Measurement of Secondary Electrons Emitted in Negative-Ion Implantation. Measurement of Secondary Electrons Emitted in Negative-Ion Implantation. 粒子線の先端的応用技術に関するシンポジウム, 6th, 175-178 粒子線の先端的応用技術に関するシンポジウム, 6th, 175-178 , 6th, 175-178 1995/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
定金伸治, 井上和則, 後藤康仁, 辻 博司, 石川順三 定金伸治, 井上和則, 後藤康仁, 辻 博司, 石川順三 定金伸治, 井上和則, 後藤康仁, 辻 博司, 石川順三 コーン形状を持つMIS型微小電子源の開発 コーン形状を持つMIS型微小電子源の開発 コーン形状を持つMIS型微小電子源の開発 粒子線の先端的応用技術に関するシンポジウム, 6th, 195-198 粒子線の先端的応用技術に関するシンポジウム, 6th, 195-198 粒子線の先端的応用技術に関するシンポジウム, 6th, 195-198 1995/11 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
富田哲生, 辻 博司, 豊田啓孝, 後藤康仁, 石川順三 富田哲生, 辻 博司, 豊田啓孝, 後藤康仁, 石川順三 富田哲生, 辻 博司, 豊田啓孝, 後藤康仁, 石川順三 RFプラズマスパッタ型負重イオン源からの酸素及びフッ素負イオン引き出し特性 RFプラズマスパッタ型負重イオン源からの酸素及びフッ素負イオン引き出し特性 RFプラズマスパッタ型負重イオン源からの酸素及びフッ素負イオン引き出し特性 粒子線の先端的応用技術に関するシンポジウム, 6th, 191-194 粒子線の先端的応用技術に関するシンポジウム, 6th, 191-194 粒子線の先端的応用技術に関するシンポジウム, 6th, 191-194 1995/11 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
辻 博司, 伊藤 一, 豊田啓孝, 南雲正二, 後藤康仁, 石川順三 辻 博司, 伊藤 一, 豊田啓孝, 南雲正二, 後藤康仁, 石川順三 辻 博司, 伊藤 一, 豊田啓孝, 南雲正二, 後藤康仁, 石川順三 負イオンビームによる粉末材料へのスキャッタレス・イオン注入 負イオンビームによる粉末材料へのスキャッタレス・イオン注入 負イオンビームによる粉末材料へのスキャッタレス・イオン注入 電気化学協会学術大会シンポジウム論文集, 62nd, 55-63 電気化学協会学術大会シンポジウム論文集, 62nd, 55-63 電気化学協会学術大会シンポジウム論文集, 62nd, 55-63 1995/05 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
石川順三, 辻 博司, 後藤康仁, 酒井滋樹 石川順三, 辻 博司, 後藤康仁, 酒井滋樹 石川順三, 辻 博司, 後藤康仁, 酒井滋樹 Negative-Ion Beam Material Processing Technology. Negative-Ion Implantation Technique. Negative-Ion Beam Material Processing Technology. Negative-Ion Implantation Technique. Negative-Ion Beam Material Processing Technology. Negative-Ion Implantation Technique. Ionics, 21, 4, 63-75 Ionics, 21, 4, 63-75 Ionics, 21, 4, 63-75 1995/04 英語 記事・総説・解説・論説等(商業誌、新聞、ウェブメディア) 公開
酒井滋樹, 辻 博司, 豊田啓孝, 後藤康仁, 石川順三, 丹上正安, 松田耕自 酒井滋樹, 辻 博司, 豊田啓孝, 後藤康仁, 石川順三, 丹上正安, 松田耕自 200kV中電流負イオン注入装置の開発 200kV中電流負イオン注入装置の開発 粒子線の先端的応用技術に関するシンポジウム, 5th, 23-26 粒子線の先端的応用技術に関するシンポジウム, 5th, 23-26 , 5th, 23-26 1994/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
藤森敬和, 後藤康仁, 辻 博司, 石川順三 藤森敬和, 後藤康仁, 辻 博司, 石川順三 藤森敬和, 後藤康仁, 辻 博司, 石川順三 低エネルギーイオン引き出しを目的とした小型マイクロ波イオン源の開発 低エネルギーイオン引き出しを目的とした小型マイクロ波イオン源の開発 低エネルギーイオン引き出しを目的とした小型マイクロ波イオン源の開発 粒子線の先端的応用技術に関するシンポジウム, 5th, 49-52 粒子線の先端的応用技術に関するシンポジウム, 5th, 49-52 粒子線の先端的応用技術に関するシンポジウム, 5th, 49-52 1994/11 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
辻 博司, 伊藤一, 豊田啓孝, 南雲正二, 後藤康仁, 石川順三 辻 博司, 伊藤一, 豊田啓孝, 南雲正二, 後藤康仁, 石川順三 辻 博司, 伊藤一, 豊田啓孝, 南雲正二, 後藤康仁, 石川順三 粉末へのイオン注入による粒子飛散の基礎現象 粉末へのイオン注入による粒子飛散の基礎現象 粉末へのイオン注入による粒子飛散の基礎現象 粒子線の先端的応用技術に関するシンポジウム, 5th, 185-188 粒子線の先端的応用技術に関するシンポジウム, 5th, 185-188 粒子線の先端的応用技術に関するシンポジウム, 5th, 185-188 1994/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
藤田直史, 大竹利也, 井上和則, 後藤康仁, 辻 博司, 石川順三 藤田直史, 大竹利也, 井上和則, 後藤康仁, 辻 博司, 石川順三 藤田直史, 大竹利也, 井上和則, 後藤康仁, 辻 博司, 石川順三 集束イオンビーム加工による横型極微フィールドエミッタの作製法と形状 集束イオンビーム加工による横型極微フィールドエミッタの作製法と形状 集束イオンビーム加工による横型極微フィールドエミッタの作製法と形状 粒子線の先端的応用技術に関するシンポジウム, 5th, 101-104 粒子線の先端的応用技術に関するシンポジウム, 5th, 101-104 粒子線の先端的応用技術に関するシンポジウム, 5th, 101-104 1994/11 日本語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
豊田啓孝, 辻博司, 南雲正二, 一原主税, 酒井滋樹, 後藤康仁, 石川順三 豊田啓孝, 辻博司, 南雲正二, 一原主税, 酒井滋樹, 後藤康仁, 石川順三 豊田啓孝, 辻博司, 南雲正二, 一原主税, 酒井滋樹, 後藤康仁, 石川順三 負イオン注入における弧立電極の帯電電位モデルとその実験的検証 負イオン注入における弧立電極の帯電電位モデルとその実験的検証 負イオン注入における弧立電極の帯電電位モデルとその実験的検証 粒子線の先端的応用技術に関するシンポジウム, 5th, 209-212 粒子線の先端的応用技術に関するシンポジウム, 5th, 209-212 粒子線の先端的応用技術に関するシンポジウム, 5th, 209-212 1994/11 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Y GOTOH, T OHTAKE, N FUJITA, K INOUE, H TSUJI, J ISHIKAWA Y GOTOH, T OHTAKE, N FUJITA, K INOUE, H TSUJI, J ISHIKAWA Y GOTOH, T OHTAKE, N FUJITA, K INOUE, H TSUJI, J ISHIKAWA FABRICATION OF LATERAL-TYPE THIN-FILM EDGE FIELD EMITTERS BY FOCUSED ION-BEAM TECHNIQUE FABRICATION OF LATERAL-TYPE THIN-FILM EDGE FIELD EMITTERS BY FOCUSED ION-BEAM TECHNIQUE FABRICATION OF LATERAL-TYPE THIN-FILM EDGE FIELD EMITTERS BY FOCUSED ION-BEAM TECHNIQUE IVMC 94 - 7TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 383-386 IVMC 94 - 7TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 383-386 IVMC 94 - 7TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, 383-386 1994 英語 研究発表ペーパー・要旨(国際会議) 公開
酒井滋樹, 後藤康仁, 辻 博司, 豊田啓孝, 石川順三, 丹上正安, 松田耕自 酒井滋樹, 後藤康仁, 辻 博司, 豊田啓孝, 石川順三, 丹上正安, 松田耕自 酒井滋樹, 後藤康仁, 辻 博司, 豊田啓孝, 石川順三, 丹上正安, 松田耕自 Special Number/Negative-Ion Beam Technology and Its Application to Materials Science. The Charging Mechanism of Insulated Electrode in Negative-Ion Implantation. Special Number/Negative-Ion Beam Technology and Its Application to Materials Science. The Charging Mechanism of Insulated Electrode in Negative-Ion Implantation. Special Number/Negative-Ion Beam Technology and Its Application to Materials Science. The Charging Mechanism of Insulated Electrode in Negative-Ion Implantation. Ionics, 20, 1, 65-69 Ionics, 20, 1, 65-69 Ionics, 20, 1, 65-69 1994/01 英語 記事・総説・解説・論説等(商業誌、新聞、ウェブメディア) 公開
豊田啓孝, 辻 博司, 南雲正二, 酒井滋樹, 後藤康仁, 石川順三 豊田啓孝, 辻 博司, 南雲正二, 酒井滋樹, 後藤康仁, 石川順三 豊田啓孝, 辻 博司, 南雲正二, 酒井滋樹, 後藤康仁, 石川順三 Special Number/Negative-Ion Beam Technology and Its Application to Materials Science. Surface Potential Measurement of Negative-Ion-Implanted Insulators by Analysing Secondary Electron Energy Distribution. Special Number/Negative-Ion Beam Technology and Its Application to Materials Science. Surface Potential Measurement of Negative-Ion-Implanted Insulators by Analysing Secondary Electron Energy Distribution. Special Number/Negative-Ion Beam Technology and Its Application to Materials Science. Surface Potential Measurement of Negative-Ion-Implanted Insulators by Analysing Secondary Electron Energy Distribution. Ionics, 20, 1, 71-76 Ionics, 20, 1, 71-76 Ionics, 20, 1, 71-76 1994/01 英語 記事・総説・解説・論説等(商業誌、新聞、ウェブメディア) 公開
辻 博司, 酒井滋樹, 豊田啓孝, 岡山芳央, 後藤康仁, 石川順三 辻 博司, 酒井滋樹, 豊田啓孝, 岡山芳央, 後藤康仁, 石川順三 辻 博司, 酒井滋樹, 豊田啓孝, 岡山芳央, 後藤康仁, 石川順三 Special Number/Negative-Ion Beam Technology and Its Application to Materials Science. Surface Potential Measurement of Insulated Electrode by Negative-Ion Implantation. Special Number/Negative-Ion Beam Technology and Its Application to Materials Science. Surface Potential Measurement of Insulated Electrode by Negative-Ion Implantation. Special Number/Negative-Ion Beam Technology and Its Application to Materials Science. Surface Potential Measurement of Insulated Electrode by Negative-Ion Implantation. Ionics, 20, 1, 57-64 Ionics, 20, 1, 57-64 Ionics, 20, 1, 57-64 1994/01 英語 記事・総説・解説・論説等(商業誌、新聞、ウェブメディア) 公開
辻博司, 石川順三, 後藤康仁 辻博司, 石川順三, 後藤康仁 辻博司, 石川順三, 後藤康仁 Special Number. Negative-Ion Beam Technology and Its Application to Materials Science. Measurement of Heavy Negative Ion Production Efficiencies in Secondary Negative Ion Emission by Sputtering. Special Number. Negative-Ion Beam Technology and Its Application to Materials Science. Measurement of Heavy Negative Ion Production Efficiencies in Secondary Negative Ion Emission by Sputtering. Special Number. Negative-Ion Beam Technology and Its Application to Materials Science. Measurement of Heavy Negative Ion Production Efficiencies in Secondary Negative Ion Emission by Sputtering. Ionics, 20, 1, 19-27 Ionics, 20, 1, 19-27 Ionics, 20, 1, 19-27 1994/01 英語 記事・総説・解説・論説等(商業誌、新聞、ウェブメディア) 公開
辻 博司, 岡山芳央, 石川順三, 後藤康仁 辻 博司, 岡山芳央, 石川順三, 後藤康仁 辻 博司, 岡山芳央, 石川順三, 後藤康仁 Special Number. Negative-Ion Beam Technology and Its Application to Materials Science. Development of Intense Sputter-Type Heavy Negative Ion Sources in DC Operation. Special Number. Negative-Ion Beam Technology and Its Application to Materials Science. Development of Intense Sputter-Type Heavy Negative Ion Sources in DC Operation. Special Number. Negative-Ion Beam Technology and Its Application to Materials Science. Development of Intense Sputter-Type Heavy Negative Ion Sources in DC Operation. Ionics, 20, 1, 29-39 Ionics, 20, 1, 29-39 Ionics, 20, 1, 29-39 1994/01 英語 記事・総説・解説・論説等(商業誌、新聞、ウェブメディア) 公開
Yasuhito Gotoh, Yasunori Taga Yasuhito Gotoh, Yasunori Taga Yasuhito Gotoh, Yasunori Taga Structures and properties of chromium thin films prepared by anisotropic emission effect sputter deposition Structures and properties of chromium thin films prepared by anisotropic emission effect sputter deposition Structures and properties of chromium thin films prepared by anisotropic emission effect sputter deposition Proceedings of the 12th Symposium on Ion Sources and Ion-Assisted Technology, 357-362 Proceedings of the 12th Symposium on Ion Sources and Ion-Assisted Technology, 357-362 Proceedings of the 12th Symposium on Ion Sources and Ion-Assisted Technology, 357-362 1989 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Toshio Kashiwagi, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa, Toshinori Takagi Toshio Kashiwagi, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa, Toshinori Takagi Toshio Kashiwagi, Yasuhito Gotoh, Hiroshi Tsuji, Junzo Ishikawa, Toshinori Takagi Impregnated electrode type liquid metal ion source (VII) - High current ion beam transporting system Impregnated electrode type liquid metal ion source (VII) - High current ion beam transporting system Impregnated electrode type liquid metal ion source (VII) - High current ion beam transporting system Proceedings of the 10th Symposium on Ion Sources and Ion-Assisted Technology, 219-223 Proceedings of the 10th Symposium on Ion Sources and Ion-Assisted Technology, 219-223 Proceedings of the 10th Symposium on Ion Sources and Ion-Assisted Technology, 219-223 1986 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開
Yasuhito Gotoh, Toshio Kashiwagi, Hiroshi Tsuji, Junzo Ishikawa, Toshinori Takagi Yasuhito Gotoh, Toshio Kashiwagi, Hiroshi Tsuji, Junzo Ishikawa, Toshinori Takagi Yasuhito Gotoh, Toshio Kashiwagi, Hiroshi Tsuji, Junzo Ishikawa, Toshinori Takagi IMPREGNATED-ELECTRODE-TYPE LIQUID METAL ION SOURCE (VI) - CHARACTERISTICS OF Au-Sb ALLOY ION SOURCE. IMPREGNATED-ELECTRODE-TYPE LIQUID METAL ION SOURCE (VI) - CHARACTERISTICS OF Au-Sb ALLOY ION SOURCE. IMPREGNATED-ELECTRODE-TYPE LIQUID METAL ION SOURCE (VI) - CHARACTERISTICS OF Au-Sb ALLOY ION SOURCE. Proceedings of the 10th Symposium on Ion Sources and Ion-Assisted Technology, 19-26 Proceedings of the 10th Symposium on Ion Sources and Ion-Assisted Technology, 19-26 Proceedings of the 10th Symposium on Ion Sources and Ion-Assisted Technology, 19-26 1986 英語 研究発表ペーパー・要旨(全国大会、その他学術会議) 公開

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タイトル言語:
講演・口頭発表等
タイトル タイトル(日本語) タイトル(英語) 会議名 会議名(日本語) 会議名(英語) 主催者 主催者(日本語) 主催者(英語) 発表年月日 記述言語 会議種別 公開
Radiation tolerant vacuum image sensor for robots working on removal of fuel debris Radiation tolerant vacuum image sensor for robots working on removal of fuel debris Radiation tolerant vacuum image sensor for robots working on removal of fuel debris International Topical Workshop on Fukushima Daiichi Decommissioning Research International Topical Workshop on Fukushima Daiichi Decommissioning Research International Topical Workshop on Fukushima Daiichi Decommissioning Research 2019/05 英語 公開
Field emitter array with electrostatic focusing electrode for radiation tolerant compact image sensor[招待あり] Field emitter array with electrostatic focusing electrode for radiation tolerant compact image sensor [招待あり] Field emitter array with electrostatic focusing electrode for radiation tolerant compact image sensor [招待あり] 11th International Vacuum Electron Sources Conference 11th International Vacuum Electron Sources Conference 11th International Vacuum Electron Sources Conference 2016/10/19 英語 口頭発表(招待・特別) 公開
フィールドエミッタアレイの開発と電子素子への応用[招待あり] フィールドエミッタアレイの開発と電子素子への応用 [招待あり] 2015年 電子情報通信学会総合大会 2015年 電子情報通信学会総合大会 2015/03/10 日本語 口頭発表(招待・特別) 公開
大電流・低エネルギーイオンビームの発生・輸送とその応用技術[招待あり] 大電流・低エネルギーイオンビームの発生・輸送とその応用技術 [招待あり] 第55回真空に関する連合講演会 第55回真空に関する連合講演会 2014/11/20 日本語 口頭発表(招待・特別) 公開
Production of Extremely Low Energy Electron Beam with Silicon-Based Field Emitter Arrays and Its Application to Space Charge Neutralization of Low-Energy and High-Current Ion Beam[招待あり] Production of Extremely Low Energy Electron Beam with Silicon-Based Field Emitter Arrays and Its Application to Space Charge Neutralization of Low-Energy and High-Current Ion Beam [招待あり] Production of Extremely Low Energy Electron Beam with Silicon-Based Field Emitter Arrays and Its Application to Space Charge Neutralization of Low-Energy and High-Current Ion Beam [招待あり] 2012 25TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC) 2012 25TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC) 2012 25TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC) IEEE COMPUTER SOC IEEE COMPUTER SOC 2012/07/12 英語 口頭発表(招待・特別) 公開
Hafnium nitride thin film cold cathode for field emitter arrays[招待あり] Hafnium nitride thin film cold cathode for field emitter arrays [招待あり] Hafnium nitride thin film cold cathode for field emitter arrays [招待あり] International Meeting for Information Display International Meeting for Information Display International Meeting for Information Display 2011 英語 公開
タイトル言語:
書籍等出版物
著者 著者(日本語) 著者(英語) タイトル タイトル(日本語) タイトル(英語) 出版社 出版社(日本語) 出版社(英語) 出版年月 記述言語 担当区分 公開
最新実用真空技術総覧編集委員会 最新実用真空技術総覧編集委員会 最新実用真空技術総覧 = New practical vacuum technology 最新実用真空技術総覧 = New practical vacuum technology エヌ・ティー・エス エヌ・ティー・エス 2019/02 日本語 共編者 公開
後藤 康仁 後藤 康仁 図解 薄膜技術(共著) 図解 薄膜技術(共著) 培風館 培風館 1999 日本語 分担執筆 公開
タイトル言語:
産業財産権 (特許)
発明者 発明者(日本語) 発明者(英語) 発明の名称 発明の名称(日本語) 発明の名称(英語) 審査の段階 番号 年月 公開
後藤 康仁 後藤 康仁 撮像板及びカメラ 撮像板及びカメラ 特許公開 特開2017-203699 2017/11/16 公開
ニコラエスク ダン, 酒井 滋樹, 石川 順三, 後藤 康仁 ニコラエスク ダン, 酒井 滋樹, 石川 順三, 後藤 康仁 イオンビーム照射装置及びイオンビーム発散抑制方法 イオンビーム照射装置及びイオンビーム発散抑制方法 特許登録 特許第5634992号 2014/10/24 公開
ニコラエスク, ダン, アドリアン, 後藤 康仁, 酒井 滋樹 ニコラエスク, ダン, アドリアン, 後藤 康仁, 酒井 滋樹 イオンビーム照射装置及びイオンビーム発散抑制方法 イオンビーム照射装置及びイオンビーム発散抑制方法 特許登録 特許第5495236号 2014/03/14 公開
ダン ニコラエスク, 後藤 康仁 ダン ニコラエスク, 後藤 康仁 静電レンズシステム 静電レンズシステム 特許公開 特開2013-211231 2013/10/10 公開
ニコラエスク, ダン, アドリアン, 後藤 康仁, 酒井 滋樹 ニコラエスク, ダン, アドリアン, 後藤 康仁, 酒井 滋樹 イオンビーム照射装置及びイオンビーム発散抑制方法 イオンビーム照射装置及びイオンビーム発散抑制方法 特許公開 特開2012-124030 2012/06/28 公開
ニコラエスク ダン, 酒井 滋樹, 石川 順三, 後藤 康仁 ニコラエスク ダン, 酒井 滋樹, 石川 順三, 後藤 康仁 イオンビーム照射装置及びイオンビーム発散抑制方法 イオンビーム照射装置及びイオンビーム発散抑制方法 特許公開 WO2010-143479 2010/12/16 公開
後藤康仁, 石川順三, 一原主税, 小林明, 平野貴之 後藤康仁, 石川順三, 一原主税, 小林明, 平野貴之 イオン源,開孔形成方法 イオン源,開孔形成方法 特許登録 特許4560785 2010/08/06 公開
石川順三, ダン・ニコラエスク, 後藤康仁, 酒井滋樹 石川順三, ダン・ニコラエスク, 後藤康仁, 酒井滋樹 イオンビーム照射装置および半導体デバイスの製造方法 イオンビーム照射装置および半導体デバイスの製造方法 特許登録 特許4514157 2010/05/21 公開
石川 順三, 辻 博司, 後藤 康仁, 竹内 光明, 酒井 滋樹 石川 順三, 辻 博司, 後藤 康仁, 竹内 光明, 酒井 滋樹 電界放出型電子源の製造方法 電界放出型電子源の製造方法 特許公開 特開2009-016233 2009/01/22 公開
後藤 康仁, 辻 博司, 石川 順三 後藤 康仁, 辻 博司, 石川 順三 イオンビームを用いた炭素系多層薄膜の製造方法 イオンビームを用いた炭素系多層薄膜の製造方法 特許公開 特開2006-037158 2006/02/09 公開
一原 主税, 小林 明, 井上 憲一, 後藤 康仁, 國仲 剛, 辻 博司, 石川 順三 一原 主税, 小林 明, 井上 憲一, 後藤 康仁, 國仲 剛, 辻 博司, 石川 順三 イオン源 イオン源 特許公開 特開2004-281129 2004/10/07 公開
石川 順三, 辻 博司, 後藤 康仁, 酒井 滋樹 石川 順三, 辻 博司, 後藤 康仁, 酒井 滋樹 負イオン注入装置 負イオン注入装置 特許登録 特許第3460242号 2003/08/15 公開
石川 順三, 後藤 康仁, 酒井 滋樹 石川 順三, 後藤 康仁, 酒井 滋樹 負イオン注入装置 負イオン注入装置 特許登録 特許第3460241号 2003/08/15 公開
小橋 宏司, 林 和志, 後藤 康仁, 中原 宏勲 小橋 宏司, 林 和志, 後藤 康仁, 中原 宏勲 ダイヤモンド電子源 ダイヤモンド電子源 特許公開 特開2003-031109 2003/01/31 公開
石川 順三, 後藤 康仁, 酒井 滋樹 石川 順三, 後藤 康仁, 酒井 滋樹 負イオン注入装置 負イオン注入装置 特許登録 特許第2998470号 1999/11/05 公開
大脇 健史, 多賀 康訓, 石山 謙吾, 後藤 康仁 大脇 健史, 多賀 康訓, 石山 謙吾, 後藤 康仁 超疎水性複合材料とその製造方法、および光学機能材料 超疎水性複合材料とその製造方法、および光学機能材料 特許登録 特許第2732129号 1997/12/26 公開

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タイトル言語:
学術賞等
賞の名称(日本語) 賞の名称(英語) 授与組織名(日本語) 授与組織名(英語) 年月
平成4年度電気関係学会関西支部連合大会奨励賞 1992
第13回国際真空マイクロエレクトロニクス会議最優秀口頭発表賞第二位 The Best Oral Presentation Award, Second Prize, 13th International Vacuum Microelectronics Conference 2000
日本真空学会第6回会誌賞 一般社団法人日本真空学会 The Vacuum Society of Japan 2017
日本真空学会第4回フェロー 一般社団法人日本真空学会 The Vacuum Society of Japan 2017
外部資金:競争的資金 (科学研究費補助金)
種別 代表/分担 テーマ(日本語) テーマ(英語) 期間
基盤研究(C) 代表 電界放出素子のその場特性評価装置の開発と素子特性ゆらぎの要因解析 2007/04/01〜2009/03/31
挑戦的萌芽研究 代表 針状試料を用いる必要のない新しい3次元アトムプローブの原理検証 (平成28年度分) 2016/04/01〜2017/03/31
基盤研究(B) 代表 300℃・10MGyの耐熱耐放射線性能を持つ電子・撮像デバイス用微小電子源の開発 (平成28年度分) 2016/04/01〜2017/03/31
挑戦的萌芽研究 代表 針状試料を用いる必要のない新しい3次元アトムプローブの原理検証 (平成29年度分) 2017/04/01〜2018/03/31
基盤研究(B) 代表 300℃・10MGyの耐熱耐放射線性能を持つ電子・撮像デバイス用微小電子源の開発 (平成29年度分) 2017/04/01〜2018/03/31
基盤研究(B) 代表 300℃・10MGyの耐熱耐放射線性能を持つ電子・撮像デバイス用微小電子源の開発 (平成30年度分) 2018/04/01〜2019/03/31
担当科目
講義名(日本語) 講義名(英語) 開講期 学部/研究科 年度
電子装置特論 後期 工学研究科 2011/04〜2012/03
真空電子工学1 前期 工学部 2011/04〜2012/03
真空電子工学2 前期 工学部 2011/04〜2012/03
電気回路と微分方程式 前期 工学部 2011/04〜2012/03
電気回路と微分方程式 Electrical Circuit and Differential Equation 前期 全学共通科目 2011/04〜2012/03
電気電子工学実習A 前期 工学部 2011/04〜2012/03
電気電子工学実習B 後期 工学部 2011/04〜2012/03
電気電子工学実験A 前期 工学部 2011/04〜2012/03
電気電子工学実験B 後期 工学部 2011/04〜2012/03
真空電子工学1 Vacuum Electronic Engineering 1 前期 工学部 2012/04〜2013/03
真空電子工学2 Vacuum Electronic Engineering 2 前期 工学部 2012/04〜2013/03
電子装置特論 Charged Particle Beam Apparatus 後期 工学研究科 2012/04〜2013/03
電気回路と微分方程式 Electrical Circuit and Differential Equation 前期 全学共通科目 2012/04〜2013/03
電気回路と微分方程式 Electric Circuits and Differential Equations 前期 工学部 2012/04〜2013/03
真空電子工学1 Vacuum Electronic Engineering 1 前期 工学部 2013/04〜2014/03
真空電子工学2 Vacuum Electronic Engineering 2 前期 工学部 2013/04〜2014/03
電気回路と微分方程式 Electric Circuits and Differential Equations 前期 工学部 2013/04〜2014/03
電子装置特論 Charged Particle Beam Apparatus 後期 工学研究科 2013/04〜2014/03
電気回路と微分方程式 Electrical Circuit and Differential Equation 前期 全学共通科目 2013/04〜2014/03
真空電子工学1 Vacuum Electronic Engineering 1 前期 工学部 2014/04〜2015/03
真空電子工学2 Vacuum Electronic Engineering 2 前期 工学部 2014/04〜2015/03
電気回路と微分方程式 Electric Circuits and Differential Equations 前期 工学部 2014/04〜2015/03
電子装置特論 Charged Particle Beam Apparatus 後期 工学研究科 2014/04〜2015/03
電気回路と微分方程式 Electrical Circuit and Differential Equation 前期 全学共通科目 2014/04〜2015/03
真空電子工学1 Vacuum Electronic Engineering 1 前期 工学部 2015/04〜2016/03
真空電子工学2 Vacuum Electronic Engineering 2 前期 工学部 2015/04〜2016/03
電子装置特論 Charged Particle Beam Apparatus 後期 工学研究科 2015/04〜2016/03
先端科学通論 Advanced Science 後期 総合生存学館 2016/04〜2017/03
真空電子工学1 Vacuum Electronic Engineering 1 前期 工学部 2016/04〜2017/03
電子物性工学 Solid State Physics and Engineering 前期 工学部 2016/04〜2017/03
電子装置特論 Charged Particle Beam Apparatus 後期 工学研究科 2016/04〜2017/03
先端科学通論 Advanced Science 後期 総合生存学館 2017/04〜2018/03
真空電子工学1 Vacuum Electronic Engineering 1 前期 工学部 2017/04〜2018/03
電子物性工学 Solid State Physics and Engineering 前期 工学部 2017/04〜2018/03
電子装置特論 Charged Particle Beam Apparatus 後期 工学研究科 2017/04〜2018/03
電気電子工学実習 Advanced Practice of Electrical and Electronic Engineering 後期 工学部 2017/04〜2018/03
真空電子工学1 Vacuum Electronic Engineering 1 前期 工学部 2018/04〜2019/03
電子物性工学 Solid State Physics and Engineering 前期 工学部 2018/04〜2019/03
電子装置特論 Charged Particle Beam Apparatus 後期 工学研究科 2018/04〜2019/03
電気電子工学実習 Advanced Practice of Electrical and Electronic Engineering 後期 工学部 2018/04〜2019/03
真空電子工学 Vacuum Electronic Engineering 前期 工学部 2019/04〜2020/03
電子物性工学 Solid State Physics and Engineering 前期 工学部 2019/04〜2020/03
電子装置特論 Charged Particle Beam Apparatus 後期 工学研究科 2019/04〜2020/03
電気電子工学実習 Advanced Practice of Electrical and Electronic Engineering 後期 工学部 2019/04〜2020/03
真空電子工学 Vacuum Electronic Engineering 前期 工学部 2020/04〜2021/03
電子装置特論 Charged Particle Beam Apparatus 後期 工学研究科 2020/04〜2021/03
電気電子工学実習 Advanced Practice of Electrical and Electronic Engineering 後期 工学部 2020/04〜2021/03
真空電子工学 Vacuum Electronic Engineering 前期 工学部 2021/04〜2022/03
電子装置特論 Charged Particle Beam Apparatus 後期 工学研究科 2021/04〜2022/03
電気電子工学実習 Advanced Practice of Electrical and Electronic Engineering 後期 工学部 2021/04〜2022/03

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