松尾 二郎

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Name(Kanji/Kana/Abecedarium Latinum)
松尾 二郎/マツオ ジロウ/Matsuo, Jiro
Primary Affiliation(Org1/Job title)
Graduate School of Engineering/Associate Professor
Affiliated programs (koza)
Org1 Job title
Graduate School of Engineering Associate Professor
Faculty
Org1 Job title
工学部
Contact Address
Type Address(Japanese) Address(English)
Office 〒611-0011 京都府宇治市五ヶ庄 Gokasho, Uji, 611-0011
Academic Organizations You are Affiliated to in Japan
Organization name(Japanese) Organization name(English)
応用物理学会
日本物理学会
表面科学会
質量分析学会
日本MRS
Academic Degree
Field(Japanese) Field(English) University(Japanese) University(English) Method
博士(工学) 京都大学
Academic Resume (Undergraduate School/Majors)
University(Japanese) University(English) Faculty(Japanese) Faculty(English) Major(s)(Japanese) Major(s)(English) Completion Status
京都大学 工学部電子工学科 卒業
Work Experience
Period Organization(Japanese) Organization(English) Job title(Japanese) Job title(English)
-
Language of Instruction
Language(japanese) Language(english) Code
英語 English eng
Personal Website(s) (URL(s))
URL
http://sakura.nucleng.kyoto-u.ac.jp/index.html
ORCID ID
https://orcid.org/0000-0003-0684-3677
researchmap URL
https://researchmap.jp/jiro_matsuo
Fields of research (key words)
Key words(Japanese) Key words(English)
イオンビーム、表面衝突、先端分析技術 ion beam, surface collision, material analysis
Published Papers
Author Author(Japanese) Author(English) Title Title(Japanese) Title(English) Bibliography Bibliography(Japanese) Bibliography(English) Publication date Refereed paper Language Publishing type Disclose
Hubert Gnaser, Rika Oki, Takaaki Aoki, Toshio Seki, Jiro Matsuo Hubert Gnaser, Rika Oki, Takaaki Aoki, Toshio Seki, Jiro Matsuo Hubert Gnaser, Rika Oki, Takaaki Aoki, Toshio Seki, Jiro Matsuo Optimized Alkali-Metal Cationization in Secondary Ion Mass Spectrometry of Polyethylene Glycol Oligomers with up to m/z 10000: Dependence on Cation Species and Concentration Optimized Alkali-Metal Cationization in Secondary Ion Mass Spectrometry of Polyethylene Glycol Oligomers with up to m/z 10000: Dependence on Cation Species and Concentration Optimized Alkali-Metal Cationization in Secondary Ion Mass Spectrometry of Polyethylene Glycol Oligomers with up to m/z 10000: Dependence on Cation Species and Concentration ANALYTICAL CHEMISTRY, 92, 1, 1511-1517 ANALYTICAL CHEMISTRY, 92, 1, 1511-1517 ANALYTICAL CHEMISTRY, 92, 1, 1511-1517 2020/01 Refereed English Research paper(scientific journal) Disclose to all
Ryo Hirose, Ayumi Onaka-Masada, Ryosuke Okuyama, Takeshi Kadono, Satoshi Shigematsu, Kouji Kobayashi, Akihiro Suzuki, Yoshihiro Koga, Jiro Matsuo, Kazunari Kurita Ryo Hirose, Ayumi Onaka-Masada, Ryosuke Okuyama, Takeshi Kadono, Satoshi Shigematsu, Kouji Kobayashi, Akihiro Suzuki, Yoshihiro Koga, Jiro Matsuo, Kazunari Kurita Ryo Hirose, Ayumi Onaka-Masada, Ryosuke Okuyama, Takeshi Kadono, Satoshi Shigematsu, Kouji Kobayashi, Akihiro Suzuki, Yoshihiro Koga, Jiro Matsuo, Kazunari Kurita Effect of ramping up rate on end of range defect in multielement molecular-ion (CH3O)-implanted silicon wafers Effect of ramping up rate on end of range defect in multielement molecular-ion (CH3O)-implanted silicon wafers Effect of ramping up rate on end of range defect in multielement molecular-ion (CH3O)-implanted silicon wafers JAPANESE JOURNAL OF APPLIED PHYSICS, 58, 12, ARTN 121002 JAPANESE JOURNAL OF APPLIED PHYSICS, 58, 12, ARTN 121002 JAPANESE JOURNAL OF APPLIED PHYSICS, 58, 12, ARTN 121002 2019/12 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Kiyoshi Miyata, Satoshi Ohmura, Yusuke Arashida, Kohei Ichiyanagi, Ikufumi Katayama, Takayuki Suzuki, Wang Chen, Shota Mizote, Takayoshi Sawa, Takayoshi Yokoya, Toshio Seki, Jiro Matsuo, Tomoharu Tokunaga, Chihiro Itoh, Kenji Tsuruta, Ryo Fukaya, Shunsuke Nozawa, Shin-Ichi Adachi, Jun Takeda, Ken Onda, Shin-Ya Koshihara, Yasuhiko Hayashi, Yuta Nishina Masaki Hada, Kiyoshi Miyata, Satoshi Ohmura, Yusuke Arashida, Kohei Ichiyanagi, Ikufumi Katayama, Takayuki Suzuki, Wang Chen, Shota Mizote, Takayoshi Sawa, Takayoshi Yokoya, Toshio Seki, Jiro Matsuo, Tomoharu Tokunaga, Chihiro Itoh, Kenji Tsuruta, Ryo Fukaya, Shunsuke Nozawa, Shin-Ichi Adachi, Jun Takeda, Ken Onda, Shin-Ya Koshihara, Yasuhiko Hayashi, Yuta Nishina Masaki Hada, Kiyoshi Miyata, Satoshi Ohmura, Yusuke Arashida, Kohei Ichiyanagi, Ikufumi Katayama, Takayuki Suzuki, Wang Chen, Shota Mizote, Takayoshi Sawa, Takayoshi Yokoya, Toshio Seki, Jiro Matsuo, Tomoharu Tokunaga, Chihiro Itoh, Kenji Tsuruta, Ryo Fukaya, Shunsuke Nozawa, Shin-Ichi Adachi, Jun Takeda, Ken Onda, Shin-Ya Koshihara, Yasuhiko Hayashi, Yuta Nishina Selective Reduction Mechanism of Graphene Oxide Driven by the Photon Mode versus the Thermal Mode. Selective Reduction Mechanism of Graphene Oxide Driven by the Photon Mode versus the Thermal Mode. Selective Reduction Mechanism of Graphene Oxide Driven by the Photon Mode versus the Thermal Mode. ACS nano, 13, 9, 10103-10112 ACS nano, 13, 9, 10103-10112 ACS nano, 13, 9, 10103-10112 2019/09/24 Refereed English Research paper(scientific journal) Disclose to all
P. Thopan, T. Seki, L. D. Yu, U. Tippawan, J. Matsuo P. Thopan, T. Seki, L. D. Yu, U. Tippawan, J. Matsuo P. Thopan, T. Seki, L. D. Yu, U. Tippawan, J. Matsuo Gas cooling secondary ions emitted by gas cluster ion beam at the travelling wave ion guide of a Q-ToF-SIMS system Gas cooling secondary ions emitted by gas cluster ion beam at the travelling wave ion guide of a Q-ToF-SIMS system Gas cooling secondary ions emitted by gas cluster ion beam at the travelling wave ion guide of a Q-ToF-SIMS system NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 450, 139-143 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 450, 139-143 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 450, 139-143 2019/07 Refereed English Research paper(scientific journal) Disclose to all
P. Thopan, T. Seki, L. D. Yu, U. Tippawan, J. Matsuo P. Thopan, T. Seki, L. D. Yu, U. Tippawan, J. Matsuo P. Thopan, T. Seki, L. D. Yu, U. Tippawan, J. Matsuo Cluster ion beam bombardment and Q-ToF-SIMS analysis of large biomolecules Cluster ion beam bombardment and Q-ToF-SIMS analysis of large biomolecules Cluster ion beam bombardment and Q-ToF-SIMS analysis of large biomolecules NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 448, 11-18 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 448, 11-18 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 448, 11-18 2019/06 Refereed English Research paper(scientific journal) Disclose to all
Hubert Gnaser, Wolfgang Bock, Jiro Matsuo Hubert Gnaser, Wolfgang Bock, Jiro Matsuo Hubert Gnaser, Wolfgang Bock, Jiro Matsuo In situ cationization of molecular ions sputtered from organic specimens under cluster bombardment In situ cationization of molecular ions sputtered from organic specimens under cluster bombardment In situ cationization of molecular ions sputtered from organic specimens under cluster bombardment JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 36, 3, 03F106 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 36, 3, 03F106 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 36, 3, 03F106 2018/05 Refereed English Research paper(scientific journal) Disclose to all
Hubert Gnaser, Wolfgang Bock, Jiro Matsuo Hubert Gnaser, Wolfgang Bock, Jiro Matsuo Hubert Gnaser, Wolfgang Bock, Jiro Matsuo In situ cationization of molecular ions sputtered from organic specimens under cluster bombardment In situ cationization of molecular ions sputtered from organic specimens under cluster bombardment In situ cationization of molecular ions sputtered from organic specimens under cluster bombardment Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 36, 3 Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 36, 3 Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 36, 3 2018/05/01 Refereed English Research paper(scientific journal) Disclose to all
瀬木 利夫, 青木 学聡, 松尾 二郎 瀬木 利夫, 青木 学聡, 松尾 二郎 Analysis of Organic Materials with SIMS Using New Probe Ions 招待講演 新しいプローブイオンを用いたSIMSによる有機材料分析 (光・量子デバイス研究会 微細加工技術とバイオ・メディカル応用) Analysis of Organic Materials with SIMS Using New Probe Ions 電気学会研究会資料. OQD = The papers of technical meeting on optical and quantum devices, IEE Japan, 2018, 22, 29-33 電気学会研究会資料. OQD = The papers of technical meeting on optical and quantum devices, IEE Japan, 2018, 22, 29-33 , 2018, 22, 29-33 2018/03/28 Japanese Research paper(scientific journal) Disclose to all
松尾 二郎 松尾 二郎 大気圧SIMS法による固液界面の観察 大気圧SIMS法による固液界面の観察 表面科学学術講演会要旨集, 2018, 363 表面科学学術講演会要旨集, 2018, 363 , 2018, 363 2018/01 Japanese Research paper(scientific journal) Disclose to all
Thopan, Prutchayawoot, Gnaser, Hubert, Oki, Rika, Aoki, Takaaki, Seki, Toshio, Matsuo, Jiro Thopan, Prutchayawoot, Gnaser, Hubert, Oki, Rika, Aoki, Takaaki, Seki, Toshio, Matsuo, Jiro Thopan, Prutchayawoot, Gnaser, Hubert, Oki, Rika, Aoki, Takaaki, Seki, Toshio, Matsuo, Jiro Cationization and fragmentation of molecular ions sputtered from polyethylene glycol under gas cluster bombardment: An analysis by MS and MS/MS Cationization and fragmentation of molecular ions sputtered from polyethylene glycol under gas cluster bombardment: An analysis by MS and MS/MS Cationization and fragmentation of molecular ions sputtered from polyethylene glycol under gas cluster bombardment: An analysis by MS and MS/MS International Journal of Mass Spectrometry, 430, 149-157 International Journal of Mass Spectrometry, 430, 149-157 International Journal of Mass Spectrometry, 430, 149-157 2018 Refereed English Research paper(scientific journal) Disclose to all
MATSUO Jiro, SEKI Toshio, AOKI Takaaki 松尾 二郎, 瀬木 利夫, 青木 学聡 MATSUO Jiro, SEKI Toshio, AOKI Takaaki Recent Progress of SIMS Technique : from Novel Primary Beams to Advanced Mass Spectrometers SIMS技術の飛躍的発展を支える新技術:新奇なイオンビーム開発から先端質量分析法まで Recent Progress of SIMS Technique : from Novel Primary Beams to Advanced Mass Spectrometers Vacuum and Surface Science, 61, 7, 426-434 表面と真空, 61, 7, 426-434 Vacuum and Surface Science, 61, 7, 426-434 2018 Japanese Disclose to all
Bostjan Jencic, Luka Jeromel, Nina Ogrinc Potocnik, Katarina Vogel-Mikus, Primoz Vavpetic, Zdravko Rupnik, Klemen Bucar, Matjaz Vencelj, Mitja Kelemen, Jiro Matsuo, Masakazu Kusakari, Zdravko Siketic, Muhammad A. Al-Jalali, Abdallah Shaltout, Primoz Pelicon Bostjan Jencic, Luka Jeromel, Nina Ogrinc Potocnik, Katarina Vogel-Mikus, Primoz Vavpetic, Zdravko Rupnik, Klemen Bucar, Matjaz Vencelj, Mitja Kelemen, Jiro Matsuo, Masakazu Kusakari, Zdravko Siketic, Muhammad A. Al-Jalali, Abdallah Shaltout, Primoz Pelicon Bostjan Jencic, Luka Jeromel, Nina Ogrinc Potocnik, Katarina Vogel-Mikus, Primoz Vavpetic, Zdravko Rupnik, Klemen Bucar, Matjaz Vencelj, Mitja Kelemen, Jiro Matsuo, Masakazu Kusakari, Zdravko Siketic, Muhammad A. Al-Jalali, Abdallah Shaltout, Primoz Pelicon Molecular imaging of alkaloids in khat (Catha edulis) leaves with MeV-SIMS Molecular imaging of alkaloids in khat (Catha edulis) leaves with MeV-SIMS Molecular imaging of alkaloids in khat (Catha edulis) leaves with MeV-SIMS NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 404, 140-145 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 404, 140-145 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 404, 140-145 2017/08 Refereed English Research paper(scientific journal) Disclose to all
Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro Angled etching of Si by ClF3-Ar gas cluster injection Angled etching of Si by ClF3-Ar gas cluster injection Angled etching of Si by ClF3-Ar gas cluster injection JAPANESE JOURNAL OF APPLIED PHYSICS, 56, 6, 06HB02 JAPANESE JOURNAL OF APPLIED PHYSICS, 56, 6, 06HB02 JAPANESE JOURNAL OF APPLIED PHYSICS, 56, 6, 06HB02 2017/06 Refereed English Research paper(scientific journal) Disclose to all
松尾 二郎 松尾 二郎 巻頭言:「イオン化」特集号に寄せて 巻頭言:「イオン化」特集号に寄せて 質量分析, 65, 1, 1-1 質量分析, 65, 1, 1-1 , 65, 1, 1-1 2017/01 Japanese Research paper(scientific journal) Disclose to all
羽田 真毅, 鈴木 達也, 阿部 伸行, 有馬 孝尚, 沖本 洋一, 腰原 伸也, 慶尾 直哉, 村上 寛虎, 西川 亘, 山下 善文, 林 靖彦, 横谷 尚睦, 松尾 二郎, 浅香 透 羽田 真毅, 鈴木 達也, 阿部 伸行, 有馬 孝尚, 沖本 洋一, 腰原 伸也, 慶尾 直哉, 村上 寛虎, 西川 亘, 山下 善文, 林 靖彦, 横谷 尚睦, 松尾 二郎, 浅香 透 時間分解電子線回折法を用いたEuBaCo<sub>2</sub>O<sub>5.38</sub>の構造ダイナミクス計測 時間分解電子線回折法を用いたEuBaCo<sub>2</sub>O<sub>5.38</sub>の構造ダイナミクス計測 日本物理学会講演概要集, 72, 1128-1128 日本物理学会講演概要集, 72, 1128-1128 , 72, 1128-1128 2017/01 Japanese Research paper(scientific journal) Disclose to all
Seki, T., Yamamoto, H., Kozawa, T., Koike, K., Aoki, T., Matsuo, J. Seki, T., Yamamoto, H., Kozawa, T., Koike, K., Aoki, T., Matsuo, J. Seki, T., Yamamoto, H., Kozawa, T., Koike, K., Aoki, T., Matsuo, J. Fabrication of a Si lever structure made by double-angled etching with reactive gas cluster injection Fabrication of a Si lever structure made by double-angled etching with reactive gas cluster injection Fabrication of a Si lever structure made by double-angled etching with reactive gas cluster injection Applied Physics Letters, 110, 18, 182105 Applied Physics Letters, 110, 18, 182105 Applied Physics Letters, 110, 18, 182105 2017 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Molecular dynamics simulations study of nano particle migration by cluster impact Molecular dynamics simulations study of nano particle migration by cluster impact Molecular dynamics simulations study of nano particle migration by cluster impact Surface and Coatings Technology, 306, 63-68 Surface and Coatings Technology, 306, 63-68 Surface and Coatings Technology, 306, 63-68 2016/11 Refereed English Research paper(scientific journal) Disclose to all
Makiko Fujii, Rie Shishido, Takaya Satoh, Shigeru Suzuki, Jiro Matsuo Makiko Fujii, Rie Shishido, Takaya Satoh, Shigeru Suzuki, Jiro Matsuo Makiko Fujii, Rie Shishido, Takaya Satoh, Shigeru Suzuki, Jiro Matsuo Effects of molecular weight and cationization agent on the sensitivity of Bi cluster secondary ion mass spectrometry Effects of molecular weight and cationization agent on the sensitivity of Bi cluster secondary ion mass spectrometry Effects of molecular weight and cationization agent on the sensitivity of Bi cluster secondary ion mass spectrometry RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 30, 14, 1722-1726 RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 30, 14, 1722-1726 RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 30, 14, 1722-1726 2016/07 Refereed English Research paper(scientific journal) Disclose to all
Takaya Satoh, Hironobu Niimi, Naoki Kikuchi, Makiko Fujii, Toshio Seki, Jiro Matsuo Takaya Satoh, Hironobu Niimi, Naoki Kikuchi, Makiko Fujii, Toshio Seki, Jiro Matsuo Takaya Satoh, Hironobu Niimi, Naoki Kikuchi, Makiko Fujii, Toshio Seki, Jiro Matsuo Solvent-free silver-nanoparticle surface-assisted laser desorption/ionization imaging mass spectrometry of the Irganox 1010 coated on polystyrene Solvent-free silver-nanoparticle surface-assisted laser desorption/ionization imaging mass spectrometry of the Irganox 1010 coated on polystyrene Solvent-free silver-nanoparticle surface-assisted laser desorption/ionization imaging mass spectrometry of the Irganox 1010 coated on polystyrene INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 404, 1-7 INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 404, 1-7 INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 404, 1-7 2016/06 Refereed English Research paper(scientific journal) Disclose to all
Toshio Seki, Yu Yoshino, Takehiko Senoo, Kunihiko Koike, Takaaki Aoki, Jiro Matsuo Toshio Seki, Yu Yoshino, Takehiko Senoo, Kunihiko Koike, Takaaki Aoki, Jiro Matsuo Toshio Seki, Yu Yoshino, Takehiko Senoo, Kunihiko Koike, Takaaki Aoki, Jiro Matsuo Reactive etching by ClF3–Ar neutral cluster beam with scanning Reactive etching by ClF3–Ar neutral cluster beam with scanning Reactive etching by ClF3–Ar neutral cluster beam with scanning Japanese Journal of Applied Physics, 55, 6S2, 06HB01 Japanese Journal of Applied Physics, 55, 6S2, 06HB01 Japanese Journal of Applied Physics, 55, 6S2, 06HB01 2016/05/09 Refereed English Research paper(scientific journal) Disclose to all
Hubert Gnaser, Masakazu Kusakari, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo Hubert Gnaser, Masakazu Kusakari, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo Hubert Gnaser, Masakazu Kusakari, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo Secondary ion emission from leucine and isoleucine under argon gas-cluster ion bombardment Secondary ion emission from leucine and isoleucine under argon gas-cluster ion bombardment Secondary ion emission from leucine and isoleucine under argon gas-cluster ion bombardment Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 34, 3 Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 34, 3 Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 34, 3 2016/05/01 Refereed English Research paper(scientific journal) Disclose to all
Kusakari, Masakazu, Fujii, Makiko, Seki, Toshio, Aoki, Takaaki, Matsuo, Jiro Masakazu Kusakari, Makiko Fujii, Toshio Seki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Kusakari, Masakazu, Fujii, Makiko, Seki, Toshio, Aoki, Takaaki, Matsuo, Jiro Development of ambient SIMS using mega-electron-volt-energy ion probe Development of ambient SIMS using mega-electron-volt-energy ion probe Development of ambient SIMS using mega-electron-volt-energy ion probe JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 34, 3, 4 Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 34, 3, 4 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 34, 3, 4 2016/05 Refereed English Research paper(scientific journal) Disclose to all
Yuta Yokoyama, Satoka Aoyagi, Makiko Fujii, Jiro Matsuo, John S. Fletcher, Nicholas P. Lockyer, John C. Vickerman, Melissa K. Passarelli, Rasmus Havelund, Martin P. Seah Yuta Yokoyama, Satoka Aoyagi, Makiko Fujii, Jiro Matsuo, John S. Fletcher, Nicholas P. Lockyer, John C. Vickerman, Melissa K. Passarelli, Rasmus Havelund, Martin P. Seah Yuta Yokoyama, Satoka Aoyagi, Makiko Fujii, Jiro Matsuo, John S. Fletcher, Nicholas P. Lockyer, John C. Vickerman, Melissa K. Passarelli, Rasmus Havelund, Martin P. Seah Peptide Fragmentation and Surface Structural Analysis by Means of ToF-SIMS Using Large Cluster Ion Sources Peptide Fragmentation and Surface Structural Analysis by Means of ToF-SIMS Using Large Cluster Ion Sources Peptide Fragmentation and Surface Structural Analysis by Means of ToF-SIMS Using Large Cluster Ion Sources ANALYTICAL CHEMISTRY, 88, 7, 3592-3597 ANALYTICAL CHEMISTRY, 88, 7, 3592-3597 ANALYTICAL CHEMISTRY, 88, 7, 3592-3597 2016/04 Refereed English Research paper(scientific journal) Disclose to all
松尾 二郎, 藤井 麻樹子, 瀬木 利夫, 青木 学聡 松尾 二郎, 藤井 麻樹子, 瀬木 利夫, 青木 学聡 クラスタービーム技術の新展開 クラスタービーム技術の新展開 精密工学会誌, 82, 4, 309-314 精密工学会誌, 82, 4, 309-314 , 82, 4, 309-314 2016/01 Japanese Research paper(scientific journal) Disclose to all
松尾 二郎, 藤井 麻樹子, 瀬木 利夫, 青木 学聡 松尾 二郎, 藤井 麻樹子, 瀬木 利夫, 青木 学聡 クラスターイオンビーム技術の最近の進展—ナノ加工からバイオ材料評価まで— クラスターイオンビーム技術の最近の進展—ナノ加工からバイオ材料評価まで— Journal of the Vacuum Society of Japan, 59, 5, 113-120 Journal of the Vacuum Society of Japan, 59, 5, 113-120 , 59, 5, 113-120 2016/01 Japanese Research paper(scientific journal) Disclose to all
佐藤 貴弥, 藤井 麻樹子, 松尾 二郎 佐藤 貴弥, 藤井 麻樹子, 松尾 二郎 レーザー脱離イオン化イメージング質量分析法による表面分析の可能性 レーザー脱離イオン化イメージング質量分析法による表面分析の可能性 Journal of Surface Analysis, 23, 1, 2-10 Journal of Surface Analysis, 23, 1, 2-10 , 23, 1, 2-10 2016/01 Japanese Research paper(scientific journal) Disclose to all
松尾 二郎 松尾 二郎 クラスターSIMS法の新展開 クラスターSIMS法の新展開 表面科学学術講演会要旨集, 36, 419 表面科学学術講演会要旨集, 36, 419 , 36, 419 2016/01 Japanese Research paper(scientific journal) Disclose to all
Shishido, R., Fujii, M., Seki, T., Aoki, T., Matsuo, J., Suzuki, S. Shishido, R., Fujii, M., Seki, T., Aoki, T., Matsuo, J., Suzuki, S. Shishido, R., Fujii, M., Seki, T., Aoki, T., Matsuo, J., Suzuki, S. Yields and images of secondary ions from organic materials by different primary Bi ions in time-of-flight secondary ion mass spectrometry Yields and images of secondary ions from organic materials by different primary Bi ions in time-of-flight secondary ion mass spectrometry Yields and images of secondary ions from organic materials by different primary Bi ions in time-of-flight secondary ion mass spectrometry Rapid Communications in Mass Spectrometry, 30, 4, 476-482 Rapid Communications in Mass Spectrometry, 30, 4, 476-482 Rapid Communications in Mass Spectrometry, 30, 4, 476-482 2016 Refereed English Research paper(scientific journal) Disclose to all
Seki, T., Kusakari, M., Fujii, M., Aoki, T., Matsuo, J. Seki, T., Kusakari, M., Fujii, M., Aoki, T., Matsuo, J. Seki, T., Kusakari, M., Fujii, M., Aoki, T., Matsuo, J. Ambient analysis of liquid materials with Wet-SIMS Ambient analysis of liquid materials with Wet-SIMS Ambient analysis of liquid materials with Wet-SIMS Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 371, 189-193 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 371, 189-193 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 371, 189-193 2016 Refereed English Research paper(scientific journal) Disclose to all
Masakazu Kusakari, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masakazu Kusakari, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masakazu Kusakari, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo Development of ambient SIMS using mega-electron-volt-energy ion probe Development of ambient SIMS using mega-electron-volt-energy ion probe Development of ambient SIMS using mega-electron-volt-energy ion probe Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 34, 3, 03H111 Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 34, 3, 03H111 Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 34, 3, 03H111 2016 Refereed English Research paper(scientific journal) Disclose to all
Gnaser, H., Kusakari, M., Fujii, M., Seki, T., Aoki, T., Matsuo, J. Gnaser, H., Kusakari, M., Fujii, M., Seki, T., Aoki, T., Matsuo, J. Gnaser, H., Kusakari, M., Fujii, M., Seki, T., Aoki, T., Matsuo, J. Secondary ion emission from leucine and isoleucine under argon gas-cluster ion bombardment Secondary ion emission from leucine and isoleucine under argon gas-cluster ion bombardment Secondary ion emission from leucine and isoleucine under argon gas-cluster ion bombardment Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 34, 3, 03H102 Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 34, 3, 03H102 Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 34, 3, 03H102 2016 Refereed English Research paper(scientific journal) Disclose to all
Suzuki, K., Kusakari, M., Fujii, M., Seki, T., Aoki, T., Matsuo, J. Suzuki, K., Kusakari, M., Fujii, M., Seki, T., Aoki, T., Matsuo, J. Suzuki, K., Kusakari, M., Fujii, M., Seki, T., Aoki, T., Matsuo, J. Development of Low-vacuum SIMS instruments with large cluster Ion beam Development of Low-vacuum SIMS instruments with large cluster Ion beam Development of Low-vacuum SIMS instruments with large cluster Ion beam Surface and Interface Analysis, 48, 11, 1119-1121 Surface and Interface Analysis, 48, 11, 1119-1121 Surface and Interface Analysis, 48, 11, 1119-1121 2016 Refereed English Research paper(scientific journal) Disclose to all
Hiroki Yamamoto, Toshio Seki, Jiro Matsuo, Kunihiko Koike, Takahiro Kozawa Hiroki Yamamoto, Toshio Seki, Jiro Matsuo, Kunihiko Koike, Takahiro Kozawa Hiroki Yamamoto, Toshio Seki, Jiro Matsuo, Kunihiko Koike, Takahiro Kozawa High-aspect-ratio patterning by ClF3-Ar neutral cluster etching High-aspect-ratio patterning by ClF3-Ar neutral cluster etching High-aspect-ratio patterning by ClF3-Ar neutral cluster etching MICROELECTRONIC ENGINEERING, 141, 145-149 MICROELECTRONIC ENGINEERING, 141, 145-149 MICROELECTRONIC ENGINEERING, 141, 145-149 2015/06 Refereed English Research paper(scientific journal) Disclose to all
Masakazu Kusakari, Hubert Gnaser, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masakazu Kusakari, Hubert Gnaser, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masakazu Kusakari, Hubert Gnaser, Makiko Fujii, Toshio Seki, Takaaki Aoki, Jiro Matsuo Molecular cluster emission in sputtering of amino acids by argon gas-cluster ions Molecular cluster emission in sputtering of amino acids by argon gas-cluster ions Molecular cluster emission in sputtering of amino acids by argon gas-cluster ions INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 383, 31-37 INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 383, 31-37 INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 383, 31-37 2015/05 Refereed English Research paper(scientific journal) Disclose to all
I. Yamada, J. Matsuo, N. Toyoda, T. Aoki, T. Seki I. Yamada, J. Matsuo, N. Toyoda, T. Aoki, T. Seki I. Yamada, J. Matsuo, N. Toyoda, T. Aoki, T. Seki Progress and applications of cluster ion beam technology Progress and applications of cluster ion beam technology Progress and applications of cluster ion beam technology CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE, 19, 1, 12-18 CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE, 19, 1, 12-18 CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE, 19, 1, 12-18 2015/02 Refereed English Research paper(scientific journal) Disclose to all
Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo Mass analysis by Ar-GCIB-dynamic SIMS for organic materials Mass analysis by Ar-GCIB-dynamic SIMS for organic materials Mass analysis by Ar-GCIB-dynamic SIMS for organic materials SURFACE AND INTERFACE ANALYSIS, 47, 2, 298-300 SURFACE AND INTERFACE ANALYSIS, 47, 2, 298-300 SURFACE AND INTERFACE ANALYSIS, 47, 2, 298-300 2015/02 Refereed English Research paper(scientific journal) Disclose to all
Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo Mass analysis by Ar-GCIB-dynamic SIMS for organic materials (Retracted article. See vol. 48, pg. 383, 2016) Mass analysis by Ar-GCIB-dynamic SIMS for organic materials (Retracted article. See vol. 48, pg. 383, 2016) Mass analysis by Ar-GCIB-dynamic SIMS for organic materials (Retracted article. See vol. 48, pg. 383, 2016) SURFACE AND INTERFACE ANALYSIS, 47, 2, 295-297 SURFACE AND INTERFACE ANALYSIS, 47, 2, 295-297 SURFACE AND INTERFACE ANALYSIS, 47, 2, 295-297 2015/02 Refereed English Research paper(scientific journal) Disclose to all
藤井 麻樹子, 瀬木 利夫, 青木 学聡, 松尾 二郎 藤井 麻樹子, 瀬木 利夫, 青木 学聡, 松尾 二郎 クラスターSIMS法を用いた生体試料分析の現状と課題 クラスターSIMS法を用いた生体試料分析の現状と課題 表面科学学術講演会要旨集, 35, 346 表面科学学術講演会要旨集, 35, 346 , 35, 346 2015/01 Japanese Research paper(scientific journal) Disclose to all
松尾 二郎, 鈴木 敢士, 草刈 将一, 藤井 麻樹子, 青木 学聡, 瀬木 利夫 松尾 二郎, 鈴木 敢士, 草刈 将一, 藤井 麻樹子, 青木 学聡, 瀬木 利夫 クラスターSIMS法による生体分子の高空間分解能イメージング クラスターSIMS法による生体分子の高空間分解能イメージング 表面科学学術講演会要旨集, 35, 347 表面科学学術講演会要旨集, 35, 347 , 35, 347 2015/01 Japanese Research paper(scientific journal) Disclose to all
宍戸 理恵, 藤井 麻樹子, 瀬木 利夫, 青木 学聡, 松尾 二郎, 鈴木 茂 宍戸 理恵, 藤井 麻樹子, 瀬木 利夫, 青木 学聡, 松尾 二郎, 鈴木 茂 BiクラスターTOF-SIMSによる有機材料のイメージング分析に関する研究 BiクラスターTOF-SIMSによる有機材料のイメージング分析に関する研究 表面科学学術講演会要旨集, 35, 245 表面科学学術講演会要旨集, 35, 245 , 35, 245 2015/01 Japanese Research paper(scientific journal) Disclose to all
Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo Masato Suzuki, Masashi Nojima, Makiko Fujii, Toshio Seki, Jiro Matsuo Mass analysis by Ar-GCIB-dynamic SIMS for organic materials Mass analysis by Ar-GCIB-dynamic SIMS for organic materials Mass analysis by Ar-GCIB-dynamic SIMS for organic materials SURFACE AND INTERFACE ANALYSIS, 46, 12-13, 1212-1214 SURFACE AND INTERFACE ANALYSIS, 46, 12-13, 1212-1214 SURFACE AND INTERFACE ANALYSIS, 46, 12-13, 1212-1214 2014/12 Refereed English Research paper(scientific journal) Disclose to all
Toshio Seki, Makiko Fujii, Masakazu Kusakari, Shunichiro Nakagawa, Takaaki Aoki, Jiro Matsuo Toshio Seki, Makiko Fujii, Masakazu Kusakari, Shunichiro Nakagawa, Takaaki Aoki, Jiro Matsuo Toshio Seki, Makiko Fujii, Masakazu Kusakari, Shunichiro Nakagawa, Takaaki Aoki, Jiro Matsuo Analysis of liquid materials in low vacuum with Wet-SIMS Analysis of liquid materials in low vacuum with Wet-SIMS Analysis of liquid materials in low vacuum with Wet-SIMS SURFACE AND INTERFACE ANALYSIS, 46, 12-13, 1133-1136 SURFACE AND INTERFACE ANALYSIS, 46, 12-13, 1133-1136 SURFACE AND INTERFACE ANALYSIS, 46, 12-13, 1133-1136 2014/12 Refereed English Research paper(scientific journal) Disclose to all
Makiko Fujii, Shunichirou Nakagawa, Toshio Seki, Takaaki Aoki, Jiro Matsuo Makiko Fujii, Shunichirou Nakagawa, Toshio Seki, Takaaki Aoki, Jiro Matsuo Makiko Fujii, Shunichirou Nakagawa, Toshio Seki, Takaaki Aoki, Jiro Matsuo Quantitative analysis of lipids with argon gas cluster ion beam secondary ion mass spectrometry Quantitative analysis of lipids with argon gas cluster ion beam secondary ion mass spectrometry Quantitative analysis of lipids with argon gas cluster ion beam secondary ion mass spectrometry SURFACE AND INTERFACE ANALYSIS, 46, 12-13, 1129-1132 SURFACE AND INTERFACE ANALYSIS, 46, 12-13, 1129-1132 SURFACE AND INTERFACE ANALYSIS, 46, 12-13, 1129-1132 2014/12 Refereed English Research paper(scientific journal) Disclose to all
Makiko Fujii, Masakazu Kusakari, Kazuhiro Matsuda, Naoki Man, Toshio Seki, Takaaki Aoki, Jiro Matsuo Makiko Fujii, Masakazu Kusakari, Kazuhiro Matsuda, Naoki Man, Toshio Seki, Takaaki Aoki, Jiro Matsuo Makiko Fujii, Masakazu Kusakari, Kazuhiro Matsuda, Naoki Man, Toshio Seki, Takaaki Aoki, Jiro Matsuo Lipid compounds analysis with MeV-SIMS apparatus for biological applications Lipid compounds analysis with MeV-SIMS apparatus for biological applications Lipid compounds analysis with MeV-SIMS apparatus for biological applications SURFACE AND INTERFACE ANALYSIS, 46, S1, 353-356 SURFACE AND INTERFACE ANALYSIS, 46, S1, 353-356 SURFACE AND INTERFACE ANALYSIS, 46, S1, 353-356 2014/11 Refereed English Research paper(scientific journal) Disclose to all
Masashi Nojima, Masato Suzuki, Makiko Fujii, Toshio Seki, Jiro Matsuo Masashi Nojima, Masato Suzuki, Makiko Fujii, Toshio Seki, Jiro Matsuo Masashi Nojima, Masato Suzuki, Makiko Fujii, Toshio Seki, Jiro Matsuo Development of organic SIMS system with Ar-GCIB and IMS-4f Development of organic SIMS system with Ar-GCIB and IMS-4f Development of organic SIMS system with Ar-GCIB and IMS-4f SURFACE AND INTERFACE ANALYSIS, 46, S1, 368-371 SURFACE AND INTERFACE ANALYSIS, 46, S1, 368-371 SURFACE AND INTERFACE ANALYSIS, 46, S1, 368-371 2014/11 Refereed English Research paper(scientific journal) Disclose to all
Tonci Tadic, Iva Bogdanovic Radovic, Zdravko Siketic, Donny Domagoj Cosic, Natko Skukan, Milko Jaksic, Jiro Matsuo Tonci Tadic, Iva Bogdanovic Radovic, Zdravko Siketic, Donny Domagoj Cosic, Natko Skukan, Milko Jaksic, Jiro Matsuo Tonci Tadic, Iva Bogdanovic Radovic, Zdravko Siketic, Donny Domagoj Cosic, Natko Skukan, Milko Jaksic, Jiro Matsuo Development of a TOF SIMS setup at the Zagreb heavy ion microbeam facility Development of a TOF SIMS setup at the Zagreb heavy ion microbeam facility Development of a TOF SIMS setup at the Zagreb heavy ion microbeam facility NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 332, 234-237 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 332, 234-237 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 332, 234-237 2014/08 Refereed English Research paper(scientific journal) Disclose to all
Toshio Seki, Yoshinobu Wakamatsu, Shunichiro Nakagawa, Takaaki Aoki, Akihiko Ishihara, Jiro Matsuo Toshio Seki, Yoshinobu Wakamatsu, Shunichiro Nakagawa, Takaaki Aoki, Akihiko Ishihara, Jiro Matsuo Toshio Seki, Yoshinobu Wakamatsu, Shunichiro Nakagawa, Takaaki Aoki, Akihiko Ishihara, Jiro Matsuo Biomaterial imaging with MeV-energy heavy ion beams Biomaterial imaging with MeV-energy heavy ion beams Biomaterial imaging with MeV-energy heavy ion beams NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 332, 326-329 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 332, 326-329 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 332, 326-329 2014/08 Refereed English Research paper(scientific journal) Disclose to all
M. Nojima, M. Suzuki, T. Adachi, S. Hotta, M. Fujii, T. Seki, J. Matsuo M. Nojima, M. Suzuki, T. Adachi, S. Hotta, M. Fujii, T. Seki, J. Matsuo M. Nojima, M. Suzuki, T. Adachi, S. Hotta, M. Fujii, T. Seki, J. Matsuo Development of Au-GCIB dynamic SIMS and cluster size filtering system Development of Au-GCIB dynamic SIMS and cluster size filtering system Development of Au-GCIB dynamic SIMS and cluster size filtering system Microscopy and Microanalysis, 20, 3, 1152-1153 Microscopy and Microanalysis, 20, 3, 1152-1153 Microscopy and Microanalysis, 20, 3, 1152-1153 2014/08/01 Refereed Research paper(international conference proceedings) Disclose to all
Jiro Matsuo, Souta Torii, Kazuki Yamauchi, Keisuke Wakamoto, Masakazu Kusakari, Shunichiro Nakagawa, Makiko Fujii, Takaaki Aoki, Toshio Seki Jiro Matsuo, Souta Torii, Kazuki Yamauchi, Keisuke Wakamoto, Masakazu Kusakari, Shunichiro Nakagawa, Makiko Fujii, Takaaki Aoki, Toshio Seki Jiro Matsuo, Souta Torii, Kazuki Yamauchi, Keisuke Wakamoto, Masakazu Kusakari, Shunichiro Nakagawa, Makiko Fujii, Takaaki Aoki, Toshio Seki Novel SIMS system with focused massive cluster ion source for mass imaging spectrometry with high lateral resolution Novel SIMS system with focused massive cluster ion source for mass imaging spectrometry with high lateral resolution Novel SIMS system with focused massive cluster ion source for mass imaging spectrometry with high lateral resolution APPLIED PHYSICS EXPRESS, 7, 5, 056602 APPLIED PHYSICS EXPRESS, 7, 5, 056602 APPLIED PHYSICS EXPRESS, 7, 5, 056602 2014/05 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Dongfang Zhang, Kostyantyn Pichugin, Julian Hirscht, Micha A. Kochman, Stuart A. Hayes, Stephanie Manz, Regis Y. N. Gengler, Derek A. Wann, Toshio Seki, Gustavo Moriena, Carole A. Morrison, Jiro Matsuo, German Sciaini, R. J. Dwayne Miller Masaki Hada, Dongfang Zhang, Kostyantyn Pichugin, Julian Hirscht, Micha A. Kochman, Stuart A. Hayes, Stephanie Manz, Regis Y. N. Gengler, Derek A. Wann, Toshio Seki, Gustavo Moriena, Carole A. Morrison, Jiro Matsuo, German Sciaini, R. J. Dwayne Miller Masaki Hada, Dongfang Zhang, Kostyantyn Pichugin, Julian Hirscht, Micha A. Kochman, Stuart A. Hayes, Stephanie Manz, Regis Y. N. Gengler, Derek A. Wann, Toshio Seki, Gustavo Moriena, Carole A. Morrison, Jiro Matsuo, German Sciaini, R. J. Dwayne Miller Cold ablation driven by localized forces in alkali halides Cold ablation driven by localized forces in alkali halides Cold ablation driven by localized forces in alkali halides NATURE COMMUNICATIONS, 5, 3863 NATURE COMMUNICATIONS, 5, 3863 NATURE COMMUNICATIONS, 5, 3863 2014/05 Refereed English Research paper(scientific journal) Disclose to all
Makiko Fujii, Shunichirou Nakagawa, Kazuhiro Matsuda, Naoki Man, Toshio Seki, Takaaki Aoki, Jiro Matsuo Makiko Fujii, Shunichirou Nakagawa, Kazuhiro Matsuda, Naoki Man, Toshio Seki, Takaaki Aoki, Jiro Matsuo Makiko Fujii, Shunichirou Nakagawa, Kazuhiro Matsuda, Naoki Man, Toshio Seki, Takaaki Aoki, Jiro Matsuo Study on the detection limits of a new argon gas cluster ion beam secondary ion mass spectrometry apparatus using lipid compound samples Study on the detection limits of a new argon gas cluster ion beam secondary ion mass spectrometry apparatus using lipid compound samples Study on the detection limits of a new argon gas cluster ion beam secondary ion mass spectrometry apparatus using lipid compound samples RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 28, 8, 917-920 RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 28, 8, 917-920 RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 28, 8, 917-920 2014/04 Refereed English Research paper(scientific journal) Disclose to all
Hubert Gnaser, Makiko Fujii, Shunichirou Nakagawa, Toshio Seki, Takaaki Aoki, Jiro Matsuo Hubert Gnaser, Makiko Fujii, Shunichirou Nakagawa, Toshio Seki, Takaaki Aoki, Jiro Matsuo Hubert Gnaser, Makiko Fujii, Shunichirou Nakagawa, Toshio Seki, Takaaki Aoki, Jiro Matsuo Prolific cluster emission in sputtering of phenylalanine by argon-cluster ion bombardment Prolific cluster emission in sputtering of phenylalanine by argon-cluster ion bombardment Prolific cluster emission in sputtering of phenylalanine by argon-cluster ion bombardment INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 360, 1, 54-57 INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 360, 1, 54-57 INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 360, 1, 54-57 2014/03 Refereed English Research paper(scientific journal) Disclose to all
松尾 二郎 松尾 二郎 クラスタイオンビームを用いる表面分析技術の新展開 クラスタイオンビームを用いる表面分析技術の新展開 応用物理, 83, 5, 371-375 応用物理, 83, 5, 371-375 , 83, 5, 371-375 2014/01 Japanese Research paper(scientific journal) Disclose to all
藤井 麻樹子, 宍戸 理恵, 鳥居 聡太, 中川 駿一郎, 瀬木 利夫, 青木 学聡, 鈴木 茂, 松尾 二郎 藤井 麻樹子, 宍戸 理恵, 鳥居 聡太, 中川 駿一郎, 瀬木 利夫, 青木 学聡, 鈴木 茂, 松尾 二郎 クラスターSIMS法による脂質分子の高感度検出とイメージングへの応用 クラスターSIMS法による脂質分子の高感度検出とイメージングへの応用 表面科学, 35, 7, 351-355 表面科学, 35, 7, 351-355 , 35, 7, 351-355 2014/01 Japanese Research paper(scientific journal) Disclose to all
T. Seki, S. Shitomoto, S. Nakagawa, T. Aoki, J. Matsuo T. Seki, S. Shitomoto, S. Nakagawa, T. Aoki, J. Matsuo T. Seki, S. Shitomoto, S. Nakagawa, T. Aoki, J. Matsuo An electrostatic quadrupole doublet focusing system for MeV heavy ions in MeV-SIMS An electrostatic quadrupole doublet focusing system for MeV heavy ions in MeV-SIMS An electrostatic quadrupole doublet focusing system for MeV heavy ions in MeV-SIMS NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 315, 356-359 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 315, 356-359 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 315, 356-359 2013/11 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Molecular dynamics simulation study of damage formation and sputtering with huge fluorine cluster impact on silicon Molecular dynamics simulation study of damage formation and sputtering with huge fluorine cluster impact on silicon Molecular dynamics simulation study of damage formation and sputtering with huge fluorine cluster impact on silicon NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 303, 170-173 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 303, 170-173 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 303, 170-173 2013/05 Refereed English Research paper(scientific journal) Disclose to all
Yasuyuki Yamamoto, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Yasuyuki Yamamoto, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Yasuyuki Yamamoto, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Ion-induced damage evaluation with Ar cluster ion beams Ion-induced damage evaluation with Ar cluster ion beams Ion-induced damage evaluation with Ar cluster ion beams SURFACE AND INTERFACE ANALYSIS, 45, 1, 167-170 SURFACE AND INTERFACE ANALYSIS, 45, 1, 167-170 SURFACE AND INTERFACE ANALYSIS, 45, 1, 167-170 2013/01 Refereed English Research paper(scientific journal) Disclose to all
K. Ichiki, J. Tamura, T. Seki, T. Aoki, J. Matsuo K. Ichiki, J. Tamura, T. Seki, T. Aoki, J. Matsuo K. Ichiki, J. Tamura, T. Seki, T. Aoki, J. Matsuo Development of gas cluster ion beam irradiation system with an orthogonal acceleration TOF instrument Development of gas cluster ion beam irradiation system with an orthogonal acceleration TOF instrument Development of gas cluster ion beam irradiation system with an orthogonal acceleration TOF instrument SURFACE AND INTERFACE ANALYSIS, 45, 1, 522-524 SURFACE AND INTERFACE ANALYSIS, 45, 1, 522-524 SURFACE AND INTERFACE ANALYSIS, 45, 1, 522-524 2013/01 Refereed English Research paper(scientific journal) Disclose to all
Hubert Gnaser, Kazuya Ichiki, Jiro Matsuo Hubert Gnaser, Kazuya Ichiki, Jiro Matsuo Hubert Gnaser, Kazuya Ichiki, Jiro Matsuo Sputtered ion emission under size-selected Arn+ cluster ion bombardment Sputtered ion emission under size-selected Arn+ cluster ion bombardment Sputtered ion emission under size-selected Arn+ cluster ion bombardment Surface and Interface Analysis, 45, 1, 138-142 Surface and Interface Analysis, 45, 1, 138-142 Surface and Interface Analysis, 45, 1, 138-142 2013/01 Refereed English Research paper(international conference proceedings) Disclose to all
Hubert Gnaser, Makiko Fujii, Shunichirou Nakagawa, Toshio Seki, Takaaki Aoki, Jiro Matsuo Hubert Gnaser, Makiko Fujii, Shunichirou Nakagawa, Toshio Seki, Takaaki Aoki, Jiro Matsuo Hubert Gnaser, Makiko Fujii, Shunichirou Nakagawa, Toshio Seki, Takaaki Aoki, Jiro Matsuo Peptide dissociation patterns in secondary ion mass spectrometry under large argon cluster ion bombardment Peptide dissociation patterns in secondary ion mass spectrometry under large argon cluster ion bombardment Peptide dissociation patterns in secondary ion mass spectrometry under large argon cluster ion bombardment Rapid Communications in Mass Spectrometry, 27, 13, 1490-1496 Rapid Communications in Mass Spectrometry, 27, 13, 1490-1496 Rapid Communications in Mass Spectrometry, 27, 13, 1490-1496 2013 Refereed English Research paper(scientific journal) Disclose to all
Kazuya Dobashi, Kensuke Inai, Misako Saito, Toshio Seki, Takaaki Aoki, Jiro Matsuo Kazuya Dobashi, Kensuke Inai, Misako Saito, Toshio Seki, Takaaki Aoki, Jiro Matsuo Kazuya Dobashi, Kensuke Inai, Misako Saito, Toshio Seki, Takaaki Aoki, Jiro Matsuo Ultrafine particle removal using gas cluster ion beam technology Ultrafine particle removal using gas cluster ion beam technology Ultrafine particle removal using gas cluster ion beam technology IEEE Transactions on Semiconductor Manufacturing, 26, 3, 328-334 IEEE Transactions on Semiconductor Manufacturing, 26, 3, 328-334 IEEE Transactions on Semiconductor Manufacturing, 26, 3, 328-334 2013 Refereed English Research paper(scientific journal) Disclose to all
Yousuke Goto, Yukihiro Angata, Masashi Yamamoto, Toshio Seki, Jiro Matsumoto, Hideo Horibe Yousuke Goto, Yukihiro Angata, Masashi Yamamoto, Toshio Seki, Jiro Matsumoto, Hideo Horibe Yousuke Goto, Yukihiro Angata, Masashi Yamamoto, Toshio Seki, Jiro Matsumoto, Hideo Horibe Removal of Ion implanted Poly vinyl phenol using Wet Ozone Removal of Ion implanted Poly vinyl phenol using Wet Ozone Removal of Ion implanted Poly vinyl phenol using Wet Ozone JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 26, 4, 467-472 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 26, 4, 467-472 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 26, 4, 467-472 2013 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Dongfang Zhang, Albert Casandruc, R. J. Dwayne Miller, Yusaku Hontani, Jiro Matsuo, Robert E. Marvel, Richard F. Haglund Masaki Hada, Dongfang Zhang, Albert Casandruc, R. J. Dwayne Miller, Yusaku Hontani, Jiro Matsuo, Robert E. Marvel, Richard F. Haglund Masaki Hada, Dongfang Zhang, Albert Casandruc, R. J. Dwayne Miller, Yusaku Hontani, Jiro Matsuo, Robert E. Marvel, Richard F. Haglund Hot electron injection driven phase transitions Hot electron injection driven phase transitions Hot electron injection driven phase transitions Physical Review B - Condensed Matter and Materials Physics, 86, 13, 134101 Physical Review B - Condensed Matter and Materials Physics, 86, 13, 134101 Physical Review B - Condensed Matter and Materials Physics, 86, 13, 134101 2012/10/01 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Dongfang Zhang, Albert Casandruc, R. J. Dwayne Miller, Yusaku Hontani, Jiro Matsuo, Robert E. Marvel, Richard F. Haglund Masaki Hada, Dongfang Zhang, Albert Casandruc, R. J. Dwayne Miller, Yusaku Hontani, Jiro Matsuo, Robert E. Marvel, Richard F. Haglund Masaki Hada, Dongfang Zhang, Albert Casandruc, R. J. Dwayne Miller, Yusaku Hontani, Jiro Matsuo, Robert E. Marvel, Richard F. Haglund Hot electron injection driven phase transitions Hot electron injection driven phase transitions Hot electron injection driven phase transitions PHYSICAL REVIEW B, 86, 13 PHYSICAL REVIEW B, 86, 13 PHYSICAL REVIEW B, 86, 13 2012/10 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Jiro Matsuo Masaki Hada, Jiro Matsuo Masaki Hada, Jiro Matsuo Ultrafast X-ray sources for time-resolved measurements Ultrafast X-ray sources for time-resolved measurements Ultrafast X-ray sources for time-resolved measurements X-RAY SPECTROMETRY, 41, 4, 188-194 X-RAY SPECTROMETRY, 41, 4, 188-194 X-RAY SPECTROMETRY, 41, 4, 188-194 2012/07 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Molecular dynamics study of crater formation by core-shell structured cluster impact Molecular dynamics study of crater formation by core-shell structured cluster impact Molecular dynamics study of crater formation by core-shell structured cluster impact NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 282, 29-32 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 282, 29-32 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 282, 29-32 2012/07 Refereed English Research paper(scientific journal) Disclose to all
J. Matsuo, K. Ichiki, Y. Yamamoto, T. Seki, T. Aoki J. Matsuo, K. Ichiki, Y. Yamamoto, T. Seki, T. Aoki J. Matsuo, K. Ichiki, Y. Yamamoto, T. Seki, T. Aoki Depth profiling analysis of damaged arginine films with Ar cluster ion beams Depth profiling analysis of damaged arginine films with Ar cluster ion beams Depth profiling analysis of damaged arginine films with Ar cluster ion beams SURFACE AND INTERFACE ANALYSIS, 44, 6, 729-731 SURFACE AND INTERFACE ANALYSIS, 44, 6, 729-731 SURFACE AND INTERFACE ANALYSIS, 44, 6, 729-731 2012/06 Refereed English Research paper(scientific journal) Disclose to all
Gustavo Moriena, Masaki Hada, German Sciaini, Jiro Matsuo, R. J. Dwayne Miller Gustavo Moriena, Masaki Hada, German Sciaini, Jiro Matsuo, R. J. Dwayne Miller Gustavo Moriena, Masaki Hada, German Sciaini, Jiro Matsuo, R. J. Dwayne Miller Femtosecond electron diffraction: Preparation and characterization of (110)-oriented bismuth films Femtosecond electron diffraction: Preparation and characterization of (110)-oriented bismuth films Femtosecond electron diffraction: Preparation and characterization of (110)-oriented bismuth films JOURNAL OF APPLIED PHYSICS, 111, 4, 043504 JOURNAL OF APPLIED PHYSICS, 111, 4, 043504 JOURNAL OF APPLIED PHYSICS, 111, 4, 043504 2012/02 Refereed English Research paper(scientific journal) Disclose to all
Hubert Gnaser, Kazuya Ichiki, Jiro Matsuo Hubert Gnaser, Kazuya Ichiki, Jiro Matsuo Hubert Gnaser, Kazuya Ichiki, Jiro Matsuo Strongly reduced fragmentation and soft emission processes in sputtered ion formation from amino acid films under large Ar-n(+) (n &lt;= 2200) cluster ion bombardment Strongly reduced fragmentation and soft emission processes in sputtered ion formation from amino acid films under large Ar-n(+) (n &lt;= 2200) cluster ion bombardment Strongly reduced fragmentation and soft emission processes in sputtered ion formation from amino acid films under large Ar-n(+) (n &lt;= 2200) cluster ion bombardment RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 26, 1, 1-8 RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 26, 1, 1-8 RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 26, 1, 1-8 2012/01 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Sachi Ibuki, Yusaku Hontani, Yasuyuki Yamamoto, Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masaki Hada, Sachi Ibuki, Yusaku Hontani, Yasuyuki Yamamoto, Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masaki Hada, Sachi Ibuki, Yusaku Hontani, Yasuyuki Yamamoto, Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Low-damage milling of an amino acid thin film with cluster ion beam Low-damage milling of an amino acid thin film with cluster ion beam Low-damage milling of an amino acid thin film with cluster ion beam JOURNAL OF APPLIED PHYSICS, 110, 9, 094701 JOURNAL OF APPLIED PHYSICS, 110, 9, 094701 JOURNAL OF APPLIED PHYSICS, 110, 9, 094701 2011/11 Refereed English Research paper(scientific journal) Disclose to all
T. Seki, T. Aoki, J. Matsuo T. Seki, T. Aoki, J. Matsuo T. Seki, T. Aoki, J. Matsuo Etching of metallic materials with Cl-2 gas cluster ion beam Etching of metallic materials with Cl-2 gas cluster ion beam Etching of metallic materials with Cl-2 gas cluster ion beam SURFACE & COATINGS TECHNOLOGY, 206, 5, 789-791 SURFACE & COATINGS TECHNOLOGY, 206, 5, 789-791 SURFACE & COATINGS TECHNOLOGY, 206, 5, 789-791 2011/11 Refereed English Research paper(scientific journal) Disclose to all
Yoshinobu Wakamatsu, Hideaki Yamada, Satoshi Ninomiya, Brian N. Jones, Toshio Seki, Takaaki Aoki, Roger Webb, Jiro Matsuo Yoshinobu Wakamatsu, Hideaki Yamada, Satoshi Ninomiya, Brian N. Jones, Toshio Seki, Takaaki Aoki, Roger Webb, Jiro Matsuo Yoshinobu Wakamatsu, Hideaki Yamada, Satoshi Ninomiya, Brian N. Jones, Toshio Seki, Takaaki Aoki, Roger Webb, Jiro Matsuo Highly sensitive molecular detection with swift heavy ions Highly sensitive molecular detection with swift heavy ions Highly sensitive molecular detection with swift heavy ions NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 269, 20, 2251-2253 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 269, 20, 2251-2253 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 269, 20, 2251-2253 2011/10 Refereed English Research paper(scientific journal) Disclose to all
Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo The effects of cluster size on sputtering and surface smoothing of PMMA with gas cluster ion beams The effects of cluster size on sputtering and surface smoothing of PMMA with gas cluster ion beams The effects of cluster size on sputtering and surface smoothing of PMMA with gas cluster ion beams Transactions of the Materials Research Society of Japan, 36, 3, 309-312 Transactions of the Materials Research Society of Japan, 36, 3, 309-312 Transactions of the Materials Research Society of Japan, 36, 3, 309-312 2011/09 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Kunio Okimura, Jiro Matsuo Masaki Hada, Kunio Okimura, Jiro Matsuo Masaki Hada, Kunio Okimura, Jiro Matsuo Photo-induced lattice softening of excited-state VO2 Photo-induced lattice softening of excited-state VO2 Photo-induced lattice softening of excited-state VO2 APPLIED PHYSICS LETTERS, 99, 5, 051903 APPLIED PHYSICS LETTERS, 99, 5, 051903 APPLIED PHYSICS LETTERS, 99, 5, 051903 2011/08 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Molecular dynamics simulations of large fluorine cluster impact on silicon with supersonic velocity Molecular dynamics simulations of large fluorine cluster impact on silicon with supersonic velocity Molecular dynamics simulations of large fluorine cluster impact on silicon with supersonic velocity NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 269, 14, 1582-1585 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 269, 14, 1582-1585 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 269, 14, 1582-1585 2011/07 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo The effect of incident energy on molecular depth profiling of polymers with large Ar cluster ion beams The effect of incident energy on molecular depth profiling of polymers with large Ar cluster ion beams The effect of incident energy on molecular depth profiling of polymers with large Ar cluster ion beams SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 221-224 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 221-224 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 221-224 2011/01 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Analysis of organic semiconductor multilayers with Ar cluster secondary ion mass spectrometry Analysis of organic semiconductor multilayers with Ar cluster secondary ion mass spectrometry Analysis of organic semiconductor multilayers with Ar cluster secondary ion mass spectrometry SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 95-98 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 95-98 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 95-98 2011/01 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Kazuya Ichiki, Jiro Matsuo Masaki Hada, Kazuya Ichiki, Jiro Matsuo Masaki Hada, Kazuya Ichiki, Jiro Matsuo Characterization of vapor-deposited L-leucine nanofilm Characterization of vapor-deposited L-leucine nanofilm Characterization of vapor-deposited L-leucine nanofilm THIN SOLID FILMS, 519, 6, 1993-1997 THIN SOLID FILMS, 519, 6, 1993-1997 THIN SOLID FILMS, 519, 6, 1993-1997 2011/01 Refereed English Research paper(scientific journal) Disclose to all
Brian N. Jones, Jiro Matsuo, Yoshihiko Nakata, Hideaki Yamada, John Watts, Steven Hinder, Vladimir Palitsin, Roger Webb Brian N. Jones, Jiro Matsuo, Yoshihiko Nakata, Hideaki Yamada, John Watts, Steven Hinder, Vladimir Palitsin, Roger Webb Brian N. Jones, Jiro Matsuo, Yoshihiko Nakata, Hideaki Yamada, John Watts, Steven Hinder, Vladimir Palitsin, Roger Webb Comparison of MeV monomer ion and keV cluster ToF-SIMS Comparison of MeV monomer ion and keV cluster ToF-SIMS Comparison of MeV monomer ion and keV cluster ToF-SIMS SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 249-252 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 249-252 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 249-252 2011/01 Refereed English Research paper(scientific journal) Disclose to all
K. Ichiki, S. Ninomiya, Y. Nakata, H. Yamada, T. Seki, T. Aoki, J. Matsuo K. Ichiki, S. Ninomiya, Y. Nakata, H. Yamada, T. Seki, T. Aoki, J. Matsuo K. Ichiki, S. Ninomiya, Y. Nakata, H. Yamada, T. Seki, T. Aoki, J. Matsuo Surface morphology of PMMA surfaces bombarded with size-selected gas cluster ion beams Surface morphology of PMMA surfaces bombarded with size-selected gas cluster ion beams Surface morphology of PMMA surfaces bombarded with size-selected gas cluster ion beams SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 120-122 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 120-122 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 120-122 2011/01 Refereed English Research paper(scientific journal) Disclose to all
H. Yamada, Y. Nakata, S. Ninomiya, T. Seki, T. Aoki, J. Tamura, J. Matsuo H. Yamada, Y. Nakata, S. Ninomiya, T. Seki, T. Aoki, J. Tamura, J. Matsuo H. Yamada, Y. Nakata, S. Ninomiya, T. Seki, T. Aoki, J. Tamura, J. Matsuo MeV-energy probe SIMS imaging of major components in washed and fractured animal cells MeV-energy probe SIMS imaging of major components in washed and fractured animal cells MeV-energy probe SIMS imaging of major components in washed and fractured animal cells SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 363-366 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 363-366 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 363-366 2011/01 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 84-87 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 84-87 SURFACE AND INTERFACE ANALYSIS, 43, 1-2, 84-87 2011/01 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Jiro Matsuo Masaki Hada, Jiro Matsuo Masaki Hada, Jiro Matsuo Evaluation of lattice motion in CdTe single crystal using in-air tabletop time-resolved X-ray diffractometer Evaluation of lattice motion in CdTe single crystal using in-air tabletop time-resolved X-ray diffractometer Evaluation of lattice motion in CdTe single crystal using in-air tabletop time-resolved X-ray diffractometer BURIED INTERFACE SCIENCES WITH X-RAYS AND NEUTRONS 2010, 24, 012010 BURIED INTERFACE SCIENCES WITH X-RAYS AND NEUTRONS 2010, 24, 012010 BURIED INTERFACE SCIENCES WITH X-RAYS AND NEUTRONS 2010, 24, 012010 2011 Refereed English Research paper(international conference proceedings) Disclose to all
H Yamada, K Ichiki, Y Nakata, S Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo H Yamada, K Ichiki, Y Nakata, S Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo H Yamada, K Ichiki, Y Nakata, S Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Processing Techniques of Biomaterials: Using Gas Cluster Ion Beam for Imaging Mass Spectrometry Processing Techniques of Biomaterials: Using Gas Cluster Ion Beam for Imaging Mass Spectrometry Processing Techniques of Biomaterials: Using Gas Cluster Ion Beam for Imaging Mass Spectrometry Transactions of the Materials Research Society of Japan, 35, 4, 793-796 Transactions of the Materials Research Society of Japan, 35, 4, 793-796 Transactions of the Materials Research Society of Japan, 35, 4, 793-796 2010/12 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo SIMS Depth Profiling of Organic Materials with Ar Cluster Ion Beam SIMS Depth Profiling of Organic Materials with Ar Cluster Ion Beam SIMS Depth Profiling of Organic Materials with Ar Cluster Ion Beam Transactions of the Materials Research Society of Japan, 35, 4, 785-788 Transactions of the Materials Research Society of Japan, 35, 4, 785-788 Transactions of the Materials Research Society of Japan, 35, 4, 785-788 2010/12 Refereed English Research paper(scientific journal) Disclose to all
K Ichiki, S Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo K Ichiki, S Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo K Ichiki, S Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Sputtering Properties of Si by Size-Selected Ar Gas Cluster Ion Beam Sputtering Properties of Si by Size-Selected Ar Gas Cluster Ion Beam Sputtering Properties of Si by Size-Selected Ar Gas Cluster Ion Beam Transactions of the Materials Research Society of Japan, 35, 4, 789-792 Transactions of the Materials Research Society of Japan, 35, 4, 789-792 Transactions of the Materials Research Society of Japan, 35, 4, 789-792 2010/12 Refereed English Research paper(scientific journal) Disclose to all
Jiro Matsuo, Teruyuki Kitagawa, Toshio Seki, Takaaki Aoki Jiro Matsuo, Teruyuki Kitagawa, Toshio Seki, Takaaki Aoki Jiro Matsuo, Teruyuki Kitagawa, Toshio Seki, Takaaki Aoki Nano processing with gas cluster ion beams Nano processing with gas cluster ion beams Nano processing with gas cluster ion beams Toraibarojisuto/Journal of Japanese Society of Tribologists, 55, 776-782 Toraibarojisuto/Journal of Japanese Society of Tribologists, 55, 776-782 Toraibarojisuto/Journal of Japanese Society of Tribologists, 55, 776-782 2010/12/01 Disclose to all
Kunihiko Koike, Yu Yoshino, Takehiko Senoo, Toshio Seki, Satoshi Ninomiya, Takaaki Aoki, Jiro Matsuo Kunihiko Koike, Yu Yoshino, Takehiko Senoo, Toshio Seki, Satoshi Ninomiya, Takaaki Aoki, Jiro Matsuo Kunihiko Koike, Yu Yoshino, Takehiko Senoo, Toshio Seki, Satoshi Ninomiya, Takaaki Aoki, Jiro Matsuo Anisotropic etching using reactive cluster beams Anisotropic etching using reactive cluster beams Anisotropic etching using reactive cluster beams Applied Physics Express, 3, 12, 126501 Applied Physics Express, 3, 12, 126501 Applied Physics Express, 3, 12, 126501 2010/12 Refereed English Research paper(scientific journal) Disclose to all
MATSUO Jiro, KITAGAWA Teruyuki, SEKI Toshio, AOKI Takaaki 松尾 二郎, 北川 晃幸, 瀬木 利夫, 青木 学聡 MATSUO Jiro, KITAGAWA Teruyuki, SEKI Toshio, AOKI Takaaki Nano Processing with Gas Cluster Ion Beams ガスクラスタイオンビームによるナノ加工技術 Nano Processing with Gas Cluster Ion Beams Journal of Japanese Society of Tribologists, 55, 11, 776-782 トライボロジスト, 55, 11, 776-782 Journal of Japanese Society of Tribologists, 55, 11, 776-782 2010/11/15 Refereed Japanese Research paper(scientific journal) Disclose to all
Masaki Hada, Kunio Okimura, Jiro Matsuo Masaki Hada, Kunio Okimura, Jiro Matsuo Masaki Hada, Kunio Okimura, Jiro Matsuo Characterization of structural dynamics of VO2 thin film on c-Al2O3 using in-air time-resolved x-ray diffraction Characterization of structural dynamics of VO2 thin film on c-Al2O3 using in-air time-resolved x-ray diffraction Characterization of structural dynamics of VO2 thin film on c-Al2O3 using in-air time-resolved x-ray diffraction PHYSICAL REVIEW B, 82, 15, 153401 PHYSICAL REVIEW B, 82, 15, 153401 PHYSICAL REVIEW B, 82, 15, 153401 2010/10 Refereed English Research paper(scientific journal) Disclose to all
Jiro Matsuo, Satoshi Ninomiya, Hideaki Yamada, Kazuya Ichiki, Yoshinobu Wakamatsu, Masaki Hada, Toshio Seki, Takaaki Aoki Jiro Matsuo, Satoshi Ninomiya, Hideaki Yamada, Kazuya Ichiki, Yoshinobu Wakamatsu, Masaki Hada, Toshio Seki, Takaaki Aoki Jiro Matsuo, Satoshi Ninomiya, Hideaki Yamada, Kazuya Ichiki, Yoshinobu Wakamatsu, Masaki Hada, Toshio Seki, Takaaki Aoki SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials SURFACE AND INTERFACE ANALYSIS, 42, 10-11, 1612-1615 SURFACE AND INTERFACE ANALYSIS, 42, 10-11, 1612-1615 SURFACE AND INTERFACE ANALYSIS, 42, 10-11, 1612-1615 2010/10 Refereed English Research paper(scientific journal) Disclose to all
Hideaki Yamada, Kazuya Ichiki, Yoshihiko Nakata, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Hideaki Yamada, Kazuya Ichiki, Yoshihiko Nakata, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Hideaki Yamada, Kazuya Ichiki, Yoshihiko Nakata, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo MeV-energy probe SIMS imaging of major components in animal cells etched using large gas cluster ions MeV-energy probe SIMS imaging of major components in animal cells etched using large gas cluster ions MeV-energy probe SIMS imaging of major components in animal cells etched using large gas cluster ions NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 268, 11-12, 1736-1740 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 268, 11-12, 1736-1740 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 268, 11-12, 1736-1740 2010/06 Refereed English Research paper(scientific journal) Disclose to all
松尾 二郎 松尾 二郎 高密度励起ビームによる二次イオン質量分析法の有機・生体材料への新展開 高密度励起ビームによる二次イオン質量分析法の有機・生体材料への新展開 應用物理, 79, 4, 326-330 應用物理, 79, 4, 326-330 , 79, 4, 326-330 2010/04 Refereed Japanese Research paper(scientific journal) Disclose to all
M. Hada, J. Matsuo M. Hada, J. Matsuo M. Hada, J. Matsuo Effects of ambient pressure on Cu K alpha X-ray radiation with millijoule and high-repetition-rate femtosecond laser Effects of ambient pressure on Cu K alpha X-ray radiation with millijoule and high-repetition-rate femtosecond laser Effects of ambient pressure on Cu K alpha X-ray radiation with millijoule and high-repetition-rate femtosecond laser APPLIED PHYSICS B-LASERS AND OPTICS, 99, 1-2, 173-179 APPLIED PHYSICS B-LASERS AND OPTICS, 99, 1-2, 173-179 APPLIED PHYSICS B-LASERS AND OPTICS, 99, 1-2, 173-179 2010/04 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Molecular dynamics simulations for gas cluster ion beam processes Molecular dynamics simulations for gas cluster ion beam processes Molecular dynamics simulations for gas cluster ion beam processes VACUUM, 84, 8, 994-998 VACUUM, 84, 8, 994-998 VACUUM, 84, 8, 994-998 2010/03 Refereed English Research paper(scientific journal) Disclose to all
J. L. S. Lee, S. Ninomiya, J. Matsuo, I. S. Gilmore, M. P. Seah, A. G. Shard J. L. S. Lee, S. Ninomiya, J. Matsuo, I. S. Gilmore, M. P. Seah, A. G. Shard J. L. S. Lee, S. Ninomiya, J. Matsuo, I. S. Gilmore, M. P. Seah, A. G. Shard Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions ANALYTICAL CHEMISTRY, 82, 1, 98-105 ANALYTICAL CHEMISTRY, 82, 1, 98-105 ANALYTICAL CHEMISTRY, 82, 1, 98-105 2010/01 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Sachi Ibuki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masaki Hada, Sachi Ibuki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masaki Hada, Sachi Ibuki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Evaluation of Damage Layer in an Organic Film with Irradiation of Energetic Ion Beams Evaluation of Damage Layer in an Organic Film with Irradiation of Energetic Ion Beams Evaluation of Damage Layer in an Organic Film with Irradiation of Energetic Ion Beams JAPANESE JOURNAL OF APPLIED PHYSICS, 49, 3, 036503 JAPANESE JOURNAL OF APPLIED PHYSICS, 49, 3, 036503 JAPANESE JOURNAL OF APPLIED PHYSICS, 49, 3, 036503 2010 Refereed English Research paper(scientific journal) Disclose to all
Masaki Hada, Jiro Matsuo Masaki Hada, Jiro Matsuo Masaki Hada, Jiro Matsuo Development of Ultrafast Pulse X-ray Source in Ambient Pressure with a Millijoule High Repetition Rate Femtosecond Laser Development of Ultrafast Pulse X-ray Source in Ambient Pressure with a Millijoule High Repetition Rate Femtosecond Laser Development of Ultrafast Pulse X-ray Source in Ambient Pressure with a Millijoule High Repetition Rate Femtosecond Laser Green Energy and Technology, 44, 300-305 Green Energy and Technology, 44, 300-305 Green Energy and Technology, 44, 300-305 2010 Refereed English Research paper(scientific journal) Disclose to all
Akihiko Sagara, Miori Hiraiwa, Satoshi Shibata, Ryuichi Sugie, Keiichi Yamada Akihiko Sagara, Miori Hiraiwa, Satoshi Shibata, Ryuichi Sugie, Keiichi Yamada Akihiko Sagara, Miori Hiraiwa, Satoshi Shibata, Ryuichi Sugie, Keiichi Yamada Luminescence studies of residual damage in low-dose arsenic implanted silicon after high-temperature annealing Luminescence studies of residual damage in low-dose arsenic implanted silicon after high-temperature annealing Luminescence studies of residual damage in low-dose arsenic implanted silicon after high-temperature annealing AIP Conference Proceedings, 1321, 225-228 AIP Conference Proceedings, 1321, 225-228 AIP Conference Proceedings, 1321, 225-228 2010 Refereed English Research paper(international conference proceedings) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 23, 20, 3264-3268 RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 23, 20, 3264-3268 RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 23, 20, 3264-3268 2009/10 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Study of density effect of large gas cluster impact by molecular dynamics simulations Study of density effect of large gas cluster impact by molecular dynamics simulations Study of density effect of large gas cluster impact by molecular dynamics simulations NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 18, 2999-3001 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 18, 2999-3001 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 18, 2999-3001 2009/09 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo The emission process of secondary ions from solids bombarded with large gas cluster ions The emission process of secondary ions from solids bombarded with large gas cluster ions The emission process of secondary ions from solids bombarded with large gas cluster ions NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 16, 2601-2604 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 16, 2601-2604 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 16, 2601-2604 2009/08 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 23, 11, 1601-1606 RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 23, 11, 1601-1606 RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 23, 11, 1601-1606 2009/06 Refereed English Research paper(scientific journal) Disclose to all
Y. Nakata, H. Yamada, Y. Honda, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Y. Nakata, H. Yamada, Y. Honda, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Y. Nakata, H. Yamada, Y. Honda, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Imaging mass spectrometry with nuclear microprobes for biological applications Imaging mass spectrometry with nuclear microprobes for biological applications Imaging mass spectrometry with nuclear microprobes for biological applications NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 12-13, 2144-2148 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 12-13, 2144-2148 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 12-13, 2144-2148 2009/06 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Toshio Seki, Satoshi Ninomiya, Kazuya Ichiki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Satoshi Ninomiya, Kazuya Ichiki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Satoshi Ninomiya, Kazuya Ichiki, Jiro Matsuo Study of crater formation and sputtering process with large gas cluster impact by molecular dynamics simulations Study of crater formation and sputtering process with large gas cluster impact by molecular dynamics simulations Study of crater formation and sputtering process with large gas cluster impact by molecular dynamics simulations NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 8-9, 1424-1427 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 8-9, 1424-1427 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 8-9, 1424-1427 2009/05 Refereed English Research paper(scientific journal) Disclose to all
T. Seki, T. Aoki, J. Matsuo T. Seki, T. Aoki, J. Matsuo T. Seki, T. Aoki, J. Matsuo High-speed processing with Cl-2 cluster ion beam High-speed processing with Cl-2 cluster ion beam High-speed processing with Cl-2 cluster ion beam NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 8-9, 1444-1446 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 8-9, 1444-1446 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 267, 8-9, 1444-1446 2009/05 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Low Damage Etching of Polymer Materials for Depth Profile Analysis Using Large Ar Cluster Ion Beam Low Damage Etching of Polymer Materials for Depth Profile Analysis Using Large Ar Cluster Ion Beam Low Damage Etching of Polymer Materials for Depth Profile Analysis Using Large Ar Cluster Ion Beam Journal of Surface Analysis, 15, 3, 275-278 Journal of Surface Analysis, 15, 3, 275-278 Journal of Surface Analysis, 15, 3, 275-278 2009/02 Refereed English Research paper(scientific journal) Disclose to all
Yoshihiko Nakata, Yoshiro Honda, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Yoshihiko Nakata, Yoshiro Honda, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Yoshihiko Nakata, Yoshiro Honda, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Matrix-free high-resolution imaging mass spectrometry with high-energy ion projectiles Matrix-free high-resolution imaging mass spectrometry with high-energy ion projectiles Matrix-free high-resolution imaging mass spectrometry with high-energy ion projectiles JOURNAL OF MASS SPECTROMETRY, 44, 1, 128-136 JOURNAL OF MASS SPECTROMETRY, 44, 1, 128-136 JOURNAL OF MASS SPECTROMETRY, 44, 1, 128-136 2009/01 Refereed English Research paper(scientific journal) Disclose to all
Hideaki Yamada, Kazuya Ichiki, Yoshihiko Nakata, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Hideaki Yamada, Kazuya Ichiki, Yoshihiko Nakata, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Hideaki Yamada, Kazuya Ichiki, Yoshihiko Nakata, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo A Processing Technique for Cell Surfaces Using Gas Cluster Ions for Imaging Mass Spectrometry A Processing Technique for Cell Surfaces Using Gas Cluster Ions for Imaging Mass Spectrometry A Processing Technique for Cell Surfaces Using Gas Cluster Ions for Imaging Mass Spectrometry Journal of the Mass Spectrometry Society of Japan, 57, 3, 117-121 Journal of the Mass Spectrometry Society of Japan, 57, 3, 117-121 Journal of the Mass Spectrometry Society of Japan, 57, 3, 117-121 2009/01 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Study of damage accumulation and annealing process at low energy boron implantation using molecular dynamics simulations Study of damage accumulation and annealing process at low energy boron implantation using molecular dynamics simulations Study of damage accumulation and annealing process at low energy boron implantation using molecular dynamics simulations Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 131-132 Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 131-132 Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 131-132 2009 Refereed English Research paper(international conference proceedings) Disclose to all
Jiro Matsuo, Kazuya Ichiki, Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Tsutomu Nagayama, Masayasu Tanjyo Jiro Matsuo, Kazuya Ichiki, Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Tsutomu Nagayama, Masayasu Tanjyo Jiro Matsuo, Kazuya Ichiki, Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Tsutomu Nagayama, Masayasu Tanjyo Stress measurement of carbon cluster implanted layers with in-plane diffraction technique Stress measurement of carbon cluster implanted layers with in-plane diffraction technique Stress measurement of carbon cluster implanted layers with in-plane diffraction technique Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 84-85 Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 84-85 Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 84-85 2009 Refereed English Research paper(international conference proceedings) Disclose to all
Jiro Matsuo, Satoshi Ninomiya, Yoshihiko Nakata, Yoshiro Honda, Kazuya Ichiki, Toshio Seki, Takaaki Aoki Jiro Matsuo, Satoshi Ninomiya, Yoshihiko Nakata, Yoshiro Honda, Kazuya Ichiki, Toshio Seki, Takaaki Aoki Jiro Matsuo, Satoshi Ninomiya, Yoshihiko Nakata, Yoshiro Honda, Kazuya Ichiki, Toshio Seki, Takaaki Aoki What size of cluster is most appropriate for SIMS? What size of cluster is most appropriate for SIMS? What size of cluster is most appropriate for SIMS? APPLIED SURFACE SCIENCE, 255, 4, 1235-1238 APPLIED SURFACE SCIENCE, 255, 4, 1235-1238 APPLIED SURFACE SCIENCE, 255, 4, 1235-1238 2008/12 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Jiro Matsuo, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Yoshiro Honda, Toshio Seki, Takaaki Aoki Satoshi Ninomiya, Jiro Matsuo, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Yoshiro Honda, Toshio Seki, Takaaki Aoki Satoshi Ninomiya, Jiro Matsuo, Kazuya Ichiki, Hideaki Yamada, Yoshihiko Nakata, Yoshiro Honda, Toshio Seki, Takaaki Aoki Low Damage Etching and SIMS Depth Profiling with Large Ar Cluster Ions Low Damage Etching and SIMS Depth Profiling with Large Ar Cluster Ions Low Damage Etching and SIMS Depth Profiling with Large Ar Cluster Ions Transactions of the MRS-J, 33, 4, 1043-1046 Transactions of the MRS-J, 33, 4, 1043-1046 Transactions of the MRS-J, 33, 4, 1043-1046 2008/12 Refereed English Research paper(scientific journal) Disclose to all
Toshio Seki, Takaaki Aoki, Jiro Matsuo Toshio Seki, Takaaki Aoki, Jiro Matsuo Toshio Seki, Takaaki Aoki, Jiro Matsuo High-Speed Nano-Processing with Cluster Ion Beams High-Speed Nano-Processing with Cluster Ion Beams High-Speed Nano-Processing with Cluster Ion Beams Transactions of the MRS-J, 33, 4, 1019-1022 Transactions of the MRS-J, 33, 4, 1019-1022 Transactions of the MRS-J, 33, 4, 1019-1022 2008/12 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Yoshihiko Nakata, Yoshiro Honda, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Yoshihiko Nakata, Yoshiro Honda, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Yoshihiko Nakata, Yoshiro Honda, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo A fragment-free ionization technique for organic mass spectrometry with large Ar cluster ions A fragment-free ionization technique for organic mass spectrometry with large Ar cluster ions A fragment-free ionization technique for organic mass spectrometry with large Ar cluster ions APPLIED SURFACE SCIENCE, 255, 4, 1588-1590 APPLIED SURFACE SCIENCE, 255, 4, 1588-1590 APPLIED SURFACE SCIENCE, 255, 4, 1588-1590 2008/12 Refereed English Research paper(scientific journal) Disclose to all
Y. Nakata, Y. Honda, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Y. Nakata, Y. Honda, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Y. Nakata, Y. Honda, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Yield enhancement of molecular ions with MeV ion-induced electronic excitation Yield enhancement of molecular ions with MeV ion-induced electronic excitation Yield enhancement of molecular ions with MeV ion-induced electronic excitation APPLIED SURFACE SCIENCE, 255, 4, 1591-1594 APPLIED SURFACE SCIENCE, 255, 4, 1591-1594 APPLIED SURFACE SCIENCE, 255, 4, 1591-1594 2008/12 Refereed English Research paper(scientific journal) Disclose to all
Yoshiro Honda, Yoshihiko Nakata, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Yoshiro Honda, Yoshihiko Nakata, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Yoshiro Honda, Yoshihiko Nakata, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo SIMS Analysis of Biological Mixtures with Fast Heavy Ion Irradiation SIMS Analysis of Biological Mixtures with Fast Heavy Ion Irradiation SIMS Analysis of Biological Mixtures with Fast Heavy Ion Irradiation Transactions of the MRS-J, 33, 4, 1039-1041 Transactions of the MRS-J, 33, 4, 1039-1041 Transactions of the MRS-J, 33, 4, 1039-1041 2008/12 Refereed English Research paper(scientific journal) Disclose to all
K. Ichiki, S. Ninomiya, Y. Nakata, Y. Honda, T. Seki, T. Aoki, J. Matsuo K. Ichiki, S. Ninomiya, Y. Nakata, Y. Honda, T. Seki, T. Aoki, J. Matsuo K. Ichiki, S. Ninomiya, Y. Nakata, Y. Honda, T. Seki, T. Aoki, J. Matsuo High sputtering yields of organic compounds by large gas cluster ions High sputtering yields of organic compounds by large gas cluster ions High sputtering yields of organic compounds by large gas cluster ions APPLIED SURFACE SCIENCE, 255, 4, 1148-1150 APPLIED SURFACE SCIENCE, 255, 4, 1148-1150 APPLIED SURFACE SCIENCE, 255, 4, 1148-1150 2008/12 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Toshio Seki, Satoshi Ninomiya, Jiro Matsuo Takaaki Aoki, Toshio Seki, Satoshi Ninomiya, Jiro Matsuo Takaaki Aoki, Toshio Seki, Satoshi Ninomiya, Jiro Matsuo MD simulation study of the sputtering process by high-energy gas cluster impact MD simulation study of the sputtering process by high-energy gas cluster impact MD simulation study of the sputtering process by high-energy gas cluster impact APPLIED SURFACE SCIENCE, 255, 4, 944-947 APPLIED SURFACE SCIENCE, 255, 4, 944-947 APPLIED SURFACE SCIENCE, 255, 4, 944-947 2008/12 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Yoshiro Honda, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Yoshiro Honda, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Yoshiro Honda, Toshio Seki, Takaaki Aoki, Jiro Matsuo Secondary ion emission from Si bombarded with large Ar cluster ions under UHV conditions Secondary ion emission from Si bombarded with large Ar cluster ions under UHV conditions Secondary ion emission from Si bombarded with large Ar cluster ions under UHV conditions APPLIED SURFACE SCIENCE, 255, 4, 880-882 APPLIED SURFACE SCIENCE, 255, 4, 880-882 APPLIED SURFACE SCIENCE, 255, 4, 880-882 2008/12 Refereed English Research paper(scientific journal) Disclose to all
Takeshi Hikata, Kazuhiko Hayashi, Tomoyuki Mizukoshi, Yoshiaki Sakurai, Itsuo Ishigami, Takaaki Aoki, Toshio Seki, Jiro Matsuo Takeshi Hikata, Kazuhiko Hayashi, Tomoyuki Mizukoshi, Yoshiaki Sakurai, Itsuo Ishigami, Takaaki Aoki, Toshio Seki, Jiro Matsuo Takeshi Hikata, Kazuhiko Hayashi, Tomoyuki Mizukoshi, Yoshiaki Sakurai, Itsuo Ishigami, Takaaki Aoki, Toshio Seki, Jiro Matsuo Carbon nanotubes from a divided catalyst: the carbon transmission method Carbon nanotubes from a divided catalyst: the carbon transmission method Carbon nanotubes from a divided catalyst: the carbon transmission method APPLIED PHYSICS EXPRESS, 1, 3, 034002 APPLIED PHYSICS EXPRESS, 1, 3, 034002 APPLIED PHYSICS EXPRESS, 1, 3, 034002 2008/03 Refereed English Research paper(scientific journal) Disclose to all
Yamada Isao, Matsuo Jiro, Toyoda Noriaki Yamada Isao, Matsuo Jiro, Toyoda Noriaki Yamada Isao, Matsuo Jiro, Toyoda Noriaki Summary of Industry-Academia Collaboration Projects on Cluster Ion Beam Process Technology Summary of Industry-Academia Collaboration Projects on Cluster Ion Beam Process Technology Summary of Industry-Academia Collaboration Projects on Cluster Ion Beam Process Technology ION IMPLANTATION TECHNOLOGY 2008, 1066, 415-+ ION IMPLANTATION TECHNOLOGY 2008, 1066, 415-+ ION IMPLANTATION TECHNOLOGY 2008, 1066, 415-+ 2008 Refereed Disclose to all
S. Kakuta, S. Sasaki, K. Furusawa, T. Seki, T. Aoki, J. Matsuo S. Kakuta, S. Sasaki, K. Furusawa, T. Seki, T. Aoki, J. Matsuo S. Kakuta, S. Sasaki, K. Furusawa, T. Seki, T. Aoki, J. Matsuo Low damage smoothing of magnetic materials using off-nonnal gas cluster ion beam irradiation Low damage smoothing of magnetic materials using off-nonnal gas cluster ion beam irradiation Low damage smoothing of magnetic materials using off-nonnal gas cluster ion beam irradiation SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8632-8636 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8632-8636 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8632-8636 2007/08 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Toshio Seki, Satoshi Ninomiya, Jiro Matsuo Takaaki Aoki, Toshio Seki, Satoshi Ninomiya, Jiro Matsuo Takaaki Aoki, Toshio Seki, Satoshi Ninomiya, Jiro Matsuo Molecular dynamics study of monomer and dimer emission processes with high energy gas cluster ion impact Molecular dynamics study of monomer and dimer emission processes with high energy gas cluster ion impact Molecular dynamics study of monomer and dimer emission processes with high energy gas cluster ion impact SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8427-8430 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8427-8430 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8427-8430 2007/08 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Molecular dynamics study of glancing angle gas cluster irradiation on irregular-structured surfaces Molecular dynamics study of glancing angle gas cluster irradiation on irregular-structured surfaces Molecular dynamics study of glancing angle gas cluster irradiation on irregular-structured surfaces NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 261, 1-2, 639-642 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 261, 1-2, 639-642 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 261, 1-2, 639-642 2007/08 Refereed English Research paper(scientific journal) Disclose to all
T. Seki, J. Matsuo T. Seki, J. Matsuo T. Seki, J. Matsuo Energy distribution of high-energy cluster ion beams Energy distribution of high-energy cluster ion beams Energy distribution of high-energy cluster ion beams NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 261, 1-2, 647-650 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 261, 1-2, 647-650 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 261, 1-2, 647-650 2007/08 English Research paper(scientific journal) Disclose to all
Toshio Seki, Jiro Matsuo Toshio Seki, Jiro Matsuo Toshio Seki, Jiro Matsuo Surface processing with high-energy gas cluster ion beams Surface processing with high-energy gas cluster ion beams Surface processing with high-energy gas cluster ion beams SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8646-8649 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8646-8649 SURFACE & COATINGS TECHNOLOGY, 201, 19-20, 8646-8649 2007/08 English Research paper(scientific journal) Disclose to all
T. Seki, J. Matsuo T. Seki, J. Matsuo T. Seki, J. Matsuo High-speed processing with high-energy SF6 cluster ion beam High-speed processing with high-energy SF6 cluster ion beam High-speed processing with high-energy SF6 cluster ion beam NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 666-669 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 666-669 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 666-669 2007/04 English Research paper(scientific journal) Disclose to all
A. Suzuki, E. Bourelle, A. Sato, T. Seki, J. Matsuo A. Suzuki, E. Bourelle, A. Sato, T. Seki, J. Matsuo A. Suzuki, E. Bourelle, A. Sato, T. Seki, J. Matsuo Effect of oblique irradiation of gas cluster ion beam on surface properties of gold mirrors Effect of oblique irradiation of gas cluster ion beam on surface properties of gold mirrors Effect of oblique irradiation of gas cluster ion beam on surface properties of gold mirrors NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 649-652 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 649-652 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 649-652 2007/04 English Research paper(scientific journal) Disclose to all
H. Tokioka, H. Yamarin, T. Fujino, M. Inoue, T. Seki, J. Matsuo H. Tokioka, H. Yamarin, T. Fujino, M. Inoue, T. Seki, J. Matsuo H. Tokioka, H. Yamarin, T. Fujino, M. Inoue, T. Seki, J. Matsuo Low-damage surface smoothing of laser crystallized polycrystalline silicon using gas cluster ion beam Low-damage surface smoothing of laser crystallized polycrystalline silicon using gas cluster ion beam Low-damage surface smoothing of laser crystallized polycrystalline silicon using gas cluster ion beam NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 658-661 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 658-661 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 658-661 2007/04 English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Molecular dynamics simulations of surface smoothing and sputtering process with glancing-angle gas cluster ion beams Molecular dynamics simulations of surface smoothing and sputtering process with glancing-angle gas cluster ion beams Molecular dynamics simulations of surface smoothing and sputtering process with glancing-angle gas cluster ion beams NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 645-648 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 645-648 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 645-648 2007/04 Refereed English Research paper(scientific journal) Disclose to all
S. Kakuta, S. Sasaki, T. Hirano, K. Ueda, T. Seki, S. Ninomiya, M. Hada, J. Matsuo S. Kakuta, S. Sasaki, T. Hirano, K. Ueda, T. Seki, S. Ninomiya, M. Hada, J. Matsuo S. Kakuta, S. Sasaki, T. Hirano, K. Ueda, T. Seki, S. Ninomiya, M. Hada, J. Matsuo Low damage smoothing of magnetic material films using a gas cluster ion beam Low damage smoothing of magnetic material films using a gas cluster ion beam Low damage smoothing of magnetic material films using a gas cluster ion beam NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 677-682 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 677-682 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 677-682 2007/04 English Research paper(scientific journal) Disclose to all
Jiro Matsuo, Satoshi Ninomiya, Yoshihiko Nakata, Kazuya Ichiki, Takaaki Aoki, Toshio Seki Jiro Matsuo, Satoshi Ninomiya, Yoshihiko Nakata, Kazuya Ichiki, Takaaki Aoki, Toshio Seki Jiro Matsuo, Satoshi Ninomiya, Yoshihiko Nakata, Kazuya Ichiki, Takaaki Aoki, Toshio Seki Size effect in cluster collision on solid surfaces Size effect in cluster collision on solid surfaces Size effect in cluster collision on solid surfaces NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 627-631 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 627-631 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 257, 627-631 2007/04 Refereed English Research paper(scientific journal) Disclose to all
Yoshihiko Nakata, Satoshi Ninomiya, Jiro Matsuo Yoshihiko Nakata, Satoshi Ninomiya, Jiro Matsuo Yoshihiko Nakata, Satoshi Ninomiya, Jiro Matsuo Secondary ion emission from bio-molecular thin films under ion bombardment Secondary ion emission from bio-molecular thin films under ion bombardment Secondary ion emission from bio-molecular thin films under ion bombardment NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 489-492 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 489-492 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 489-492 2007/03 English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Yoshihiko Nakata, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Yoshihiko Nakata, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Yoshihiko Nakata, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Measurements of secondary ions emitted from organic compounds bombarded with large gas cluster ions Measurements of secondary ions emitted from organic compounds bombarded with large gas cluster ions Measurements of secondary ions emitted from organic compounds bombarded with large gas cluster ions NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 493-496 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 493-496 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 493-496 2007/03 Refereed English Research paper(scientific journal) Disclose to all
K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 350-353 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 350-353 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 350-353 2007/03 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo The effect of incident cluster ion energy and size on secondary ion yields emitted from Si The effect of incident cluster ion energy and size on secondary ion yields emitted from Si The effect of incident cluster ion energy and size on secondary ion yields emitted from Si NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 528-531 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 528-531 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 256, 1, 528-531 2007/03 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Molecular dynamics study of surface modification with a glancing angle gas cluster ion beam Molecular dynamics study of surface modification with a glancing angle gas cluster ion beam Molecular dynamics study of surface modification with a glancing angle gas cluster ion beam NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 255, 1, 265-268 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 255, 1, 265-268 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 255, 1, 265-268 2007/02 Refereed English Research paper(scientific journal) Disclose to all
Y. Nakata, Y. Honda, S. Ninomiya, J. Matsuo Y. Nakata, Y. Honda, S. Ninomiya, J. Matsuo Y. Nakata, Y. Honda, S. Ninomiya, J. Matsuo Ion-induced emission of amino acid molecular ions from thin films Ion-induced emission of amino acid molecular ions from thin films Ion-induced emission of amino acid molecular ions from thin films TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 899-901 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 899-901 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 899-901 2007 English Research paper(international conference proceedings) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo The effect of incident cluster ion size on secondary ion yields produced from Si The effect of incident cluster ion size on secondary ion yields produced from Si The effect of incident cluster ion size on secondary ion yields produced from Si TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 895-898 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 895-898 TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 32, 4, 895-898 2007 Refereed English Research paper(international conference proceedings) Disclose to all
Satoshi Ninomiya, Takaaki Aoki, Toshio Seki, Jiro Matsuo Satoshi Ninomiya, Takaaki Aoki, Toshio Seki, Jiro Matsuo Satoshi Ninomiya, Takaaki Aoki, Toshio Seki, Jiro Matsuo Secondary ion measurements for oxygen cluster ion SIMS Secondary ion measurements for oxygen cluster ion SIMS Secondary ion measurements for oxygen cluster ion SIMS APPLIED SURFACE SCIENCE, 252, 19, 7290-7292 APPLIED SURFACE SCIENCE, 252, 19, 7290-7292 APPLIED SURFACE SCIENCE, 252, 19, 7290-7292 2006/07 Refereed English Research paper(scientific journal) Disclose to all
Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Molecular dynamics study of particle emission by reactive cluster ion impact Molecular dynamics study of particle emission by reactive cluster ion impact Molecular dynamics study of particle emission by reactive cluster ion impact APPLIED SURFACE SCIENCE, 252, 19, 6466-6469 APPLIED SURFACE SCIENCE, 252, 19, 6466-6469 APPLIED SURFACE SCIENCE, 252, 19, 6466-6469 2006/07 Refereed English Research paper(scientific journal) Disclose to all
Satoshi Ninomiya, Takaaki Aoki, Toshio Seki, Jiro Matsuo Satoshi Ninomiya, Takaaki Aoki, Toshio Seki, Jiro Matsuo Satoshi Ninomiya, Takaaki Aoki, Toshio Seki, Jiro Matsuo High-intensity Si cluster ion emission from a silicon target bombarded with large Ar cluster ions High-intensity Si cluster ion emission from a silicon target bombarded with large Ar cluster ions High-intensity Si cluster ion emission from a silicon target bombarded with large Ar cluster ions APPLIED SURFACE SCIENCE, 252, 19, 6550-6553 APPLIED SURFACE SCIENCE, 252, 19, 6550-6553 APPLIED SURFACE SCIENCE, 252, 19, 6550-6553 2006/07 Refereed English Research paper(scientific journal) Disclose to all
C Heck, T Seki, T Oosawa, M Chikamatsu, N Tanigaki, T Hiraga, J Matsuo C Heck, T Seki, T Oosawa, M Chikamatsu, N Tanigaki, T Hiraga, J Matsuo C Heck, T Seki, T Oosawa, M Chikamatsu, N Tanigaki, T Hiraga, J Matsuo ITO surface smoothing with argon cluster ion beam ITO surface smoothing with argon cluster ion beam ITO surface smoothing with argon cluster ion beam NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 140-142 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 140-142 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 140-142 2006/01 Refereed English Research paper(scientific journal) Disclose to all
瀬木 利夫, 松尾 二郎 瀬木 利夫, 松尾 二郎 High-Speed Nano-Processing with Cluster Ion Beams High-Speed Nano-Processing with Cluster Ion Beams High-Speed Nano-Processing with Cluster Ion Beams AIP Conference Proceedings, 214-217 AIP Conference Proceedings, 214-217 AIP Conference Proceedings, 214-217 2006/01 Refereed English Research paper(scientific journal) Disclose to all
T Seki, T Murase, J Matsuo T Seki, T Murase, J Matsuo T Seki, T Murase, J Matsuo Cluster size dependence of sputtering yield by cluster ion beam irradiation Cluster size dependence of sputtering yield by cluster ion beam irradiation Cluster size dependence of sputtering yield by cluster ion beam irradiation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 179-181 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 179-181 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 179-181 2006/01 Refereed English Research paper(scientific journal) Disclose to all
T Aoki, J Matsuo T Aoki, J Matsuo T Aoki, J Matsuo Molecular dynamics simulations of surface modification and damage formation by gas cluster ion impacts Molecular dynamics simulations of surface modification and damage formation by gas cluster ion impacts Molecular dynamics simulations of surface modification and damage formation by gas cluster ion impacts NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 517-519 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 517-519 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 242, 1-2, 517-519 2006/01 Refereed English Research paper(scientific journal) Disclose to all
T. Aoki, J. Matsuo T. Aoki, J. Matsuo T. Aoki, J. Matsuo Molecular dynamics simulations of the cluster-size effect on the sputtering process with reactive gas cluster ions Molecular dynamics simulations of the cluster-size effect on the sputtering process with reactive gas cluster ions Molecular dynamics simulations of the cluster-size effect on the sputtering process with reactive gas cluster ions Materials Research Society Symposium Proceedings, 908, 18-24 Materials Research Society Symposium Proceedings, 908, 18-24 Materials Research Society Symposium Proceedings, 908, 18-24 2006 Refereed English Research paper(scientific journal) Disclose to all
E Bourelle, A Suzuki, A Sato, T Seki, J Matsuo E Bourelle, A Suzuki, A Sato, T Seki, J Matsuo E Bourelle, A Suzuki, A Sato, T Seki, J Matsuo Sidewall polishing with a gas cluster ion beam for photonic device applications Sidewall polishing with a gas cluster ion beam for photonic device applications Sidewall polishing with a gas cluster ion beam for photonic device applications NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 241, 1-4, 622-625 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 241, 1-4, 622-625 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 241, 1-4, 622-625 2005/12 Refereed English Research paper(scientific journal) Disclose to all
T Seki, J Matsuo T Seki, J Matsuo T Seki, J Matsuo Energy distributions of high current cluster ion beams Energy distributions of high current cluster ion beams Energy distributions of high current cluster ion beams NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 241, 1-4, 604-608 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 241, 1-4, 604-608 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 241, 1-4, 604-608 2005/12 Refereed English Research paper(scientific journal) Disclose to all
T Aoki, J Matsuo T Aoki, J Matsuo T Aoki, J Matsuo Molecular dynamics study of the angular dependence of reactive cluster impacts Molecular dynamics study of the angular dependence of reactive cluster impacts Molecular dynamics study of the angular dependence of reactive cluster impacts NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 241, 1-4, 594-598 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 241, 1-4, 594-598 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 241, 1-4, 594-598 2005/12 Refereed English Research paper(scientific journal) Disclose to all
T Seki, J Matsuo T Seki, J Matsuo T Seki, J Matsuo Development of 1 mA cluster ion beam source Development of 1 mA cluster ion beam source Development of 1 mA cluster ion beam source NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 455-458 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 455-458 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 237, 1-2, 455-458 2005/08 Refereed English Research paper(scientific journal) Disclose to all
S Kakuta, T Seki, S Sasaki, K Furusawa, T Aoki, J Matsuo S Kakuta, T Seki, S Sasaki, K Furusawa, T Aoki, J Matsuo S Kakuta, T Seki, S Sasaki, K Furusawa, T Aoki, J Matsuo Size and energy distribution of gas cluster ion beam measured by energy resolved time of flight mass spectroscopy Size and energy distribution of gas cluster ion beam measured by energy resolved time of flight mass spectroscopy Size and energy distribution of gas cluster ion beam measured by energy resolved time of flight mass spectroscopy SURFACE & COATINGS TECHNOLOGY, 196, 1-3, 198-202 SURFACE & COATINGS TECHNOLOGY, 196, 1-3, 198-202 SURFACE & COATINGS TECHNOLOGY, 196, 1-3, 198-202 2005/06 Refereed English Research paper(scientific journal) Disclose to all
Yoshihiko Nakata, Satoshi Ninomiya, Takaaki Aoki, Hidetsugu Tsuchida, Jiro Matsuo, Akio Itoh Yoshihiko Nakata, Satoshi Ninomiya, Takaaki Aoki, Hidetsugu Tsuchida, Jiro Matsuo, Akio Itoh Yoshihiko Nakata, Satoshi Ninomiya, Takaaki Aoki, Hidetsugu Tsuchida, Jiro Matsuo, Akio Itoh A Comparison of Ions with Neutrals Emitted from Semiconductors Bombarded by MeV Si Ions A Comparison of Ions with Neutrals Emitted from Semiconductors Bombarded by MeV Si Ions A Comparison of Ions with Neutrals Emitted from Semiconductors Bombarded by MeV Si Ions Transactions of the Materials Research Society of Japan, 30, 3, 797-800 Transactions of the Materials Research Society of Japan, 30, 3, 797-800 Transactions of the Materials Research Society of Japan, 30, 3, 797-800 2005/06 Refereed English Research paper(scientific journal) Disclose to all
T. Aoki, J. Matsuo T. Aoki, J. Matsuo T. Aoki, J. Matsuo Molecular dynamics study of suface structure and sputtering process by sequencial fluorine cluster impacts Molecular dynamics study of suface structure and sputtering process by sequencial fluorine cluster impacts Molecular dynamics study of suface structure and sputtering process by sequencial fluorine cluster impacts Materials Research Society Symposium Proceedings, 843, 189-194 Materials Research Society Symposium Proceedings, 843, 189-194 Materials Research Society Symposium Proceedings, 843, 189-194 2005 Refereed English Research paper(scientific journal) Disclose to all
Claire Heck, Takeru Oosawa, Masayuki Chikamatsu, Nobu Tanigaki, Toshio Seki, Jiro Matsuo Claire Heck, Takeru Oosawa, Masayuki Chikamatsu, Nobu Tanigaki, Toshio Seki, Jiro Matsuo Claire Heck, Takeru Oosawa, Masayuki Chikamatsu, Nobu Tanigaki, Toshio Seki, Jiro Matsuo Organic electroluminescent device on ITO smoothed with Ar cluster ion beam Organic electroluminescent device on ITO smoothed with Ar cluster ion beam Organic electroluminescent device on ITO smoothed with Ar cluster ion beam Nonlinear Optics Quantum Optics, 34, 1-4, 255-258 Nonlinear Optics Quantum Optics, 34, 1-4, 255-258 Nonlinear Optics Quantum Optics, 34, 1-4, 255-258 2005 Refereed English Research paper(scientific journal) Disclose to all
Teruyuki Kitagawa, Noriaki Toyoda, Harushige Tsubakino, Jiro Matsuo, Isao Yamada Teruyuki Kitagawa, Noriaki Toyoda, Harushige Tsubakino, Jiro Matsuo, Isao Yamada Teruyuki Kitagawa, Noriaki Toyoda, Harushige Tsubakino, Jiro Matsuo, Isao Yamada Comparison of irradiation effects between cluster and monomer for DLC film deposition Comparison of irradiation effects between cluster and monomer for DLC film deposition Comparison of irradiation effects between cluster and monomer for DLC film deposition Novel Materials Processing by Advanced Electromagnetic Energy Sources, 245-248 Novel Materials Processing by Advanced Electromagnetic Energy Sources, 245-248 Novel Materials Processing by Advanced Electromagnetic Energy Sources, 245-248 2005 Refereed English Disclose to all
H. Kageyama, T. Asanuma, T. Takeuchi, K. Kadono, J. Matsuo, T. Seki, T. Kitagawa, N. Toyoda, Y. Shimizugawa, T. Uruga H. Kageyama, T. Asanuma, T. Takeuchi, K. Kadono, J. Matsuo, T. Seki, T. Kitagawa, N. Toyoda, Y. Shimizugawa, T. Uruga H. Kageyama, T. Asanuma, T. Takeuchi, K. Kadono, J. Matsuo, T. Seki, T. Kitagawa, N. Toyoda, Y. Shimizugawa, T. Uruga Glancing angle fluorescence XAFS study on metal oxide thin films obtained by oxygen gas cluster ion beam assisted deposition techniques Glancing angle fluorescence XAFS study on metal oxide thin films obtained by oxygen gas cluster ion beam assisted deposition techniques Glancing angle fluorescence XAFS study on metal oxide thin films obtained by oxygen gas cluster ion beam assisted deposition techniques Physica Scripta T, T115, 504-506 Physica Scripta T, T115, 504-506 Physica Scripta T, T115, 504-506 2005 Refereed English Research paper(scientific journal) Disclose to all
Kageyama H, Asanuma T, Takeuchi T, Kadono K, Matsuo J, Seki T, Kitagawa T, Toyoda N, Shimizugawa Y, Uruga T Kageyama H, Asanuma T, Takeuchi T, Kadono K, Matsuo J, Seki T, Kitagawa T, Toyoda N, Shimizugawa Y, Uruga T Kageyama H, Asanuma T, Takeuchi T, Kadono K, Matsuo J, Seki T, Kitagawa T, Toyoda N, Shimizugawa Y, Uruga T Glancing angle fluorescence XAFS study on metal oxide thin films obtained by oxygen gas cluster ion beam assisted deposition techniques Glancing angle fluorescence XAFS study on metal oxide thin films obtained by oxygen gas cluster ion beam assisted deposition techniques Glancing angle fluorescence XAFS study on metal oxide thin films obtained by oxygen gas cluster ion beam assisted deposition techniques PHYSICA SCRIPTA, T115, 504-506 PHYSICA SCRIPTA, T115, 504-506 PHYSICA SCRIPTA, T115, 504-506 2005 Refereed Disclose to all
E Bourelle, A Suzuki, A Sato, T Seki, J Matsuo E Bourelle, A Suzuki, A Sato, T Seki, J Matsuo E Bourelle, A Suzuki, A Sato, T Seki, J Matsuo Polishing of sidewall surfaces using a gas cluster ion beam Polishing of sidewall surfaces using a gas cluster ion beam Polishing of sidewall surfaces using a gas cluster ion beam JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 43, 10A, L1253-L1255 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 43, 10A, L1253-L1255 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 43, 10A, L1253-L1255 2004/10 Refereed English Research paper(scientific journal) Disclose to all
J Matsuo, C Okubo, T Seki, T Aoki, N Toyoda, Yamada, I J Matsuo, C Okubo, T Seki, T Aoki, N Toyoda, Yamada, I J Matsuo, C Okubo, T Seki, T Aoki, N Toyoda, Yamada, I A new secondary ion mass spectrometry (SIMS) system with high-intensity cluster ion source A new secondary ion mass spectrometry (SIMS) system with high-intensity cluster ion source A new secondary ion mass spectrometry (SIMS) system with high-intensity cluster ion source NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 219, 463-467 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 219, 463-467 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 219, 463-467 2004/06 Refereed English Research paper(scientific journal) Disclose to all
T Seki, J Matsuo T Seki, J Matsuo T Seki, J Matsuo Surface smoothing with large current cluster ion beam Surface smoothing with large current cluster ion beam Surface smoothing with large current cluster ion beam NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 216, 191-195 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 216, 191-195 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 216, 191-195 2004/02 Refereed English Research paper(scientific journal) Disclose to all
N. Toyoda, J. Matsuo, I. Yamada N. Toyoda, J. Matsuo, I. Yamada N. Toyoda, J. Matsuo, I. Yamada Surface modification with gas cluster ion beams from fundamental characteristics to applications Surface modification with gas cluster ion beams from fundamental characteristics to applications Surface modification with gas cluster ion beams from fundamental characteristics to applications Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 216, 1-4, 379-389 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 216, 1-4, 379-389 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 216, 1-4, 379-389 2004/02 Refereed English Research paper(international conference proceedings) Disclose to all
Takaaki Aoki, Jiro Matsuo, Isao Yamada Takaaki Aoki, Jiro Matsuo, Isao Yamada Takaaki Aoki, Jiro Matsuo, Isao Yamada Molecular Dynamics Study Of Surface Morphological Evolution By Cluster Impacts Molecular Dynamics Study Of Surface Morphological Evolution By Cluster Impacts Molecular Dynamics Study Of Surface Morphological Evolution By Cluster Impacts MRS Proceedings, 792, R4.7.1-R4.7.6 MRS Proceedings, 792, R4.7.1-R4.7.6 MRS Proceedings, 792, R4.7.1-R4.7.6 2004 Refereed English Research paper(scientific journal) Disclose to all
K. Kimura, Y. Oota, K. Nakajima, M. Suzuki, T. Aoki, J. Matsuo, A. Agarwal, B. Freer, A. Stevenson, M. Ameen K. Kimura, Y. Oota, K. Nakajima, M. Suzuki, T. Aoki, J. Matsuo, A. Agarwal, B. Freer, A. Stevenson, M. Ameen K. Kimura, Y. Oota, K. Nakajima, M. Suzuki, T. Aoki, J. Matsuo, A. Agarwal, B. Freer, A. Stevenson, M. Ameen Molecular effect on projected range in ultralow-energy ion implantation Molecular effect on projected range in ultralow-energy ion implantation Molecular effect on projected range in ultralow-energy ion implantation Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 211, 2, 206-210 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 211, 2, 206-210 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 211, 2, 206-210 2003/10 English Research paper(scientific journal) Disclose to all
Isao Yamada, Jiro Matsuo, Noriaki Toyoda Isao Yamada, Jiro Matsuo, Noriaki Toyoda Isao Yamada, Jiro Matsuo, Noriaki Toyoda METI/NEDO Projects on Cluster Ion Beam Process Technology METI/NEDO Projects on Cluster Ion Beam Process Technology METI/NEDO Projects on Cluster Ion Beam Process Technology AIP Conference Proceedings, 680, 727-730 AIP Conference Proceedings, 680, 727-730 AIP Conference Proceedings, 680, 727-730 2003/08/26 Refereed English Research paper(international conference proceedings) Disclose to all
Kitagawa T, Miyauchi K, Kanda K, Shimizugawa Y, Toyoda N, Tsubakino H, Matsui S, Matsuo J, Yamada I Kitagawa T, Miyauchi K, Kanda K, Shimizugawa Y, Toyoda N, Tsubakino H, Matsui S, Matsuo J, Yamada I Kitagawa T, Miyauchi K, Kanda K, Shimizugawa Y, Toyoda N, Tsubakino H, Matsui S, Matsuo J, Yamada I Near edge X-ray absorption fine structure study for optimization of hard diamond-like carbon film formation with Ar cluster ion beam Near edge X-ray absorption fine structure study for optimization of hard diamond-like carbon film formation with Ar cluster ion beam Near edge X-ray absorption fine structure study for optimization of hard diamond-like carbon film formation with Ar cluster ion beam JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 42, 6B, 3971-3975 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 42, 6B, 3971-3975 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 42, 6B, 3971-3975 2003/06 Refereed Disclose to all
T Aoki, J Matsuo, G Takaoka, Yamada, I T Aoki, J Matsuo, G Takaoka, Yamada, I T Aoki, J Matsuo, G Takaoka, Yamada, I Cluster species and cluster size dependence of damage formation by cluster ion impact Cluster species and cluster size dependence of damage formation by cluster ion impact Cluster species and cluster size dependence of damage formation by cluster ion impact NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 861-865 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 861-865 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 861-865 2003/05 Refereed English Research paper(scientific journal) Disclose to all
J Matsuo, T Seki, T Aoki, Yamada, I J Matsuo, T Seki, T Aoki, Yamada, I J Matsuo, T Seki, T Aoki, Yamada, I Atomistic study of cluster collision on solid surfaces Atomistic study of cluster collision on solid surfaces Atomistic study of cluster collision on solid surfaces NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 838-841 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 838-841 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 838-841 2003/05 Refereed English Research paper(scientific journal) Disclose to all
Yamada, I, J Matsuo, N Toyoda Yamada, I, J Matsuo, N Toyoda Yamada, I, J Matsuo, N Toyoda Cluster ion beam process technology Cluster ion beam process technology Cluster ion beam process technology NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 820-829 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 820-829 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 206, 820-829 2003/05 Refereed English Research paper(scientific journal) Disclose to all
R. C. Birtcher, A. W. McCormick, P. M. Baldo, N. Toyoda, I. Yamada, J. Matsuo R. C. Birtcher, A. W. McCormick, P. M. Baldo, N. Toyoda, I. Yamada, J. Matsuo R. C. Birtcher, A. W. McCormick, P. M. Baldo, N. Toyoda, I. Yamada, J. Matsuo Gold nanoparticles sputtered by single ions and clusters Gold nanoparticles sputtered by single ions and clusters Gold nanoparticles sputtered by single ions and clusters Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 851-854 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 851-854 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 851-854 2003/05 Refereed English Research paper(international conference proceedings) Disclose to all
Teruyuki Kitagawa, Kazuya Miyauchi, Noriaki Toyoda, Kazuhiro Kanda, Tokumi Ikeda, Harushige Tsubakino, Jiro Matsuo, Shinji Matsui, Isao Yamada Teruyuki Kitagawa, Kazuya Miyauchi, Noriaki Toyoda, Kazuhiro Kanda, Tokumi Ikeda, Harushige Tsubakino, Jiro Matsuo, Shinji Matsui, Isao Yamada Teruyuki Kitagawa, Kazuya Miyauchi, Noriaki Toyoda, Kazuhiro Kanda, Tokumi Ikeda, Harushige Tsubakino, Jiro Matsuo, Shinji Matsui, Isao Yamada Influence of residual Ar+ in Ar cluster ion beam for DLC film formation Influence of residual Ar+ in Ar cluster ion beam for DLC film formation Influence of residual Ar+ in Ar cluster ion beam for DLC film formation Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 884-888 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 884-888 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 884-888 2003/05 Refereed English Research paper(international conference proceedings) Disclose to all
Takaaki Aoki, Jiro Matsuo, Gikan Takaoka, Noriaki Toyoda, Isao Yamada Takaaki Aoki, Jiro Matsuo, Gikan Takaoka, Noriaki Toyoda, Isao Yamada Takaaki Aoki, Jiro Matsuo, Gikan Takaoka, Noriaki Toyoda, Isao Yamada Defect characteristics by boron cluster ion implantation Defect characteristics by boron cluster ion implantation Defect characteristics by boron cluster ion implantation Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 855-860 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 855-860 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 855-860 2003/05 English Research paper(international conference proceedings) Disclose to all
A. Nakai, T. Aoki, T. Seki, J. Matsuo, G. H. Takaoka, I. Yamada A. Nakai, T. Aoki, T. Seki, J. Matsuo, G. H. Takaoka, I. Yamada A. Nakai, T. Aoki, T. Seki, J. Matsuo, G. H. Takaoka, I. Yamada Modeling of surface smoothing process by cluster ion beam irradiation Modeling of surface smoothing process by cluster ion beam irradiation Modeling of surface smoothing process by cluster ion beam irradiation Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 842-845 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 842-845 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 842-845 2003/05 Refereed English Research paper(international conference proceedings) Disclose to all
T. Seki, J. Matsuo, G. H. Takaoka, I. Yamada T. Seki, J. Matsuo, G. H. Takaoka, I. Yamada T. Seki, J. Matsuo, G. H. Takaoka, I. Yamada Generation of the large current cluster ion beam Generation of the large current cluster ion beam Generation of the large current cluster ion beam Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 902-906 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 902-906 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 902-906 2003/05 Refereed English Research paper(international conference proceedings) Disclose to all
O. Nakatsu, J. Matsuo, K. Omoto, T. Seki, G. Takaoka, I. Yamada O. Nakatsu, J. Matsuo, K. Omoto, T. Seki, G. Takaoka, I. Yamada O. Nakatsu, J. Matsuo, K. Omoto, T. Seki, G. Takaoka, I. Yamada Titanium-dioxide film formation using gas cluster ion beam assisted deposition technique Titanium-dioxide film formation using gas cluster ion beam assisted deposition technique Titanium-dioxide film formation using gas cluster ion beam assisted deposition technique Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 866-869 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 866-869 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 206, 866-869 2003/05 English Research paper(international conference proceedings) Disclose to all
Takaaki Aoki, Jiro Matsuo, Gikan Takaoka Takaaki Aoki, Jiro Matsuo, Gikan Takaoka Takaaki Aoki, Jiro Matsuo, Gikan Takaoka Molecular dynamics study of damage formation characteristics by large cluster ion impacts Molecular dynamics study of damage formation characteristics by large cluster ion impacts Molecular dynamics study of damage formation characteristics by large cluster ion impacts Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 202, 278-282 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 202, 278-282 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 202, 278-282 2003/04 Refereed English Research paper(international conference proceedings) Disclose to all
Teruyuki Kitagawa, Isao Yamada, Noriaki Toyoda, Harushige Tsubakino, Jiro Matsuo, G. H. Takaoka, Allen Kirkpatrick Teruyuki Kitagawa, Isao Yamada, Noriaki Toyoda, Harushige Tsubakino, Jiro Matsuo, G. H. Takaoka, Allen Kirkpatrick Teruyuki Kitagawa, Isao Yamada, Noriaki Toyoda, Harushige Tsubakino, Jiro Matsuo, G. H. Takaoka, Allen Kirkpatrick Hard DLC film formation by gas cluster ion beam assisted deposition Hard DLC film formation by gas cluster ion beam assisted deposition Hard DLC film formation by gas cluster ion beam assisted deposition Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 201, 2, 405-412 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 201, 2, 405-412 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 201, 2, 405-412 2003/02 Refereed English Research paper(scientific journal) Disclose to all
松尾 二郎, 瀬木 利夫, 青木 学聡 松尾 二郎, 瀬木 利夫, 青木 学聡 クラスターイオン衝突における非線形照射効果とそのプロセス応用 クラスターイオン衝突における非線形照射効果とそのプロセス応用 高温学会誌, 29, 5, 201-206 高温学会誌, 29, 5, 201-206 , 29, 5, 201-206 2003 Refereed Japanese Research paper(scientific journal) Disclose to all
Kitagawa T, Miyauchi K, Kanda K, Matsui S, Toyoda N, Tsubakino H, Matsuo J, Yamada I Kitagawa T, Miyauchi K, Kanda K, Matsui S, Toyoda N, Tsubakino H, Matsuo J, Yamada I Kitagawa T, Miyauchi K, Kanda K, Matsui S, Toyoda N, Tsubakino H, Matsuo J, Yamada I Difference of irradiation effects between Ar cluster ion and Ar+ for DLC film formation Difference of irradiation effects between Ar cluster ion and Ar+ for DLC film formation Difference of irradiation effects between Ar cluster ion and Ar+ for DLC film formation APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 755-758 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 755-758 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 755-758 2003 Refereed Disclose to all
Noriaki Toyoda, Jiro Matsuo, Takaaki Aoki, Isao Yamada, David B. Fenner Noriaki Toyoda, Jiro Matsuo, Takaaki Aoki, Isao Yamada, David B. Fenner Noriaki Toyoda, Jiro Matsuo, Takaaki Aoki, Isao Yamada, David B. Fenner Secondary ion mass spectrometry with gas cluster ion beams Secondary ion mass spectrometry with gas cluster ion beams Secondary ion mass spectrometry with gas cluster ion beams Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 190, 1-4, 860-864 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 190, 1-4, 860-864 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 190, 1-4, 860-864 2002/05 Refereed English Research paper(international conference proceedings) Disclose to all
G. H. Takaoka, T. Seki, K. Tsumura, J. Matsuo G. H. Takaoka, T. Seki, K. Tsumura, J. Matsuo G. H. Takaoka, T. Seki, K. Tsumura, J. Matsuo Scanning tunneling microscope observations of Ge deposition on Si(111)-7 × 7 surfaces irradiated by Xe ions Scanning tunneling microscope observations of Ge deposition on Si(111)-7 × 7 surfaces irradiated by Xe ions Scanning tunneling microscope observations of Ge deposition on Si(111)-7 × 7 surfaces irradiated by Xe ions Thin Solid Films, 405, 1-2, 141-145 Thin Solid Films, 405, 1-2, 141-145 Thin Solid Films, 405, 1-2, 141-145 2002/02/22 English Research paper(scientific journal) Disclose to all
G. H. Takaoka, D. Yamazaki, J. Matsuo G. H. Takaoka, D. Yamazaki, J. Matsuo G. H. Takaoka, D. Yamazaki, J. Matsuo High quality ITO film formation by the simultaneous use of cluster ion beam and laser irradiation High quality ITO film formation by the simultaneous use of cluster ion beam and laser irradiation High quality ITO film formation by the simultaneous use of cluster ion beam and laser irradiation Materials Chemistry and Physics, 74, 1, 104-108 Materials Chemistry and Physics, 74, 1, 104-108 Materials Chemistry and Physics, 74, 1, 104-108 2002/02/01 Refereed English Research paper(scientific journal) Disclose to all
T. Kitagawa, K. Miyauchi, K. Kanda, Y. Shimizugawa, N. Toyoda, H. Tsubakino, S. Matsui, T. Gego, J. Matsuo, I. Yamada T. Kitagawa, K. Miyauchi, K. Kanda, Y. Shimizugawa, N. Toyoda, H. Tsubakino, S. Matsui, T. Gego, J. Matsuo, I. Yamada T. Kitagawa, K. Miyauchi, K. Kanda, Y. Shimizugawa, N. Toyoda, H. Tsubakino, S. Matsui, T. Gego, J. Matsuo, I. Yamada NEXAFS study for optimization of hard DLC films formation with Ar cluster ion beam NEXAFS study for optimization of hard DLC films formation with Ar cluster ion beam NEXAFS study for optimization of hard DLC films formation with Ar cluster ion beam 2002 International Microprocesses and Nanotechnology Conference, MNC 2002, 90-91 2002 International Microprocesses and Nanotechnology Conference, MNC 2002, 90-91 2002 International Microprocesses and Nanotechnology Conference, MNC 2002, 90-91 2002 Refereed English Research paper(international conference proceedings) Disclose to all
Isao Yamada, Jiro Matsuo, Noriaki Toyoda Isao Yamada, Jiro Matsuo, Noriaki Toyoda Isao Yamada, Jiro Matsuo, Noriaki Toyoda Cluster ion beam processing - METI/NEDO projects and recent progress Cluster ion beam processing - METI/NEDO projects and recent progress Cluster ion beam processing - METI/NEDO projects and recent progress Proceedings of the International Conference on Ion Implantation Technology, 22-27-, 661-664 Proceedings of the International Conference on Ion Implantation Technology, 22-27-, 661-664 Proceedings of the International Conference on Ion Implantation Technology, 22-27-, 661-664 2002 Refereed English Research paper(international conference proceedings) Disclose to all
GH Takaoka, S Nakamura, T Seki, J Matsuo GH Takaoka, S Nakamura, T Seki, J Matsuo GH Takaoka, S Nakamura, T Seki, J Matsuo Interaction of SF6 cluster ion beams with Si surface Interaction of SF6 cluster ion beams with Si surface Interaction of SF6 cluster ion beams with Si surface JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 40, 12B, L1384-L1386 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 40, 12B, L1384-L1386 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 40, 12B, L1384-L1386 2001/12 English Research paper(scientific journal) Disclose to all
H. Biederman, D. Slavinska, H. Boldyreva, H. Lehmberg, G. Takaoka, J. Matsuo, H. Kinpara, J. Zemek H. Biederman, D. Slavinska, H. Boldyreva, H. Lehmberg, G. Takaoka, J. Matsuo, H. Kinpara, J. Zemek H. Biederman, D. Slavinska, H. Boldyreva, H. Lehmberg, G. Takaoka, J. Matsuo, H. Kinpara, J. Zemek Modification of polycarbonate and polypropylene surfaces by argon ion cluster beams Modification of polycarbonate and polypropylene surfaces by argon ion cluster beams Modification of polycarbonate and polypropylene surfaces by argon ion cluster beams Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 19, 6, 2050-2056 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 19, 6, 2050-2056 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 19, 6, 2050-2056 2001/11 Refereed English Research paper(scientific journal) Disclose to all
Yamada I, Matsuo J, Toyoda N, Kirkpatrick A Yamada I, Matsuo J, Toyoda N, Kirkpatrick A Yamada I, Matsuo J, Toyoda N, Kirkpatrick A Materials processing by gas cluster ion beams Materials processing by gas cluster ion beams Materials processing by gas cluster ion beams MATERIALS SCIENCE & ENGINEERING R-REPORTS, 34, 6, 231-295 MATERIALS SCIENCE & ENGINEERING R-REPORTS, 34, 6, 231-295 MATERIALS SCIENCE & ENGINEERING R-REPORTS, 34, 6, 231-295 2001/10/30 Refereed Disclose to all
T Aoki, J Matsuo, Yamada, I T Aoki, J Matsuo, Yamada, I T Aoki, J Matsuo, Yamada, I Cluster size effect on reactive sputtering by fluorine cluster impact using molecular dynamics simulation Cluster size effect on reactive sputtering by fluorine cluster impact using molecular dynamics simulation Cluster size effect on reactive sputtering by fluorine cluster impact using molecular dynamics simulation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 180, 164-170 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 180, 164-170 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 180, 164-170 2001/06 Refereed English Research paper(scientific journal) Disclose to all
S Chiba, T Aoki, J Matsuo S Chiba, T Aoki, J Matsuo S Chiba, T Aoki, J Matsuo Molecular dynamics simulation of fluorine ion etching of silicon Molecular dynamics simulation of fluorine ion etching of silicon Molecular dynamics simulation of fluorine ion etching of silicon NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 180, 317-321 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 180, 317-321 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 180, 317-321 2001/06 Refereed English Research paper(scientific journal) Disclose to all
T Aoki, S Chiba, J Matsuo, Yamada, I, JP Biersack T Aoki, S Chiba, J Matsuo, Yamada, I, JP Biersack T Aoki, S Chiba, J Matsuo, Yamada, I, JP Biersack Molecular dynamics and Monte-Carlo simulation of sputtering and mixing by ion irradiation Molecular dynamics and Monte-Carlo simulation of sputtering and mixing by ion irradiation Molecular dynamics and Monte-Carlo simulation of sputtering and mixing by ion irradiation NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 180, 312-316 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 180, 312-316 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 180, 312-316 2001/06 Refereed English Research paper(scientific journal) Disclose to all
J Matsuo, G Takaoka, Yamada, I J Matsuo, G Takaoka, Yamada, I J Matsuo, G Takaoka, Yamada, I O-2 cluster ion assisted deposition for tin doped indium oxide (ITO) films O-2 cluster ion assisted deposition for tin doped indium oxide (ITO) films O-2 cluster ion assisted deposition for tin doped indium oxide (ITO) films APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 576, 995-998 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 576, 995-998 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 576, 995-998 2001 Refereed English Research paper(international conference proceedings) Disclose to all
Yamada, I, J Matsuo, Z Insepov, T Aoki, T Seki, N Toyoda Yamada, I, J Matsuo, Z Insepov, T Aoki, T Seki, N Toyoda Yamada, I, J Matsuo, Z Insepov, T Aoki, T Seki, N Toyoda Nano-processing with gas cluster ion beams Nano-processing with gas cluster ion beams Nano-processing with gas cluster ion beams NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 164, 944-959 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 164, 944-959 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 164, 944-959 2000/04 Refereed English Research paper(scientific journal) Disclose to all
T Seki, T Aoki, J Matsuo, Yamada, I T Seki, T Aoki, J Matsuo, Yamada, I T Seki, T Aoki, J Matsuo, Yamada, I STM observation of surface vacancies created by ion impact STM observation of surface vacancies created by ion impact STM observation of surface vacancies created by ion impact NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 164, 650-655 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 164, 650-655 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 164, 650-655 2000/04 Refereed English Research paper(scientific journal) Disclose to all
T Aoki, J Matsuo, Yamada, I T Aoki, J Matsuo, Yamada, I T Aoki, J Matsuo, Yamada, I Molecular dynamics simulation of fluorine cluster ion impact Molecular dynamics simulation of fluorine cluster ion impact Molecular dynamics simulation of fluorine cluster ion impact NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 164, 546-552 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 164, 546-552 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 164, 546-552 2000/04 Refereed English Research paper(scientific journal) Disclose to all
T Seki, J Matsuo, Yamada, I T Seki, J Matsuo, Yamada, I T Seki, J Matsuo, Yamada, I UHV-STM study on ion-assisted deposition UHV-STM study on ion-assisted deposition UHV-STM study on ion-assisted deposition NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 161, 1007-1010 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 161, 1007-1010 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 161, 1007-1010 2000/03 Refereed English Research paper(scientific journal) Disclose to all
Majeed A. Foad, Roger Webb, Roger Smith, Jiro Matsuo, Amir Al-Bayati, T-Sheng-Wang, Tony Cullis Majeed A. Foad, Roger Webb, Roger Smith, Jiro Matsuo, Amir Al-Bayati, T-Sheng-Wang, Tony Cullis Majeed A. Foad, Roger Webb, Roger Smith, Jiro Matsuo, Amir Al-Bayati, T-Sheng-Wang, Tony Cullis Shallow junction formation by decaborane molecular ion implantation Shallow junction formation by decaborane molecular ion implantation Shallow junction formation by decaborane molecular ion implantation Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 18, 1, 445-449 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 18, 1, 445-449 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 18, 1, 445-449 2000/01 Refereed English Research paper(scientific journal) Disclose to all
Zinetulla Insepov, Rafael Manory, Jiro Matsuo, Isao Yamada Zinetulla Insepov, Rafael Manory, Jiro Matsuo, Isao Yamada Zinetulla Insepov, Rafael Manory, Jiro Matsuo, Isao Yamada Proposal for a hardness measurement technique without indentor by gas-cluster-beam bombardment Proposal for a hardness measurement technique without indentor by gas-cluster-beam bombardment Proposal for a hardness measurement technique without indentor by gas-cluster-beam bombardment Physical Review B - Condensed Matter and Materials Physics, 61, 13, 8744-8752 Physical Review B - Condensed Matter and Materials Physics, 61, 13, 8744-8752 Physical Review B - Condensed Matter and Materials Physics, 61, 13, 8744-8752 2000 Refereed English Research paper(scientific journal) Disclose to all
Jiro Matsuo, Hiroshi Katsumata, Eiji Minami, Isao Yamada Jiro Matsuo, Hiroshi Katsumata, Eiji Minami, Isao Yamada Jiro Matsuo, Hiroshi Katsumata, Eiji Minami, Isao Yamada O2 cluster ion-assisted deposition for tin-doped indium oxide films O2 cluster ion-assisted deposition for tin-doped indium oxide films O2 cluster ion-assisted deposition for tin-doped indium oxide films Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 161, 952-957 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 161, 952-957 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 161, 952-957 2000 Refereed English Research paper(scientific journal) Disclose to all
Noriaki Toyoda, Norihisa Hagiwara, Jiro Matsuo, Isao Yamada Noriaki Toyoda, Norihisa Hagiwara, Jiro Matsuo, Isao Yamada Noriaki Toyoda, Norihisa Hagiwara, Jiro Matsuo, Isao Yamada Surface smoothing mechanism of gas cluster ion beams Surface smoothing mechanism of gas cluster ion beams Surface smoothing mechanism of gas cluster ion beams Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 161, 980-985 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 161, 980-985 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 161, 980-985 2000 Refereed English Research paper(scientific journal) Disclose to all
J. A. Greer, D. B. Fenner, J. Hautala, L. P. Allen, V. DiFilippo, N. Toyoda, I. Yamada, J. Matsuo, E. Minami, H. Katsumata J. A. Greer, D. B. Fenner, J. Hautala, L. P. Allen, V. DiFilippo, N. Toyoda, I. Yamada, J. Matsuo, E. Minami, H. Katsumata J. A. Greer, D. B. Fenner, J. Hautala, L. P. Allen, V. DiFilippo, N. Toyoda, I. Yamada, J. Matsuo, E. Minami, H. Katsumata Etching, smoothing, and deposition with gas-cluster ion beam technology Etching, smoothing, and deposition with gas-cluster ion beam technology Etching, smoothing, and deposition with gas-cluster ion beam technology Surface and Coatings Technology, 133-134, 273-282 Surface and Coatings Technology, 133-134, 273-282 Surface and Coatings Technology, 133-134, 273-282 2000 Refereed English Research paper(scientific journal) Disclose to all
J Zemek, I Yamada, G Takaoka, J Matsuo J Zemek, I Yamada, G Takaoka, J Matsuo J Zemek, I Yamada, G Takaoka, J Matsuo Polycarbonate surface modified by argon cluster ion beams Polycarbonate surface modified by argon cluster ion beams Polycarbonate surface modified by argon cluster ion beams JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 17, 6, 2653-2655 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 17, 6, 2653-2655 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 17, 6, 2653-2655 1999/11 Refereed English Disclose to all
T Aoki, T Seki, J Matsuo, Z Insepov, Yamada, I T Aoki, T Seki, J Matsuo, Z Insepov, Yamada, I T Aoki, T Seki, J Matsuo, Z Insepov, Yamada, I Cluster size dependence of the impact process on a carbon substrate Cluster size dependence of the impact process on a carbon substrate Cluster size dependence of the impact process on a carbon substrate NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 153, 1-4, 264-269 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 153, 1-4, 264-269 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 153, 1-4, 264-269 1999/06 Refereed English Research paper(scientific journal) Disclose to all
K Goto, J Matsuo, Y Tada, T Sugii, Yamada, I K Goto, J Matsuo, Y Tada, T Sugii, Yamada, I K Goto, J Matsuo, Y Tada, T Sugii, Yamada, I Decaborane (B10H14) ion implantation technology for sub-0.1-mu m PMOSFET's Decaborane (B10H14) ion implantation technology for sub-0.1-mu m PMOSFET's Decaborane (B10H14) ion implantation technology for sub-0.1-mu m PMOSFET's IEEE TRANSACTIONS ON ELECTRON DEVICES, 46, 4, 683-689 IEEE TRANSACTIONS ON ELECTRON DEVICES, 46, 4, 683-689 IEEE TRANSACTIONS ON ELECTRON DEVICES, 46, 4, 683-689 1999/04 Refereed English Research paper(scientific journal) Disclose to all
H Katsumata, J Matsuo, T Nishihara, T Tachibana, K Yamada, M Adachi, E Minami, Yamada, I H Katsumata, J Matsuo, T Nishihara, T Tachibana, K Yamada, M Adachi, E Minami, Yamada, I H Katsumata, J Matsuo, T Nishihara, T Tachibana, K Yamada, M Adachi, E Minami, Yamada, I Optical thin film formation by gas-cluster ion beam assisted deposition Optical thin film formation by gas-cluster ion beam assisted deposition Optical thin film formation by gas-cluster ion beam assisted deposition APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 409-412 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 409-412 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 409-412 1999 Refereed English Research paper(international conference proceedings) Disclose to all
T Sugii, K Goto, T Tanaka, J Matsuo, Yamada, I T Sugii, K Goto, T Tanaka, J Matsuo, Yamada, I T Sugii, K Goto, T Tanaka, J Matsuo, Yamada, I Ultra low energy boron implantation using cluster ions for decananometer MOSFETs Ultra low energy boron implantation using cluster ions for decananometer MOSFETs Ultra low energy boron implantation using cluster ions for decananometer MOSFETs APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 383-386 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 383-386 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 383-386 1999 Refereed English Research paper(international conference proceedings) Disclose to all
Yamada I, Matsuo J, Toyoda N, Aoki T Yamada I, Matsuo J, Toyoda N, Aoki T Yamada I, Matsuo J, Toyoda N, Aoki T Applications of cluster ion implantation in microelectronics devices Applications of cluster ion implantation in microelectronics devices Applications of cluster ion implantation in microelectronics devices APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 379-382 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 379-382 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 379-382 1999 Refereed Disclose to all
J. Matsuo, E. Minami, M. Saito, N. Toyoda, H. Katsumata, I. Yamada J. Matsuo, E. Minami, M. Saito, N. Toyoda, H. Katsumata, I. Yamada J. Matsuo, E. Minami, M. Saito, N. Toyoda, H. Katsumata, I. Yamada High-intensity oxygen cluster ion beam generation and its application to cluster ion-assisted deposition High-intensity oxygen cluster ion beam generation and its application to cluster ion-assisted deposition High-intensity oxygen cluster ion beam generation and its application to cluster ion-assisted deposition European Physical Journal D, 9, 1-4, 635-638 European Physical Journal D, 9, 1-4, 635-638 European Physical Journal D, 9, 1-4, 635-638 1999 Refereed English Research paper(scientific journal) Disclose to all
N. Toyoda, N. Hagiwara, J. Matsuo, I. Yamada N. Toyoda, N. Hagiwara, J. Matsuo, I. Yamada N. Toyoda, N. Hagiwara, J. Matsuo, I. Yamada Surface treatment of diamond films with Ar and O2 cluster ion beams Surface treatment of diamond films with Ar and O2 cluster ion beams Surface treatment of diamond films with Ar and O2 cluster ion beams Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 148, 1-4, 639-644 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 148, 1-4, 639-644 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 148, 1-4, 639-644 1999 Refereed English Research paper(scientific journal) Disclose to all
Nishiyama A, Adachi M, Toyoda N, Hagiwara N, Matsuo J, Yamada I Nishiyama A, Adachi M, Toyoda N, Hagiwara N, Matsuo J, Yamada I Nishiyama A, Adachi M, Toyoda N, Hagiwara N, Matsuo J, Yamada I Surface smoothing of CVD-diamond membrane for X-ray lithography by gas cluster ion beam Surface smoothing of CVD-diamond membrane for X-ray lithography by gas cluster ion beam Surface smoothing of CVD-diamond membrane for X-ray lithography by gas cluster ion beam APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 421-424 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 421-424 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 421-424 1999 Refereed Disclose to all
Yamada I, Matsuo J, Toyoda N, Aoki T, Jones E, Insepov Z Yamada I, Matsuo J, Toyoda N, Aoki T, Jones E, Insepov Z Yamada I, Matsuo J, Toyoda N, Aoki T, Jones E, Insepov Z Non-linear processes in the gas cluster ion beam modification of solid surfaces Non-linear processes in the gas cluster ion beam modification of solid surfaces Non-linear processes in the gas cluster ion beam modification of solid surfaces MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 253, 1-2, 249-257 MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 253, 1-2, 249-257 MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 253, 1-2, 249-257 1998/09/30 Refereed Disclose to all
D Takeuchi, T Seki, T Aoki, J Matsuo, Yamada, I D Takeuchi, T Seki, T Aoki, J Matsuo, Yamada, I D Takeuchi, T Seki, T Aoki, J Matsuo, Yamada, I Cluster ion bombardment on atomically flat Au(111) solid surfaces Cluster ion bombardment on atomically flat Au(111) solid surfaces Cluster ion bombardment on atomically flat Au(111) solid surfaces MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 76-79 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 76-79 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 76-79 1998/07 Refereed English Research paper(scientific journal) Disclose to all
T Aoki, T Seki, J Matsuo, Z Insepov, Yamada, I T Aoki, T Seki, J Matsuo, Z Insepov, Yamada, I T Aoki, T Seki, J Matsuo, Z Insepov, Yamada, I Molecular dynamics simulation of a carbon cluster ion impacting on a carbon surface Molecular dynamics simulation of a carbon cluster ion impacting on a carbon surface Molecular dynamics simulation of a carbon cluster ion impacting on a carbon surface MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 139-142 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 139-142 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 139-142 1998/07 Refereed English Research paper(scientific journal) Disclose to all
T Seki, T Aoki, M Tanomura, J Matsuo, Yamada, I T Seki, T Aoki, M Tanomura, J Matsuo, Yamada, I T Seki, T Aoki, M Tanomura, J Matsuo, Yamada, I Energy dependence of a single trace created by C-60 ion impact Energy dependence of a single trace created by C-60 ion impact Energy dependence of a single trace created by C-60 ion impact MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 143-146 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 143-146 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 143-146 1998/07 Refereed English Research paper(scientific journal) Disclose to all
W Qin, RP Howson, M Akizuki, J Matsuo, G Takaoka, Yamada, I W Qin, RP Howson, M Akizuki, J Matsuo, G Takaoka, Yamada, I W Qin, RP Howson, M Akizuki, J Matsuo, G Takaoka, Yamada, I Indium oxide film formation by O-2 cluster ion-assisted deposition Indium oxide film formation by O-2 cluster ion-assisted deposition Indium oxide film formation by O-2 cluster ion-assisted deposition MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 258-261 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 258-261 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 258-261 1998/07 Refereed English Research paper(scientific journal) Disclose to all
N Shimada, T Aoki, J Matsuo, Yamada, I, K Goto, T Sugui N Shimada, T Aoki, J Matsuo, Yamada, I, K Goto, T Sugui N Shimada, T Aoki, J Matsuo, Yamada, I, K Goto, T Sugui Reduction of boron transient enhanced diffusion in silicon by low-energy cluster ion implantation Reduction of boron transient enhanced diffusion in silicon by low-energy cluster ion implantation Reduction of boron transient enhanced diffusion in silicon by low-energy cluster ion implantation MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 80-83 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 80-83 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 80-83 1998/07 Refereed English Research paper(scientific journal) Disclose to all
M Akizuki, J Matsuo, W Qin, T Aoki, M Harada, S Ogasawara, K Yodoshi, Yamada, I M Akizuki, J Matsuo, W Qin, T Aoki, M Harada, S Ogasawara, K Yodoshi, Yamada, I M Akizuki, J Matsuo, W Qin, T Aoki, M Harada, S Ogasawara, K Yodoshi, Yamada, I Low-temperature formation of perovskite PbTiO3 films by O-2 cluster ion-assisted deposition Low-temperature formation of perovskite PbTiO3 films by O-2 cluster ion-assisted deposition Low-temperature formation of perovskite PbTiO3 films by O-2 cluster ion-assisted deposition MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 255-257 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 255-257 MATERIALS CHEMISTRY AND PHYSICS, 54, 1-3, 255-257 1998/07 Refereed English Research paper(scientific journal) Disclose to all
Isao Yamada, Jiro Matsuo Isao Yamada, Jiro Matsuo Isao Yamada, Jiro Matsuo Cluster ion beam processing Cluster ion beam processing Cluster ion beam processing Materials Science in Semiconductor Processing, 1, 1, 27-41 Materials Science in Semiconductor Processing, 1, 1, 27-41 Materials Science in Semiconductor Processing, 1, 1, 27-41 1998/04/01 Refereed English Research paper(scientific journal) Disclose to all
K Goto, T Sugii, J Matsuo K Goto, T Sugii, J Matsuo K Goto, T Sugii, J Matsuo High performance 0.04 mu m PMOSFET High performance 0.04 mu m PMOSFET High performance 0.04 mu m PMOSFET FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 34, 2, 135-141 FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 34, 2, 135-141 FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 34, 2, 135-141 1998 Refereed English Research paper(scientific journal) Disclose to all
W. K. Chu, Y. P. Li, J. R. Liu, J. Z. Wu, S. C. Tidrow, N. Toyoda, J. Matsuo, I. Yamada W. K. Chu, Y. P. Li, J. R. Liu, J. Z. Wu, S. C. Tidrow, N. Toyoda, J. Matsuo, I. Yamada W. K. Chu, Y. P. Li, J. R. Liu, J. Z. Wu, S. C. Tidrow, N. Toyoda, J. Matsuo, I. Yamada Smoothing of YBa2Cu3O7-δ films by ion cluster beam bombardment Smoothing of YBa2Cu3O7-δ films by ion cluster beam bombardment Smoothing of YBa2Cu3O7-δ films by ion cluster beam bombardment Applied Physics Letters, 72, 2, 246-248 Applied Physics Letters, 72, 2, 246-248 Applied Physics Letters, 72, 2, 246-248 1998 Refereed English Research paper(scientific journal) Disclose to all
Noriaki Toyoda, Hiroaki Kitani, Norihisa Hagiwara, Takaaki Aoki, Jiro Matsuo, Isao Yamada Noriaki Toyoda, Hiroaki Kitani, Norihisa Hagiwara, Takaaki Aoki, Jiro Matsuo, Isao Yamada Noriaki Toyoda, Hiroaki Kitani, Norihisa Hagiwara, Takaaki Aoki, Jiro Matsuo, Isao Yamada Angular distributions of the particles sputtered with Ar cluster ions Angular distributions of the particles sputtered with Ar cluster ions Angular distributions of the particles sputtered with Ar cluster ions Materials Chemistry and Physics, 54, 1-3, 262-265 Materials Chemistry and Physics, 54, 1-3, 262-265 Materials Chemistry and Physics, 54, 1-3, 262-265 1998 Refereed English Research paper(scientific journal) Disclose to all
Noriaki Toyoda, Hiroaki Kitani, Norihisa Hagiwara, Jiro Matsuo, Isao Yamada Noriaki Toyoda, Hiroaki Kitani, Norihisa Hagiwara, Jiro Matsuo, Isao Yamada Noriaki Toyoda, Hiroaki Kitani, Norihisa Hagiwara, Jiro Matsuo, Isao Yamada Surface smoothing effects with reactive cluster ion beams Surface smoothing effects with reactive cluster ion beams Surface smoothing effects with reactive cluster ion beams Materials Chemistry and Physics, 54, 1-3, 106-110 Materials Chemistry and Physics, 54, 1-3, 106-110 Materials Chemistry and Physics, 54, 1-3, 106-110 1998 Refereed English Research paper(scientific journal) Disclose to all
Yamada I, Matsuo J, Toyoda N, Aoki T, Jones E, Insepov Z Yamada I, Matsuo J, Toyoda N, Aoki T, Jones E, Insepov Z Yamada I, Matsuo J, Toyoda N, Aoki T, Jones E, Insepov Z Gas cluster ion beam processing Gas cluster ion beam processing Gas cluster ion beam processing SIMILARITIES AND DIFFERENCES BETWEEN ATOMIC NUCLEI AND CLUSTERS, 416, 310-329 SIMILARITIES AND DIFFERENCES BETWEEN ATOMIC NUCLEI AND CLUSTERS, 416, 310-329 SIMILARITIES AND DIFFERENCES BETWEEN ATOMIC NUCLEI AND CLUSTERS, 416, 310-329 1998 Refereed Disclose to all
T Seki, T Kaneko, D Takeuchi, T Aoki, J Matsuo, Z Insepov, Yamada, I T Seki, T Kaneko, D Takeuchi, T Aoki, J Matsuo, Z Insepov, Yamada, I T Seki, T Kaneko, D Takeuchi, T Aoki, J Matsuo, Z Insepov, Yamada, I STM observation of HOPG surfaces irradiated with Ar cluster ions STM observation of HOPG surfaces irradiated with Ar cluster ions STM observation of HOPG surfaces irradiated with Ar cluster ions NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 498-502 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 498-502 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 498-502 1997/01 Refereed English Research paper(scientific journal) Disclose to all
瀬木 利夫, 田能村 昌宏, 松尾 二郎, 山田 公 瀬木 利夫, 田能村 昌宏, 松尾 二郎, 山田 公 クラスターイオンの非線形効果(原子核とマイクロララスターの類似性と異質性,研究会報告) クラスターイオンの非線形効果(原子核とマイクロララスターの類似性と異質性,研究会報告) 素粒子論研究, 95, 2, B39-B43 素粒子論研究, 95, 2, B39-B43 , 95, 2, B39-B43 1997 Refereed Japanese Disclose to all
GH Takaoka, T Hamano, K Fukushima, J Matsuo, Yamada, I GH Takaoka, T Hamano, K Fukushima, J Matsuo, Yamada, I GH Takaoka, T Hamano, K Fukushima, J Matsuo, Yamada, I Preparation and catalytic activity of nano-scale Au islands supported on TiO2 Preparation and catalytic activity of nano-scale Au islands supported on TiO2 Preparation and catalytic activity of nano-scale Au islands supported on TiO2 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 503-506 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 503-506 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 503-506 1997/01 Refereed English Research paper(scientific journal) Disclose to all
T Aoki, J Matsuo, Z Insepov, Yamada, I T Aoki, J Matsuo, Z Insepov, Yamada, I T Aoki, J Matsuo, Z Insepov, Yamada, I Molecular dynamics simulation of damage formation by cluster ion impact Molecular dynamics simulation of damage formation by cluster ion impact Molecular dynamics simulation of damage formation by cluster ion impact NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 49-52 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 49-52 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 49-52 1997/01 Refereed English Research paper(scientific journal) Disclose to all
D Takeuchi, T Aoki, J Matsuo, Yamada, I D Takeuchi, T Aoki, J Matsuo, Yamada, I D Takeuchi, T Aoki, J Matsuo, Yamada, I Non-linear effects in high energy cluster ion implantation Non-linear effects in high energy cluster ion implantation Non-linear effects in high energy cluster ion implantation APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 392, 491-494 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 392, 491-494 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 392, 491-494 1997 Refereed English Research paper(international conference proceedings) Disclose to all
J Matsuo, M Akizuki, Yamada, I J Matsuo, M Akizuki, Yamada, I J Matsuo, M Akizuki, Yamada, I Cluster ion assisted thin film formation Cluster ion assisted thin film formation Cluster ion assisted thin film formation APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 392, 499-502 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 392, 499-502 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 392, 499-502 1997 Refereed English Research paper(international conference proceedings) Disclose to all
M Tanomura, D Takeuchi, J Matsuo, GH Takaoka, Yamada, I M Tanomura, D Takeuchi, J Matsuo, GH Takaoka, Yamada, I M Tanomura, D Takeuchi, J Matsuo, GH Takaoka, Yamada, I Fullerene ion irradiation to silicon Fullerene ion irradiation to silicon Fullerene ion irradiation to silicon NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 480-483 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 480-483 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 121, 1-4, 480-483 1997/01 Refereed English Research paper(scientific journal) Disclose to all
K Goto, J Matsuo, Y Tada, T Tanaka, Y Momiyama, T Sugii, Yamada, I K Goto, J Matsuo, Y Tada, T Tanaka, Y Momiyama, T Sugii, Yamada, I K Goto, J Matsuo, Y Tada, T Tanaka, Y Momiyama, T Sugii, Yamada, I A high performance 50nm PMOSFET using decaborane (B10H14) ion implantation and 2-step activation annealing process A high performance 50nm PMOSFET using decaborane (B10H14) ion implantation and 2-step activation annealing process A high performance 50nm PMOSFET using decaborane (B10H14) ion implantation and 2-step activation annealing process INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 471-474 INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 471-474 INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 471-474 1997 Refereed English Research paper(international conference proceedings) Disclose to all
Toyoda N, Matsuo J, Yamada I Toyoda N, Matsuo J, Yamada I Toyoda N, Matsuo J, Yamada I The sputtering effects of cluster ion beams The sputtering effects of cluster ion beams The sputtering effects of cluster ion beams APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 392, 483-486 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 392, 483-486 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 392, 483-486 1997 Refereed Disclose to all
N. Toyoda, H. Kitani, J. Matsuo, I. Yamada N. Toyoda, H. Kitani, J. Matsuo, I. Yamada N. Toyoda, H. Kitani, J. Matsuo, I. Yamada Reactive sputtering by SF6 cluster ion beams Reactive sputtering by SF6 cluster ion beams Reactive sputtering by SF6 cluster ion beams Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 121, 1-4, 484-488 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 121, 1-4, 484-488 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 121, 1-4, 484-488 1997 Refereed English Research paper(scientific journal) Disclose to all
H. Kitani, N. Toyoda, J. Matsuo, I. Yamada H. Kitani, N. Toyoda, J. Matsuo, I. Yamada H. Kitani, N. Toyoda, J. Matsuo, I. Yamada Incident angle dependence of the sputtering effect of Ar-cluster-ion bombardment Incident angle dependence of the sputtering effect of Ar-cluster-ion bombardment Incident angle dependence of the sputtering effect of Ar-cluster-ion bombardment Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 121, 1-4, 489-492 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 121, 1-4, 489-492 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 121, 1-4, 489-492 1997 Refereed English Research paper(scientific journal) Disclose to all
Jiro Matsuo, Noriaki Toyoda, Makoto Akizuki, Isao Yamada Jiro Matsuo, Noriaki Toyoda, Makoto Akizuki, Isao Yamada Jiro Matsuo, Noriaki Toyoda, Makoto Akizuki, Isao Yamada Sputtering of elemental metals by Ar cluster ions Sputtering of elemental metals by Ar cluster ions Sputtering of elemental metals by Ar cluster ions Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 121, 1-4, 459-463 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 121, 1-4, 459-463 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 121, 1-4, 459-463 1997 Refereed English Research paper(scientific journal) Disclose to all
Matsuo J, Toyoda N, Yamada I Matsuo J, Toyoda N, Yamada I Matsuo J, Toyoda N, Yamada I Nanofabrication technology by gas cluster ion beams Nanofabrication technology by gas cluster ion beams Nanofabrication technology by gas cluster ion beams JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 14, 6, 3951-3954 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 14, 6, 3951-3954 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 14, 6, 3951-3954 1996/11 Refereed Disclose to all
GH Takaoka, J Matsuo, CE Ascheron, Yamada, I GH Takaoka, J Matsuo, CE Ascheron, Yamada, I GH Takaoka, J Matsuo, CE Ascheron, Yamada, I Fundamental aspects of the ionized cluster-beam deposition process Fundamental aspects of the ionized cluster-beam deposition process Fundamental aspects of the ionized cluster-beam deposition process SURFACE REVIEW AND LETTERS, 3, 1, 1013-1016 SURFACE REVIEW AND LETTERS, 3, 1, 1013-1016 SURFACE REVIEW AND LETTERS, 3, 1, 1013-1016 1996/02 Refereed English Research paper(scientific journal) Disclose to all
J Matsuo, M Akizuki, J Northby, GH Takaoka, Yamada, I J Matsuo, M Akizuki, J Northby, GH Takaoka, Yamada, I J Matsuo, M Akizuki, J Northby, GH Takaoka, Yamada, I Sputtering with gas cluster-ion beams Sputtering with gas cluster-ion beams Sputtering with gas cluster-ion beams SURFACE REVIEW AND LETTERS, 3, 1, 1017-1021 SURFACE REVIEW AND LETTERS, 3, 1, 1017-1021 SURFACE REVIEW AND LETTERS, 3, 1, 1017-1021 1996/02 Refereed English Research paper(scientific journal) Disclose to all
CE Ascheron, M Akizuki, J Matsuo, Z Insepov, GH Takaoka, Yamada, I CE Ascheron, M Akizuki, J Matsuo, Z Insepov, GH Takaoka, Yamada, I CE Ascheron, M Akizuki, J Matsuo, Z Insepov, GH Takaoka, Yamada, I Cluster ion bombardment-induced surface damage of Si Cluster ion bombardment-induced surface damage of Si Cluster ion bombardment-induced surface damage of Si SURFACE REVIEW AND LETTERS, 3, 1, 1045-1049 SURFACE REVIEW AND LETTERS, 3, 1, 1045-1049 SURFACE REVIEW AND LETTERS, 3, 1, 1045-1049 1996/02 Refereed English Research paper(scientific journal) Disclose to all
I. Yamada, J. Matsuo, Z. Insepov, D. Takeuchi, M. Akizuki, N. Toyoda I. Yamada, J. Matsuo, Z. Insepov, D. Takeuchi, M. Akizuki, N. Toyoda I. Yamada, J. Matsuo, Z. Insepov, D. Takeuchi, M. Akizuki, N. Toyoda Surface processing by gas cluster ion beams at the atomic (molecular) level Surface processing by gas cluster ion beams at the atomic (molecular) level Surface processing by gas cluster ion beams at the atomic (molecular) level Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 14, 3, 781-785 Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 14, 3, 781-785 Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 14, 3, 781-785 1996 Refereed English Research paper(scientific journal) Disclose to all
Akihisa Yoshida, Masahiro Deguchi, Makoto Kitabatake, Takashi Hirao, Jiro Matsuo, Noriaki Toyoda, Isao Yamada Akihisa Yoshida, Masahiro Deguchi, Makoto Kitabatake, Takashi Hirao, Jiro Matsuo, Noriaki Toyoda, Isao Yamada Akihisa Yoshida, Masahiro Deguchi, Makoto Kitabatake, Takashi Hirao, Jiro Matsuo, Noriaki Toyoda, Isao Yamada Atomic level smoothing of CVD diamond films by gas cluster ion beam etching Atomic level smoothing of CVD diamond films by gas cluster ion beam etching Atomic level smoothing of CVD diamond films by gas cluster ion beam etching Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 112, 1-4, 248-251 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 112, 1-4, 248-251 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 112, 1-4, 248-251 1996 Refereed English Research paper(scientific journal) Disclose to all
Yamada, I, J Matsuo, Z Insepov, M Akizuki Yamada, I, J Matsuo, Z Insepov, M Akizuki Yamada, I, J Matsuo, Z Insepov, M Akizuki Surface modifications by gas cluster ion beams Surface modifications by gas cluster ion beams Surface modifications by gas cluster ion beams NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 106, 1-4, 165-169 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 106, 1-4, 165-169 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 106, 1-4, 165-169 1995/12 Refereed English Research paper(scientific journal) Disclose to all
J MATSUO, H ABE, GH TAKAOKA, YAMADA, I J MATSUO, H ABE, GH TAKAOKA, YAMADA, I J MATSUO, H ABE, GH TAKAOKA, YAMADA, I GAS CLUSTER ION-BEAM EQUIPMENTS FOR INDUSTRIAL APPLICATIONS GAS CLUSTER ION-BEAM EQUIPMENTS FOR INDUSTRIAL APPLICATIONS GAS CLUSTER ION-BEAM EQUIPMENTS FOR INDUSTRIAL APPLICATIONS NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 99, 1-4, 244-247 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 99, 1-4, 244-247 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 99, 1-4, 244-247 1995/05 Refereed English Research paper(scientific journal) Disclose to all
T YAMAGUCHI, J MATSUO, M AKIZUKI, CE ASCHERON, GH TAKAOKA, YAMADA, I T YAMAGUCHI, J MATSUO, M AKIZUKI, CE ASCHERON, GH TAKAOKA, YAMADA, I T YAMAGUCHI, J MATSUO, M AKIZUKI, CE ASCHERON, GH TAKAOKA, YAMADA, I SPUTTERING EFFECT OF GAS CLUSTER ION-BEAMS SPUTTERING EFFECT OF GAS CLUSTER ION-BEAMS SPUTTERING EFFECT OF GAS CLUSTER ION-BEAMS NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 99, 1-4, 237-239 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 99, 1-4, 237-239 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 99, 1-4, 237-239 1995/05 Refereed English Research paper(scientific journal) Disclose to all
M AKIZUKI, J MATSUO, M HARADA, S OGASAWARA, A DOI, K YONEDA, T YAMAGUCHI, GH TAKAOKA, CE ASCHERON, YAMADA, I M AKIZUKI, J MATSUO, M HARADA, S OGASAWARA, A DOI, K YONEDA, T YAMAGUCHI, GH TAKAOKA, CE ASCHERON, YAMADA, I M AKIZUKI, J MATSUO, M HARADA, S OGASAWARA, A DOI, K YONEDA, T YAMAGUCHI, GH TAKAOKA, CE ASCHERON, YAMADA, I LOW-DAMAGE SURFACE PROCESSING BY GAS CLUSTER ION-BEAMS LOW-DAMAGE SURFACE PROCESSING BY GAS CLUSTER ION-BEAMS LOW-DAMAGE SURFACE PROCESSING BY GAS CLUSTER ION-BEAMS NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 99, 1-4, 229-232 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 99, 1-4, 229-232 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 99, 1-4, 229-232 1995/05 Refereed English Research paper(scientific journal) Disclose to all

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Author Author(Japanese) Author(English) Title Title(Japanese) Title(English) Bibliography Bibliography(Japanese) Bibliography(English) Publication date Refereed paper Language Publishing type Disclose
K. Tsutsui, B. Z. Li, I. Mizushima, H. Wakabayashi, K. Suguro, J. Matsuo, Y. L. Jinag, T. Skotnicki, K. Ohuchi, S. Shibata, X. P. Qu, Y. Erokhin, T. Skotnicki K. Tsutsui, B. Z. Li, I. Mizushima, H. Wakabayashi, K. Suguro, J. Matsuo, Y. L. Jinag, T. Skotnicki, K. Ohuchi, S. Shibata, X. P. Qu, Y. Erokhin, T. Skotnicki K. Tsutsui, B. Z. Li, I. Mizushima, H. Wakabayashi, K. Suguro, J. Matsuo, Y. L. Jinag, T. Skotnicki, K. Ohuchi, S. Shibata, X. P. Qu, Y. Erokhin, T. Skotnicki Preface Preface Preface 15th International Workshop on Junction Technology, IWJT 2015 15th International Workshop on Junction Technology, IWJT 2015 15th International Workshop on Junction Technology, IWJT 2015 2016/05/09 Disclose to all
Matsuo Jiro, Nakagawa Shunichiro, Torii Souta, Fujii Makiko, Seki Toshio, Aoki Takaaki 松尾 二郎, 中川 俊一郎, 鳥居 聡太, 藤井 麻樹子, 瀬木 利夫, 青木 学聡 Matsuo Jiro, Nakagawa Shunichiro, Torii Souta, Fujii Makiko, Seki Toshio, Aoki Takaaki High sensitive detection and molecular imaging of lipid molecules with cluster SIMS クラスターSIMS法による脂質分子の高感度検出とイメージングへの応用 High sensitive detection and molecular imaging of lipid molecules with cluster SIMS Abstract of annual meeting of the Surface Science of Japan, 33, 0, 18-18 表面科学学術講演会要旨集, 33, 0, 18-18 Abstract of annual meeting of the Surface Science of Japan, 33, 0, 18-18 2013 Disclose to all
M. Hada, Y. Hontani, R. E. Marvel, R. F. Haglund, J. Matsuo M. Hada, Y. Hontani, R. E. Marvel, R. F. Haglund, J. Matsuo M. Hada, Y. Hontani, R. E. Marvel, R. F. Haglund, J. Matsuo Ultrafast Hot Electron Induced Phase Transitions in Vanadium Dioxide Ultrafast Hot Electron Induced Phase Transitions in Vanadium Dioxide Ultrafast Hot Electron Induced Phase Transitions in Vanadium Dioxide XVIIITH INTERNATIONAL CONFERENCE ON ULTRAFAST PHENOMENA, 41 XVIIITH INTERNATIONAL CONFERENCE ON ULTRAFAST PHENOMENA, 41 XVIIITH INTERNATIONAL CONFERENCE ON ULTRAFAST PHENOMENA, 41 2013 Refereed English Disclose to all
Kai Nordlund, John Baglin, Maria-Grazia Grimaldi, Jiro Matsuo, Jan Meijer Kai Nordlund, John Baglin, Maria-Grazia Grimaldi, Jiro Matsuo, Jan Meijer Kai Nordlund, John Baglin, Maria-Grazia Grimaldi, Jiro Matsuo, Jan Meijer Beam Interactions with Materials and Atoms Section B of: Nuclear Instruments & Methods in Physics Research Beam Interactions with Materials and Atoms Section B of: Nuclear Instruments & Methods in Physics Research Beam Interactions with Materials and Atoms Section B of: Nuclear Instruments & Methods in Physics Research NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 282, VII-VII NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 282, VII-VII NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 282, VII-VII 2012/07 English Other Disclose to all
松尾 二郎, 中川 駿一郎, 志戸本 祥, 鳥居 聡太, 瀬木 利夫, 青木 学聡 松尾 二郎, 中川 駿一郎, 志戸本 祥, 鳥居 聡太, 瀬木 利夫, 青木 学聡 松尾 二郎, 中川 駿一郎, 志戸本 祥, 鳥居 聡太, 瀬木 利夫, 青木 学聡 Cluster SIMS analysis of lipid thin films クラスターSIMS法による脂質薄膜の構造評価 Cluster SIMS analysis of lipid thin films Abstract of annual meeting of the Surface Science of Japan, 32, 0 表面科学学術講演会要旨集, 32, 0 Abstract of annual meeting of the Surface Science of Japan, 32, 0 2012 Disclose to all
Matsuo Jiro, Ichiki Kazuya, Seki Toshio, Aoki Takaaki 松尾 二郎, 市木 和弥, 瀬木 利夫, 青木 学聡 Matsuo Jiro, Ichiki Kazuya, Seki Toshio, Aoki Takaaki Bio-SIMS with Novel Primary Ion Beams toward Molecular-Imaging 2次イオン質量分析法(SIMS法)によるバイオイメー ジング Bio-SIMS with Novel Primary Ion Beams toward Molecular-Imaging Abstract of annual meeting of the Surface Science of Japan, 31, 0, 171-171 表面科学学術講演会要旨集, 31, 0, 171-171 Abstract of annual meeting of the Surface Science of Japan, 31, 0, 171-171 2011 Japanese Disclose to all
Ichiki, Kazuya, Ninomiya, Satoshi, Seki, Toshio, Aoki, Takaaki, Matsuo, Jiro Ichiki, Kazuya, Ninomiya, Satoshi, Seki, Toshio, Aoki, Takaaki, Matsuo, Jiro Ichiki, Kazuya, Ninomiya, Satoshi, Seki, Toshio, Aoki, Takaaki, Matsuo, Jiro Sputtering yield measurements with size-selected gas cluster ion beams Sputtering yield measurements with size-selected gas cluster ion beams Sputtering yield measurements with size-selected gas cluster ion beams MRS Proceedings,1181, pp. 135-140 MRS Proceedings,1181, pp. 135-140 MRS Proceedings,1181, pp. 135-140 2011/01 Refereed English Disclose to all
K. Tsutsui, B.-Z. Li, I. Mizushima, K. Suguro, Y. Kawasaki, Y.-L. Jiang, T. Skotnicki, S. Shishiguchi, J. Matsuo, H. Wakabayashi, X.-P. Qu, Y. Erokhin, T. Skotnicki K. Tsutsui, B.-Z. Li, I. Mizushima, K. Suguro, Y. Kawasaki, Y.-L. Jiang, T. Skotnicki, S. Shishiguchi, J. Matsuo, H. Wakabayashi, X.-P. Qu, Y. Erokhin, T. Skotnicki K. Tsutsui, B.-Z. Li, I. Mizushima, K. Suguro, Y. Kawasaki, Y.-L. Jiang, T. Skotnicki, S. Shishiguchi, J. Matsuo, H. Wakabayashi, X.-P. Qu, Y. Erokhin, T. Skotnicki Preface Preface Preface Extended Abstracts of the 11th International Workshop on Junction Technology, IWJT 2011, iii Extended Abstracts of the 11th International Workshop on Junction Technology, IWJT 2011, iii Extended Abstracts of the 11th International Workshop on Junction Technology, IWJT 2011, iii 2011 Refereed English Disclose to all
Masaki Hada, Jiro Matsuo Masaki Hada, Jiro Matsuo Masaki Hada, Jiro Matsuo Evaluation of lattice motion in CdTe single crystal using in-air tabletop time-resolved X-ray diffractometer Evaluation of lattice motion in CdTe single crystal using in-air tabletop time-resolved X-ray diffractometer Evaluation of lattice motion in CdTe single crystal using in-air tabletop time-resolved X-ray diffractometer BURIED INTERFACE SCIENCES WITH X-RAYS AND NEUTRONS 2010, 24, 1 BURIED INTERFACE SCIENCES WITH X-RAYS AND NEUTRONS 2010, 24, 1 BURIED INTERFACE SCIENCES WITH X-RAYS AND NEUTRONS 2010, 24, 1 2011 Refereed English Disclose to all
松尾 二郎, 瀬木 利夫, 青木 学聡 松尾 二郎, 瀬木 利夫, 青木 学聡 クラスターイオンビーム技術の最近の進展 (特集 クラスタービームとその応用技術) クラスターイオンビーム技術の最近の進展 (特集 クラスタービームとその応用技術) 表面科学,31 (11), pp. 564-571 表面科学,31 (11), pp. 564-571 2010/11 Refereed Japanese Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Toshio Seki, Takaaki Aoki, Jiro Matsuo Characteristics of organic depth profiling using large cluster ion beams Characteristics of organic depth profiling using large cluster ion beams Characteristics of organic depth profiling using large cluster ion beams Extended Abstracts of 10th Workshop on Cluster Ion Beam Technology, 43-47 Extended Abstracts of 10th Workshop on Cluster Ion Beam Technology, 43-47 Extended Abstracts of 10th Workshop on Cluster Ion Beam Technology, 43-47 2010/06 English Research paper, summary (international conference) Disclose to all
Aoki, Takaaki, Seki, Toshio, Matsuo, Jiro Aoki, Takaaki, Seki, Toshio, Matsuo, Jiro Aoki, Takaaki, Seki, Toshio, Matsuo, Jiro MD simulation of small boron cluster implantation MD simulation of small boron cluster implantation MD simulation of small boron cluster implantation 2010 International Workshop on Junction Technology Extended Abstracts,, pp. 1-2 2010 International Workshop on Junction Technology Extended Abstracts,, pp. 1-2 2010 International Workshop on Junction Technology Extended Abstracts,, pp. 1-2 2010/05 English Disclose to all
MATSUO Jiro, SEKI Toshio, NINOMIYA Satoshi, AOKI Takaaki 松尾 二郎, 瀬木 利夫, 二宮 啓, 青木 学聡 MATSUO Jiro, SEKI Toshio, NINOMIYA Satoshi, AOKI Takaaki Surface smoothing with energetic cluster ion beams クラスタイオンビームによる平坦化加工技術 Surface smoothing with energetic cluster ion beams Journal of the Japan Society for Abrasive Technology, 54, 5, 272-275 砥粒加工学会誌 = Journal of the Japan Society of Grinding Engineers, 54, 5, 272-275 Journal of the Japan Society for Abrasive Technology, 54, 5, 272-275 2010/05/01 Refereed Japanese Disclose to all
松尾二郎, 松尾二郎 松尾二郎, 松尾二郎 高密度励起ビームによる二次イオン質量分析法の有機・生体材料への新展開 高密度励起ビームによる二次イオン質量分析法の有機・生体材料への新展開 応用物理, 79, 4, 326-330 応用物理, 79, 4, 326-330 , 79, 4, 326-330 2010/04/10 Refereed Japanese Disclose to all
Wakamatsu Yoshinobu, Yamada Hideaki, Ninomiya Satoshi, Seki Toshio, Aoki Takaaki, Ishihara Akihiko, Matsuo Jiro 若松 慶信, 山田 英丙, 二宮 啓, 瀬木 利夫, 青木 学聡, 石原 昭彦, 松尾 二郎 Wakamatsu Yoshinobu, Yamada Hideaki, Ninomiya Satoshi, Seki Toshio, Aoki Takaaki, Ishihara Akihiko, Matsuo Jiro Lipid Imaging of Rat Brain Tissue with Swift Heavy Ions 高速重イオンによるラット脳組織内の脂質イメージング Lipid Imaging of Rat Brain Tissue with Swift Heavy Ions Abstract of annual meeting of the Surface Science of Japan, 30, 0, 197-197 表面科学学術講演会要旨集, 30, 0, 197-197 Abstract of annual meeting of the Surface Science of Japan, 30, 0, 197-197 2010 Japanese Disclose to all
yamamoto yasuyuki, ichiki kazuya, ninomiya satoshi, seki toshio, aoki takaaki, matsuo jirou 山本 恭千, 市木 和弥, 二宮 啓, 瀬木 利夫, 青木 学聡, 松尾 二郎 yamamoto yasuyuki, ichiki kazuya, ninomiya satoshi, seki toshio, aoki takaaki, matsuo jirou Instrumental development of imaging mass spectrometry with ToF-SIMS using Ar cluster ArクラスターSIMSを用いたToF型質量イメージング装置の開発 Instrumental development of imaging mass spectrometry with ToF-SIMS using Ar cluster Abstract of annual meeting of the Surface Science of Japan, 30, 0, 308-308 表面科学学術講演会要旨集, 30, 0, 308-308 Abstract of annual meeting of the Surface Science of Japan, 30, 0, 308-308 2010 Japanese Disclose to all
Matsuo Jiro, Ichiki Kazuya, Yamamoto Yasuyuki, Wakamatsu Yoshinobu, Aoki Takaaki, Seki Toshio 松尾 二郎, 市木 和弥, 山本 恭千, 若松 慶喜, 青木 学聡, 瀬木 利夫 Matsuo Jiro, Ichiki Kazuya, Yamamoto Yasuyuki, Wakamatsu Yoshinobu, Aoki Takaaki, Seki Toshio SIMS for biological Applications 二次イオン質量分析法を用いた生体組織の観察 SIMS for biological Applications Abstract of annual meeting of the Surface Science of Japan, 30, 0, 447-447 表面科学学術講演会要旨集, 30, 0, 447-447 Abstract of annual meeting of the Surface Science of Japan, 30, 0, 447-447 2010 Japanese Disclose to all
G. Sciaini, M. Hada, J. Matsuo, A. Karantza, G. Moriena, R.J. Dwayne Mi G. Sciaini, M. Hada, J. Matsuo, A. Karantza, G. Moriena, R.J. Dwayne Mi G. Sciaini, M. Hada, J. Matsuo, A. Karantza, G. Moriena, R.J. Dwayne Mi Coherent acoustic phonons in highly oriented bismuth films monitored by femtosecond electron diffraction Coherent acoustic phonons in highly oriented bismuth films monitored by femtosecond electron diffraction Coherent acoustic phonons in highly oriented bismuth films monitored by femtosecond electron diffraction Optics InfoBase Conference Papers Optics InfoBase Conference Papers Optics InfoBase Conference Papers 2010 Refereed English Disclose to all
J. Matsuo, M. Kase, T. Aoki, T. Seki J. Matsuo, M. Kase, T. Aoki, T. Seki J. Matsuo, M. Kase, T. Aoki, T. Seki 18<sup>th</sup> International Conference on Ion Implantation Technology 18<sup>th</sup> International Conference on Ion Implantation Technology 18<sup>th</sup> International Conference on Ion Implantation Technology AIP Conference Proceedings, 1321, xi AIP Conference Proceedings, 1321, xi AIP Conference Proceedings, 1321, xi 2010 Refereed English Disclose to all
Y.-L. Jiang, S. Shishiguchi, J. Matsuo, H. Wakabayashi, Y.-C. Yeo, S. Deleonibus Y.-L. Jiang, S. Shishiguchi, J. Matsuo, H. Wakabayashi, Y.-C. Yeo, S. Deleonibus Y.-L. Jiang, S. Shishiguchi, J. Matsuo, H. Wakabayashi, Y.-C. Yeo, S. Deleonibus IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology: Foreword IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology: Foreword IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology: Foreword IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology 2010 Refereed English Disclose to all
Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo MD simulation of small boron cluster implantation MD simulation of small boron cluster implantation MD simulation of small boron cluster implantation IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology, 114-115 IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology, 114-115 IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology, 114-115 2010 Refereed English Disclose to all
T. Seki, Y. Yoshino, T. Senoo, K. Koike, S. Ninomiya, T. Aoki, J. Matsuo T. Seki, Y. Yoshino, T. Senoo, K. Koike, S. Ninomiya, T. Aoki, J. Matsuo T. Seki, Y. Yoshino, T. Senoo, K. Koike, S. Ninomiya, T. Aoki, J. Matsuo High Speed Si Etching with ClF3 Cluster Injection High Speed Si Etching with ClF3 Cluster Injection High Speed Si Etching with ClF3 Cluster Injection ION IMPLANTATION TECHNOLOGY 2010, 1321, 317-+ ION IMPLANTATION TECHNOLOGY 2010, 1321, 317-+ ION IMPLANTATION TECHNOLOGY 2010, 1321, 317-+ 2010 Refereed English Disclose to all
K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Energy effects on the sputtering yield of Si bombarded with gas cluster ion beams Energy effects on the sputtering yield of Si bombarded with gas cluster ion beams Energy effects on the sputtering yield of Si bombarded with gas cluster ion beams ION IMPLANTATION TECHNOLOGY 2010, 1321, 294-+ ION IMPLANTATION TECHNOLOGY 2010, 1321, 294-+ ION IMPLANTATION TECHNOLOGY 2010, 1321, 294-+ 2010 Refereed English Disclose to all
Masaki Hada, Yusaku Hontani, Sachi Ibuki, Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masaki Hada, Yusaku Hontani, Sachi Ibuki, Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Masaki Hada, Yusaku Hontani, Sachi Ibuki, Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Evaluation of Surface Damage of Organic Films due to Irradiation with Energetic Ion Beams Evaluation of Surface Damage of Organic Films due to Irradiation with Energetic Ion Beams Evaluation of Surface Damage of Organic Films due to Irradiation with Energetic Ion Beams ION IMPLANTATION TECHNOLOGY 2010, 1321, 314-+ ION IMPLANTATION TECHNOLOGY 2010, 1321, 314-+ ION IMPLANTATION TECHNOLOGY 2010, 1321, 314-+ 2010 Refereed English Disclose to all
Yoshinobu Wakamatsu, Hideaki Yamada, Satoshi Ninomiya, Brian N. Jones, Toshio Seki, Takaaki Aoki, Roger Webb, Jiro Matsuo Yoshinobu Wakamatsu, Hideaki Yamada, Satoshi Ninomiya, Brian N. Jones, Toshio Seki, Takaaki Aoki, Roger Webb, Jiro Matsuo Yoshinobu Wakamatsu, Hideaki Yamada, Satoshi Ninomiya, Brian N. Jones, Toshio Seki, Takaaki Aoki, Roger Webb, Jiro Matsuo Biomolecular Emission by Swift Heavy Ion Bombardment Biomolecular Emission by Swift Heavy Ion Bombardment Biomolecular Emission by Swift Heavy Ion Bombardment ION IMPLANTATION TECHNOLOGY 2010, 1321, 233-+ ION IMPLANTATION TECHNOLOGY 2010, 1321, 233-+ ION IMPLANTATION TECHNOLOGY 2010, 1321, 233-+ 2010 Refereed English Disclose to all
Y. Yamamoto, K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Y. Yamamoto, K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Y. Yamamoto, K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, J. Matsuo Evaluation of surface damage on organic materials irradiated with Ar cluster ion beam Evaluation of surface damage on organic materials irradiated with Ar cluster ion beam Evaluation of surface damage on organic materials irradiated with Ar cluster ion beam ION IMPLANTATION TECHNOLOGY 2010, 1321, 298-+ ION IMPLANTATION TECHNOLOGY 2010, 1321, 298-+ ION IMPLANTATION TECHNOLOGY 2010, 1321, 298-+ 2010 Refereed English Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Hideaki Yamada, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Hideaki Yamada, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Hideaki Yamada, Toshio Seki, Takaaki Aoki, Jiro Matsuo SIMS depth profiling of organic films with Ar cluster ion beams SIMS depth profiling of organic films with Ar cluster ion beams SIMS depth profiling of organic films with Ar cluster ion beams Extended Abstracts of 9th Workshop on Cluster Ion Beam Technology, 61-68 Extended Abstracts of 9th Workshop on Cluster Ion Beam Technology, 61-68 Extended Abstracts of 9th Workshop on Cluster Ion Beam Technology, 61-68 2009 English Research paper, summary (national conference and other science council) Disclose to all
Wakamatsu Yoshinobu, Yamada Hideaki, Nakata Yoshihiko, Ninomiya Satoshi, Seki Toshio, Aoki Takaaki, Matsuo Jiro 若松 慶信, 山田 英丙, 中田 由彦, 二宮 啓, 瀬木 利夫, 青木 学聡, 松尾 二郎 Wakamatsu Yoshinobu, Yamada Hideaki, Nakata Yoshihiko, Ninomiya Satoshi, Seki Toshio, Aoki Takaaki, Matsuo Jiro Developing SIMS at low vacuum using fast heavy ions 高速重イオンを用いた低真空SIMSの開発 Developing SIMS at low vacuum using fast heavy ions Abstract of annual meeting of the Surface Science of Japan, 29, 0, 35-35 表面科学学術講演会要旨集, 29, 0, 35-35 Abstract of annual meeting of the Surface Science of Japan, 29, 0, 35-35 2009 Japanese Disclose to all
Jiro Matsuo, Kazuya Ichiki, Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Tsutomu Nagayama, Masayasu Tanjyo Jiro Matsuo, Kazuya Ichiki, Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Tsutomu Nagayama, Masayasu Tanjyo Jiro Matsuo, Kazuya Ichiki, Masaki Hada, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Tsutomu Nagayama, Masayasu Tanjyo Stress measurement of carbon cluster implanted layers with in-plane diffraction technique Stress measurement of carbon cluster implanted layers with in-plane diffraction technique Stress measurement of carbon cluster implanted layers with in-plane diffraction technique Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 84-85 Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 84-85 Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 84-85 2009 Refereed English Disclose to all
T. Aoki, J. Matsuo T. Aoki, J. Matsuo T. Aoki, J. Matsuo Study of damage accumulation and annealing process at low energy boron implantation using molecular dynamics simulations Study of damage accumulation and annealing process at low energy boron implantation using molecular dynamics simulations Study of damage accumulation and annealing process at low energy boron implantation using molecular dynamics simulations Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 131-132 Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 131-132 Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 131-132 2009 Refereed English Disclose to all
NAKATA Yoshihiko, YAMADA Hideaki, HONDA Yoshiro, NINOMIYA Satoshi, SEKI Toshio, AOKI Takaaki, MATSUO Jiro 中田 由彦, 山田 英丙, 本田 善郎, 二宮 啓, 瀬木 利夫, 青木 学聡, 松尾 二郎 NAKATA Yoshihiko, YAMADA Hideaki, HONDA Yoshiro, NINOMIYA Satoshi, SEKI Toshio, AOKI Takaaki, MATSUO Jiro Imaging Mass Spectrometry with Swift Heavy Ions 高速重イオンを利用したイメージング質量分析 Imaging Mass Spectrometry with Swift Heavy Ions Journal of the Mass Spectrometry Society of Japan, 56, 4, 201-208 質量分析 = Mass spectroscopy, 56, 4, 201-208 Journal of the Mass Spectrometry Society of Japan, 56, 4, 201-208 2008/08/01 Japanese Disclose to all
Nakata Y., Honda Y., Ninomiya S., Seki T., Aoki T., Matsuo J. 中田 由彦, 本田 善郎, 二宮 啓, 瀬木 利夫, 青木 学聡, 松尾 二郎 Nakata Y., Honda Y., Ninomiya S., Seki T., Aoki T., Matsuo J. 24aRB-2 A New Approach to High Resolution Imaging Mass Spectrometry 24aRB-2 高分解能イメージング質量分析へ向けたイオン入射条件の探索(原子分子・放射線融合(イオン-表面相互作用),領域1,原子・分子,量子エレクトロニクス,放射線物理) 24aRB-2 A New Approach to High Resolution Imaging Mass Spectrometry Meeting Abstracts of the Physical Society of Japan, 63, 0, 165-165 日本物理学会講演概要集, 63, 0, 165-165 Meeting Abstracts of the Physical Society of Japan, 63, 0, 165-165 2008 Japanese Disclose to all
Ninomiya S., Ichiki K., Nakata Y., Seki T., Aoki T., Matsuo J. 二宮 啓, 市木 和弥, 中田 由彦, 瀬木 利夫, 青木 学聡, 松尾 二郎 Ninomiya S., Ichiki K., Nakata Y., Seki T., Aoki T., Matsuo J. 23aRB-2 The effect of incident velocity of large Ar cluster ions on secondary ion emission for Si 23aRB-2 巨大Arクラスター衝突によりSiから生成される二次イオンにおける入射速度効果(放射線物理(散乱素過程),領域1,原子・分子,量子エレクトロニクス,放射線物理) 23aRB-2 The effect of incident velocity of large Ar cluster ions on secondary ion emission for Si Meeting Abstracts of the Physical Society of Japan, 63, 0, 144-144 日本物理学会講演概要集, 63, 0, 144-144 Meeting Abstracts of the Physical Society of Japan, 63, 0, 144-144 2008 Japanese Disclose to all
Matsuo Jiro, Ninomiya Satoshi, Aoki Takaaki, Seki Toshio 松尾 二郎, 二宮 啓, 青木 学聡, 瀬木 利夫 Matsuo Jiro, Ninomiya Satoshi, Aoki Takaaki, Seki Toshio Recent Progress in Cluster Ion Beam:-Toward Nano-Processing and Advanced Material Analysis クラスターイオンの新しい展開:~ナノプロセスから先端分析応用~ Recent Progress in Cluster Ion Beam:-Toward Nano-Processing and Advanced Material Analysis Journal of Surface Analysis, 14, 3, 196-203 Journal of Surface Analysis, 14, 3, 196-203 Journal of Surface Analysis, 14, 3, 196-203 2008 Japanese Disclose to all
青木 学聡, Seki Toshio, Matsuo Jiro 青木 学聡, Seki Toshio, Matsuo Jiro 青木 学聡, Seki Toshio, Matsuo Jiro Study of density effect of large gas cluster impact by molecular dynamics simulations クラスターイオン衝突の密度効果 Study of density effect of large gas cluster impact by molecular dynamics simulations Annual report of Ion Beam Engineering Laboratory, University of Hyogo, 2008, 224-227 兵庫県立大学工学研究科イオン工学研究室論文集, 2008, 224-227 Annual report of Ion Beam Engineering Laboratory, University of Hyogo, 2008, 224-227 2008 English Disclose to all
瀬木 利夫, Aoki Takaaki, Matsuo Jiro 瀬木 利夫, Aoki Takaaki, Matsuo Jiro 瀬木 利夫, Aoki Takaaki, Matsuo Jiro High-speed processing with Cl2 cluster ion beam 塩素クラスターによる高速加工 High-speed processing with Cl2 cluster ion beam Annual report of Ion Beam Engineering Laboratory, University of Hyogo, 2008, 259-264 兵庫県立大学工学研究科イオン工学研究室論文集, 2008, 259-264 Annual report of Ion Beam Engineering Laboratory, University of Hyogo, 2008, 259-264 2008 English Disclose to all
Toshio Seki, Takaaki Aoki, Jiro Matsu Toshio Seki, Takaaki Aoki, Jiro Matsu Toshio Seki, Takaaki Aoki, Jiro Matsu Investigation of Damage with Cluster Ion Beam Irradiation Using HR-RBS Investigation of Damage with Cluster Ion Beam Irradiation Using HR-RBS Investigation of Damage with Cluster Ion Beam Irradiation Using HR-RBS ION IMPLANTATION TECHNOLOGY 2008, 1066, 423-+ ION IMPLANTATION TECHNOLOGY 2008, 1066, 423-+ ION IMPLANTATION TECHNOLOGY 2008, 1066, 423-+ 2008 Refereed English Disclose to all
Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Computer modeling of cluster ion impacts Computer modeling of cluster ion impacts Computer modeling of cluster ion impacts EXTENDED ABSTRACTS 2008 INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY, 49-54 EXTENDED ABSTRACTS 2008 INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY, 49-54 EXTENDED ABSTRACTS 2008 INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY, 49-54 2008 Refereed English Research paper, summary (international conference) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Yoshiro Honda, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Yoshiro Honda, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Yoshiro Honda, Toshio Seki, Takaaki Aoki, Jiro Matsuo Ionization and low damage etching of soft materials with slow Ar cluster ions Ionization and low damage etching of soft materials with slow Ar cluster ions Ionization and low damage etching of soft materials with slow Ar cluster ions Extended Abstracts of 8th Workshop on Cluster Ion Beam Technology, 41-46 Extended Abstracts of 8th Workshop on Cluster Ion Beam Technology, 41-46 Extended Abstracts of 8th Workshop on Cluster Ion Beam Technology, 41-46 2007 English Research paper, summary (international conference) Disclose to all
Ninomiya S., Ichiki K., Nakata Y., Seki T., Aoki T., Matsuo J. 二宮 啓, 市木 和弥, 中田 由彦, 瀬木 利夫, 青木 学聡, 松尾 二郎 Ninomiya S., Ichiki K., Nakata Y., Seki T., Aoki T., Matsuo J. 19aXJ-4 Measurements of secondary ion yields under size-selected cluster ion irradiation 19aXJ-4 サイズ選別されたクラスターイオン照射における二次イオン収率測定(放射線物理,領域1,原子・分子,量子エレクトロニクス,放射線物理) 19aXJ-4 Measurements of secondary ion yields under size-selected cluster ion irradiation Meeting Abstracts of the Physical Society of Japan, 62, 0, 138-138 日本物理学会講演概要集, 62, 0, 138-138 Meeting Abstracts of the Physical Society of Japan, 62, 0, 138-138 2007 Japanese Disclose to all
Jiro Matsuo, Takaaki Aoki, Toshio Seki Jiro Matsuo, Takaaki Aoki, Toshio Seki Jiro Matsuo, Takaaki Aoki, Toshio Seki Cluster ion implantation - Prospects and challenges Cluster ion implantation - Prospects and challenges Cluster ion implantation - Prospects and challenges Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007, 53-54 Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007, 53-54 Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007, 53-54 2007 Refereed English Disclose to all
Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo Takaaki Aoki, Toshio Seki, Jiro Matsuo MD study of damage structures with poly-atomic boron cluster implantation MD study of damage structures with poly-atomic boron cluster implantation MD study of damage structures with poly-atomic boron cluster implantation Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007, 23-24 Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007, 23-24 Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007, 23-24 2007 Refereed English Disclose to all
Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Kazuya Ichiki, Satoshi Ninomiya, Toshio Seki, Takaaki Aoki, Jiro Matsuo Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere Extended Abstracts of 7th Workshop on Cluster Ion Beam and Advanced Quantum Beam Process Technology, 124-129 Extended Abstracts of 7th Workshop on Cluster Ion Beam and Advanced Quantum Beam Process Technology, 124-129 Extended Abstracts of 7th Workshop on Cluster Ion Beam and Advanced Quantum Beam Process Technology, 124-129 2006 English Research paper, summary (international conference) Disclose to all
Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo Satoshi Ninomiya, Kazuya Ichiki, Yoshihiko Nakata, Toshio Seki, Takaaki Aoki, Jiro Matsuo The effect of incident cluster ion size on secondary ion yields emitted from Si The effect of incident cluster ion size on secondary ion yields emitted from Si The effect of incident cluster ion size on secondary ion yields emitted from Si Extended Abstracts of 7th Workshop on Cluster Ion Beam and Advanced Quantum Beam Process Technology, 148-154 Extended Abstracts of 7th Workshop on Cluster Ion Beam and Advanced Quantum Beam Process Technology, 148-154 Extended Abstracts of 7th Workshop on Cluster Ion Beam and Advanced Quantum Beam Process Technology, 148-154 2006 English Research paper, summary (international conference) Disclose to all
Ninomiya S., Aoki T., Seki T., Nakata Y., Ichiki K., Matsuo J. 二宮 啓, 青木 学聡, 瀬木 利夫, 中田 由彦, 市木 和弥, 松尾 二郎 Ninomiya S., Aoki T., Seki T., Nakata Y., Ichiki K., Matsuo J. 28aTA-6 Incident cluster ion dependence of ionization probability on sputtering 28aTA-6 スパッタリングにおけるイオン化確率の入射クラスターイオン種依存性(28aTA 放射線物理,領域1(原子・分子,量子エレクトロニクス,放射線物理)) 28aTA-6 Incident cluster ion dependence of ionization probability on sputtering Meeting Abstracts of the Physical Society of Japan, 61, 0, 155-155 日本物理学会講演概要集, 61, 0, 155-155 Meeting Abstracts of the Physical Society of Japan, 61, 0, 155-155 2006 Japanese Disclose to all
Ninomiya S., Ichiki K., Nakata Y., Seki T., Aoki T., Matsuo J. 二宮 啓, 市木 和弥, 中田 由彦, 瀬木 利夫, 青木 学聡, 松尾 二郎 Ninomiya S., Ichiki K., Nakata Y., Seki T., Aoki T., Matsuo J. 26pWD-7 Measurements of secondary ions produced by size-selected cluster ions 26pWD-7 サイズ選別されたクラスターイオンにより生成される二次イオンの測定(26pWD 放射線物理,領域1(原子・分子,量子エレクトロニクス,放射線物理)) 26pWD-7 Measurements of secondary ions produced by size-selected cluster ions Meeting Abstracts of the Physical Society of Japan, 61, 0, 126-126 日本物理学会講演概要集, 61, 0, 126-126 Meeting Abstracts of the Physical Society of Japan, 61, 0, 126-126 2006 Japanese Disclose to all
Ninomiya Satoshi, Ichiki Kazuya, Nakata Yoshihiko, Seki Toshio, Aoki Takaaki, Matsuo Jiro 二宮 啓, 市木 和弥, 中田 由彦, 瀬木 利夫, 青木 学聡, 松尾 二郎 Ninomiya Satoshi, Ichiki Kazuya, Nakata Yoshihiko, Seki Toshio, Aoki Takaaki, Matsuo Jiro Incident size dependence of secondary ion yields emitted from biomolecules under Ar cluster ion bombardment Arクラスターイオン衝撃により生体高分子薄膜から放出される二次イオン収率の入射サイズ依存性 Incident size dependence of secondary ion yields emitted from biomolecules under Ar cluster ion bombardment Abstract of annual meeting of the Surface Science of Japan, 26, 0, 106-106 表面科学講演大会講演要旨集, 26, 0, 106-106 Abstract of annual meeting of the Surface Science of Japan, 26, 0, 106-106 2006 Disclose to all
Ichiki Kazuya, Ninomiya Satoshi, Seki Toshio, Aoki Takaaki, Matsuo Jiro 市木 和弥, 二宮 啓, 瀬木 利夫, 青木 学聡, 松尾 二郎 Ichiki Kazuya, Ninomiya Satoshi, Seki Toshio, Aoki Takaaki, Matsuo Jiro Incident cluster size dependence of secondary ion yields クラスターイオン照射における二次イオン収率の入射サイズ依存性 Incident cluster size dependence of secondary ion yields Abstract of annual meeting of the Surface Science of Japan, 26, 0, 108-108 表面科学講演大会講演要旨集, 26, 0, 108-108 Abstract of annual meeting of the Surface Science of Japan, 26, 0, 108-108 2006 Disclose to all
T. Seki, J. Matsuo T. Seki, J. Matsuo T. Seki, J. Matsuo High-speed nano-processing with cluster ion beams High-speed nano-processing with cluster ion beams High-speed nano-processing with cluster ion beams ION IMPLANTATION TECHNOLOGY, 866, 214-+ ION IMPLANTATION TECHNOLOGY, 866, 214-+ ION IMPLANTATION TECHNOLOGY, 866, 214-+ 2006 Refereed English Disclose to all
Matsuo, Jiro, Aoki, Takaaki, Seki, Toshio Matsuo, Jiro, Aoki, Takaaki, Seki, Toshio Matsuo, Jiro, Aoki, Takaaki, Seki, Toshio Large Cluster Ions as Projectiles for SIMS-Opportunities and Challenges Large Cluster Ions as Projectiles for SIMS-Opportunities and Challenges Large Cluster Ions as Projectiles for SIMS-Opportunities and Challenges Proceedings of 18th Annual Workshop on SIMS,, pp. 29-32 Proceedings of 18th Annual Workshop on SIMS,, pp. 29-32 Proceedings of 18th Annual Workshop on SIMS,, pp. 29-32 2005/05 Refereed English Disclose to all
Satoshi Ninomiya, Chikage Imada, Masafumi Nagai, Yoshihiko Nakata, Takaaki Aoki, Jiro Matsuo, Nobutsugu Imanishi Satoshi Ninomiya, Chikage Imada, Masafumi Nagai, Yoshihiko Nakata, Takaaki Aoki, Jiro Matsuo, Nobutsugu Imanishi Satoshi Ninomiya, Chikage Imada, Masafumi Nagai, Yoshihiko Nakata, Takaaki Aoki, Jiro Matsuo, Nobutsugu Imanishi Total sputtering yields of solids under MeV-energy Si ion bombardment Total sputtering yields of solids under MeV-energy Si ion bombardment Total sputtering yields of solids under MeV-energy Si ion bombardment Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 230, 1-4, 483-488 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 230, 1-4, 483-488 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 230, 1-4, 483-488 2005/04 English Disclose to all
Yoshihiko Nakata, Satoshi Ninomiya, Chikage Imada, Masafumi Nagai, Takaaki Aoki, Jiro Matsuo, Nobutsugu Imanishi Yoshihiko Nakata, Satoshi Ninomiya, Chikage Imada, Masafumi Nagai, Takaaki Aoki, Jiro Matsuo, Nobutsugu Imanishi Yoshihiko Nakata, Satoshi Ninomiya, Chikage Imada, Masafumi Nagai, Takaaki Aoki, Jiro Matsuo, Nobutsugu Imanishi Secondary neutral and ionized particle measurements under MeV-energy ion bombardment Secondary neutral and ionized particle measurements under MeV-energy ion bombardment Secondary neutral and ionized particle measurements under MeV-energy ion bombardment Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 230, 1-4, 489-494 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 230, 1-4, 489-494 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 230, 1-4, 489-494 2005/04 English Disclose to all
Ninomiya S, Nakata Y, Aoki T, Matsuo J, Ito A 二宮 啓, 中田 由彦, 青木 学聡, 松尾 二郎, 伊藤 秋男 Ninomiya S, Nakata Y, Aoki T, Matsuo J, Ito A 25aYJ-6 A comparison of total sputtering yields measured with several methods 25aYJ-6 複数の方法で測定した全スパッタリング収率の比較(放射線物理,領域1(原子・分子,量子エレクトロニクス,放射線物理)) 25aYJ-6 A comparison of total sputtering yields measured with several methods Meeting Abstracts of the Physical Society of Japan, 60, 0 日本物理学会講演概要集, 60, 0 Meeting Abstracts of the Physical Society of Japan, 60, 0 2005 Japanese Disclose to all
Nakata Y, Ninomiya S, Aoki T, Tsuchida H, Matsuo J, Itoh A 中田 由彦, 二宮 啓, 青木 学聡, 土田 秀次, 松尾 二郎, 伊藤 秋男 Nakata Y, Ninomiya S, Aoki T, Tsuchida H, Matsuo J, Itoh A 25aYJ-9 Measurements of yields and kinetic energies of secondary neutrals spattered by swift ion 25aYJ-9 高速イオン衝撃スパッタリングによる中性粒子の収量及び放出エネルギー測定(放射線物理,領域1(原子・分子,量子エレクトロニクス,放射線物理)) 25aYJ-9 Measurements of yields and kinetic energies of secondary neutrals spattered by swift ion Meeting Abstracts of the Physical Society of Japan, 60, 0 日本物理学会講演概要集, 60, 0 Meeting Abstracts of the Physical Society of Japan, 60, 0 2005 Japanese Disclose to all
Ninomiya S., Aoki T., Seki T., Matsuo J. 二宮 啓, 青木 学聡, 瀬木 利夫, 松尾 二郎 Ninomiya S., Aoki T., Seki T., Matsuo J. 19pYR-5 Secondary ion emission from semiconductors under large gas cluster Ion bombardment 19pYR-5 巨大ガスクラスターイオン衝突による半導体材料からの二次イオン放出(放射線物理,領域1(原子・分子,量子エレクトロニクス,放射線物理)) 19pYR-5 Secondary ion emission from semiconductors under large gas cluster Ion bombardment Meeting Abstracts of the Physical Society of Japan, 60, 0, 56-56 日本物理学会講演概要集, 60, 0, 56-56 Meeting Abstracts of the Physical Society of Japan, 60, 0, 56-56 2005 Japanese Disclose to all
Nakata Y, Ninomiya S, Aoki T, Tsuchida H, Matsuo J, Itoh A 中田 由彦, 二宮 啓, 青木 学聡, 土田 秀次, 松尾 二郎, 伊藤 秋男 Nakata Y, Ninomiya S, Aoki T, Tsuchida H, Matsuo J, Itoh A 19pYR-9 Excited molecule emissions under MeV-energy ion bombardment 19pYR-9 MeV重イオン衝撃スパッタリングによる励起状態分子放出(放射線物理,領域1(原子・分子,量子エレクトロニクス,放射線物理)) 19pYR-9 Excited molecule emissions under MeV-energy ion bombardment Meeting Abstracts of the Physical Society of Japan, 60, 0 日本物理学会講演概要集, 60, 0 Meeting Abstracts of the Physical Society of Japan, 60, 0 2005 Japanese Disclose to all
Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Molecular dynamics simulations of sequential cluster ion impacts Molecular dynamics simulations of sequential cluster ion impacts Molecular dynamics simulations of sequential cluster ion impacts Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 228, 1-4, 46-50 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 228, 1-4, 46-50 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 228, 1-4, 46-50 2005/01 English Disclose to all
Takaaki Aoki, Jiro Matsuo, Isao Yamada Takaaki Aoki, Jiro Matsuo, Isao Yamada Takaaki Aoki, Jiro Matsuo, Isao Yamada Surface structure dependence of impact processes of gas cluster ions Surface structure dependence of impact processes of gas cluster ions Surface structure dependence of impact processes of gas cluster ions Novel Materials Processing by Advanced Electromagnetic Energy Sources, 231-234 Novel Materials Processing by Advanced Electromagnetic Energy Sources, 231-234 Novel Materials Processing by Advanced Electromagnetic Energy Sources, 231-234 2005 English Disclose to all
L. K. Ono, T. Aoki, T. Seki, J. Matsuo, A. Itoh L. K. Ono, T. Aoki, T. Seki, J. Matsuo, A. Itoh L. K. Ono, T. Aoki, T. Seki, J. Matsuo, A. Itoh Gas cluster ion beam source for secondary ion emission measurements Gas cluster ion beam source for secondary ion emission measurements Gas cluster ion beam source for secondary ion emission measurements Novel Materials Processing by Advanced Electromagnetic Energy Sources, 227-230 Novel Materials Processing by Advanced Electromagnetic Energy Sources, 227-230 Novel Materials Processing by Advanced Electromagnetic Energy Sources, 227-230 2005 English Disclose to all
T. Aoki, J. Matsuo T. Aoki, J. Matsuo T. Aoki, J. Matsuo Molecular dynamics simulations of the cluster-size effect on the sputtering process with reactive gas cluster ions Molecular dynamics simulations of the cluster-size effect on the sputtering process with reactive gas cluster ions Molecular dynamics simulations of the cluster-size effect on the sputtering process with reactive gas cluster ions Materials Research Society Symposium Proceedings, 908, 18-24 Materials Research Society Symposium Proceedings, 908, 18-24 Materials Research Society Symposium Proceedings, 908, 18-24 2005 Refereed English Disclose to all
T Aoki, J Matsuo T Aoki, J Matsuo T Aoki, J Matsuo Molecular dynamics study of suface structure and sputtering process by sequencial fluorine cluster impacts Molecular dynamics study of suface structure and sputtering process by sequencial fluorine cluster impacts Molecular dynamics study of suface structure and sputtering process by sequencial fluorine cluster impacts Surface Engineering 2004 - Fundamentals and Applications, 843, 189-194 Surface Engineering 2004 - Fundamentals and Applications, 843, 189-194 Surface Engineering 2004 - Fundamentals and Applications, 843, 189-194 2005 Refereed English Disclose to all
S Kakuta, S Sasaki, K Furusawa, T Seki, T Aoki, J Matsuo S Kakuta, S Sasaki, K Furusawa, T Seki, T Aoki, J Matsuo S Kakuta, S Sasaki, K Furusawa, T Seki, T Aoki, J Matsuo Low damage smoothing of magnetic materials using oblique irradiation of gas cluster ion beam Low damage smoothing of magnetic materials using oblique irradiation of gas cluster ion beam Low damage smoothing of magnetic materials using oblique irradiation of gas cluster ion beam Surface Engineering 2004 - Fundamentals and Applications, 843, 183-188 Surface Engineering 2004 - Fundamentals and Applications, 843, 183-188 Surface Engineering 2004 - Fundamentals and Applications, 843, 183-188 2005 Refereed English Disclose to all
T Seki, J Matsuo T Seki, J Matsuo T Seki, J Matsuo High-speed processing with reactive cluster ion beams High-speed processing with reactive cluster ion beams High-speed processing with reactive cluster ion beams Surface Engineering 2004 - Fundamentals and Applications, 843, 251-256 Surface Engineering 2004 - Fundamentals and Applications, 843, 251-256 Surface Engineering 2004 - Fundamentals and Applications, 843, 251-256 2005 Refereed English Disclose to all
Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Takaaki Aoki, Jiro Matsuo Surface structure dependence of impact processes of gas cluster ions Surface structure dependence of impact processes of gas cluster ions Surface structure dependence of impact processes of gas cluster ions Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 216, 1-4, 185-190 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 216, 1-4, 185-190 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 216, 1-4, 185-190 2004/02 English Disclose to all
Shigeru Kakuta, Toshio Seki, Shinji Sasaki, Kenji Furusawa, Takaaki Aoki, Jiro Matsuo Shigeru Kakuta, Toshio Seki, Shinji Sasaki, Kenji Furusawa, Takaaki Aoki, Jiro Matsuo Shigeru Kakuta, Toshio Seki, Shinji Sasaki, Kenji Furusawa, Takaaki Aoki, Jiro Matsuo Fast Neutral Ar Penetration during Gas Cluster Ion Beam Irradiation into Magnetic Thin Films Fast Neutral Ar Penetration during Gas Cluster Ion Beam Irradiation into Magnetic Thin Films Fast Neutral Ar Penetration during Gas Cluster Ion Beam Irradiation into Magnetic Thin Films MRS Proceedings, 792, R9.36.1-R9.36.6 MRS Proceedings, 792, R9.36.1-R9.36.6 MRS Proceedings, 792, R9.36.1-R9.36.6 2004 Refereed English Research paper, summary (international conference) Disclose to all
Ninomiya S, Nakata Y, Aoki T, Matsuo J, Itoh A 二宮 啓, 中田 由彦, Aoki T, 松尾 二郎, 伊藤 秋男 Ninomiya S, Nakata Y, Aoki T, Matsuo J, Itoh A 12aTG-5 Total sputtering yields of insulators and metals in MeV-energy range 12aTG-5 MeV エネルギー領域での絶縁体及び金属の全スパッタリング収率測定(放射線物理, 領域 1) 12aTG-5 Total sputtering yields of insulators and metals in MeV-energy range Meeting Abstracts of the Physical Society of Japan, 59, 0 日本物理学会講演概要集, 59, 0 Meeting Abstracts of the Physical Society of Japan, 59, 0 2004 Japanese Disclose to all
T Seki, J Matsuo T Seki, J Matsuo T Seki, J Matsuo High-speed processing with cluster ion beams High-speed processing with cluster ion beams High-speed processing with cluster ion beams RADIATION EFFECTS AND ION-BEAM PROCESSING OF MATERIALS, 792, 593-598 RADIATION EFFECTS AND ION-BEAM PROCESSING OF MATERIALS, 792, 593-598 RADIATION EFFECTS AND ION-BEAM PROCESSING OF MATERIALS, 792, 593-598 2004 Refereed English Disclose to all
S Kakuta, T Seki, S Sasaki, K Furusawa, T Aoki, J Matsuo S Kakuta, T Seki, S Sasaki, K Furusawa, T Aoki, J Matsuo S Kakuta, T Seki, S Sasaki, K Furusawa, T Aoki, J Matsuo Fast neutral Ar penetration during gas cluster ion beam irradiation into magnetic thin films Fast neutral Ar penetration during gas cluster ion beam irradiation into magnetic thin films Fast neutral Ar penetration during gas cluster ion beam irradiation into magnetic thin films RADIATION EFFECTS AND ION-BEAM PROCESSING OF MATERIALS, 792, 599-604 RADIATION EFFECTS AND ION-BEAM PROCESSING OF MATERIALS, 792, 599-604 RADIATION EFFECTS AND ION-BEAM PROCESSING OF MATERIALS, 792, 599-604 2004 Refereed English Disclose to all
Takaaki Aoki, Takaaki Aoki, Jiro Matsuo, Isao Yamada, Isao Yamada Takaaki Aoki, Takaaki Aoki, Jiro Matsuo, Isao Yamada, Isao Yamada Takaaki Aoki, Takaaki Aoki, Jiro Matsuo, Isao Yamada, Isao Yamada Molecular dynamics study of surface morphological evolution by cluster impacts Molecular dynamics study of surface morphological evolution by cluster impacts Molecular dynamics study of surface morphological evolution by cluster impacts Materials Research Society Symposium - Proceedings, 792, 497-502 Materials Research Society Symposium - Proceedings, 792, 497-502 Materials Research Society Symposium - Proceedings, 792, 497-502 2003/12/01 Disclose to all
Matsuo, Jiro, Kitagawa, Teruyuki, Shimizugawa, Yutaka, Kageyama, Hiroyuki, Kanda, Kazuhiro, Seki, Toshio, Aoki, Takaaki, Matsui, Shinji Matsuo, Jiro, Kitagawa, Teruyuki, Shimizugawa, Yutaka, Kageyama, Hiroyuki, Kanda, Kazuhiro, Seki, Toshio, Aoki, Takaaki, Matsui, Shinji Matsuo, Jiro, Kitagawa, Teruyuki, Shimizugawa, Yutaka, Kageyama, Hiroyuki, Kanda, Kazuhiro, Seki, Toshio, Aoki, Takaaki, Matsui, Shinji XAFS study of thin films fabricated with cluster ion assisted deposition technique XAFS study of thin films fabricated with cluster ion assisted deposition technique XAFS study of thin films fabricated with cluster ion assisted deposition technique Trans. Mat. Res. Soc. Jpn.,28, pp. 101-106 Trans. Mat. Res. Soc. Jpn.,28, pp. 101-106 Trans. Mat. Res. Soc. Jpn.,28, pp. 101-106 2003/12 Refereed English Disclose to all
Noriaki Toyoda, Jiro Matsuo, Takaaki Aoki, Isao Yamada, David B. Fenner Noriaki Toyoda, Jiro Matsuo, Takaaki Aoki, Isao Yamada, David B. Fenner Noriaki Toyoda, Jiro Matsuo, Takaaki Aoki, Isao Yamada, David B. Fenner Secondary ion mass spectrometry with gas cluster ion beams Secondary ion mass spectrometry with gas cluster ion beams Secondary ion mass spectrometry with gas cluster ion beams Applied Surface Science, 203-204, 214-218 Applied Surface Science, 203-204, 214-218 Applied Surface Science, 203-204, 214-218 2003/01/15 English Disclose to all
T Seki, J Matsuo, GH Takaoka T Seki, J Matsuo, GH Takaoka T Seki, J Matsuo, GH Takaoka High current cluster ion beam source High current cluster ion beam source High current cluster ion beam source APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 715-718 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 715-718 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 715-718 2003 Refereed English Disclose to all
T Aoki, T Seki, A Nakai, J Matsuo, G Takaoka T Aoki, T Seki, A Nakai, J Matsuo, G Takaoka T Aoki, T Seki, A Nakai, J Matsuo, G Takaoka Study of cluster-size effect on damage formation Study of cluster-size effect on damage formation Study of cluster-size effect on damage formation APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 741-744 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 741-744 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 680, 741-744 2003 Refereed English Disclose to all
T Seki, T Aoki, A Nakai, J Matsuo, GH Takaoka T Seki, T Aoki, A Nakai, J Matsuo, GH Takaoka T Seki, T Aoki, A Nakai, J Matsuo, GH Takaoka Threshold energy for generating damage with cluster ion irradiation Threshold energy for generating damage with cluster ion irradiation Threshold energy for generating damage with cluster ion irradiation MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 749, 335-340 MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 749, 335-340 MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 749, 335-340 2003 Refereed English Disclose to all
Aoki, Takaaki, Seki, Toshio, Nakai, Atsuko, Matsuo, Jiro, Takaoka, Gikan H Aoki, Takaaki, Seki, Toshio, Nakai, Atsuko, Matsuo, Jiro, Takaoka, Gikan H Aoki, Takaaki, Seki, Toshio, Nakai, Atsuko, Matsuo, Jiro, Takaoka, Gikan H Cluster Size Effect on Surface Modification Process using Cluster Ion Beam Cluster Size Effect on Surface Modification Process using Cluster Ion Beam Cluster Size Effect on Surface Modification Process using Cluster Ion Beam Trans. Mat. Res. Soc. Jpn.,28 (2), pp. 485-488 Trans. Mat. Res. Soc. Jpn.,28 (2), pp. 485-488 Trans. Mat. Res. Soc. Jpn.,28 (2), pp. 485-488 2003/01 Refereed English Disclose to all
T Seki, T Aoki, A Nakai, J Matsuo, GH Takaoka T Seki, T Aoki, A Nakai, J Matsuo, GH Takaoka T Seki, T Aoki, A Nakai, J Matsuo, GH Takaoka Threshold energy for generating damage with cluster ion irradiation Threshold energy for generating damage with cluster ion irradiation Threshold energy for generating damage with cluster ion irradiation MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 749, 335-340 MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 749, 335-340 MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 749, 335-340 2003 Refereed English Disclose to all
T Aoki, A Nakai, J Matsuo, G Takaoka T Aoki, A Nakai, J Matsuo, G Takaoka T Aoki, A Nakai, J Matsuo, G Takaoka Study of surface morphological evolution by cluster ion irradiation on solid targets Study of surface morphological evolution by cluster ion irradiation on solid targets Study of surface morphological evolution by cluster ion irradiation on solid targets MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 749, 311-316 MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 749, 311-316 MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 749, 311-316 2003 Refereed English Disclose to all
AOKI Takaaki, MATSUO Jiro, TAKAOKA Gikan 青木 学聡, 松尾 二郎, 高岡 義寛 AOKI Takaaki, MATSUO Jiro, TAKAOKA Gikan MD simulations of accumulation and desorption with low energy boron implantation 低エネルギーホウ素イオン注入におけるホウ素の蓄積・脱離過程のシミュレーション MD simulations of accumulation and desorption with low energy boron implantation Technical report of IEICE. SDM, 102, 540, 25-28 電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス, 102, 540, 25-28 Technical report of IEICE. SDM, 102, 540, 25-28 2002/12/13 Japanese Disclose to all
Takaaki Aoki, Jiro Matsuo, Gikan Takaoka Takaaki Aoki, Jiro Matsuo, Gikan Takaoka Takaaki Aoki, Jiro Matsuo, Gikan Takaoka Study of damage formation by low-energy boron cluster ion implantation Study of damage formation by low-energy boron cluster ion implantation Study of damage formation by low-energy boron cluster ion implantation Proceedings of the International Conference on Ion Implantation Technology, 22-27-, 560-563 Proceedings of the International Conference on Ion Implantation Technology, 22-27-, 560-563 Proceedings of the International Conference on Ion Implantation Technology, 22-27-, 560-563 2002 English Disclose to all
Toshio Seki, Jiro Matsuo, Gikan H. Takaoka Toshio Seki, Jiro Matsuo, Gikan H. Takaoka Toshio Seki, Jiro Matsuo, Gikan H. Takaoka Development of the large current cluster ion beam technology Development of the large current cluster ion beam technology Development of the large current cluster ion beam technology Proceedings of the International Conference on Ion Implantation Technology, 22-27-, 673-676 Proceedings of the International Conference on Ion Implantation Technology, 22-27-, 673-676 Proceedings of the International Conference on Ion Implantation Technology, 22-27-, 673-676 2002 Refereed English Disclose to all
高岡 義寛, 瀬木 利夫, 松尾 二郎 高岡 義寛, 瀬木 利夫, 松尾 二郎 高岡 義寛, 瀬木 利夫, 松尾 二郎 Chemical Reaction of Cluster Ion Beam with Surfaces クラスターイオンビーム照射による表面反応過程 Chemical Reaction of Cluster Ion Beam with Surfaces Proceedings of the 12th Symposium on Beam Engineering of Advanced Material Syntheses, 61-64 Proceedings of the 12th Symposium on Beam Engineering of Advanced Material Syntheses, 61-64 Proceedings of the 12th Symposium on Beam Engineering of Advanced Material Syntheses, 61-64 2001/11 Refereed Japanese Research paper, summary (national conference and other science council) Disclose to all
N. Toyoda, T. Aoki, J. Matsuo, I. Yamada, K. Wada, L.C. Kimerling N. Toyoda, T. Aoki, J. Matsuo, I. Yamada, K. Wada, L.C. Kimerling N. Toyoda, T. Aoki, J. Matsuo, I. Yamada, K. Wada, L.C. Kimerling Photoluminescence study of defects induced by B<sub>10</sub>H<sub>14</sub> ions Photoluminescence study of defects induced by B<sub>10</sub>H<sub>14</sub> ions Photoluminescence study of defects induced by B<sub>10</sub>H<sub>14</sub> ions Materials Research Society Symposium - Proceedings, 669, J4201-J4206 Materials Research Society Symposium - Proceedings, 669, J4201-J4206 Materials Research Society Symposium - Proceedings, 669, J4201-J4206 2001 Refereed English Disclose to all
E.C. Jones, K.S. Jones, M.D. Giles, P. Stolk, J. Matsuo E.C. Jones, K.S. Jones, M.D. Giles, P. Stolk, J. Matsuo E.C. Jones, K.S. Jones, M.D. Giles, P. Stolk, J. Matsuo Materials Research Society Symposium - Proceedings: Preface Materials Research Society Symposium - Proceedings: Preface Materials Research Society Symposium - Proceedings: Preface Materials Research Society Symposium - Proceedings, 669, xi Materials Research Society Symposium - Proceedings, 669, xi Materials Research Society Symposium - Proceedings, 669, xi 2001 Refereed English Disclose to all
T. Aoki, J. Matsuo, G. Takaoka, I. Yamada T. Aoki, J. Matsuo, G. Takaoka, I. Yamada T. Aoki, J. Matsuo, G. Takaoka, I. Yamada Molecular dynamics simulations of cluster ion impact on diamond surface Molecular dynamics simulations of cluster ion impact on diamond surface Molecular dynamics simulations of cluster ion impact on diamond surface Materials Research Society Symposium - Proceedings, 650, [d]R3.40.1-R3.40.1 Materials Research Society Symposium - Proceedings, 650, [d]R3.40.1-R3.40.1 Materials Research Society Symposium - Proceedings, 650, [d]R3.40.1-R3.40.1 2001 Refereed English Disclose to all
Seki, Toshio, Matsuo, Jiro, Takaoka, Gikan H, Yamada, Isao Seki, Toshio, Matsuo, Jiro, Takaoka, Gikan H, Yamada, Isao Seki, Toshio, Matsuo, Jiro, Takaoka, Gikan H, Yamada, Isao STM observation of a Si surface irradiated with a single Ar cluster ion STM observation of a Si surface irradiated with a single Ar cluster ion STM observation of a Si surface irradiated with a single Ar cluster ion AIP Conference Proceedings,576, pp. 1003-1006 AIP Conference Proceedings,576, pp. 1003-1006 AIP Conference Proceedings,576, pp. 1003-1006 2001 Refereed English Disclose to all
Seki, Toshio, Tsumura, Takaaki, Aoki, Takaaki, Matsuo, Jiro, Takaoka, Gikan H, Yamada, Isao Seki, Toshio, Tsumura, Takaaki, Aoki, Takaaki, Matsuo, Jiro, Takaoka, Gikan H, Yamada, Isao Seki, Toshio, Tsumura, Takaaki, Aoki, Takaaki, Matsuo, Jiro, Takaoka, Gikan H, Yamada, Isao Ar Cluster Ion Bombardment Effects on Semiconductor Surfaces Ar Cluster Ion Bombardment Effects on Semiconductor Surfaces Ar Cluster Ion Bombardment Effects on Semiconductor Surfaces Mat. Res. Soc. Symp. Proceedings,647, pp. O9.4.1-O9.4.6 Mat. Res. Soc. Symp. Proceedings,647, pp. O9.4.1-O9.4.6 Mat. Res. Soc. Symp. Proceedings,647, pp. O9.4.1-O9.4.6 2001 Refereed English Disclose to all
KINPARA Hiromichi, SEKI Toshio, MATSUO Jiro, TAKAOKA Gikan 金原 啓道, 瀬木 利夫, 松尾 二郎, 高岡 義寛 KINPARA Hiromichi, SEKI Toshio, MATSUO Jiro, TAKAOKA Gikan Improvement and Applications of Gas Cluster Ion Beam ガスクラスターイオンビームの大電流化及び表面高機能化 Improvement and Applications of Gas Cluster Ion Beam Technical report of IEICE. SDM, 100, 517, 1-6 電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス, 100, 517, 1-6 Technical report of IEICE. SDM, 100, 517, 1-6 2000/12/14 Japanese Disclose to all
CHIBA Shun-ichi, AOKI Takaaki, MATSUO Jiro, TAKAOKA Gikan 千葉 俊一, 青木 学聡, 松尾 二郎, 高岡 義寛 CHIBA Shun-ichi, AOKI Takaaki, MATSUO Jiro, TAKAOKA Gikan Molecular Dynamics Simulation of Fluorine Ion Etching of Silicon 分子動力学法を用いたFイオン照射によるSi表面エッチングのシミュレーション Molecular Dynamics Simulation of Fluorine Ion Etching of Silicon Technical report of IEICE. SDM, 100, 517, 23-28 電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス, 100, 517, 23-28 Technical report of IEICE. SDM, 100, 517, 23-28 2000/12/14 Japanese Disclose to all
瀬木 利夫, 津村 一道, 松尾 二郎, 高岡 義寛 瀬木 利夫, 津村 一道, 松尾 二郎, 高岡 義寛 Si(111)上Ge極薄膜へのイオン照射効果 Si(111)上Ge極薄膜へのイオン照射効果 Proceedings of the 11th Symposium on Beam Engineering of Advanced Material Syntheses,, pp. 41-44 Proceedings of the 11th Symposium on Beam Engineering of Advanced Material Syntheses,, pp. 41-44 2000/11 Japanese Disclose to all
J Matsuo, N Toyoda, M Saito, T Aoki, T Seki, Yamada, I J Matsuo, N Toyoda, M Saito, T Aoki, T Seki, Yamada, I J Matsuo, N Toyoda, M Saito, T Aoki, T Seki, Yamada, I Novel analysis techniques using cluster ion beams Novel analysis techniques using cluster ion beams Novel analysis techniques using cluster ion beams APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 429-432 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 429-432 APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 475, 429-432 1999 Refereed English Disclose to all
Noriaki Toyoda, Masahiro Saito, Norihisa Hagiwara, Jiro Matsuo, Isao Yamada Noriaki Toyoda, Masahiro Saito, Norihisa Hagiwara, Jiro Matsuo, Isao Yamada Noriaki Toyoda, Masahiro Saito, Norihisa Hagiwara, Jiro Matsuo, Isao Yamada Cluster size measurement of large Ar cluster ions with Time of Flight Cluster size measurement of large Ar cluster ions with Time of Flight Cluster size measurement of large Ar cluster ions with Time of Flight Proceedings of the International Conference on Ion Implantation Technology, 2, 1234-1237 Proceedings of the International Conference on Ion Implantation Technology, 2, 1234-1237 Proceedings of the International Conference on Ion Implantation Technology, 2, 1234-1237 1999 Refereed English Disclose to all
E. Minami, W. Qin, M. Akizuki, H. Kastumata, J. Matsuo, I. Yamada E. Minami, W. Qin, M. Akizuki, H. Kastumata, J. Matsuo, I. Yamada E. Minami, W. Qin, M. Akizuki, H. Kastumata, J. Matsuo, I. Yamada Development of multi-beam gas cluster ion beam equipment for high quality ITO film formation at low temperatures Development of multi-beam gas cluster ion beam equipment for high quality ITO film formation at low temperatures Development of multi-beam gas cluster ion beam equipment for high quality ITO film formation at low temperatures Proceedings of the International Conference on Ion Implantation Technology, 2, 1191-1194 Proceedings of the International Conference on Ion Implantation Technology, 2, 1191-1194 Proceedings of the International Conference on Ion Implantation Technology, 2, 1191-1194 1999 Refereed English Disclose to all
Takuya Kusaba, Norihiro Shimada, Takaaki Aoki, Jiro Matsuo, Isao Yamada, Kenichi Goto, Toshihiro Sugii Takuya Kusaba, Norihiro Shimada, Takaaki Aoki, Jiro Matsuo, Isao Yamada, Kenichi Goto, Toshihiro Sugii Takuya Kusaba, Norihiro Shimada, Takaaki Aoki, Jiro Matsuo, Isao Yamada, Kenichi Goto, Toshihiro Sugii Boron diffusion in ultra low-energy (<1 keV/atom) decaborane (B<sub>10</sub>H<sub>14</sub>) ion implantation Boron diffusion in ultra low-energy (<1 keV/atom) decaborane (B<sub>10</sub>H<sub>14</sub>) ion implantation Boron diffusion in ultra low-energy (<1 keV/atom) decaborane (B<sub>10</sub>H<sub>14</sub>) ion implantation Proceedings of the International Conference on Ion Implantation Technology, 2, 1258-1261 Proceedings of the International Conference on Ion Implantation Technology, 2, 1258-1261 Proceedings of the International Conference on Ion Implantation Technology, 2, 1258-1261 1999 Refereed English Disclose to all
Takashi Nishihara, Hiroshi Katsumata, Jiro Matsuo, Isao Yamada Takashi Nishihara, Hiroshi Katsumata, Jiro Matsuo, Isao Yamada Takashi Nishihara, Hiroshi Katsumata, Jiro Matsuo, Isao Yamada Fullerene ion (C<sub>60</sub><sup>+</sup>) implantation in GaAs(100) substrate Fullerene ion (C<sub>60</sub><sup>+</sup>) implantation in GaAs(100) substrate Fullerene ion (C<sub>60</sub><sup>+</sup>) implantation in GaAs(100) substrate Proceedings of the International Conference on Ion Implantation Technology, 2, 1203-1206 Proceedings of the International Conference on Ion Implantation Technology, 2, 1203-1206 Proceedings of the International Conference on Ion Implantation Technology, 2, 1203-1206 1999 Refereed English Disclose to all
H. Katsumata, J. Matsuo, T. Nishihara, T. Tachibana, E. Minami, K. Yamada, M. Adachi, I. Yamada H. Katsumata, J. Matsuo, T. Nishihara, T. Tachibana, E. Minami, K. Yamada, M. Adachi, I. Yamada H. Katsumata, J. Matsuo, T. Nishihara, T. Tachibana, E. Minami, K. Yamada, M. Adachi, I. Yamada Formation of oxide thin films for optical applications by O<sub>2</sub>-cluster ion beam assisted deposition Formation of oxide thin films for optical applications by O<sub>2</sub>-cluster ion beam assisted deposition Formation of oxide thin films for optical applications by O<sub>2</sub>-cluster ion beam assisted deposition Proceedings of the International Conference on Ion Implantation Technology, 2, 1195-1198 Proceedings of the International Conference on Ion Implantation Technology, 2, 1195-1198 Proceedings of the International Conference on Ion Implantation Technology, 2, 1195-1198 1999 Refereed English Disclose to all
Zinetulla Insepov, Takaaki Aoki, Jiro Matsuo, Isao Yamada Zinetulla Insepov, Takaaki Aoki, Jiro Matsuo, Isao Yamada Zinetulla Insepov, Takaaki Aoki, Jiro Matsuo, Isao Yamada Computer simulation of decaborane implantation and rapid thermal annealing Computer simulation of decaborane implantation and rapid thermal annealing Computer simulation of decaborane implantation and rapid thermal annealing Proceedings of the International Conference on Ion Implantation Technology, 2, 807-810 Proceedings of the International Conference on Ion Implantation Technology, 2, 807-810 Proceedings of the International Conference on Ion Implantation Technology, 2, 807-810 1999 Refereed English Disclose to all
Majeed A. Foad, Roger Webb, Roger Smith, Erin Jones, Amir Al-Bayati, Mark Lee, Vikas Agrawal, Sanjay Banerjee, Jiro Matsuo, Isao Yamada Majeed A. Foad, Roger Webb, Roger Smith, Erin Jones, Amir Al-Bayati, Mark Lee, Vikas Agrawal, Sanjay Banerjee, Jiro Matsuo, Isao Yamada Majeed A. Foad, Roger Webb, Roger Smith, Erin Jones, Amir Al-Bayati, Mark Lee, Vikas Agrawal, Sanjay Banerjee, Jiro Matsuo, Isao Yamada Formation of shallow junctions using decaborane molecular ion implantation; Comparison with molecular dynamics simulation Formation of shallow junctions using decaborane molecular ion implantation; Comparison with molecular dynamics simulation Formation of shallow junctions using decaborane molecular ion implantation; Comparison with molecular dynamics simulation Proceedings of the International Conference on Ion Implantation Technology, 1, 106-109 Proceedings of the International Conference on Ion Implantation Technology, 1, 106-109 Proceedings of the International Conference on Ion Implantation Technology, 1, 106-109 1999 Refereed English Disclose to all
Toshio Seki, Jiro Matsuo, Isao Yamada Toshio Seki, Jiro Matsuo, Isao Yamada Toshio Seki, Jiro Matsuo, Isao Yamada STM observations of the annealing process of the damage caused by ion impact STM observations of the annealing process of the damage caused by ion impact STM observations of the annealing process of the damage caused by ion impact Proceedings of the International Conference on Ion Implantation Technology, 2, 1262-1265 Proceedings of the International Conference on Ion Implantation Technology, 2, 1262-1265 Proceedings of the International Conference on Ion Implantation Technology, 2, 1262-1265 1999 Refereed English Disclose to all
SEKI Toshio, MATSUO Jiro, YAMADA Isao 瀬木 利夫, 松尾 二郎, 山田 公 SEKI Toshio, MATSUO Jiro, YAMADA Isao VT-STM observation of Si surfaces damaged by ion impact イオン衝突によるシリコン表面欠陥の高温STM観察 VT-STM observation of Si surfaces damaged by ion impact Technical report of IEICE. SDM, 98, 445, 31-38 電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス, 98, 445, 31-38 Technical report of IEICE. SDM, 98, 445, 31-38 1998/12/10 Japanese Disclose to all
KUSABA T., SEKI T., AOKI T., MATSUO J., KASE M., GOTO K., SUGII T., YAMADA I. 草場 拓也, 瀬木 利夫, 青木 学聡, 松尾 二郎, 加勢 正隆, 後藤 賢一, 杉井 寿博, 山田 公 KUSABA T., SEKI T., AOKI T., MATSUO J., KASE M., GOTO K., SUGII T., YAMADA I. Damage formation and enhanced diffusion by decaborane ion implantation デカボランイオン注入による損傷の形成とその増速拡散への影響 Damage formation and enhanced diffusion by decaborane ion implantation Technical report of IEICE. SDM, 98, 445, 97-104 電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス, 98, 445, 97-104 Technical report of IEICE. SDM, 98, 445, 97-104 1998/12/10 Japanese Disclose to all
Isao Yamada, Jiro Matsuo, Noriaki Toyoda, Takaaki Aoki 山田 公, 松尾 二郎, 豊田 紀章, 青木 学聡 Isao Yamada, Jiro Matsuo, Noriaki Toyoda, Takaaki Aoki Cluster Ion Implantation and Device Processes クラスターイオン注入とデバイスプロセス Cluster Ion Implantation and Device Processes Shinku/Journal of the Vacuum Society of Japan, 41, 11, 932-939 真空, 41, 11, 932-939 Shinku/Journal of the Vacuum Society of Japan, 41, 11, 932-939 1998 English Disclose to all
T Seki, M Tanomura, T Aoki, J Matsuo, Yamada, I T Seki, M Tanomura, T Aoki, J Matsuo, Yamada, I T Seki, M Tanomura, T Aoki, J Matsuo, Yamada, I Size dependence of bombardment characteristics produced by cluster ion beams Size dependence of bombardment characteristics produced by cluster ion beams Size dependence of bombardment characteristics produced by cluster ion beams ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 93-98 ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 93-98 ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 93-98 1998 Refereed English Disclose to all
J Matsuo, W Qin, M Akizuki, T Yodoshi, Yamada, I J Matsuo, W Qin, M Akizuki, T Yodoshi, Yamada, I J Matsuo, W Qin, M Akizuki, T Yodoshi, Yamada, I High quality oxide film formation by O-2 cluster ion assisted deposition technique High quality oxide film formation by O-2 cluster ion assisted deposition technique High quality oxide film formation by O-2 cluster ion assisted deposition technique ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 87-92 ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 87-92 ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 87-92 1998 Refereed English Disclose to all
T. Tanaka, H. Ogawa, K. Goto, K. Itabashi, T. Yamazaki, J. Matsuo, T. Sugii, I. Yamada T. Tanaka, H. Ogawa, K. Goto, K. Itabashi, T. Yamazaki, J. Matsuo, T. Sugii, I. Yamada T. Tanaka, H. Ogawa, K. Goto, K. Itabashi, T. Yamazaki, J. Matsuo, T. Sugii, I. Yamada Channel engineering using B<sub>10</sub>H<sub>14</sub> ion implantation for low Vth and high SCE immunity of buried-channel PMOSFETs in 4-Gbit DRAMs and beyond Channel engineering using B<sub>10</sub>H<sub>14</sub> ion implantation for low Vth and high SCE immunity of buried-channel PMOSFETs in 4-Gbit DRAMs and beyond Channel engineering using B<sub>10</sub>H<sub>14</sub> ion implantation for low Vth and high SCE immunity of buried-channel PMOSFETs in 4-Gbit DRAMs and beyond Digest of Technical Papers - Symposium on VLSI Technology, 88-89 Digest of Technical Papers - Symposium on VLSI Technology, 88-89 Digest of Technical Papers - Symposium on VLSI Technology, 88-89 1998 Refereed English Disclose to all
Z Insepov, T Aoki, J Matsuo, Yamada, I Z Insepov, T Aoki, J Matsuo, Yamada, I Z Insepov, T Aoki, J Matsuo, Yamada, I Computer simulation of annealing after cluster ion implantation Computer simulation of annealing after cluster ion implantation Computer simulation of annealing after cluster ion implantation SILICON FRONT-END TECHNOLOGY-MATERIALS PROCESSING AND MODELLING, 532, 147-152 SILICON FRONT-END TECHNOLOGY-MATERIALS PROCESSING AND MODELLING, 532, 147-152 SILICON FRONT-END TECHNOLOGY-MATERIALS PROCESSING AND MODELLING, 532, 147-152 1998 Refereed English Disclose to all
J Matsuo, T Aoki, K Goto, T Sugii, Yamada, I J Matsuo, T Aoki, K Goto, T Sugii, Yamada, I J Matsuo, T Aoki, K Goto, T Sugii, Yamada, I Ultra shallow junction formation by cluster ion implantation Ultra shallow junction formation by cluster ion implantation Ultra shallow junction formation by cluster ion implantation SILICON FRONT-END TECHNOLOGY-MATERIALS PROCESSING AND MODELLING, 532, 17-22 SILICON FRONT-END TECHNOLOGY-MATERIALS PROCESSING AND MODELLING, 532, 17-22 SILICON FRONT-END TECHNOLOGY-MATERIALS PROCESSING AND MODELLING, 532, 17-22 1998 Refereed English Disclose to all
T Seki, M Tanomura, T Aoki, J Matsuo, Yamada, I T Seki, M Tanomura, T Aoki, J Matsuo, Yamada, I T Seki, M Tanomura, T Aoki, J Matsuo, Yamada, I Size dependence of bombardment characteristics produced by cluster ion beams Size dependence of bombardment characteristics produced by cluster ion beams Size dependence of bombardment characteristics produced by cluster ion beams ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 93-98 ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 93-98 ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 93-98 1998 Refereed English Disclose to all
T Aoki, T Seki, M Tanomura, J Matsuo, Z Insepov, Yamada, I T Aoki, T Seki, M Tanomura, J Matsuo, Z Insepov, Yamada, I T Aoki, T Seki, M Tanomura, J Matsuo, Z Insepov, Yamada, I Molecular dynamics simulation of fullerene cluster ion impact Molecular dynamics simulation of fullerene cluster ion impact Molecular dynamics simulation of fullerene cluster ion impact ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 81-86 ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 81-86 ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 504, 81-86 1998 Refereed English Disclose to all
YAMADA Isao, MATSUO Jiro, TOYODA Noriaki, AOKI Takaaki, INSEPOV Zinetulla 山田 公, 松尾 二郎, 豊田 紀章, 青木 学聡, INSEPOV Zinetulla YAMADA Isao, MATSUO Jiro, TOYODA Noriaki, AOKI Takaaki, INSEPOV Zinetulla A New Sputter Etching Technology by Gas-Cluster Ion Beam ガスクラスターイオンビームによる表面エッチング A New Sputter Etching Technology by Gas-Cluster Ion Beam Journal of the Surface Science Society of Japan, 18, 12, 743-751 表面科学, 18, 12, 743-751 Journal of the Surface Science Society of Japan, 18, 12, 743-751 1997/12/10 Japanese Disclose to all
YAMADA Isao, MATSUO Jiro, TOYODA Noriaki, AOKI Takaaki 山田 公, 松尾 二郎, 豊田 紀章, 青木 学聡 YAMADA Isao, MATSUO Jiro, TOYODA Noriaki, AOKI Takaaki Gas Cluster Ion Beam Processing ガスクラスターイオンビームプロセッシング Gas Cluster Ion Beam Processing 電気学会研究会資料. MC, 金属・セラミックス研究会, 1997, 1, 27-34 電気学会研究会資料. MC, 金属・セラミックス研究会, 1997, 1, 27-34 電気学会研究会資料. MC, 金属・セラミックス研究会, 1997, 1, 27-34 1997/11/18 Japanese Disclose to all
瀬木 利夫, 田能村 昌宏, 松尾 二郎, 山田 公 瀬木 利夫, 田能村 昌宏, 松尾 二郎, 山田 公 クラスタ-衝突における非線形効果 (原子核とマイクロクラスタ-の類似性と異質性) クラスタ-衝突における非線形効果 (原子核とマイクロクラスタ-の類似性と異質性) 物性研究, 68, 2, 194-198 物性研究, 68, 2, 194-198 , 68, 2, 194-198 1997/05 Japanese Disclose to all
N Toyoda, J Matsuo, Yamada, I N Toyoda, J Matsuo, Yamada, I N Toyoda, J Matsuo, Yamada, I Surface processing by gas cluster ion beams Surface processing by gas cluster ion beams Surface processing by gas cluster ion beams ION IMPLANTATION TECHNOLOGY - 96, 808-811 ION IMPLANTATION TECHNOLOGY - 96, 808-811 ION IMPLANTATION TECHNOLOGY - 96, 808-811 1997 Refereed English Disclose to all
Yamada, I, J Matsuo, EC Jones, D Takeuchi, T Aoki, K Goto, T Sugii Yamada, I, J Matsuo, EC Jones, D Takeuchi, T Aoki, K Goto, T Sugii Yamada, I, J Matsuo, EC Jones, D Takeuchi, T Aoki, K Goto, T Sugii Range and damage distribution in cluster ion implantation Range and damage distribution in cluster ion implantation Range and damage distribution in cluster ion implantation MATERIALS MODIFICATION AND SYNTHESIS BY ION BEAM PROCESSING, 438, 363-374 MATERIALS MODIFICATION AND SYNTHESIS BY ION BEAM PROCESSING, 438, 363-374 MATERIALS MODIFICATION AND SYNTHESIS BY ION BEAM PROCESSING, 438, 363-374 1997 Refereed English Disclose to all
J Matsuo, D Takeuchi, T Aoki, Yamada, I J Matsuo, D Takeuchi, T Aoki, Yamada, I J Matsuo, D Takeuchi, T Aoki, Yamada, I Cluster ion implantation for shallow junction formation Cluster ion implantation for shallow junction formation Cluster ion implantation for shallow junction formation ION IMPLANTATION TECHNOLOGY - 96, 768-771 ION IMPLANTATION TECHNOLOGY - 96, 768-771 ION IMPLANTATION TECHNOLOGY - 96, 768-771 1997 Refereed English Disclose to all
AOKI T, SHIMADA N, TAKEUCHI D, MATSUO J, INSEPOV Z, YAMADA I 青木 学聡, 島田 規広, 竹内 大輔, 松尾 二郎, Insepov Zinetulla, 山田 公 AOKI T, SHIMADA N, TAKEUCHI D, MATSUO J, INSEPOV Z, YAMADA I The Molecular Dynamics Simulation of Boron Cluster Ion Implantation 分子動力学法によるホウ素クラスターイオン注入のシミュレーション The Molecular Dynamics Simulation of Boron Cluster Ion Implantation Technical report of IEICE. SDM, 96, 396, 49-54 電子情報通信学会技術研究報告. SDM, シリコン材料・デバイス, 96, 396, 49-54 Technical report of IEICE. SDM, 96, 396, 49-54 1996/12/06 Japanese Disclose to all
Yamada, I, J Matsuo Yamada, I, J Matsuo Yamada, I, J Matsuo Nanoscale processing by gas cluster ion beams - Novel technique in ion beam processing Nanoscale processing by gas cluster ion beams - Novel technique in ion beam processing Nanoscale processing by gas cluster ion beams - Novel technique in ion beam processing THIRD INTERNATIONAL CONFERENCE ON INTELLIGENT MATERIALS - THIRD EUROPEAN CONFERENCE ON SMART STRUCTURES AND MATERIALS, 2779, 759-764 THIRD INTERNATIONAL CONFERENCE ON INTELLIGENT MATERIALS - THIRD EUROPEAN CONFERENCE ON SMART STRUCTURES AND MATERIALS, 2779, 759-764 THIRD INTERNATIONAL CONFERENCE ON INTELLIGENT MATERIALS - THIRD EUROPEAN CONFERENCE ON SMART STRUCTURES AND MATERIALS, 2779, 759-764 1996 Refereed English Disclose to all
Yamada, I, J Matsuo Yamada, I, J Matsuo Yamada, I, J Matsuo Lateral sputtering by gas cluster ion beams and its applications to atomic level surface modification Lateral sputtering by gas cluster ion beams and its applications to atomic level surface modification Lateral sputtering by gas cluster ion beams and its applications to atomic level surface modification ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING, 396, 149-154 ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING, 396, 149-154 ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING, 396, 149-154 1996 Refereed English Disclose to all
D Takeuchi, J Matsuo, Yamada, I D Takeuchi, J Matsuo, Yamada, I D Takeuchi, J Matsuo, Yamada, I Bombarding effects of gas cluster ion beams on sapphire surfaces: Characteristics of modified layers and their mechanical and optical properties Bombarding effects of gas cluster ion beams on sapphire surfaces: Characteristics of modified layers and their mechanical and optical properties Bombarding effects of gas cluster ion beams on sapphire surfaces: Characteristics of modified layers and their mechanical and optical properties ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING, 396, 279-284 ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING, 396, 279-284 ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING, 396, 279-284 1996 Refereed English Disclose to all
K KARAHASHI, J MATSUO, K HORIUCHI K KARAHASHI, J MATSUO, K HORIUCHI K KARAHASHI, J MATSUO, K HORIUCHI REACTION-KINETICS OF ATOMIC CHLORINE ON SI(100)2X1 REACTION-KINETICS OF ATOMIC CHLORINE ON SI(100)2X1 REACTION-KINETICS OF ATOMIC CHLORINE ON SI(100)2X1 EVOLUTION OF SURFACE AND THIN FILM MICROSTRUCTURE, 280, 189-192 EVOLUTION OF SURFACE AND THIN FILM MICROSTRUCTURE, 280, 189-192 EVOLUTION OF SURFACE AND THIN FILM MICROSTRUCTURE, 280, 189-192 1993 Refereed English Disclose to all

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Title language:
Books etc
Author Author(Japanese) Author(English) Title Title(Japanese) Title(English) Publisher Publisher(Japanese) Publisher(English) Publication date Language Type Disclose
松尾 二郎 松尾 二郎 松尾 二郎 Ultra-Hard DLC formation at low temperture by gas cluster in beam assisted deposition Ultra-Hard DLC formation at low temperture by gas cluster in beam assisted deposition Ultra-Hard DLC formation at low temperture by gas cluster in beam assisted deposition Mass and Change transprt in inorganic matcrials,/,957-964 Mass and Change transprt in inorganic matcrials,/,957-964 Mass and Change transprt in inorganic matcrials,/,957-964 2000 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Clustor size Measurment of Large Ar Cluster Ins with Time of Flight Clustor size Measurment of Large Ar Cluster Ins with Time of Flight Clustor size Measurment of Large Ar Cluster Ins with Time of Flight IEEE, Proc. of the 12th International Canferencecn Im Implantation Technology,/,1234-1237 IEEE, Proc. of the 12th International Canferencecn Im Implantation Technology,/,1234-1237 IEEE, Proc. of the 12th International Canferencecn Im Implantation Technology,/,1234-1237 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 AIP, Application of Cluster In Implantation Micro electronic Devices AIP, Application of Cluster In Implantation Micro electronic Devices AIP, Application of Cluster In Implantation Micro electronic Devices AIP, Application of Accelaratars in Research and Industry,/,379-382 AIP, Application of Accelaratars in Research and Industry,/,379-382 AIP, Application of Accelaratars in Research and Industry,/,379-382 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Borm Diffusiun in Ultra Low Enery Decaboranc Im Implantation Borm Diffusiun in Ultra Low Enery Decaboranc Im Implantation Borm Diffusiun in Ultra Low Enery Decaboranc Im Implantation IEEE, Proc, of the 12th International Canferencecn Im Implantation Technology,/,1258-1261 IEEE, Proc, of the 12th International Canferencecn Im Implantation Technology,/,1258-1261 IEEE, Proc, of the 12th International Canferencecn Im Implantation Technology,/,1258-1261 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Monte Curlo Simolation of Surfaces Smoothing Effect by Closter Ions Monte Curlo Simolation of Surfaces Smoothing Effect by Closter Ions Monte Curlo Simolation of Surfaces Smoothing Effect by Closter Ions IEEE, Proc. of the 12th Infornatinal Canferecnce on Im Implantation Technology,/,1230-1233 IEEE, Proc. of the 12th Infornatinal Canferecnce on Im Implantation Technology,/,1230-1233 IEEE, Proc. of the 12th Infornatinal Canferecnce on Im Implantation Technology,/,1230-1233 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Development of Multi Been Gas Cluster In Bean Egipment for High Quality ITO Film Formation at Low temperatune Development of Multi Been Gas Cluster In Bean Egipment for High Quality ITO Film Formation at Low temperatune Development of Multi Been Gas Cluster In Bean Egipment for High Quality ITO Film Formation at Low temperatune IEEE, Proc, of the 12th In fornatinal Canferecnce on Im Inplantation Technology,/,1191-1194 IEEE, Proc, of the 12th In fornatinal Canferecnce on Im Inplantation Technology,/,1191-1194 IEEE, Proc, of the 12th In fornatinal Canferecnce on Im Inplantation Technology,/,1191-1194 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Formation of Complex Cluster in Ar/O<sub>2</sub> Gas Closter Beams Formation of Complex Cluster in Ar/O<sub>2</sub> Gas Closter Beams Formation of Complex Cluster in Ar/O<sub>2</sub> Gas Closter Beams IEEE, Proc, of the 12th International Conferencecn Im Implantation Technology,/,1226-1229 IEEE, Proc, of the 12th International Conferencecn Im Implantation Technology,/,1226-1229 IEEE, Proc, of the 12th International Conferencecn Im Implantation Technology,/,1226-1229 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 STM-Observatins of the Amealiy Process of the Damage Caosel by Im Impact STM-Observatins of the Amealiy Process of the Damage Caosel by Im Impact STM-Observatins of the Amealiy Process of the Damage Caosel by Im Impact IEEE, Proc, of the 12th Internatinal Canference on Im Implantation Technology,/,1262-1265 IEEE, Proc, of the 12th Internatinal Canference on Im Implantation Technology,/,1262-1265 IEEE, Proc, of the 12th Internatinal Canference on Im Implantation Technology,/,1262-1265 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Formation of oxide thir Films for Optical Applications by Oz cluster Im Assited Depusitim Formation of oxide thir Films for Optical Applications by Oz cluster Im Assited Depusitim Formation of oxide thir Films for Optical Applications by Oz cluster Im Assited Depusitim IEEE, Proc. of the 12th International Conferercecn Im Inplantation Technology,/,1195-1198 IEEE, Proc. of the 12th International Conferercecn Im Inplantation Technology,/,1195-1198 IEEE, Proc. of the 12th International Conferercecn Im Inplantation Technology,/,1195-1198 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Moleculen Dynamic Study of Inplat and Damge Furmation in Low Energy Borm Cluster Im Implantation Moleculen Dynamic Study of Inplat and Damge Furmation in Low Energy Borm Cluster Im Implantation Moleculen Dynamic Study of Inplat and Damge Furmation in Low Energy Borm Cluster Im Implantation IEEE, Proc, of the 12th Internatinal Canference on Im Implantation Technology,/,1254-1257 IEEE, Proc, of the 12th Internatinal Canference on Im Implantation Technology,/,1254-1257 IEEE, Proc, of the 12th Internatinal Canference on Im Implantation Technology,/,1254-1257 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Surface Smoothing of CVD Diamond Membrane for X-ray Lithography by Gcs Cluster In Beam Surface Smoothing of CVD Diamond Membrane for X-ray Lithography by Gcs Cluster In Beam Surface Smoothing of CVD Diamond Membrane for X-ray Lithography by Gcs Cluster In Beam RIP, Application of Accelarutors in Research and Industry,/,421-424 RIP, Application of Accelarutors in Research and Industry,/,421-424 RIP, Application of Accelarutors in Research and Industry,/,421-424 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Novel Analysis Technigue using Gas Closter Becns Novel Analysis Technigue using Gas Closter Becns Novel Analysis Technigue using Gas Closter Becns AIP, Applicatin of Accelertirs in Research and Industry,/,429-432 AIP, Applicatin of Accelertirs in Research and Industry,/,429-432 AIP, Applicatin of Accelertirs in Research and Industry,/,429-432 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Optical Thin Film Formation by Gas Closter In Becn Assisted Depositin Optical Thin Film Formation by Gas Closter In Becn Assisted Depositin Optical Thin Film Formation by Gas Closter In Becn Assisted Depositin AIP, Application of Accelertors in Research and Industry,/,409-412 AIP, Application of Accelertors in Research and Industry,/,409-412 AIP, Application of Accelertors in Research and Industry,/,409-412 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Fulleren Im Implantation in GaAs(100)substrate Fulleren Im Implantation in GaAs(100)substrate Fulleren Im Implantation in GaAs(100)substrate IEEE, Proc, of the 12th Infornatinal Canferecnce on Im Implantation Technology,/,1203-1206 IEEE, Proc, of the 12th Infornatinal Canferecnce on Im Implantation Technology,/,1203-1206 IEEE, Proc, of the 12th Infornatinal Canferecnce on Im Implantation Technology,/,1203-1206 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Oxide Film Deposition by Gas Cluster Im Assisted Depusitin Oxide Film Deposition by Gas Cluster Im Assisted Depusitin Oxide Film Deposition by Gas Cluster Im Assisted Depusitin AIP, Application of Acceleratons in Research and Industry,/,425-428 AIP, Application of Acceleratons in Research and Industry,/,425-428 AIP, Application of Acceleratons in Research and Industry,/,425-428 1999 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 Cluster Ion Beam Processing Cluster Ion Beam Processing Cluster Ion Beam Processing Materials Science in Semiconductor Procesing,/,27-41 Materials Science in Semiconductor Procesing,/,27-41 Materials Science in Semiconductor Procesing,/,27-41 1998 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Range and Damage Distribution in Cluster Ion Implantation" "Range and Damage Distribution in Cluster Ion Implantation" "Range and Damage Distribution in Cluster Ion Implantation" Materials Research Society Symposium Proceedings,438/,363-374 Materials Research Society Symposium Proceedings,438/,363-374 Materials Research Society Symposium Proceedings,438/,363-374 1997 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Fundamental Aspects of the Ionized Cluster-Beam Deposition Process" "Fundamental Aspects of the Ionized Cluster-Beam Deposition Process" "Fundamental Aspects of the Ionized Cluster-Beam Deposition Process" Surface Review and Letters,3/1,1013-1016 Surface Review and Letters,3/1,1013-1016 Surface Review and Letters,3/1,1013-1016 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Surface Processing by Gas Cluster Ion Beams" "Surface Processing by Gas Cluster Ion Beams" "Surface Processing by Gas Cluster Ion Beams" International Conference on Ion Implantation Technology, IIT'96, International Conference on Ion Implantation Technology, IIT'96, International Conference on Ion Implantation Technology, IIT'96, 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Shallow Junction Formation by Polyatomic Cluster Ion Implantation" "Shallow Junction Formation by Polyatomic Cluster Ion Implantation" "Shallow Junction Formation by Polyatomic Cluster Ion Implantation" International Conference on Ion Implantation Technology, IIT'96, International Conference on Ion Implantation Technology, IIT'96, International Conference on Ion Implantation Technology, IIT'96, 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Gas-Cluster Ion Collisions on Solid Surfaces" "Gas-Cluster Ion Collisions on Solid Surfaces" "Gas-Cluster Ion Collisions on Solid Surfaces" Proceedings of the International Symposium on Material Chemistry in Nuclear Enviroment,/,517-525 Proceedings of the International Symposium on Material Chemistry in Nuclear Enviroment,/,517-525 Proceedings of the International Symposium on Material Chemistry in Nuclear Enviroment,/,517-525 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Shallow Junction Formation by Polyatomic Cluster Ion Implantation" "Shallow Junction Formation by Polyatomic Cluster Ion Implantation" "Shallow Junction Formation by Polyatomic Cluster Ion Implantation" IEEE Proceedings of the 11th INT'L Conference on Ion Implantation Technology,1/,772-775 IEEE Proceedings of the 11th INT'L Conference on Ion Implantation Technology,1/,772-775 IEEE Proceedings of the 11th INT'L Conference on Ion Implantation Technology,1/,772-775 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Cluster Ion Implantation for Shallow Junction Formation" "Cluster Ion Implantation for Shallow Junction Formation" "Cluster Ion Implantation for Shallow Junction Formation" International Conference on Ion Implantation Technology, IIT'96, International Conference on Ion Implantation Technology, IIT'96, International Conference on Ion Implantation Technology, IIT'96, 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Bombarding Effects of Gas Cluster Ion Beams on Sapphire Surfaces : Characteristics of Modified Layers and Their Mechanical and Optical Properties" "Bombarding Effects of Gas Cluster Ion Beams on Sapphire Surfaces : Characteristics of Modified Layers and Their Mechanical and Optical Properties" "Bombarding Effects of Gas Cluster Ion Beams on Sapphire Surfaces : Characteristics of Modified Layers and Their Mechanical and Optical Properties" Materials Research Society Symposium Proceedings,396/,279-284 Materials Research Society Symposium Proceedings,396/,279-284 Materials Research Society Symposium Proceedings,396/,279-284 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Low-Damage Surface Treatment by Gas Cluster-Ion Beams" "Low-Damage Surface Treatment by Gas Cluster-Ion Beams" "Low-Damage Surface Treatment by Gas Cluster-Ion Beams" Surface Review and Letters,3/1,891-895 Surface Review and Letters,3/1,891-895 Surface Review and Letters,3/1,891-895 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Sputtering with Gas Cluster-Ion Beams" "Sputtering with Gas Cluster-Ion Beams" "Sputtering with Gas Cluster-Ion Beams" Surface Review and Letters,3/1,1017-1021 Surface Review and Letters,3/1,1017-1021 Surface Review and Letters,3/1,1017-1021 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Lateral Sputtering by Gas Cluster Ion Beams and Its Applications to Atomic Level Surface Modification" "Lateral Sputtering by Gas Cluster Ion Beams and Its Applications to Atomic Level Surface Modification" "Lateral Sputtering by Gas Cluster Ion Beams and Its Applications to Atomic Level Surface Modification" Materials Research Society Symposium Proceedings,396/,149-154 Materials Research Society Symposium Proceedings,396/,149-154 Materials Research Society Symposium Proceedings,396/,149-154 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Cluster Ion Bombardment-Induced Surface Damage of Si" "Cluster Ion Bombardment-Induced Surface Damage of Si" "Cluster Ion Bombardment-Induced Surface Damage of Si" Surface Review and Letters,3/1,1045-1049 Surface Review and Letters,3/1,1045-1049 Surface Review and Letters,3/1,1045-1049 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Gas Cluster Ion Beam Processing for ULSI Fabrication" "Gas Cluster Ion Beam Processing for ULSI Fabrication" "Gas Cluster Ion Beam Processing for ULSI Fabrication" Material Research Society Symposium Proceedings,427/,265-276 Material Research Society Symposium Proceedings,427/,265-276 Material Research Society Symposium Proceedings,427/,265-276 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Novel Shallow Junction Technology Using Decaborane(B10H14)" "Novel Shallow Junction Technology Using Decaborane(B10H14)" "Novel Shallow Junction Technology Using Decaborane(B10H14)" Proceedings of IEDM, Proceedings of IEDM, Proceedings of IEDM, 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Cluster Ion Implantation for Shallow Junction Formation" "Cluster Ion Implantation for Shallow Junction Formation" "Cluster Ion Implantation for Shallow Junction Formation" IEEE Proceedings of the 11th INT'L Conference on Ion Implantation Technology,1/,768-771 IEEE Proceedings of the 11th INT'L Conference on Ion Implantation Technology,1/,768-771 IEEE Proceedings of the 11th INT'L Conference on Ion Implantation Technology,1/,768-771 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Nanoscale Processing by Gas Cluster Ion Beams-Novel Technique in Ion Beam Processing-" "Nanoscale Processing by Gas Cluster Ion Beams-Novel Technique in Ion Beam Processing-" "Nanoscale Processing by Gas Cluster Ion Beams-Novel Technique in Ion Beam Processing-" Proceedings of the 3rd International Conference on Intelligent Materials, Proceedings of the 3rd International Conference on Intelligent Materials, Proceedings of the 3rd International Conference on Intelligent Materials, 1996 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Cluster Ion Beam Processing of Materials" "Cluster Ion Beam Processing of Materials" "Cluster Ion Beam Processing of Materials" Ion Implantation Technology-IIT'94, (Elsevier Science B. V. ),/,1002-1005 Ion Implantation Technology-IIT'94, (Elsevier Science B. V. ),/,1002-1005 Ion Implantation Technology-IIT'94, (Elsevier Science B. V. ),/,1002-1005 1995 English Disclose to all
松尾 二郎 松尾 二郎 松尾 二郎 "Improvement of Diamond X-Ray Mask Membrane : Optical Transmittance, Surface Roughness and Irradiation Durability" "Improvement of Diamond X-Ray Mask Membrane : Optical Transmittance, Surface Roughness and Irradiation Durability" "Improvement of Diamond X-Ray Mask Membrane : Optical Transmittance, Surface Roughness and Irradiation Durability" Proceedings of Micro-and Nano-Engineering '95,/,1-5 Proceedings of Micro-and Nano-Engineering '95,/,1-5 Proceedings of Micro-and Nano-Engineering '95,/,1-5 1995 English Disclose to all

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Title language:
External funds: competitive funds and Grants-in-Aid for Scientific Research (Kakenhi)
Type Position Title(Japanese) Title(English) Period
基盤研究(C) クラスターイオン分析法の研究 -
挑戦的萌芽研究 コンパクトフェムト秒X線源の探査研究 2010-2011
基盤研究(A) Representative 巨大クラスターイオンによる機能性有機材料評価技術の研究 2011-2013
基盤研究(A) Representative 大気圧SIMS法の開発とその固液界面評価への応用 (平成29年度分) 2017/04/01-2018/03/31
基盤研究(A) Representative 大気圧SIMS法の開発とその固液界面評価への応用 (平成30年度分) 2018/04/01-2019/03/31
基盤研究(A) Representative 大気圧SIMS法の開発とその固液界面評価への応用 (平成30年度分) 2018/04/01-2019/03/31
基盤研究(A) Representative 大気圧SIMS法の開発とその固液界面評価への応用 (2019年度分) 2019/04/01-2020/03/31
基盤研究(A) Representative 大気圧SIMS法の開発とその固液界面評価への応用 (2020年度分) 2020/04/01-2021/03/31
External funds: other than those above
System Main person Title(Japanese) Title(English) Period
高速粒子の表面衝突ダイナミクスの研究 Collision Dynamics of Hyper-thormal Particles on Solid Surfaces -
クラスターイオンビームプロセスの研究 Study on Cluster Ion Beam Processing -
独立行政法人科学技術振興機構理事長 北澤宏一 ソフトナノマテリアル3D分子イメージン グ法の開発 -
研究成果展開事業(先端計測分析技術・機器開発プログラム) 松尾二郎 クラスターイオンを用いる固液界面評価技術の開 2014/12/01-2018/03/30
Teaching subject(s)
Name(Japanese) Name(English) Term Department Period
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2011/04-2012/03
量子科学 後期 工学研究科 2011/04-2012/03
量子物性基礎論(原) 後期 工学部 2011/04-2012/03
原子物理学(材エネ原宇) 後期 工学部 2011/04-2012/03
原子物理学 Atomic Physics 後期 工学部 2012/04-2013/03
量子物性基礎論 Introduction to Solid State Physics 後期 工学部 2012/04-2013/03
量子科学 Quantum Science 後期 工学研究科 2012/04-2013/03
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2012/04-2013/03
原子物理学 Atomic Physics 後期 工学部 2013/04-2014/03
量子物性基礎論 Introduction to Solid State Physics 後期 工学部 2013/04-2014/03
量子科学 Quantum Science 後期 工学研究科 2013/04-2014/03
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2013/04-2014/03
原子物理学 Atomic Physics 後期 工学部 2014/04-2015/03
量子物性基礎論 Introduction to Solid State Physics 後期 工学部 2014/04-2015/03
量子科学 Quantum Science 後期 工学研究科 2014/04-2015/03
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2014/04-2015/03
原子物理学 Atomic Physics 後期 工学部 2015/04-2016/03
量子物性基礎論 Introduction to Solid State Physics 後期 工学部 2015/04-2016/03
量子科学 Quantum Science 後期 工学研究科 2015/04-2016/03
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2015/04-2016/03
先端科学通論 Advanced Science 後期 総合生存学館 2016/04-2017/03
原子物理学 Atomic Physics 後期 工学部 2016/04-2017/03
量子物性基礎論 Introduction to Solid State Physics 後期 工学部 2016/04-2017/03
量子科学 Quantum Science 後期 工学研究科 2016/04-2017/03
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2016/04-2017/03
先端科学通論 Advanced Science 後期 総合生存学館 2017/04-2018/03
原子物理学 Atomic Physics 後期 工学部 2017/04-2018/03
量子物性基礎論 Introduction to Solid State Physics 後期 工学部 2017/04-2018/03
量子科学 Quantum Science 後期 工学研究科 2017/04-2018/03
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2017/04-2018/03
原子物理学 Atomic Physics 後期 工学部 2018/04-2019/03
量子物性基礎論 Introduction to Solid State Physics 後期 工学部 2018/04-2019/03
量子科学 Quantum Science 後期 工学研究科 2018/04-2019/03
量子ビーム科学特論 Quantum Beam Science, Adv. 前期 工学研究科 2018/04-2019/03
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2018/04-2019/03
量子物性基礎論 Introduction to Solid State Physics 後期 工学部 2019/04-2020/03
量子科学 Quantum Science 後期 工学研究科 2019/04-2020/03
量子ビーム科学特論 Quantum Beam Science, Adv. 前期 工学研究科 2019/04-2020/03
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2019/04-2020/03
量子物性基礎論(原) Introduction to Solid State Physics 後期 工学部 2020/04-2021/03
量子科学 Quantum Science 後期 工学研究科 2020/04-2021/03
量子ビーム科学特論 Quantum Beam Science, Adv. 前期 工学研究科 2020/04-2021/03
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2020/04-2021/03
インターンシップ(原) Internship 後期集中 工学部 2021/04-2022/03
インターンシップD(原子核) Engineering Internship D 後期集中 工学研究科 2021/04-2022/03
インターンシップM(原子核) Engineering Internship M 後期集中 工学研究科 2021/04-2022/03
原子核工学セミナーA Seminar on Nuclear Engineering A, B 前期集中 工学研究科 2021/04-2022/03
原子核工学セミナーB Seminar on Nuclear Engineering A, B 後期集中 工学研究科 2021/04-2022/03
原子核工学特別セミナーA Seminar on Nuclear Engineering, Adv. A 前期集中 工学研究科 2021/04-2022/03
原子核工学特別セミナーB Seminar on Nuclear Engineering, Adv. B 後期集中 工学研究科 2021/04-2022/03
原子核工学特別セミナーC Seminar on Nuclear Engineering, Adv. C 前期集中 工学研究科 2021/04-2022/03
原子核工学特別セミナーD Seminar on Nuclear Engineering, Adv. D 後期集中 工学研究科 2021/04-2022/03
原子核工学特別セミナーE Seminar on Nuclear Engineering, Adv. E 前期集中 工学研究科 2021/04-2022/03
原子核工学特別セミナーF Seminar on Nuclear Engineering, Adv. F 後期集中 工学研究科 2021/04-2022/03
原子核工学特別実験及演習第一 Experiments and Exercises on Nuclear Engineering, Adv.I 通年集中 工学研究科 2021/04-2022/03
原子核工学特別実験及演習第二 Experiments and Exercises on Nuclear Engineering, Adv.II 通年集中 工学研究科 2021/04-2022/03
物理工学英語(原) English for Engineering Science 前期集中 工学部 2021/04-2022/03
特別研究2(原) Graduation Thesis2 後期集中 工学部 2021/04-2022/03
特別研究1(原) Graduation Thesis1 前期集中 工学部 2021/04-2022/03
特別研究1(原) Graduation Thesis1 後期集中 工学部 2021/04-2022/03
特別研究2(原) Graduation Thesis2 前期集中 工学部 2021/04-2022/03
研究論文(修士) Master's Thesis 通年集中 工学研究科 2021/04-2022/03
量子物性基礎論(原) Introduction to Solid State Physics 後期 工学部 2021/04-2022/03
量子科学 Quantum Science 後期 工学研究科 2021/04-2022/03
量子ビーム科学特論 Quantum Beam Science, Adv. 前期 工学研究科 2021/04-2022/03
電磁気学続論 Advanced Course of Electromagnetism 前期 全学共通科目 2021/04-2022/03

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Part-time lecturer (outside KU)
Cource name(Japanese) Cource name(English) Term University Department Period
名古屋大学 大学院生命農学研究科 2013/04/11-2014/03/31
国立大学法人大阪大学 2015/04/09-2016/03/31
Faculty management (title, position)
Title Period
工学研究科・工学部図書委員会 委員 2018/04/01-2019/03/31
宇治キャンパス公開2019実行委員会委員 2019/04/01-2020/03/31
宇治地区総合環境安全管理センター運営委員会委員 2019/04/01-2021/03/31
Academic organizaions (other)
Organization name(Japanese) Organization name(English) Misc(Japanese) Misc(English) Period
日本学術振興会第141委員会 運営委員 2014/04/01-
Other activities (awards)
Award name Organization name Date
日本応用物理学会フェロー 日本応用物理学会 2018/09/23